Etching paste |
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
IPC classes for russian patent Etching paste (RU 2449000):
 Power transmitting cable / 2420555
Power transmitting cable includes the following: at least one current conductor; insulating layer enveloping the above conductor so that at least one insulated conductor is formed; fire-resistant protective cover not containing halogen, located in radial external position relative to the above insulated conductor; the above cover has inner and outer layers which contact each other. Outer layer has thickness which is at least equal to thickness of the above outer layer. Inner layer includes polymer material having glass transition temperature equal to or less than -30°C. Outer layer includes polymer material resistant to drill fluid.
 Titanium and titanium nitride proofing etching solution / 2350688
Invention refers to chemical treatment of metal surface, specifically to removal of proofing consisting of titanium substrate and ion plasma sprayed titanium nitride coating. The solution contains, wt %: hydrochloric acid 8.0 - 10.0, ammonium fluoride 4.5 - 6.0, sodium sulphate 0.5 - 0.9, additive "Progress 21" or "Progress 30" 0.01 - 0.03, the rest - water.
Etching solution / 2323181
Proposed etching solution contains the following components: HF, HNO3, NH4F, H2O and additionally it contains glycerin CH2OHCHOHCH2OH at the following ratio of components, mass-%: HF, 20.0-24.0; HNO3, 12.0-16.0; NH4F, 14.0-18.0; CH2OHCHOHCH2OH, 0.5-1.5; the remainder being H2O.
Composition for removing photochemically polyvinyl alcohol-base tanned layer from printing form / 2316032
Invention proposes a polyvinyl alcohol-base oxidizing composition for removal of tanned polymeric layer that comprises the following components, wt.-%: sodium or potassium metaperiodate or sodium or potassium dihydro-ortho-periodate, 20-70; magnesium or calcium, or aluminum salt or salts, 20-70, and one or more crystalline organic acids, 5-50. Invention provides enhancing effectiveness of regeneration of net-stencil printing screens and to improve retention of oxidizing compositions. Invention is used for regeneration of netted-stencil printing screens prepared with use of photoresist materials.
 Method and composition for reduction of ferric sulfide deposits in pipe lines (versions) / 2315799
Proposed method consists in bringing the inner surfaces of pipe in contact with composition prepared from aqueous solution containing the compounds given in formula (I):
 The composition for etching of the surface of the rubber / 2050398
The invention relates to a composition for etching rubber surface before metallization and can be used in mechanical engineering, in particular, the coating composition, anti-friction protective polymeric coatings on mechanical rubber goods (MRG) by the electroplating method
 The provide the etchant for revealing structures of non-metallic materials / 2021322
The invention relates to the field of surface processing of non-metallic materials, mainly gipsoangidritovye binders and composites on their basis
 The solution for etching fibers / 2019553
 Method of reducing quartz glass surface roughness / 2433968
Invention relates to a technique for treating quartz glass. The method involves treating the surface of quartz glass, containing 0.01-0.1% hydroxyl groups, in an aqueous solution containing fluoride ions, wherein the surface of the article is first heated for 5 hours at 980-1050°C. The method uses articles made from quartz glass with initial surface roughness of 0.8-1.8 mcm.
Pickling solution / 2367628
Pickling solution includes, wt %: HF 3.5-4.0; H2SO4 73.5-74.5; H2O 20.0-22.0; K2Cr2O7 1.0-1.5.
Solution for glass matting / 2340576
Solution of composition, wt %: HF 40.0-50.0; NF4F·HF 6.0-10.0; NaF 2.0-3.0; H2O 20.0-30.0; CCl3COOH 3.0-5.0; Li3PO4 3.0-5.0; HCl 5.0-6.0; HNO3 4.0-5.0; BaSO4 1.0-2.0.
Etching solution / 2338709
Etching solution contains HF, H2SO4, glycerine and K2Cr2O7, with the following ratios of components, in wt %: HF - 55.0 - 65.0; H2SO4 - 27.0-32.0; glycerine -2.0-3.0; K2Cr2O7 - 5.0-10.0.
Etching solution / 2323181
Proposed etching solution contains the following components: HF, HNO3, NH4F, H2O and additionally it contains glycerin CH2OHCHOHCH2OH at the following ratio of components, mass-%: HF, 20.0-24.0; HNO3, 12.0-16.0; NH4F, 14.0-18.0; CH2OHCHOHCH2OH, 0.5-1.5; the remainder being H2O.
Etching solution / 2320589
Invention relates to etching solution used for treatment of glass surface and applying marker signs, pictures and others on it. Proposed etching solution contains the following components, wt.-%: hydrofluoric acid, 50.0-60.0; nitric acid, 15.0-20.0; polyacrylamide, 0.5-1.0; sulfuric acid, 10.0-15.0; selenic acid, 0.5-1.0, and water, the balance. Invention provides decreasing time for treatment of glass surface and enhancing output of labor. The glass rate value is 1.5-2 mcm/min. Invention provides enhancing the rate of glass treatment with the proposed etching solution.
Polishing solution / 2301204
Proposed polishing solution contains the following components, mass-%: H2SO4, 30.0-40.0; HF,8.0-10.0; HNO3,13.0-15.0; HCl, 39.0-45.0.
Engraving pastes for inorganic surfaces / 2274615
The invention is pertaining to the new engraving pastes in the form of typed, homogeneous, impurities free and possessing a non-Newtonian flow pattern for engraving of the inorganic surfaces, in particular, of glass, preferably the glass grounded on silicon oxide and silicon nitride, and other systems based on silicon oxide and silicon nitride and also on their layers. The typed engraving agent represents the homogeneous, free from particles-impurities engraving paste, which includes: at least one engraving component for the inorganic surfaces, a dissolvent, a thickener, and if it is necessary - organic and-or inorganic acid (acids), if necessary, additives such as the defoaming agents, thixotropic agents, the agents for the check of the flow, the deaeration agents and the adhesion promoters, which are effective even at the temperatures from 15 up to 50°C and-or activated, if necessary, by power supply. As the thickener the engraving paste includes cellulose and derivatives of the cellulose, amylum or derivatives of the amylum and-or the polymetric compounds based on acrylate or the functionalized vinyl links in the shares (in mass %): from 0.5 up to 25 mass %, preferably from 3 up to 20 mass %in respect to the total mass of the engraving paste. The method of engraving provides for application on the inorganic surface of the engraving indicated paste with the following its flushing away by the dissolvent.
 Method of making macroporous glass of optical property / 2250881
Proposed method includes treatment of microporous glass plates with alkali during period of time sufficient for obtaining volume of pores no less than 50% followed by washing in distilled water and drying; plates having thickness of 3 to 4 mm are treated with alkali solution at temperature of solution from 0 to 2 C; washing with distilled water is performed at temperature close to freezing point; washing is continued for 7 days at daily change of distilled water; then temperature of distilled water is raised to room temperature and drying is performed at temperature of 80 C for 1-1.5 h. Prior to drying, plates are gradually shifted from last portion of distilled water through water-alcohol solutions at increasing concentration of alcohol and then through absolute alcohol.
Pasta for matting / 2238919
The invention relates to the technology for glass processing and production thereof to obtain a decorative effect in the form of a Mat picture
Method of making macroporous glass of optical property / 2250881
Proposed method includes treatment of microporous glass plates with alkali during period of time sufficient for obtaining volume of pores no less than 50% followed by washing in distilled water and drying; plates having thickness of 3 to 4 mm are treated with alkali solution at temperature of solution from 0 to 2 C; washing with distilled water is performed at temperature close to freezing point; washing is continued for 7 days at daily change of distilled water; then temperature of distilled water is raised to room temperature and drying is performed at temperature of 80 C for 1-1.5 h. Prior to drying, plates are gradually shifted from last portion of distilled water through water-alcohol solutions at increasing concentration of alcohol and then through absolute alcohol.
Engraving pastes for inorganic surfaces / 2274615
The invention is pertaining to the new engraving pastes in the form of typed, homogeneous, impurities free and possessing a non-Newtonian flow pattern for engraving of the inorganic surfaces, in particular, of glass, preferably the glass grounded on silicon oxide and silicon nitride, and other systems based on silicon oxide and silicon nitride and also on their layers. The typed engraving agent represents the homogeneous, free from particles-impurities engraving paste, which includes: at least one engraving component for the inorganic surfaces, a dissolvent, a thickener, and if it is necessary - organic and-or inorganic acid (acids), if necessary, additives such as the defoaming agents, thixotropic agents, the agents for the check of the flow, the deaeration agents and the adhesion promoters, which are effective even at the temperatures from 15 up to 50°C and-or activated, if necessary, by power supply. As the thickener the engraving paste includes cellulose and derivatives of the cellulose, amylum or derivatives of the amylum and-or the polymetric compounds based on acrylate or the functionalized vinyl links in the shares (in mass %): from 0.5 up to 25 mass %, preferably from 3 up to 20 mass %in respect to the total mass of the engraving paste. The method of engraving provides for application on the inorganic surface of the engraving indicated paste with the following its flushing away by the dissolvent.
|
FIELD: chemistry. SUBSTANCE: invention relates to materials for processing glass, glass-ceramic and quartz surfaces, and can be used in optoelectronics to make optical components. The paste contains ammonium hydrofluoride (NH4F·HF), barium sulphate (BaSO4), sulphuric acid (H2SO4), isoamyl acetate, granular alkali-earth metal fluoride with granule size 25-63 mcm and water. Components are in the following ratio, wt %: ammonium hydrofluoride - 10-34; barium sulphate - 17-22; sulphuric acid - 2-4; isoamyl acetate - 1-2; alkali-earth metal fluoride - 10-34; water - the rest. The disclosed paste has low toxicity due to low concentration of active fluoride ions as a result of using ammonium hydrofluoride instead of hydrofluoric acid. EFFECT: use of the paste enables to obtain a coarse-grained surface with roughness of up to 65 mcm. 1 tbl, 3 ex
The invention relates to materials for surface treatment of glass, glass-ceramic and quartz and can be used in opto-electronics industry in the manufacture of optical components, as well as for the manufacture of grinding environmental materials. Famous pasta for etching [A.S. 948926], including, wt.%:
Pasta is not possible to obtain in the process of chemical etching of the glass surface which has a high polishing characteristics, the presence of hydrofluoric acid in the paste makes the process of etching unsustainable. Known etching solution [A.S. 779323]was chosen for the prototype. The solution comprises, by weight.%:
The solution does not allow to obtain a surface with a depth of etching of the material more than 2.5 μm, which does not allow to use this surface for grinding. When this etching solution toxicity due to the presence of hydrofluoric acid. The objective of the invention is to increase the depth of etching of the workpiece, i.e. increasing roughness, reduced toxicity and increased in scope. For solving the problem proposed pasta for etching, containing sulfuric acid, isoamylase, hydrofloric ammonium, barium sulfate, water, granulated fluoride, alkaline earth metal bead size 25-63 μm, in the following ratio, wt.%:
Fluoride of alkaline earth metal, being preaction-able, creates a natural barrier reactive component to the workpiece and is responsible for a number etched grains on the surface. Using hydrohloride ammonium provides, through its hydrolysis, active etching reagent hydrofluoric acid, which provides the etching surface. The use of hydrohloride ammonium is preferred before photoavtorally acid, as its hydrolysis produces a small amount of hydrofluoric acid, equal to the steady-state chemical equilibrium:
While using hydrofluoric acid to interact with the glass is a mixture of chemical equilibrium, for alignment which flows further hydrolysis of hydrohloride ammonium, adding to the reaction solution of hydrofluoric acid in the required quantities. This pasta does not contain an excess of hydrofluoric acid, which lowers the toxicity of pasta. Barium sulfate does not react with any component of the paste and is responsible for the density of the paste. Sulfuric acid is required on the I transformation products of the reaction of hydrofluoric acid in soluble salts. Isoamylase promotes uniform distribution of reactive ions in the etching paste. The decrease in the concentration of hydrohloride ammonium below 10 wt.% impractical due to the decrease in the thickness of the layer treatment must be performed and the failure to achieve the desired roughness, increasing hydrohloride ammonium more than 34 wt.% results protravlennuyu, heterogeneous surface material. The decrease in the concentration of barium sulfate below 17 wt.% leads to heterogeneity of pasta and uneven etching, an increase in the concentration of barium sulfate above 22 wt.% causes of kakovosti and uneven access etching reagent to the treated surface. The decrease in acid concentration below 2 wt.% not possible to remove all the salt, and the concentration is increased above the value of 4 wt.% leads to underutilization acid and excessive toxicity paste. At concentrations of solidaritat less than 1 wt.%, moving in the paste such ions is uneven, with its concentrations greater than 2 wt.% is exfoliating paste. Concentrations of fluoride, alkaline earth metal below 10 wt.% leads to areas completely etched large depressions on the treated surface, and the concentration of fluoride of alkaline earth metal above 34 wt.% Pref is the CIO to the emergence of large non-etched regions, protrusions, i.e. in both cases, uneven etching of the grain surface. The presence of fluoride, alkaline earth metal bead size 25-63 μm allows to obtain coarse etching with roughness in the range 27-65 mm. The water required for hydrolysis of hydrohloride ammonium, and values of its concentration calculated from equation 1. Deviation from these values is impractical, as it will not be fully utilized or hydrofloric ammonium or water. We offer pasta were treated with different surfaces: glass, Sitall, quartz.
As a result of applying paste the roughness of the processed surface of the material is increased about 24, 18, 12 times for glass, glass-ceramic and quartz, respectively, compared to the prototype. This allows you to use paste to create environmental abrasive tools, abrasives, for example, for grinding materials, the hardness lower than the hardness of the machined surface. We offer pasta has a lower toxicity by reducing the concentration of active fluorine. Use paste to etch glass, glass-ceramic and quartz provides in comparison with the known analogues of the following benefits: - the possibility of obtaining a coarse surface with roughness up to 65 microns; - possibility of regulating the size of etched grains from 30 to 65 μm by means of changing the composition of the PA who you are; - reduction of toxicity paste through the use of hydrohloride ammonium instead of hydrofluoric acid. Pasta for etching, containing sulfuric acid, isoamylase, characterized in that it further comprises hydrofloric ammonium, barium sulfate, water, granulated fluoride, alkaline earth metal bead size 25-63 μm in the following ratio, wt.%:
|
|||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
