Composition for photoactivated etching of silicon dioxode films
SUBSTANCE: invention can be used in producing integrated microcircuits and other electronic devices which use a planar manufacturing technique based on photolithographic processes. The composition for photoactivated etching of silicon dioxide films includes a polymer base - polymethyl methacrylate, a photosensitive component - ammonium fluoride in trifluoroacetic acid solution, a solvent - acetone, a protophilic agent - diphenylamine.
EFFECT: invention simplifies the process of producing a photoetched pattern on a silicon layer, increases the rate of photoetching and significantly reduces defects in the obtained articles.
1 tbl, 4 ex
The invention relates to the field of microelectronics, in particular the production of integrated circuits and other electronic devices using planar photolithography.
Known photopolymerizable composition for dry film photoresist, which are used to retrieve the image in the manufacture of printed circuit boards in the electronic industry (patent RF №2163724, 7G03C 1/72, H01L 31/08, publ. 2001.02.27). Known composition includes a copolymer of styrene and mono-n-butylmalonate, difunctional acrylate, 1-chloro-2-hydroxy-3-methacryloxypropyl, inhibitor, photoinitiator, dye and connection glycol. A disadvantage of known composition is its composition, which requires the introduction of photoinitiators for the implementation of photochemical reactions.
Known photolithography process without the use of stage manifestations, which implements the dry transfer of the pattern from the resist on Si02 using a reaction between silicon dioxide with pairs of HF at temperatures above 100°C. as catalysts for the process of etching composition using an organic base and peroxide compounds affecting the mechanism of the etching process (study of the reaction of the etching on the border of the silicon dioxide film resist process of the photolithography stage without symptoms. Studies on the interfacial etching reaction of devlopment-free vapor photolithography/Xiaoyin Hong, Lu Jianping, Duan Shengquan, Chen Qidao, Wang, Peiqing // J.Vac.Sci. and Technol. B. - 1999. - 17, 5. - C.2090-2095). For carrying out process a substrate covered with a film of photopolymer-based cinnamate containing 5-nitroacenaphthene as a photosensitive component and catalyst for the etching. There is a method of lithography allows to exclude the operation of manifestation and zadabrivaniya photoresist.
A disadvantage of known composition is the need to introduce in its catalyst composition, and the impossibility of using the composition for a photolithography process to avoid a stage of etching, which involves feeding into the system of toxic hydrogen fluoride HF at an elevated temperature.
Famous photo composition for etching films of silicon dioxide without the use of stages of manifestation, zadabrivaniya and etching, based on the reaction of the donor-acceptor interactions in non-aqueous solvents using as a light-sensitive photoactive component, ammonium fluoride, and as profiling reagent and simultaneously a solvent for the polymer base of polymethylmethacrylate is used pyridine (Photo composition for etching films of silicon dioxide. RF patent №2330049). The composition is selected as a prototype.
A disadvantage of known composition is a little soon the th etching (of 0.26 μm/min), as well as the use of toxic solvent is pyridine.
The task of the claimed invention to provide compositions for photo etching films of silicon dioxide SiO2in the processes of photolithography with high etching rate, which leads to simplification of the production process photolithographic pattern in the silicon layer and a substantial decrease in the defects of the products obtained.
The problem is solved in that, as in the prototype, the composition for photo etching films of silicon dioxide includes a polymer base poly (methyl methacrylate) (PMMA) and a photosensitive component, the ammonium fluoride solution triperoxonane acid, but unlike the prototype of the solvent used safe acetone, and as profiling reagent - diphenylamine in the following ratio, wt.%: polymethylmethacrylate 5,6-6,5; ammonium fluoride 4,0-4,6; diphenylamine 16,6-19,2; acetone 45,3-52,2; triperoxonane acid 21,3-24,6.
The main feature of the new photo composition is the release of F-ions due to donor-acceptor interaction of NH4+-acid and profiling of diphenylamine reagent, followed by ammonia (equation 1):
The anion F-h is obojdetsya in the system, further, the UV irradiation-formed active anion-radicals of fluorine, which poisoned the film of silicon dioxide (equations 2, 3):
For carrying out the invention take the components in the mass ratio, are presented in the claims.
Below is a staged preparation of solutions a, B and C required to obtain the composition for photo etching.
Example 1. First prepare a solution, which take a portion of about 0.50 g of polymethylmethacrylate PMMA and pour approximately 5.0 ml of acetone. The mixture was thoroughly stirred with a glass rod and incubated until complete dissolution of PMMA (about 24 hours). Then in the solution And injected approximately 1.50 g of diphenylamine, mixed with a glass rod for about 30 minutes until complete dissolution of diphenylamine and obtain solution B.
To prepare the solution In take out a portion of approximately 0.34 g of ammonium fluoride NH4F, pour in to 1.48 ml triperoxonane acid CF3COOH and mix thoroughly. Thus, there is a heating of the resulting mixture, after 3-5 minutes is the complete dissolution of NH4F.
The solution is poured to the solution and mixed. Thus there is little heating of the mixture and the viscosity increase of the solution. The resulting composition for a photo is aktivirovannogo etching was incubated for 1-2 hours until complete dissolution of all components. The claimed composition for photo etching films of silicon dioxide with one of the quantitative combinations of the components ready. After preparation, the composition retains its properties during the month.
Below are examples illustrating the application of the invention.
Example 2. On a silicon wafer with a layer of SiO2thickness of 0.35 μm, pre-cleaned in ethyl alcohol from dirt, put a pipette 1 drop of photo composition prepared according to example 1. The plate is irradiated under the lamp DRL-250 up to the full release of the film of silicon dioxide, which is time-45 with irradiated spot wash with acetone with a cotton swab, watching the complete removal of SiO2.
The velocity V photochemical etching in example 2 is 0.47 μm/min. at the same time determine the rate of chemical etching, going without UV irradiation. She is negligible and is 0.02 μm/min In a further contribution of this component is ignored.
Example 3. Prepare solutions a and B of example 1. To prepare the solution In weigh 0.32 g of ammonium fluoride NH4F and pour 1.5 ml triperoxonane acid CF3COOH, mix thoroughly. Thus, there is a heating of the resulting mixture, after 3-5 minutes is the complete dissolution of NH4F. the Solutions B and C are mixed and incubated within 1-2 hours until complete dissolution of all components. On a silicon wafer with a layer of SiO2thickness of 0.35 μm, cleansed from impurities in ethanol, applied by irrigation method 3 ml of the obtained composition for photo etching. Then the plate is irradiated under the lamp DRL-250 irradiated spot with a cotton swab gently washed with acetone until complete removal of SiO2that occurs within 37 seconds.
The velocity V photochemical etching in example 3 is 0.56 μm/min
Example 4. Prepare solutions a and B of example 1. To prepare the solution In weigh 0.34 g of ammonium fluoride NH4F, pour triperoxonane acid CF3COOH (1.5 ml), stirred thoroughly. Thus, there is a heating of the resulting mixture, after 3-5 minutes is the complete dissolution of NH4F. the Prepared solution is poured to the solution, the solutions are mixed, incubated for 1-2 hours until complete dissolution of all components. On a silicon wafer with a layer of SiO2thickness of 0.35 μm, cleansed from impurities in ethyl alcohol, applied with a pipette 1 drop of the obtained composition for photo etching. The plate is irradiated under the lamp DRL-250 up to the full release of the film of silicon dioxide, which occurs in 30 C. the Irradiated spot wash with acetone with a cotton swab, watching the complete removal of SiO2.
The velocity V fot the chemical etching in example 4 is 0.70 μm/min
|Comparative data on the rate of etching according to the invention and the prototype presented in the table.|
|The concentration of ammonium fluoride NH4F, g/ml||0,035||0,049||0,052|
|The etching rate V, µm/min||on|
|0,47 (example 2)||0,56 (example 3)||0,70 (example 4)|
|0,26||0,26||settling in sediment|
The data show that the rate of etching composition according to the invention in 2 and more times higher compared with the composition of the prototype, especially at high concentrations, for which the composition of the prototype unattainable.
The main advantage of the claimed invention is to substantially increase the speed of photoetching, to 0.70 μm/min down from 0.26 μm/min in the prototype that allows to reduce the time photoexposure. The use of a composition according to the invention retains DOS is onsto prototype: completely excluded the stage of manifestation, zadabrivaniya and etching, which account for the largest number of defects and distortions of the circuit pattern. Etching S1O2 and removing etching products takes place at the stage of exposure. Eliminates the use of toxic solvent of pyridine and its utilization. Thus, photoetching using the claimed compositions more effectively in the field of microelectronics.
Sources of information
1. RF patent №2163724, publ. 27.02.2001.
2. J.Vac.Sci. and Technol. Century - 1999. - 17, 5. - S-2095.
3. RF patent №2330049, publ. 27.07.2008. The prototype.
Composition for photo etching films of silicon dioxide, including a polymer base poly (methyl methacrylate), a photosensitive component ammonium fluoride, triperoxonane acid and protophilic reagent, characterized in that as profiling reagent used diphenylamine, and the solvent is acetone, in the following ratio, wt.%:
|The ammonium fluoride||4,0-4,6|
|Triperoxonane the I acid||from 21.3 to 24.6|
SUBSTANCE: invention relates to agriculture, particularly a composition for mulching different types of soil, lawn and parking areas. The aqueous mulching composition contains lignosulphonate, carbamide, Na-carboxymethyl cellulose, potassium chloride, Andreaeopsida moss and Juniperus virginiana 'Erecta' juniper needles. Three versions of said composition are disclosed.
EFFECT: invention improves the environment while widening the range of compositions of natural materials for mulching soil.
3 cl, 1 tbl
SUBSTANCE: invention relates to materials for processing glass, glass-ceramic and quartz surfaces, and can be used in optoelectronics to make optical components. The paste contains ammonium hydrofluoride (NH4F·HF), barium sulphate (BaSO4), sulphuric acid (H2SO4), isoamyl acetate, granular alkali-earth metal fluoride with granule size 25-63 mcm and water. Components are in the following ratio, wt %: ammonium hydrofluoride - 10-34; barium sulphate - 17-22; sulphuric acid - 2-4; isoamyl acetate - 1-2; alkali-earth metal fluoride - 10-34; water - the rest. The disclosed paste has low toxicity due to low concentration of active fluoride ions as a result of using ammonium hydrofluoride instead of hydrofluoric acid.
EFFECT: use of the paste enables to obtain a coarse-grained surface with roughness of up to 65 mcm.
1 tbl, 3 ex
FIELD: polygraphic, electronic and radiotechnical industry.
SUBSTANCE: invention proposes a polyvinyl alcohol-base oxidizing composition for removal of tanned polymeric layer that comprises the following components, wt.-%: sodium or potassium metaperiodate or sodium or potassium dihydro-ortho-periodate, 20-70; magnesium or calcium, or aluminum salt or salts, 20-70, and one or more crystalline organic acids, 5-50. Invention provides enhancing effectiveness of regeneration of net-stencil printing screens and to improve retention of oxidizing compositions. Invention is used for regeneration of netted-stencil printing screens prepared with use of photoresist materials.
EFFECT: improved and valuable properties of composition.
FIELD: reduction of ferric sulfide deposits in pipe lines.
SUBSTANCE: proposed method consists in bringing the inner surfaces of pipe in contact with composition prepared from aqueous solution containing the compounds given in formula (I): , where X is anion whose valence "n" is selected from definite group and at least one amine selected from group including alkyl amines, dialkyl amines, alkylen diamines, cycloalkyl amines or their conjugates with acids. According to another version, use is made of composition containing tris(hydroxymnethyl) phosphine, at least one amine or its conjugate with acid and solvent. In presence of composition, fast complexation takes place; as a result, ferric sulfide deposits are dissolved and are removed from pipe.
EFFECT: possibility of using safe, available and inexpensive materials ensuring deposition of polymers.
72 cl, 1 tbl
SUBSTANCE: disclosed is a novel photopolymer acrylic oligomer-oligomer composition consisting of a bifunctional oligomer, an oligomer with functionality higher than 2, a monomer, a methyl methacrylate oligomer with molecular weight 20000-70000 and a polymerisation initiator, with the following ratio of components in pts.wt: acrylic bifunctional oligomer 15-95; acrylic oligomer with functionality higher than 2 15-70; acrylic monomer 0-25; methyl methacrylate oligomer with molecular weight 20000-70000 5-20; photopolymerisation initiator 0.1-1.0. Disclosed is a wear-resistant coating on organic glass, obtained via photochemically initiated three-dimensional radical polymerisation of the disclosed composition. Disclosed is a method of producing a wear-resistant coating on organic glass, involving a step for preparing a photopolymeric acrylic oligomer-oligomer composition and a step for curing thereof. The technical result is endowing resistance to formation of microcracks during ablation (silver resistance), low shrinkage and high adhesion to a coated substrate obtained via photopolymerisation of acrylic oligomer-oligomer compositions.
EFFECT: invention enables to obtain wear-resistant protective coatings on organic glass with surface hardness close to that of sapphire crystals.
7 cl, 6 tbl, 19 ex
SUBSTANCE: acrylic lacquer contains an acrylic copolymer dispersion Primal AC-4800ER, a coalescent additive Nexcoat NX-795, a wax additive Aquacer 502, Orotan 681 dispersant, a polyurethane thickener Acrisol RM-2020, a neutraliser - 20% aqueous ammonia solution, an antifoaming agent Nopko NXZ, a preservative Kathon LXE and water.
EFFECT: with the given combination of components, the acrylic lacquer is characterised by good working characteristics and forms a high-lustre transparent coating on wooden articles.
2 tbl, 4 ex
SUBSTANCE: acrylic paint composition in the first version contains an acrylic film-forming - acrylic organosoluble copolymer Polyform and a copolymer of p-butylmethacrylate with methylmethacrylate, silica filler, thickener - benton or pangel, plasticiser - phthalic ester, pigment and organic solvent. In the second version the acrylic paint composition contains an acrylic film-forming - acrylic organosoluble copolymer Polyform and a copolymer of p-butylmethacrylate with methylmethacrylate and additionally a polyorganosiloxane resin, silica filler, thickener - benton or pangel, plasticiser - phthalic ester, pigment and organic solvent.
EFFECT: improved physical and mechanical properties.
2 cl, 2 tbl
SUBSTANCE: invention relates to adhesive lacquer for polyvinylchloride and can be used for depositing images on polyvinylchloride with subsequent deposition of coating varnish. The adhesive lacquer contains a synthetic resin - copolymer of methylmethacrylate with Tglass=124 °C and dynamic viscosity of the solution in toluene equal to 1500 mPa s, a volatile solvent - methyl ethylketone and toluene and an antistatic additive EFKA 6780 ("EFKA" Degussa).
EFFECT: reduced stickiness and increased binding power.
1 tbl, 4 ex
SUBSTANCE: invention pertains to water-base lacquer coating materials, meant for depositing on metallic and non-metallic structures in construction, aviation technology and other industries. Description is given of the lacquer coating composition, which contains water-base aryl copolymer "ОЛД-04С" - a product of cohydrolysis of acrylic acid, methacrylic acid, methyl methacrylate, butyl acrylate and calcium (meth)acrylate in quantity of 100 wt %, pigments 50-205.1 wt %, silicone fluid 0.3-0.7 wt %, water 450-550 wt %. The pigments used in the proposed composition are in form of titanium dioxide, blue phthalocyanine pigments, blue anthraquinone, green phthalocyanine, yellow light resistant, red iron oxide, coloured refractory pigments, carbon black and or their mixture. The composition can also contain filler in form of talc, kaolin, modified nano-silicate and or their mixture in quantity of 7-93 wt %, and melamine phosphate in quantity of 1-5 wt % as a fire retarding agent.
EFFECT: proposed lacquer coating composition provides for good rheological properties, in particular good opaqueness, high water resistance and freeze resistance with retention of adhesive and physical and mechanical properties.
SUBSTANCE: proposed coating includes a lower layer of an aluminum alloy anodic oxide coating and an upper layer representing a thermo regulating paint coat comprising acrylate holmium-containing vanish "АКГ-1,2" (42-38 percent by weight) and oxide-modified zirconium (IV), 7-4 (58-62 percent by weight). The coating features low solar radiation absorption factor values (As ≤ 0,10-0,11) and high radiation factors (ε≥0,92-0,94). This allows reducing the radiator-emitter area which is particularly important in development of promising spacecrafts. Availability of two thermoregulating coatings, i.e. the anodic oxide and paint coatings allows a notable increase in service life of the said radiators and producing the said coatings on the surface of products made from aluminum or its alloys with lower As/ε parameter values and without drawbacks inherent in silicate coatings.
EFFECT: antirust protection of complicated-design structures and provision of preset thermal-and-radiation characteristics.
FIELD: paint and varnish materials.
SUBSTANCE: invention describes a composition used in decorative finishing and comprising the following components, wt.-%: 20% solution of polymethylmethacrylate in dichloroethane as a film-forming agent, 20.5-23.25; aromatic solvent, 70.5-74.5, and aluminum powder modified with an organic dye by grinding, 4.25-5.0, taken in the ratio = 1:(0.005-0.008). The proposed composition provides decorative effect of cover mimic to mother-of-pearl with good adhesion of the composition on plastics of different chemical nature. Invention can be used in coloring plastics with imitation of mother-of-pearl, in particular, for national consumption goods.
EFFECT: improved and valuable properties of composition.
2 tbl, 2 ex
FIELD: chemical industry; polygraphy; methods of the stencil printing.
SUBSTANCE: the invention is pertaining to the paint suitable for the stencil printing inside the pressurized castings. The invention describes the paint suitable for the printing films made out of the transparent thermoplastic, consisting predominantly of: a) one or several pigments; b) the binding in the solution in c) the organic solvent or in the mixture of the organic solvents, d) the routine auxiliary materials, if it is desirable, at that as the binding use the copolymer of the poly-(metha)-acrylate containing (м1) from 50 up to 90 % to the mass of alkylmethacrtlate having from 1 up to 6 atoms of carbon in the ethereal radical; (м2) from 5 up to 25 % to the mass, at least, one vinylaromatic compound; (м3) from 1 up to 25 % to the mass of maleic anhydride, and if it is desirable, (м4) from 0 up to 5 % to the mass of the alkylacrylate having from 1 up to 6 atoms of carbon in the ethereal radical or the copolymer of the poly-(metha)-acrylamide containing polymethylmethacrylate with the degree of imidization from 65 up to 80 %, to 1 up to 15 mass % of methacrylic acid and from 1 up to 15 mass % of methacrylic anhydrade. At that the indicated copolymer has the softening temperature by VIKA (ISO 306 B) at least of 115°С. As the dissolvents use aliphatic, cycloaliphatic and aromatic hydrocarbons, ketones, esters, ethers, alcohols, phenoles or their mixtures. The invention also describes the film made out of the thermoplastic printed by the above described paint; the pressurized casting consisting of the film made out of the thermoplastic printed on the opposite side with the above described paint and supplied on this side with the layer of the thermoplastic coating. At that the indicated layer is applied by the operation of pressure die casting on the inside and at that the film and-or the plastic material for operation of the pressure die casting on the inside represents the copolymer of polymethylmethacrylate; and the method of production of the pressurized castings includes the following stages: a) stencil printing of the thermoplastic films by the above described method, b) the film molding, c) the pressurized castings on the inside on the stencil printed film side in the casting mould with the thermoplastic, and d) removal of the pressurized casting from the casting mould. The technical result of the invention: the paint is resistant to the action of the high pressures and temperatures during the operation of the pressurized casting on the inside, the image stencil printed by the paint has the stable color after long-term action of the atmospheric conditions.
EFFECT: the invention ensures, that the paint is resistant to the action of the high pressures and temperatures during the operation of the pressurized casting on the inside, the image stencil printed by the paint has the stable color after the long-term action of the atmospheric conditions.
6 cl, 1 tbl
FIELD: building industry.
SUBSTANCE: invention relates to manufacturing acryl resins-base building composition materials used in internal and external finishing of compartments of industrial and civil designation, in particular, in making pouring flooring covers, protective and finishing materials and pouring compounds. Acryl composition for finishing works comprising a binding agent, quarts sand as a filling agent, plasticizing agent, hardening agent and water involves 40-60% aqueous dispersion of copolymer of butylacrylate, methylmethacrylate and methacrylic acid as a binding agent, tributyl phosphate as a plasticing agent, Portland cement M400 as a hardening agent and, additionally, it comprises acryl-urethane thickening agent of associative type "Polifob TR-117" wherein components are taken in the following ratio, wt.-%: 40-60% dispersion of copolymer of butylacrylate, methylmethacrylate and methacrylic acid, 15.0-30.0; acryl-urethane thickening agent of associative type "Polifob TR-117", 0.1-0.2; quartz sand, 35.0-50.0; tributyl phosphate, 0.15-0.25; Portland cement M400, 8-12, and water, the balance. The composition can comprise additionally pigment in the amount up to 11 wt.-%. Invention provides enhancing mechanical strength of cover, its adhesion to surface and decreasing water absorption.
EFFECT: improved and valuable technical properties of composition.
2 cl, 2 tbl
SUBSTANCE: invention relates to field of chemistry, in particular to compositions, based on polyorganosiloxane for application as shock-absorbing material, absorbing shock mechanical energy in vehicles, mechanisms, apparatuses, operating on earth, in air and space. Composition of shock - absorbing material contains polydimethyldiphenylsiloxane caoutchouc of general formula HO[(Me2SiO)n(Ph2SiO)m]kH, where n, m represent molar content of links, n+m=100 when m=4÷12, k=33÷69, boric acid or its ether, iron oxide, titanium dioxide as semi-reinforcing filling agent, wollastonite as reinforcing filling agent, magnesium oxide as thickening agent, and talc and fluoroplast as antiadhesive components.
EFFECT: elaboration of composition of shock-absorbing material, which ensures penetration of 160-220 convunits and absence of crystallisation at temperature minus 80°C for two hours.
SUBSTANCE: invention relates to the rubber industry and can be used in making industrial rubber articles. The butadiene-methylstyrene rubber based rubber mixture contains sulphur, diphenyl guanidine, a vulcanisation accelerator, technical carbon, zinc oxide, stearic acid, an anti-ageing agent and a modifier. The vulcanisation accelerator used is sulphenamide Ts, the anti-ageing agent and modifier are 2-(dibutylaminomethyl)-4-methyl-6-(1,7,7-trimethylbicyclo[2.2.1]hept-exo-2-yl)phenol.
EFFECT: high building tack while maintaining high ageing resistance of the butadiene-methylstyrene rubber based rubber mixture.
3 tbl, 4 ex
SUBSTANCE: invention relates to high-strength composite polymer materials for deck and floor coatings. The composite polymer material, which is a rubber mixture processed by a moulding technique, contains a polymer matrix, a vulcanising system consisting of thiuram, altax, zinc oxide and stearic acid, filler and process additives. The polymer matrix used is a petrol-, oil- and ozone-resistant polymer which is modified with polyvinyl chloride and contains 26-34 wt % acrylonitrile, and additionally sulphur, sulphenamide and polymerised 2,2,4-trimethyl 1,2- dihydroquinoline. The filler consists of BS-100 silicon dioxide, pigment titanium dioxide, natural hydrophobic chalk in weight ratio of 35-115:4-20:5-50 pts.wt, respectively. The process additives include TGM-3 oligoester acrylate plasticiser and antipyrenes which contain antimony trioxide and zinc borate in ratio of 3-20:5-25, and N-cyclohexyl thiophthalimide.
EFFECT: invention enables to obtain high-strength petrol-, oil- and ozone-resistant floor coating with antistatic, fire-resistance and vibration-absorption properties.
2 cl, 2 tbl, 5 ex
SUBSTANCE: invention relates to a fire-resistant rubber mixture and can be used in car, oil and industrial rubber industry. The fire-resistant rubber mixture contains synthetic isoprene and diene rubber, polyvinyl chloride, sulphur, sulphenamide Ts, zinc oxide, stearine, technical carbon, monoethanolamine, naphtham-2, diaphene FP, N-nitrosodiphenylamine, oxanol KD-6, antimony trioxide, chlorinated paraffin XP-70, chlorinated paraffin XP-470 and borates.
EFFECT: invention improves physical and mechanical properties, especially fire-resistance, tensile strength and breaking elongation.
3 ex, 2 tbl
SUBSTANCE: invention relates to production of integrated microcircuits and other electronic devices which use a plenary manufacturing technique based on photolithographic processes. The photoactivated composition contains a polymer base and a photosensitive component. The polymer base is polymethyl methacrylate and the photosensitive component is ammonium fluoride. The composition further contains a protophilic reagent - α-naphthylamine and solvents - acetone and trifluoroacetic acid. Components are in the following ratio, wt %: polymethyl methacrylate - 11.8; ammonium fluoride - 4.7-7.1; α-naphthylamine - 18.3; acetone - 8.3-10.7; trifluoroacetic acid - 54.5. Use of the composition simplifies the technological process of obtaining photoetched pattern in a silicon layer, while excluding development, baking and wet chemical etching steps.
EFFECT: simple technological process when using the disclosed composition also considerably reduces defects in the obtained articles.