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Semiconductor photoelectric generator (versions)

Semiconductor photoelectric generator (versions)
IPC classes for russian patent Semiconductor photoelectric generator (versions) (RU 2336596):
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FIELD: physics, phototechnics.

SUBSTANCE: invention concerns electronic technics, particularly devices converting electromagnetic emission energy into electric energy, and technologies of their manufacturing, particularly semiconductor photoelectric generators. Semiconductor photoelectric generator takes form of a matrix of commuted microphotoconverters with one or two linear dimensions comparable to diffusion length of secondary current carriers in base area; p-n transition planes are perpendicular to working surface of generator; microphotoconverter surface free of n-p transitions carries a 10-30 nm thick insulating film with 10-40 nm metal clusters positioned on it at 60-120 nm distance from each other; and dielectric layer of passivating antireflection coating is laid over nanoclusters. Two more embodiments of photoelectric generator are claimed.

EFFECT: improved efficiency of photoelectric generator and electromagnetic radiation conversion for single emission.

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The invention relates to electronic devices, namely, devices that convert the energy of electromagnetic radiation in electric and manufacturing technologies, in particular to a semiconductor photovoltaic generator.

Known photovoltaic generator matrix type (patent RF №2265915, 2005, IPC 01L 31/18), in which the semiconductor substrate are epitaxial layers of n and p-type, and the locking effect abratoceon transitions resolved by pulsed breakdown. The disadvantage of this Converter is high enough efficiency not exceeding 8.6% in a single light intensity.

Also known Converter of solar energy into electrical energy (RF patent No. 2217845, 2003, the IPC 01L 31/04) - based photosensitive layer on the metal plate containing the metal nanoparticles in n-layer semiconductor polymer and semiconductor nanocrystals p-type. The disadvantage of this Converter is the instability of the state, ensuring the increase of the dielectric permittivity of the environment of the photosensitive layer, increased losses in the n-region and the effect of photon degradation.

As a prototype adopted the design of the PV generator (A.S. No. 288163 of the USSR, 1967, IPC 01L 31/042), made in the form of a matrix from commute avannah of micropropagules, have one or two linear size commensurate with the diffusion length of minority carriers in the base region, and the plane of p-n junctions perpendicular to the working surface of the generator.

The disadvantage of this Converter is not sufficiently high conversion efficiency.

The task of the invention is to increase the efficiency of the photovoltaic generator, the conversion efficiencies of electromagnetic radiation.

The above result is achieved in that in the semiconductor photovoltaic generator, made in the form of a matrix from commutated of micropropagules, with one or two linear size commensurate with the diffusion length of minority carriers in the base region, and the plane of p-n junctions perpendicular to the working surface of the generator, on the surface of micropropagules free of n-p junctions, placed insulating film thickness of 10-30 nm, where the nanoclusters of metals 10-40 nm with spacing between nanoclusters 60-120 nm, and over the nanoclusters is a layer pestiviruses antireflection coating of dielectric material.

Also increase the efficiency and effectiveness of the conversion is achieved in that in the semiconductor photovoltaic generator, made in the form of mA is the matrix of the commutated of micropropagules, have one or two linear size commensurate with the diffusion length of minority carriers in the base region, and the plane of the n-p junctions perpendicular to the working surface of the generator, on the surface of micropropagules-free p-n junctions, placed an insulating film containing nanoclusters of metals 10-40 nm, and the film is a layer pestiviruses antireflection coating of dielectric material.

Also increase the efficiency and effectiveness of the conversion is achieved in that in the semiconductor photovoltaic generator, made in the form of a matrix from commutated of micropropagules, with one or two linear size commensurate with the diffusion length of minority carriers in the base region, and the plane of the n-p junctions perpendicular to the working surface of the generator, characterized in that on the surface of micropropagules-free p-n junctions, placed an insulating film containing nanoclusters of metals 10-40 nm, with an insulating film performs the function pestiviruses antireflection coating.

The invention is illustrated figure 1-4.

Figure 1 shows the main elements of the structure of the semiconductor photovoltaic generator nanoclusters located on isolera the overall film, with a base region of n-type. Figure 2 shows the main elements of the structure of the semiconductor photovoltaic generator with vertical epitaxial p-n - transitions with nanoclusters located on an insulating film, for the case of a substrate of n-type. Figure 3 shows the main elements of the structure of the semiconductor photovoltaic generator are placed in the insulating film nanoclusters. Figure 4 shows the main elements of the structure of the semiconductor photovoltaic generator nanoclusters inside the insulating film, which acts as pestiviruses antireflection coating.

Figure 1 is a photovoltaic generator consists of micropropagules 1 containing n-p - transitions 2, the base region 4 of n-type and doped layer 5, the working surface 3, the external metal contacts 6, the inner metal contacts 7, the insulating film 8, nanoclusters 9, pestiviruses antireflection coating of dielectric material 10, is free from n-p junctions of the surface 11. In this case n-R - 2 transitions are perpendicular to the working surface 3. One or two linear size micropropagative 1 commensurate with the diffusion length of minority carriers in the base region 4. The insulating film 8 is located at the free n-p transitions of the surface 11, taldenaplex 8 10-30 nm. On the insulating film 8 is placed nanoclusters 9, the size of 10-40 nm, and the distance between the nanoclusters 9 is 60-120 nm. Over the nanoclusters 9 is a layer pestiviruses antireflection coating of dielectric material 10.

Figure 2 on a substrate of n-type 12 posted by epitaxial layers of n-type 5 and p-type 4 punched bretomania p-n junction 7, and the inner metal contacts are missing.

Figure 3 nanoclusters 9 is placed inside the insulating film 8, and pestiviruses the antireflection coating 10 is located on the insulating film 8.

Figure 4 nanoclusters 9 is placed inside the insulating film 8, which performs the function pestiviruses antireflection coating.

The device operates as follows.

Falling on the working surface 3 of the electromagnetic radiation through pestiviruses the antireflection coating 10 and the insulating film 8 is fed to the surface 11 micropropagative 1, available from n-p transitions 2, for example, perpendicular to the n-p transition 2. Is the absorption of photons, accompanied by the formation of electron-hole pairs and the emergence of excess charge carriers. Electron-hole pairs are separated field that causes the external circuit photocurrent directed to the base region 4. At the same time the radiation arrives at the nanoclusters 9. The frequency of the plasma p is sonance nanoclusters 9 corresponds to the frequency of the incident electromagnetic radiation that allows you to pereizuchit incident radiation through an insulating film 8, and thus creates an environment in which propagates an electromagnetic wave. There is a sharp increase in the number of minority charge carriers and increase the generation function.

In the device according to claim 2 through pestiviruses the antireflection coating of dielectric material 10 radiation arrives at the nanoclusters 9, located in the insulating film 8.

In the device according to claim 3 electromagnetic radiation is delivered directly to the insulating film 8, which performs the function pestiviruses antireflection coating, and located it nanoclusters 9.

The combination of optical, mechanical and diffusion characteristics of the coating and the characteristics of the nanoclusters allows in some cases to use an insulating, dielectric film containing nanoclusters and as an antireflection coating (without additional pestiviruses antireflection coating of dielectric material over the film).

As for the matrix PV generators are characterized by the ability to generate charge carriers in the entire volume, additional sources of generation of carriers in the form of nanoclusters allows to reach in a single radiation values efficiency attainable in other structures at high concentrations of radiation. Thus, the growth generated in the base region, increased the e efficiency of conversion of electromagnetic radiation increases the efficiency of the proposed design of the photovoltaic generator in real operating conditions in comparison with the known structures.

An example of executing the semiconductor photoelectrically generator.

EXAMPLE 1. Photovoltaic generator is a matrix of column micropropagative with a vertical n-p-n...-p - structure. Micropropagated represent a silicon wafer mark KDB is 0.5(0.1) with the diffusion transitions and continuous ohmic contacts of India with both n - and p-sides of the plates. On the surface, free from n-p junctions, placed an insulating film of silicon dioxide of a thickness of 10-20 nm, which are the nanoclusters of metal, for example gold, 10-40 nm, while the distance between the nanoclusters 60-120 nm. Over the nanoclusters is a layer pestiviruses antireflection coating of dielectric type silicon nitride of SixNy.

EXAMPLE 2. Photovoltaic generator is a multi-layer epitaxial n-p-n...-R - structure on a semiconductor substrate of silicon of n-type brand KDB is 0.5(0.1) with punched aboutnomoney p-n - transitions. On the surface, free from n-p junctions, placed an insulating film of silicon dioxide of a thickness of 10-20 nm, which are the nanoclusters of metal, for example silver atoms, the size of 10-40 nm, while the distance between the nanoclusters 60-120 nm. Over the nanoclusters is a layer pestiviruses antireflection coating of the of Electrica type silicon nitride of Si xNy.

It should be noted that these embodiments does not limit the claims of the applicant, which can be defined by the attached claims, and many modifications and improvements may be made within the framework of the present invention. For example, you can create in microtiterplates additional p-n - or isotopic transitions, as well as creating oblique matrix.

1. Semiconductor photovoltaic generator, made in the form of a matrix from commutated of micropropagules, with one or two linear size commensurate with the diffusion length of minority carriers in the base region, and the plane of p-n junctions perpendicular to the working surface of the generator, characterized in that on the surface of micropropagules free of n-p junctions are placed insulating film thickness of 10-30 nm, where the nanoclusters of metals 10-40 nm with spacing between nanoclusters 60-120 nm, and over the nanoclusters is a layer pestiviruses antireflection coating of dielectric material.

2. Semiconductor photovoltaic generator, made in the form of a matrix from commutated of micropropagules, with one or two linear size commensurate with the diffusion length of minority wear is her current in the base region, and the plane of the n-p junctions perpendicular to the working surface of the generator, characterized in that on the surface of micropropagules-free p-n junctions placed an insulating film containing nanoclusters of metals 10-40 nm, and the film is a layer pestiviruses antireflection coating of dielectric material.

3. Semiconductor photovoltaic generator, made in the form of a matrix from commutated of micropropagules, with one or two linear size commensurate with the diffusion length of minority carriers in the base region, and the plane of the n-p junctions perpendicular to the working surface of the generator, characterized in that on the surface of micropropagules-free p-n junctions placed an insulating film containing nanoclusters of metals 10-40 nm, with an insulating film performs the function pestiviruses antireflection coating.

 

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