Method of depositing precision photolithographic pattern on cylindrical surface of optical component and image contact exposure device for realising said method. RU patent 2519872.
 Polyurethane composition and its application for obtaining holographic media / 2518125Claimed invention relates to polyurethane composition for obtaining holographic media. Claimed composition includes: A) polyisocyanate component; B) isocyanate-reactionable component, which includes, at least, 50 wt % calculated per the total mixtute of B) polyetherpolyols B1) with number average molecular weights higher than 1000 g/mol, which have refraction index nD 20<1.55 and contain one or several oxyalkyl links of formulae (I)-(III): -CH2-CH2-O- (I), -CH2-CH(R)-O- (II), -CH2-CH2-CH2O- (III), with R being alkyl or aryl residue, which can be substituted or broken with heteroatoms; C) compounds, which have refraction index nD 20>1.55 and contain groups, under action of actinic radiation reacting with ethylene-unsaturated compounds with polymerisation (radiation-solidified groups), and do not contain NCO-groups themselves; D) radical stabilisers; E) photoinitiators; F) catalysts if necessary; G) auxiliary substances and additives if necessary. Also described are: method of obtaining media for recording visual holograms, medium for recording visual holograms, application of such medium and method of hologram recording. |
 Pattern generation / 2518084Invention relates to generation of electron or photon pattern on substrate, application of fluoropolymer to this end, to method of pattern generation and to electron or photon device thus made. Proposed method comprises: formation of film of said electron or photon material on said substrate and application of said fluoropolymer for protection of said electron or photon material in pattern generation. |
 Photopolymer composition and use thereof to produce holographic media / 2515991Present invention relates to a photopolymer composition for producing holographic media, which contains three-dimensionally cross-linked organic polymers (A) or precursors thereof as a matrix, and compounds (B), which contain groups which, when exposed to actinic radiation, react with unsaturated compounds with ethylene fragments to form polymers (radiation-curable groups), and which are dissolved in said matrix or are located therein in a distributed state, as well as a component (C) which is at least one photoinitiator, wherein density of the polymeric cross-linking of the organic polymer, expressed through average molecular weight MS of two segments connected by polymer bridges, is a value ranging from 2685 g/mol to 55000 g/mol. The invention also describes a medium which is suitable for recording visual holograms, use of said medium and a method for exposure thereof. |
 Polyurethane prepolymer-based compositions based for production of holographic media / 2515549Claimed invention relates to polyurethane composition for production of holographic media. Composition contains: (A) polyisocyanate component, which contains at least one polyurethane prepolymer with terminal NCO-groups exclusively on base of oligomeric or polymeric dysfunctional compounds, reaction-able with respect to isocyanates, with average molecular weights from 200 to 10000 g/mole, in which NCO-groups are bound with primary residues, (B) polymers, reaction-able with respect to isocyanates, (C) compounds, which contain groups, which when exposed to actinic irradiation react with ethylene-unsaturated compounds with polymerisation (radiation - solidified groups), and themselves do not contain NCO-groups, (D) stabilisers of radicals and (E) photoinitiators, with compounds, applied in component C), having refractive index nD 20>1.55. Also described are: method of producing medium of recording of visual holograms, application of such medium and method of hologram recording. |
 Polyurethane composition and use thereof to produce holographic media / 2510666Present invention relates to a polyurethane composition for producing holographic media. Said composition contains: A) a polyisocyanate component; B) an isocynate reactive component, which contains hydroxy functional multi-block copolymers B1) of the type Y(Xi-H)n with i=1-10 and n= 2-8 and number-average molecular weight greater than 1000 g/mol, wherein segments Xi are respectively built from alkylene oxide links of formula (I): -CH2-CH(R)-O- formula (I), wherein R is hydrogen, an alkyl or aryl residue, which can be substituted or interrupted with a heteroatom (e.g. ether oxygen), Y is the base of the starter unit and the fraction of segments Xi relative the total amount of segments Xi and Y is at least 50 wt %; C) compounds having a refraction index nD 20>1.55 and contain groups which react under the action of actinic radiation with ethylenically unsaturated compounds with polymerisation (radiation-cured groups) and do not contain NCO- groups themselves; D) radical stabilisers; E) photoinitiators; F) optionally catalysts; G) optionally auxiliary substances and additives. The invention also describes a method of producing media for recording visual holograms, media for recording visual holograms, use of such a medium and a method of recording holograms. |
 Method of making multilayer metal elements using ultraviolet radiation-utilising processes / 2496129According to the method, the conducting surface of a substrate is coated with a first layer of photosensitive resin and treated with radiation through a mask which is matched with the required shaped cut. By developing the first layer, a first level of a mould made from resin with openings which open the conducting surface of the substrate is obtained. Further, a new layer of photosensitive resin is deposited on top of the developed layer. The new layer is also treated with radiation through a mask which is matched with the required shaped cut. By developing the new layer, a multi-level mould made from resin with openings which open the conducting surface of the substrate is obtained. Electrodeposition of metal or alloy is carried out in the openings of the multi-level mould. The substrate is separated and resin layers are removed to open the multilayer metal structure formed by said metal or alloy, obtained via deposition in the openings. |
 Negative photosensitive polymer composition, method of forming pattern and liquid ejection head / 2495468Photosensitive composition contains a cation-polymerisable compound, an acid photogenerator having an anionic part and a cationic part, as well as a salt having a cationic part having anyone of a quaternary ammonium structure or a quaternary phosphonium structure, and an anionic part. The anionic part of the salt is substituted with the anionic part of the first acid obtained from the anionic part of the acid photogenerator, to form a second acid having acid strength lower than that of the first acid. The cation-polymerisable compound is an epoxy resin. The acid photogenerator is at least a compound selected from a group comprising a sulphonic acid compound and other sulphonic acid derivatives, a diazomethane compound, a sulphonium salt, an iodonium salt, a sulphonimide compound, a disulphonic compound, a nitrobenzene compound, a benzoin tosylate compound, an iron arene complex, a halogen-containing triadine compound, an acetophene derivative, and a cyano group-containing sulfatoxim. The method of forming a pattern involves preparing a substrate on which the photosensitive composition is provided. A portion of the composition is then exposed to light to cure the exposed portion. The cured portion is then heated. The liquid ejection head has a part with an outlet channel for ejecting liquid. The part with the outlet channel is formed from cured material made from said composition. |
 Method of forming masking image in positive electron resists / 2478226Method of forming a masking image in positive electron resists involves direct etching of the resist directly in the process of exposure with an electron beam in a vacuum. The resists used are polymers which are capable of chain depolymerisation (e.g., polyalkylmethacrylates, polymethyl-isopropenyl ketone, poly-alpha-methylstyrene). Exposure is carried out in the region of the glass-transition temperature of the starting polymer or at higher temperatures. |
| Method of producing contact photomask with submicron and nanometric design rules / 2470336 Invention relates to microelectronics and specifically to methods of producing contact photomasks with submicron and nanometric design rules and can be used in producing photomasks for producing acoustoelectric devices operating on surface and volume acoustic waves. In the method of producing contact photomasks with submicron and nanometric design rules, a photomask for projection photolithography with dimensions which are N times larger than those of the contact photomask is made and using that photomask for projection photolithography and apparatus for projection photolithography which reduce the size the transferred drawing N times, the image is transferred onto circular wafers made of material which is transparent for UV radiation, having dimensions which correspond to linear dimensions of silicon wafers used to produce integrated circuits using said apparatus for projection photolithography, and contact photomasks are made from said special circular wafers. |
 X-ray lithographic template and method for production thereof / 2469369Production of an X-ray lithographic template involves processes of forming a resistive mask on the working surface of the starting electroconductive substrate (or having electroconductive layers), processes for electrodeposition of a metallic X-ray absorbing layer, wherein the starting substrate consists of two components made from different materials: a reference ring and an internal disc which is completely removed by selective etching on the last stages of making the template. |
 Method and device for obtaining metallized image onto sheet material / 2267408Method and device can be used for protection of sheet material having original image against imitation. Method is based upon applying metal onto sheet material. Metal is subject to influence at preset points by aid providing connection of points. Salt-containing solution is applied onto sheet material and sheet material is impregnated with the solution. Then extraction of metal is induced from solution at preset points and image is formed from integrity of those points. Original image is created as a result which provides reliable protection from imitation. |
 Method of screen-x-ray lithography / 2344453X-ray mask locked in mask holder and comprising a topological image generated on its working surface and the substrate to be processed locked in its holder and furnished with an X-ray resistor layer applied on its surface are arranged on the path of exposing radiation. Note here that the X-ray screen is arranged closer to the said radiation source. Mind that all processes of producing X-ray mask are executed at a temperature equal to that of the aforesaid mask inside the lithographic station working chamber during exposure. Note also that prior to exposure, the X-ray mask total surface area is uniformly warmed up electro thermally and by subjecting it to warm-up radiation till preset temperature, the said radiation not generating additional exposure dose in the aforesaid X-ray-resistor. Then the aforesaid temperature is kept up with the help of the aforesaid means during the entire period of the X-ray mask staying in the lithographic station working chamber. |
 Method of screen scanning synchrotron x-ray lithography / 2344454X-ray mask comprises a bearing membrane with a metal X-ray-absorbing topological image made on its surface and the substrate to be processed locked in its holder and furnished with an X-ray resistor layer applied on its surface are arranged on the path of synchrotron radiation, the X-ray mask being located closer to the radiation source. Note that the synchrotron accumulator magnetic structure control is executed by a special computer program periodically changing the corner of orbit inclination relative to median plane that allows scanning the SR beam propagating over the lithographic channel and over the X-ray mask working area. Mind that the amplitudes of deflectors magnetic fields defining the orbit of electrons on the site of the accumulator between the deflectors are set depending upon the distances between the said deflectors and the point whereat circulating electron orbit intersects the axis at a given period of operating lithographic channel, the aforesaid setting being made so as to allow the bunch of electrons to pass through the aforesaid point during the entire exposure period and to vary its inclination angle relative to the aforesaid median plane. |
 Lithographic mask for liga-technology and method for its manufacture / 2350995Application: for manufacture of lithographic mask. Topological X-ray absorbing pattern is formed on working surface of bearing membrane, at that identical topological X-ray absorbing pattern from the same material (or combination of materials), of the same thickness and spatially matched with the first one is also formed on the opposite side of bearing membrane. |
 Method for manufacture of litographic mask for liga-technology / 2350996Application: for manufacture of lithographic mask. Resistive mask is formed by means of X-ray lithography on working surface of bearing membrane or processed substrate, which are blanks for lithographic mask and are made of materials with low atomic weight, and processes of electroplating metals with high atomic weight via formed resistive mask, at that at first thick layer of X-ray resist is applied on working surface of bearing membrane or processed substrate, and then thin layer of either photo- or highly sensitive electronic resist, in the latter resistive mask is shaped and then masking coating with its help, which serves as stencil for performance of lithography by X-ray radiation of appropriate spectral range for creation of resistive mask in the layer of X-ray resist. |
 Flexible nano-imprinting stamp / 2365960Present invention concerns nano-imprinting stamp designed for imprinting the millimicron (nano) and millimeter structures. Nano-imprinting stamp 1 has a major component and a first and second imprinting component 2, 3, with lithographic pattern 7 to be imprinted in a printable substrate. In first aspect, first and the second imprinting components 2, 3 can be displaced independently in a direction practically parallel to that of imprinting of the imprinting stamp. In the second aspect, first and second imprinting components 2, 3 are loosely coupled mechanically in a direction practically parallel to that of imprinting of the imprinting stamp. The stamp limits impact of defects in the substrate printed with the lithographic pattern 7, or thereon, and defects in the stamp or thereon, and any combinations of such defects by localisation of stamp bend in the major component 5 between imprinting components 2, 3. |
 Photoactivation method and use of catalyst through inverted two-stage procedure / 2381835Invention relates to a method of photoactivation of a photocatalyst by irradiating a composition containing the said catalyst. The method of using a photolatent catalyst (a) in which a composition containing said catalyst is irradiated before subsequent treatment is characterised by that, the photolatent catalyst is: (a1) a compound selected from a group consisting of a photolatent acid, an aromatic iodonium salt or oxime-based photolatent acid; (a2) a photolatent base compound. Also described is a substrate on which a coating made from the composition is deposited in accordance with the above described method. Also described is a method of using photolatent catalyst (a), in which a composition containing said catalyst is irradiated before subsequent treatment, characterised by that subsequent treatment is preparation of foam material and the composition contains polyol and isocyanate components and photolatent base (a2) as photolatent catalyst. |
 Nanoimprint lithography method / 2384871Invention relates to microelectronics and can be used in nanoimprint lithography when making ordered arrays of magnetic and other structures. The method involves formation of a relief on a resist coating deposited on a substrate via nanoimprint lithography with application of exciting ultrasonic oscillations and an axial force onto a die. Ultrasonic oscillations arising when the die gets into contact with the resist are also detected in the substrate, from the intensity and/or phase and/or spectrum from which the degree of filling the die relief with the resist is determined. |
 Method for lift-off lithography of film-type island structures / 2400790Substrate with a mask in form of a film-type layer is heated in an inert medium until melting of island elements contained in the mask image, where material of the mask does not wet the surface of the substrate. The method for lift-off lithography of film-type island structures on a substrate includes the following steps: formation of a mask island layer, melting the mask island layer, sputtering a layer of second material, removal of the mask island layer, sputtering a third material and removal of the second material. Material of the first layer is selected such that it is does not wet the surface of the substrate. |
 Antimony-free photocurable polymeric composition and three-dimensional article / 2408627Invention relates to a photocurable composition for a three-dimensional article containing the following in wt %: (a) a cation-curable component containing an oxetane compound 35-80; (b) a free-radical active component containing poly(meth)acrylate, which is not dipentaerythritol hexaacrylate 15-60; (c) an antimony-free cationic photoinitiator 0.1-10; (d) a free-radical photoinitiator 0.01-10; (e) one or more additives which increase impact resistance 0.01-40. The photocurable composition can be cured under the effect of actinic radiation and optionally heating, which enables to obtain three-dimensional articles which can be used in various aerospace fields and in methods of casting with consumable patterns. Described also is a method of producing a non-toxic photocurable composition by mixing all components and a method of making a three-dimensional article which is free from antimony. |
FIELD: physics, optics.
SUBSTANCE: invention relates to electro-optical instrument-making and is designed to deposit a photolithographic pattern on the working surface of hat orifices of an optical-mechanical unit in a scanning device for generating code signal for controlling solar orientation of spacecraft. The method and device for realising said method include steps of depositing a chromium coating on a substrate, having a given radius of curvature R, made of optical glass by vacuum deposition, depositing a positive photoresist layer by a drip method on the working surface of a revolving substrate placed in a centrifuge, drying and heat treatment until full polymerisation of the photoresist layer and contact exposure of the image from a photographic mask by superposition and fixation thereof with the working surface of the obtained workpiece and subsequent illumination of the photoresist layer with a UV radiation source.
EFFECT: facilitating uniform deposition of a photoresist layer on the working surface of a substrate made of optical glass with a given radius of curvature, providing precise superposition and fixation of the working surface obtained after depositing the photoresist of the workpiece of an optical component, with subsequent uniform illumination of the photoresist layer with a UV radiation source.
9 cl, 6 dwg
The method of application of precision photolithographic drawing on a cylindrical surface of optical details and application for contact display picture for its implementation.
The invention relates to the field of opto-electronic instrument and is intended for applying photolithographic figure on the working surface of the cylindrical aperture optical-mechanical unit in the scanning device to generate code control signal orientation on Sun SPACECRAFT (SC).
Site aperture rotates around the axis of the device, which is focused on the Sun. With the passage of radiation through a transparent graphic aperture on photoreception device code is formed the control signal, which is used for precise orientation of the SPACECRAFT.
In opto-electronics industry are widely used optical parts in the form of grids, scales and masks with transparent and opaque picture. On the surface of the optical components is applied to the image by photolithography. This kind of optical parts are used as modulators of the light flux, grid in the image plane, perform other functions. Modern optical photolithography focuses solely on the production of optical components with flat work surface. Modern devices, such as a system basmasovo laser photolithography DWL-66FS (Heidelberg, Germany), in 3D mode, you can implement only a slight relief, but not the surface with a large parameter curvature.
High requirements to the optical parts (grids, scales and limbs and other) for resolution, strength, radiation and corrosion resistance and optical characteristics in connection with their use in different climatic conditions - in vacuum, space, etc. contributed to the development of methods of their production, based on application of the method of photolithography. As a metal, forming the image grid, worlds or of the scale most commonly used chrome and silver, thanks to their stable dimensional characteristics at etching that is usually applied to the workpiece by thermal evaporation in vacuum. Standard methods of photolithography figure photomask is transferred to reliefoobrazuyushchey material (usually a photoresist) and is dry or liquid etching substrate to a certain depth. The scale and the grid is produced by drawing on a substrate photosensitive layer, its exposure, applying metallic figure and films of titanium oxide and silicon oxide. (RTM 3-520-74. The scale and grid photographic. Technological process of manufacture with application of photoconductive to the basis of diazocompounds/1/.
According to the method of manufacture scales and grids (SU 834399, 3 IPC G01D 13/06, published 30.05.1981) 12/ the photosensitive layer exhibiting a UV light through a mask made of quartz glass.
The development model of the technology is the method of manufacture of precision optical scales by the method of inverse photolithography (RU 2370799, IPC G02B 27/00 published: 20.10.2009) /3/, which includes the following operations: application of the chrome layer on a substrate of optical glass vacuum plating, coating photoresist on the substrate first heat treatment, exposure, development, second heat treatment, training embossed images. The operation method is carried out in accordance with the industry standard (OST-6209-86, "Scale and grid photographic. Typical technological processes with application of positive photoresists based diazocompounds") /4/. The application of the photoresist on the basis of diazo compounds produced on a rotating workpiece with the help of the glass tubes, dropper or syringe (speed centrifuges from 800 to 4000 rpm, admissible deviation of frequency of rotation from ±40 rpm up to + 200 rpm).
The first heat treatment of billets with a layer of photoresist produce in a drying oven at SNA (convection method and in the installation of the infrared drying WAP-700. The display is produced using the installation pin up Interfax-50M and the installation of projection copy JuBPM S80, intended for manufacturing of elements of topology of not less than 5 microns, and procurement subjected to emission of mercury-quartz lamps.
The closest to the sequence of the claimed invention is a method of manufacturing of precision optical scales by photolithography with the launch of the (options) (EN 2430391 6 IPC G02B 27/32, G03F 7/004) /5/adopted as a prototype of the present invention.
Prototype method include the following technological operations:
- application of chrome plating on the polished substrate of optical glass by the method of vacuum spraying;
- drawing on the work surface of the substrate placed in a centrifuge thin and uniform layer of positive photoresist drip feed while rotating centrifuge;
- drying and thermal treatment received billet optical parts to the complete polymerization of photoresist;
- contact exposure on an installation that contains a tool for capturing and combining glass photomask and flat surface of the workpiece optical details and source of UV radiation that is designed to expose the layer photoresist, located above the surface of the mask.
The known method of photolithography used in the production of circular optical scales at the production Association "Urals optical and mechanical plant named AS production Association", Ekaterinburg (Deukmejian, magazine "Practical production problems" received 29.01.2007) /6/. Industrial mastered the production of wide range of precision optical flat parts made by photolithography.
However, the above methods are intended for the application of precision photolithographic picture on a flat substrate made of optical glass and do not allow to apply photolithographic figure on a piece of cylindrical surfaces of optical parts fixed radius of curvature.
The present invention is to develop the method of application of precision photolithographic figure contact-exposure image with photomask on the cylindrical surface of optical parts.
The technical result of the invention is the possibility of uniform drawing a layer of photoresist on the working surface of the substrate of optical glass with a specified radius of curvature, ensure precise alignment and fixation of the working surface obtained after application of the photoresist procurement optical parts followed a uniform illumination of a layer of photoresist source of UV radiation.
This technical result is achieved by the way of drawing precision photolithographic figure on the cylindrical surface of the optical parts includes applying chrome coating the surface of optical glass vacuum sputtering, application of drip way layer of positive photoresist on the working surface of the rotating substrate placed in a centrifuge, drying and heat treatment to the complete polymerization layer of photoresist and contact exposure image with photomask by combining and fixing it with the working surface obtained procurement and subsequent illumination layer of photoresist from the source of ultraviolet radiation.
According to the invention, the substrate with a specified radius of curvature R, for the application of their working surface layer of photoresist installed symmetrically in the frame centrifuges by combining the working surface of the substrate with the inner lateral surface of the frame and then when exhibiting images on working surface obtained procurement optical parts use a mask made of a flexible polymer material, which you are bending shape of the workpiece, and blowout layer of photoresist carry out diafragmalna light flux from a shielded source of ultraviolet radiation cylindrical form, which have aligned with the working surface of the workpiece.
In special cases, the method:
- photomask is made from polyethylene terephthalate;
- stopped down luminous flux carried out at an angle of 120 degrees to the Central axis of the source of UV-radiation;
- drying and thermal treatment of blanks optical parts carried out in a thermostat at the temperature of 90 OC for 30 minutes;
- illumination of the working surface of the workpiece from a source of ultraviolet radiation hold for 30 minutes at power source 8 watts.
For realization of the method of application of precision photolithographic figure on the cylindrical surface of the optical parts used device for contact exposure of an image, including the means for combining and fixing photomask with the working surface of the workpiece optical details and source of UV radiation above the photomask to expose photoresistive layer of the workpiece.
According to the invention, the means for combining and fixing photomask with the working surface of the workpiece optical parts contains metal body, in the upper part of which is made lodgement for procurement optical parts fixed radius of curvature, combined and fixed together with the photomask of flexible polymeric material radial clip, which along its longitudinal axis is a window to expose the layer of photoresist, and at the bottom side of the radial clamp is equipped with both sides base with holes to secure it with the side walls of the hull, which in the upper part provided for fixing the workpiece optical parts two removable supports having screw fixing with the case, and the source of UV radiation has a cylindrical the form, equipped with a screen, which carried out its full length and aperture aperture 120 and is located coaxially with the lodgement of the building.
In some cases, of the execution devices:
- the source of UV radiation is mounted on a tripod mounted on the chassis;
- the source of UV radiation has a capacity of 8 W;
- radial clamp is made of Teflon.
The use of flexible photomask allows to combine it with the bending with the cylindrical surface of the substrate and secure the Assembly to the lodgement of the building. Placement of two substrates in the frame centrifuges by combining the working surface of the substrate with the inside of the rim centrifuges when rotating centrifuge and drip feed of photoresist provides reception uniform a layer of photoresist on the working surface of the workpiece optical parts. The combination and fixation of the working surface of the workpiece surface flexible photomask in lodgement of the case with the use of radial thrust and lugs ensures the possibility of contact exposure image with photomask on the working surface of the workpiece optical parts fixed radius of curvature. However, as the side surface of the photomask is based on the lateral surface of the lodgement is eliminated sinusoidal waveform distortion of the picture when the contact exhibiting with photomask on the working surface of the workpiece optical parts. The use of shielded diafragmennogo angle of 120 degrees, source of UV radiation cylindrical provides in the illumination of the layer of photoresist uniformity of light emission and eliminates lateral illumination layer of photoresist, leading to the parallax image.
The invention is illustrated by figures
Figure 1 shows a drawing scanner flexible photomask with transparent longitudinal slit, where a is the front view, 6 - top view.
Figure 2 presents the drawing glass master template with an opaque slot, intended for the manufacture of flexible photomask, where a - front view, b - view from the top.
Figure 3 shows a drawing of the substrate optical parts with the curvature radius R, where a - front view, b - view from the top.
Figure 4 shows a perspective view of a centrifuge for applying a layer of photoresist on the working surface of the workpiece with a specified radius of curvature R
Figure 5 shows Assembly drawing devices for display images with photomask on the photoresist layer procurement optical parts fixed radius of curvature R, front view.
Procurement for photomask (figure 1) contains the substrate 1, made of polymeric material, in particular polyethylene, on the surface which caused photoemulsion layer 2, which is made transparent figure 3.
Master template (figure 2) contains a glass plate 4, on the surface of which is coated with the layer opaque layer of chromium 5, which after etching chromium remains negative opaque figure 6.
Substrate 7 optical parts (Fig 3) made of optical glass brand COT 3-3677-8, working on the polished surface of which has an opaque layer of chromium 8 thickness of 1 m, applied by vacuum deposition.
From plate glass diamond ring drills for vertical drilling machine drill substrate specified radius R. At the round-grinding machine with diamond circles grind and Polish with a working surface of preparation of the substrate to the roughness Rz 0,05 from which to sawing machine diamond cutting circle cut out two pads optical parts and working on the polished surface of the substrate is applied by vacuum deposition opaque layer of chromium in the thickness 1 mm.
Centrifuge (figure 4) for the application of drip photoresist on the working surface of the substrate with a specified radius of curvature R is a frame, on the inner side surface 9 of which in horizontal symmetrical grooves 10, 10A placed two pads optical parts. The depth of grooves 10, 10A ensures alignment of the working surface of the substrate with the inner lateral surface structure 9. The centrifuge housing has clamping ring 11 for fixing substrates.
The device for contact display picture (figure 5) a tool for combining and fixing photomask with the working surface of the workpiece optical parts contains metal case 12, in the upper part of which is made lodgement 13 installed workpiece optical parts 7,8, combined with the photomask 2, made of a flexible polymer material using radial clamp 14, which along its longitudinal axis is a window 21 (6) to expose the layer of photoresist on the working surface of the workpiece optical parts. Radial pressing 14 is made of PTFE and is equipped with both sides in the Central part of the base with 15 holes 16 to secure it to the side wall of the housing 12, which in the upper part of lodgement 13 on the sides of the hull there are 12 removable stops 17,18, United with the body 12 fasteners (bolts) 19,20. Radial pressing 14 is made of Teflon.
The source of UV radiation 22 8 watts is mounted on a tripod on the housing 12 (not shown) coaxially with the lodgement 13, has a cylindrical shape and is equipped with the entire length of the screen, 23 which made along the longitudinal axis aperture 24 aperture 120 degrees.
The method of application of precision photolithographic figure on the cylindrical surface of the optical parts as follows.
4. On the surface layer of chromium 8 drip method in a centrifuge (figure 4) put in rotation on each of the two are placed in the slots 10, 10A on the side of the rim centrifuges substrates optical parts uniform layer of positive photoresist PF - 0,5, 1 micron thickness, which shall be checked visually on the uniformity of the interference of color in accordance with the industry standard (OST-253783. Details optical, coated two-layer and three-layer coatings from solutions. Technical requirements and methods of control) /7/.
5. Received blanks are subjected to drying and heat treatment in thermostat at the temperature of 90 OC for 30 minutes.
6. The blank optical details combine with flexible photomask 2 by bending, and put on lodgement 13 fixtures, and fix a clamp 14 (figure 5), securing it to the chassis 12 screws in the mounting holes 16 in bosses 15 to contact exposure image with photomask 2 through the window 15 radial pressing 14 (6). However, as the side surface of the photomask 2 is based on the lateral surface of the lodgement 13, eliminated sinusoidal waveform distortion of the picture when the contact exhibiting with photomask 2 on the working surface of the workpiece optical parts.
7. Blowout layer of photoresist on the working surface of the workpiece optical parts operate from a source of UV radiation 22 to ensure the same conditions of exposure directed normally uniform light output, passed through the diaphragm 24 aperture 120 degrees, made in the screen 23.
Next, perform a standard methods adopted in photolithography the following operations.
8. The manifestation of the picture.
9. Control the shown picture.
10. Retouching manifested picture, shelter breakdowns of photoresist.
11. Etching chrome layer 8 is carried out in accordance with the standard operations, avoiding Peretrutov on individual sections of the picture.
12. Quality control photolithographic figure performed under a microscope, and if necessary, retouch defects of the photoresist. Transverse pattern offset flexible photomask should not exceed 2-3 microns and lie in the plane formed by the border of the figure in space.
Accuracy photolithographic figure is provided by the accuracy of the original image taken from the master template (figure 2), the accuracy of locating photomask 2 in lodgement 13 and binding edge of the photomask 2 to the pattern on the mask.
The inventive method provides thickness of drawing on the working surface of the optical parts not more than 0,003 and deviation of the boundaries of the drawing slit from planes, in which they are located no more than 0,003 for each border. Prototypes optical-mechanical unit of a product, in which a scanning the encoder is made of cylindrical optical components with photolithographic pattern, obtained by the claimed method and device for its implementation.
Sources of information
RT 3-520-74. The scale and grid photographic. Technological process of manufacture with application of photoconductive to the basis of diazocompounds.
2. SU 834399, IPC 3 G01D 13/06, published 30.05.1981.
3. EN 2370799, IPC G02B 27/00 published: 20.10.2009.
4. OST-6209-86, "Scale and grid photographic. Typical technological processes with application of positive photoresists based diazo compounds".
5. EN 2430391, MPK 6 G02B 27/32, G03F 7/004 - prototype.
6. Photolithography in the production of circular optical scales on the Ural optical-mechanical factory, Yekaterinburg. Deukmejian, magazine "Practical production problems", submitted on 29.01.2007.
7. OST-253783. Details optical, coated two-layer and three-layer coatings from solutions. Technical requirements and methods of control.
1. The method of application of precision photolithographic figure on the cylindrical surface optical details, including the application of the chrome coating on the substrate of optical glass vacuum sputtering, application of drip way layer of positive photoresist on the working surface of the rotating substrate placed in a centrifuge, drying and heat treatment to the complete polymerization layer of photoresist and contact exposure image with photomask by combining and fixing it with the working surface obtained procurement and subsequent illumination layer of photoresist from the source of ultraviolet radiation to the complete polymerization layer of photoresist, wherein the substrate with a specified radius of curvature installed symmetrically in the frame centrifuges by combining the working surface of the substrate with the inner lateral surface of the frame and in the exposure of the image on the working surface obtained procurement optical parts use a mask made of a flexible polymer material, which you are bending shape of the workpiece, and blowout layer of photoresist carry out diafragmalna light flux from a shielded source of ultraviolet radiation cylindrical form, which have aligned with the labour the surface of the workpiece.
2. The method according to claim 1, characterized in that the photomask is made from polyethylene terephthalate.
3. The method according to claim 1, wherein is stopped down luminous flux carried out at an angle of 120 degrees to the Central axis of the source of UV radiation.
4. The method according to claim 1, wherein the drying and thermal treatment of blanks optical parts carried out in a thermostat at the temperature of 90 OC for 30 minutes
5. The method according to claim 1, characterized in that the illumination of the working surface of the workpiece from a source of ultraviolet radiation hold for 30 minutes at power source 8 watts.
6. Device for contact display picture for the implementation of the method according to claim 1, comprising means for combining and fixing photomask with the working surface of the workpiece optical details and source of UV radiation, located above the photomask to expose photoresistive layer procurement, wherein the means for combining and fixing photomask with the working surface of the workpiece optical parts contains metal body, in the upper part of which is made lodgement for procurement optical parts fixed radius of curvature, combined and fixed together with the photomask of flexible polymeric material radial clip, which along its longitudinal axis is a window to expose the layer of photoresist, and at the bottom side of the radial clamp is equipped with both sides base with holes to secure it with the side walls of the hull, which in the upper part provided for fixing the workpiece optical parts two removable supports having screw fixing with the case, and the source of UV radiation has a cylindrical shape, equipped with a screen, which carried out its full length and aperture aperture 120 and is located coaxially with the lodgement of the building.
7. The device according to claim 6, wherein the source of UV radiation is mounted on a tripod mounted on the chassis.
8. The device according to claim 6 or 7, wherein the source of UV radiation has a capacity of 8 watts.
9. The device according to claim 6, wherein the radial clamp is made of Teflon.