Method of coat application on copper contacts of electric switching devices. RU patent 2509825.
| Sintered material for high-current sliding electric contact / 2506334 Invention relates to powder metallurgy, and namely to powder antifriction materials for high-current sliding contacts. It can be used for fabrication of current-collecting brushes, for example unipolar generators or current-collecting shoes contacting a rail of a tunnel railway. Material of the high-current sliding electric contact working in the pair with a steel counter relay with contact current density of more than 100 A/cm2 includes the following, wt %: copper 24-57; graphite 2-3; iron is the rest. |
| Method of making part semis for electric terminals and electric terminal component / 2497632 Invention relates to powder metallurgy, particularly, to making of semi-finished part for electric terminals in the form of a strip. Unit is made from silver-based composite including one or more metal oxides or carbon. Coating of basic metal powder is applied on said composite unit. Coated unit is compacted and annealed in reducing or inert atmosphere or in vacuum. This prevents formation of eutectic melt of composite silver and basic metal that coat the composite silver-based unit. Annealed unit is subjected to extrusion to obtain strip with top side of composite and bottom side of silver or silver-based alloy. |
| Contact point and method of its making / 2451355 Contact point from a composite material is made from a fine-grained dense graphite with specific electric resistance of not more than 16.0 mcOhm*m and compression strength of at least 60 MPa, with ash content of not more than 0.3% and porosity of not more than 20%, with metal additives of silver that are evenly distributed in the inner volume and make at least 7 wt %. The contact point is made in the form of a truncated pyramid with a base in the form of a rectangle. Faces of the truncated pyramid are arranged to the base at the angle of 75-87 degrees. The method to manufacture a contact point consists in the fact that initially a contact point is manufactured by dimensional mechanical processing from a fine-grained dense graphite, then the contact point is impregnated with an aqueous solution of silver nitrate, is placed into a container, filled with wood charcoal, recovery burning is carried out in accordance with a certain temperature-time mode 2-3 times with final recovery burning to achieve weight increment of the contact point mass of at least 7%. |
 Method for production of ag/sno2 powder mixture for interrupting contacts / 2442835The invention relates to powder metallurgy, in particular, to metal powder products. It can be used in production of ceramic metal materials for interrupting contacts based on silver and used in low-voltage equipment. The intermediate thermally unstable composition components Ag2O and Na2SnO3 are produced during the single-stage deposition from the solution containing AgNO3, Na2SnO3 and NaOH. The deposit containing SnO2 is extracted from the resulting mixute, and the mixture is dried and thermally processed. |
 Method of producing superfine charge of silver-zink oxide for electric contacts / 2434717Invention relates to grinding and may be used for production of arcing electric contacts. Proposed method comprises chemical deposition solution of silver and zinc nitrates, filtration, rinsing and annealing of precipitate. Note here that water-soluble surface-active poly(vinylpirrolidone) in amount of 1 to 3% of total volume of solution is added to solution of nitrates. |
 Contact piece, method and tool for its manufacture / 2420823Contact piece is made from composite material in the form of body of rotation, which is restricted with side surface with generatrix consisting of straight-line and (or) curved sections and two parallel surfaces of bases, made from fine dense graphite with specific resistance of not more than 16.0 mcOhm*m, compression strength of not less than 60 MPa, ash content of not more than 0.3% and volume porosity of not more than 20%. Manufacturing method of contact piece consists in the fact that flat workpiece is made from fine dense graphite, which has thickness equal to height of contact piece; workpiece is installed into the device, part of contact piece is cut out on one side, and workpiece is reinstalled and the rest part of contact piece is cut out on the other side. Contact piece manufacturing tool includes shank and working part consisting at least of one cutting element offset relative to rotation axis of tool the cutting edges of which form side furnace of contact piece. |
| Sintered electro-contact material on base of copper / 2415958 Sintered electro-contact material on base of copper contains, wt %: soot of zinc oxide - 2.2 - 2.5; aluminium - 0.001 - 0.005; tungsten - 3 - 10; copper - the rest. |
 Method to produce chrome and copper-based electric contacts / 2415487In method to make chrome and copper based electric contacts, including rolling chrome powder particles with balls in mill drum with further detection of minimum gap value Dt.proc. between chrome particles in frame of test pellet soaked with alcohol, which is pressed with height from 2.0 to 4.0 mm at constantly selected pressure Pspec from the range of 3.0-6.0 t/cm2 and their value comparison with value of minimum gaps between chrome particles in a similar test pellet made by pressing from chrome powder of initial raw materials Dt.init. at the same pressure Pspec., considering the processed powder good if its is not below 1.4, preparation of charge by mechanical mixing of powders of processed chrome and copper, pressing and preliminary recovery in atmosphere of live dehydrated hydrogen with soaking at temperature of 250-700°C, liquid-phase sintering at temperature of 1100-1250°C in atmosphere of live dehydrated hydrogen or solid-phase sintering at temperature of not more than 1050°C in atmosphere of live dehydrated hydrogen or in vacuum, additional heating of items to the temperature of 300-950°C in atmosphere of hydrogen and settling in closed stamp, according to proposed solution, chrome powder particles are rolled for 25-27 hours in mill drum at the ratio of balls or rolling solids weight and powder making 1:2, coefficient of drum fill of not more than 0.4, frequency of drum rotation 0.4-0.65 Nrot, min-1 where Nrot =42.4/√D, D - drum diametre, m. |
| Method of producing powder ceramet cu-cd/cdo for electric contacts / 2401314 Mix material is prepared containing powders of copper and cadmium with the solution of thermally unstable cadmium salt. Said mix is dried and thermally treated at 300-500°C. Produced burden is subjected to cold briquetting and sintering. Then second compaction and annealing are performed to produce Cu-Cd/CdO. |
 Method of producing composite material for copper-based electric contacts / 2398656Invention relates to powder metallurgy, particularly to method of producing copper-based composite materials. It can be used for production of electric contacts. Powders of graphite, copper, aluminium, phosphor copper and copper oxide are mixed at the following ratio, wt % graphite 0.10-0.20; aluminium 0.20-0.30; phosphor copper 0.05-0.15; copper oxide 1.15-1.4; copper making the rest. Prepared mix is subjected to high-power treatment in ball mill to produce granules of material representing copper-based matrix with reinforcing particles uniformly distributed therein in amount of 0.35 to 0.55 wt % of total weight with average size of 0.1 to 0.5 mm. Material matrix represents α-Cu(Al) substitutional solution while reinforcing particles - γ-Al2O3 with average size of 20-40 nm. Mix is compacted by extruding in heated state. |
 Method for synthesis of nanostructure film on article and apparatus for realising said method / 2466207Synthesis method involves placing an article and reference samples in a vacuum chamber, heating and monitoring their temperature, and depositing a metallic material from an evaporator onto the article and reference samples. In the process of depositing material, reference samples are successively removed from the vacuum chamber using a linking device and phase composition, structure and thickness of the film deposited on each sample is determined using a transmission electron microscope. At least one of the following process parameters is then varied if necessary: heating temperature of the surface of the article and reference samples, atmospheric pressure in the working volume of the vacuum chamber, atmospheric composition, the value of current passing through the evaporator, distance between the evaporator and the surface of the article, composition of the evaporated material. Once a film of given structure, phase composition and thickness forms on the surface of the next reference sample, the process of depositing the material is stopped. |
 Ion gun system, vapour deposition apparatus and method of making lens / 2455387Ion gun system (60) has an ion gun (14) for emitting a beam of ions; an electric power supply unit (61) for powering the ion gun; two mass flow regulators (64, 65) for feeding each of the two types of gases into the ion gun; a control unit (12) connected to the electric power supply unit and operating as a means of controlling the ion gun in order to control power supplied to the ion gun from the electric power supply unit; and a control unit (12) connected to the mass flow regulators and operating as a means of controlling mass flow in order to control flow of gas fed into the ion gun from the mass flow regulators, wherein the control unit (12) as a means of controlling mass flow is provided with such a function that the given flow value for each of the two types of fed gases varies step by step within the range of stable operation of the ion gun and change to another given value is realised. |
 Method, and apparatus for multi-layer film production and multi-layer structure produced by their means / 2451769Invention relates to ion-plasma sputtering of multi-layer films. According to the film production method, ion-plasma sputtering of substrate by target material is done in vacuum with application of magnetic field. Preliminarily dependence of material properties of sputtered layer on pressure rating of sputtering gas is determined. Sputtering is done at pressure rating as well as rating and/or orientation of applied magnetic field required for obtaining specified properties of sputtered layer material. Wherein at least two layers are sputtered from one target at different sputtering gas pressures. Apparatus for film production comprises a shielded cathode target and a substrate holder located in horizontal magnetic field with orientation field configured to be changed. The shield is made with adjustable height and at least two openings for sputtering material. Each opening has an insert with adjustable height, and additional vertical wrapped partition. |
 Procedure for determination of rate of thermal vacuum sedimentation of alloys by method of emission spectroscopy / 2427667Procedure consists in excitation of alloy atoms with electron impact in vapour phase, in resolution of obtained emission radiation in spectre, in recording spectre and in calculation of sedimentation rate. Also, excitation is performed with two plane parallel metal plates screened with dielectric covering positioned opposite to each other parallel to flow of vapours of evaporated alloy and connected to outputs of high frequency generator. |
 Deposition by impulse magnetron dispersion with pre-ionisation / 2364661Invention is related to method for deposition of substance onto substrate, impulse source of supply for magnetron reactor and to magnetron reactor. Substance is dispersed onto substrate in magnetron reactor. Prior to supply of each pulse of the main voltage, gas is pre-ionised to provide for generation of current pulses. Time for decay of specified current pulses after cutoff of the main voltage pulses that are less than 5 microseconds. Pulse source of supply comprises facilities for generation of the main voltage pulses, facilities for generation of control pulses and commuting facilities. |
 Device to apply porous coats onto tapes (versions) / 2337179Device incorporates a vacuum chamber, an evaporator, a reel-on/reel-out shafts, upper and main guide rollers and deflecting rollers arranged above the evaporator in symmetry with the vertical. The upper guide rollers represent cooled cylinders. The rotary drums, representing cooled cylinders, are arranged in the condensation zone. The main guide rollers are arranged around the lower part of the aforesaid rotary drums so as to allow the tape sections to pass there between and to make the angle of 0 to 30° between the straight line connecting the evaporator center with any point of the said tape section and the normal to the tape section point, and to allow the tape section to pass between the upper guide roller and the main guide roller located above the other main guide rollers making the angle of 55 to 80°. In compliance with the other version, the device incorporates fixed drums arranged in the condensation zone and representing cooled cylinders with the main guide rollers running in rotary separators and fitted along the cylindrical section of the said cooled drum. |
 Lenses antireflection coating having low internal stress and ultralow residual reflection power / 2324763Invention refers to reflective coatings for optical lenses, namely to compositions for antireflection coatings production. Optical lenses and one check lens are brought into vacuum deposition chamber and put onto the same deposition surface. The chamber contains continuous optical check device interacting with said check lens and source with composition to form antireflection coating. A layer of composition with high refraction index is deposited first, constituting a mixture of cerium and titanium oxides, mass of cerium oxides being less than 25%. Deposited next is low refraction index layer containing silicon oxide, for example mixture of silicon and aluminum oxides (aluminum oxides mass is less than about 10%). Continuous optical check device is used to detect a moment when required optical thickness of antireflection coating is achieved; light beam is adjusted by means of this device in such a way that correlation of blue, green and red component intensities in reflected light ensure practically white reflection. Lens coating produced in such a way has low reflection power and internal stresses, and doesn't produce colouration of reflected light. |
 Coating deposition in vacuum monitoring method and apparatus for performing the same / 2318915Method comprises steps of exciting tuning fork on ends of which reference samples are placed; heating said samples till predetermined temperature values at comparing current values of their temperature with preset ones; measuring initial oscillation period and registering its value; depositing coating while measuring current values of tuning fork oscillations; detecting thickness of coating according to difference of initial and current values of oscillations of tuning fork on base of their comparison with results of test coating deposition; determining time moment of starting coating deposition; predicted time period till termination of coating deposition of predetermined thickness; preliminarily indicating termination of coating deposition process when coating thickness consisting 0.9 of predetermined coating thickness value is achieved; indicating moment of termination of coating deposition process onto reference samples at achieving predetermined thickness of coating. |
 Device for deposition of the multilayered optical coatings / 2312170The invention is pertaining to the device for deposition of the multilayered optical coatings and may be used at manufacture of the laser technology at development of the antireflecting coatings and the reflective coatings on the butt surfaces of the semiconductor lasers. The device contains two targets located in the vacuum chamber and two ion beam formers. In the vacuum chamber there is the multi-channel loading port (MCLP) with the substrates. The pairs including the ion beam former and the target are disposed on the opposite sides of the MCLP. The active gas stream former is made with the capability to form more than one stream and to realize feeding of the active gas particles streams to the different sides of the MCLP. The MCLP is capable to change positions of the substrates and to reorient their working surfaces concerning the pairs of the ion beam former and the target. In each indicated pair the target are executed in the form of the units amounting the unit of targets are made as the components composing the targets block with the capability of their mutual replacement or to be replaced by the designated for cleaning reflective target. The automatic control unit is electrically connected with the ion beam formers, the blocks of the targets, the active gas streams former and the MCLP. The invention is aimed at the increase of the efficiency of the production process and at improvement of reproducibility of the process of deposition of the coatings in the continuous production process. |
 Method of the ionic treatment of the surface layer of the metal articles and the installation for its realization / 2305142The invention is pertaining to the to the vacuum ionic a-plasma process engineering and may be used in the aircraft industry and natural gas industry at preparation of the articles surfaces, for example, the compressor blades for application on them of the protective coatings, to formation of the modified surface layer of the articles, and also as the bench test support at solution of the exploratory industrial-technological problems. The method of the ionic treatment provides, that as the evaporable current-conductive substance use titanium or zirconium. Current regulation of the vacuum arc and the negative potential on the article is exercised on the basis of the control of the radiation dose with the help of the multi-grid probe fulfilling the functions of the electrostatic analyzer of the charged particles of the ion component of the flow. The probe collector through the analog-to-digital converter (ADC) is connected to the microcontroller, which is connected through the ADC to the power supply unit. The power supply unit is connected with the feed of the negative potential and its separate regulation to the article, the electrode-evaporator and the probe grids. The microcontroller input is connected with the digital vacuum meter of the working chamber and the probe collector output the analog-to-digital converter is connected with the drive of the block of the vacuum pumps, and also its input through the analog-to-digital converter is connected with the additional sensor of the energy level of the ionic flow. The technical result of the invention consists in the increased efficiency of optimization of the ionic treatment. |
 Application of antifriction wear-proof coat on titanium, alloys / 2502828Proposed method comprises pre-cleaning and activation of titanium alloy surface by bombardment with argon ions using gas plasma generator and ion plasma deposition of composite coat by magnetron sputtering of cathode containing titanium carbide and molybdenum disulfide combined with application of negative potential to the article, deposition and bombardment being combined as well. Coat is deposited on pre-doped surface layer of titanium alloy formed by magnetron sputtering of cathode material combined with application of negative potential exceeding that used at coat deposition. Initial ratio of sputtered cathode material is as follows: titanium carbide - 40-60 wt %, molybdenum disulfide making the rest. |
FIELD: metallurgy.
SUBSTANCE: proposed method comprises ion-plasma spraying of molybdenum on copper contact. Spraying is started at voltage across copper contact of 1100-1500 V and heating to volumetric temperature of 180-230°C.Then, spraying is conducted at reference voltage across copper contact of 110-130 V to make 2-4 mcm-thick coat layer. Then, voltage is increased across copper contact to 1100-1500 V to allows spraying duration of 0.3-0.5 of that for spraying said one mcm-thick coat. Thereafter, spraying is performed at voltage increased many times to said increased voltage and decreased to said reference voltage to produce required thickness.
EFFECT: higher spark erosion resistance of copper contacts, longer life of switching devices.
1 tbl, 2 ex
Method refers to elektroapparatstroy and power supply systems and can be used for surface treatment of contact connections, in particular explosive copper contacts elektrokommutatsionnogo devices.
The known method of application of composite laminate molybdenum-copper coating on copper contact area, including the use of the concentrated streams of energy for evaporation source materials of molybdenum and copper and condensation them on the contact surface. As the source of materials used first foil copper weight of 4 to 5 mg, with the addition of molybdenum powder weight of 0.8 to 0.9 g, then one copper foil weighing 175 to 185 mg Evaporation is carried out by passing to foil an electric current, causing her electric explosion. Condensation of explosion products on the contact surface is carried out at the value of consumed power density on the hardened surface of 4.5% to 5.0 and 3,7% to 4,2 GW/m 2, respectively (RU №2455388, SS 14/32, 2012).
The disadvantage of this method is the impossibility of its use in explosive high-current copper conductors for the protection of surfaces of contact details, which is the arc, or both, and live, and arc quenching, as used in it operations and their sequence assume coating, the upper layer which is copper, not possessing high refractoriness and non consequently, arc resistance.
Closest to the claimed is a method of obtaining coatings for electrical contact, based on ion-plasma spraying material hardness is higher hardness of the substrate material with the supporting substrate voltage 90 to 120 C. the substrate sprayed dual copper alloy with chromium, many times change during deposition substrate voltage up to 1000-1200 In and back to the reference, and the rate of change of voltage is 1 to 2 times per micrometer thickness and the length of spraying at 1000-1200 In equal 0,2-0,4 from the time of deposition of coatings micron thickness (SU # 1628564, CL SC 14/54, 1989).
The disadvantage of the prototype method is that the coating is not enough refractory to improve postojati contact details in discontinuous current copper conductors because of the content of a large number of copper in it.
The objective of the invention is to increase electric erosion resistance of the surface of the explosive copper contact details electrocautery devices.
The technical result is the increase of a resource of work of the copper conductors electrocautery devices.
The task and this technical result is achieved in the method of applying coatings on copper contact electrocautery device by ion-plasma spraying of molybdenum copper contact. Spraying begin when the voltage at the copper contact 1100-1500 In ensuring its heating to bulk temperature 180-230 C, then spraying is conducted at the reference voltage at the copper contact 110-130 In ensuring spraying coating layer thickness of 2 to 4 micrometers, and then at higher voltages at the copper contact, equal 1100-1500 In, and duration of deposition, equal 0,3-0,5 from the time of deposition of a coating thickness of one micrometer. Then continue spraying with multiple voltage at the copper contact from the reference to the mentioned high voltage and low voltage referred back to a reference voltage and obtaining of the coating thickness.
The essential difference between the claimed process consists in that provides for the application of molybdenum coating on the pre-heated copper contact detail with the temperature limit its heating. Heating occurs when the voltage on the sprayed surface 1100-1500 In, because at high voltage increases the intensity of the ion bombardment with a significant reduction in the share of ion deposition (condensation).
The voltage ion bombardment chosen not less 1100 In, as if it decreases no heating of the surface temperatures of 180 C, which is the beginning temperature recrystallization of electrical copper contributing to the implementation of ions of molybdenum in its surface. The excess of the value of 1500 leads to the heating above 230 C and the weakening of the contact details that with further multiple switching, including shock loading, leads to reduction of a resource of work.
The use of copper conductive contact details with ion-plasma coated with refractory material molybdenum can reduce the number formed in short circuit mode bridges welding by raising the melting point of the material surface contact details. Deposition of coating is performed in case of voltage 110-130 In, as this current plasma arc is 90-100 And that allows to besiege molybdenum.
A change in the process of applying a voltage from 110-130 V to 1100-1500 In the back and allows to maintain temperature of evaporation surface is necessary for strong coupling sputtered layers of molybdenum among themselves. The duration of intermediate ion bombardment of every two to four deposited micrometers molybdenum coating over time, less than 0,3 from the time of coating deposition micron thickness does not allow heat evaporated surface to a degree sufficient for strong coupling sputtered layers of molybdenum among themselves. Long-ion bombardment - more than 0.5 from the time of coating deposition micron thickness leads to overheating and loss of strength of the copper contact details.
Voltage change at deposited molybdenum surface from 110-130 V to 1100-1500 In the coating thickness less than 2 mm leads to significant the Hizdakchut of each layer of the coating and in the end cost more time and energy to obtain the required thickness required for increase of a resource of operation of the copper conductors electrocautery devices. Voltage change from 110-130 V to 1100-1500 In the coating thickness more than 4 microns not provide the strongly coupled layers molybdenum coating.
The method is as follows. On sprayed end surface of the cathode copper brand M1 place of high-purity molybdenum brand m,95-MP. The cathode is placed in a cathode Assembly arc evaporator units for ion-plasma coating. Light arc and serves voltage 1100-1500 In that lets you spray molybdenum cathode surface and bombarding ions sputtered item until it reaches a bulk temperature 180-23°N Then reduce the voltage to 110-130 In and at arc current 90-100 And precipitated on the part surface layer molybdenum coating. After deposition of coating layer thickness of 2-4 micrometer change the voltage up to 1100-1500 In, due to this there is the strengthening of the ion bombardment at decrease of the ion deposition. High voltages remain within 0.3 to 0.5 from the time of coating deposition micron thickness. During this period of mechanochemically impact on the deposited layer with his warm-up. After the specified time high voltage reduced to 110-130 In and this cycle is repeated many times in such a way as to achieve the coating thickness.
The invention is realized in laboratory conditions on the upgraded installation of ion-plasma spraying "Bulat". On sprayed end surface of the copper cathode copper brand M1 mechanically fixed plate made of high-purity molybdenum brand m,95-MP thickness of 5 mm Handling subjected contact surface samples 40 mm diameter of electrical copper brand MT. Previously, it was established the dependence of the bulk sample temperature from different combinations of voltage and time of the ion bombardment. Temperature was controlled by the contact method using thermocouples TCA (L).
Example 1. The sample was degreased in alcohol, was placed in a vacuum chamber on podsoznatel. The chamber was pumped to achieve a vacuum of order 4·10 -5 mm RT. century, after pumping on the sample was applied voltage 1100 In and supported within 10 minutes. Next, the voltage is reduced to 120 V, and the current plasma arc was 90 And that has allowed to receive the deposition rate of about 30 microns per hour. After 4 minutes spraying changed the voltage on the sample to 1100 In and supported within 1 minute, which amounted to 0,5 from the time of coating deposition micron thickness. Then the voltage again reduced and the cycle is repeated again 4 times. The sample was cooled in a vacuum within 10 minutes. Total processing time was 45 minutes, she got coating thickness of about 9 micrometers.
Example 2. The sample was degreased in alcohol, was placed in a vacuum chamber on podsoznatel. The chamber was evacuated, the sample was applied voltage 1500 V and supported within 8 minutes. Next, the voltage was reduced to 130, with current plasma arc amounted to 100 And that has allowed to receive the deposition rate of about 40 mcm/hour. After 6 minutes spraying changed the voltage on a sample of 1,500 In and supported within 30 seconds, which was 0.3 from the time of coating deposition micron thickness. Then the voltage again reduced and the cycle is repeated 3 times. The sample was cooled in a vacuum within 10 minutes. Total processing time also was 44 minutes, the floor had a thickness of about 14 micrometers.
Tests on electro-erosion wear resistance of samples with applied coatings conducted during their contact with the electrode made of tungsten wire on the presence of the conductivity in contact. Test mode: frequency switching (number of cycles circuit-breaking) is equal to 1 Hz (60 switching in a minute), the distance between the contacts 5 mm, 220 V voltage, current strength was 10 A. For the refusal was taken lack of conductivity in contact for ten consecutive switching. Tested coating thickness 9-10 micrometers as without pre ion processing, and the proposed method. The results are given in the table.
The proposed method is at the stage of laboratory tests.
Method of applying coatings on copper contact electrocautery device, which is characterized by the fact that the lead ion-plasma spraying of molybdenum copper contact, which begin at the voltage at the copper contact 1100-1500 In ensuring heating it to surround temperature 180-230 C, then if the reference voltage at the copper contact 110-130 In ensuring spraying coating layer thickness of 2 to 4 micrometers, and then at higher voltages at the copper contact, equal 1100-1500 In, and duration of deposition, equal 0,3-0,5 from the time of deposition of coatings thickness of one micrometer, then continue spraying with multiple voltage at the copper contact referred to high voltage and low voltage referred back to a reference voltage and obtaining of the coating thickness.