Optical element, display device, anti-reflective optical component and form wizard

FIELD: physics, optics.

SUBSTANCE: anti-reflective optical element has a base and a plurality of structures situated on the surface of the base and in form of cuts or protrusions with a conical shape. The structures are arranged with a spacing which is less than or equal to the wavelength of light of the wavelength range in the ambient environment using said element. Lower portions of structures lying next to each other are connected to each other. The effective refraction index in the direction of the depth of the structures gradually increases in the direction of the base and corresponds to an S-shaped curved line. The structures have a single step on the lateral surface of the structures.

EFFECT: improved anti-reflective characteristics.

19 cl, 60 dwg, 1 tbl

 

The technical field to which the invention relates.

The present invention relates to an optical element, display device, antireflective optical component and the master form. In particular, the present invention relates to an optical element in which the patterns are arranged with a pitch equal to or smaller than the wavelengths of light in the environment of use.

The level of technology

Usually in an optical element that uses a light transmissive substrate consisting of glass, plastic, etc. that perform surface treatment to suppress the light reflection surface. The way in which small and dense inhomogeneous structure (structure type "eye of the moth") is formed on the surface of the optical element, illustrated as a surface treatment (see, for example, "Optical and Electro-Optical Engineering Contact" Vol.43, No. 11 (2005), 630-637).

Usually when periodic nonuniform shape is formed on the surface of the optical element, diffraction occurs when light passes through a periodic inhomogeneous form, which significantly reduces the amount of transmitted directly light component. However, when the step of nonuniform shape smaller than the wavelength of the transmitted light, diffraction does not occur. For example, if a nonuniform shape is rectangular, can be achieved antireflective EF is known, which is effective for light having a single wavelength, the corresponding step, the depth or the like

As described above, the optical element has a good antireflective characteristics, it is assumed the application of this optical element on solar cells and display devices. As a heterogeneous structure, which integrates the antireflective characteristics, proposed the following :

Small in the form of a tent heterogeneous structure (step: approximately 300 nm, depth: approximately 400 nm) have been proposed as a structure manufactured by using the electron beam exposure (for example, see NTT Advanced Technology Corporation, "Master Mold for Forming Anti-reflection (Moth-eye Structures having no wavelength dependence", [online], [accessed Sep 1, 2008], Internet<http://keytech.ntt-at.co.jp/nano/prd_0%20033%20.html_l>).

In addition, the Super-RENS Technology Team, the Center for Applied Near-Field Optics Research of the Advanced Industrial Science and Technology proposed structure with nano-holes with a diameter of 100 nm and a depth of 500 nm or more (for example, see the National Institute of Advanced Industrial Science and Technology, "Development of Desktop Device Enabling Nanometer-scale Microfabrication", [online], [access Sep 1, 2008], Internet<http://aist.go.jp/aist_i/press_release/pr2%200%2006/pr2%200%2006%2003%2006/pr%202%200%2006%2003%2006.html__>). Such structures can be formed using a method of forming microstructures, which uses a burner optical drive. In particular, such structures shall be formed with the device nanomechanical processing, based on the technology of theplanetary in which way lithography laser visible light using a semiconductor laser (wavelength of 406 nm), combined with a thermally non-linear material (see, for example, to the National Institute of Advanced Industrial Science and Technology, "Development of Desktop Device Enabling Nanometer-scale Microfabrication", [online], [access Sep 1, 2008], Internet<__>).

In addition, the authors of the present invention proposed a structure having the form of a hanging bell or a shape similar to an elliptical cone (for example, see International publication No. 08/023816, brochure). The structures are achieved antireflective characteristics close to the characteristics of the structures obtained by electron beam exposure. In addition, these structures can be manufactured using a method in which a process for manufacturing a master-form optical disks combined with the etching process.

Disclosure of inventions

Technical task

In recent years there has been a need for more visibility of various display devices such as liquid crystal display device. To meet such requirements, it is important to further improve the above antireflective characteristics of the optical elements.

In line with this objective of the present invention is to predstavi the ü optical elements, having a good antireflective characteristics, a display device, antireflective optical component and master the form.

Technical solution

To solve the problems described above, the first invention provides an antireflective optical element, including:

basis; and

many of the structures located on the surface of the base,

patterns are recesses or protrusions conical shape,

patterns are arranged with a pitch less than or equal to the wavelength of light used in the environment, and the lower portions of structures that are located next to each other, are connected to each other, and

the effective refractive index in the direction of the depth of the structures gradually increases towards the base and corresponds to the S-shaped curved line.

The second invention provides an optical element, which includes:

basis; and

many of the structures located on the surface of the base,

patterns are recesses or protrusions in the form of bars which pass in one direction on the surface of the base,

patterns are arranged with a pitch less than or equal to the wavelength of light used in the environment, and the lower portions of structures that are located next to each other, are connected to each other, and

EF is an objective index of refraction in the direction of the depth of the structures gradually increases towards the base and corresponds to the S-shaped curved line.

The third invention provides antireflective optical component, including:

the optical component; and

many of the structures located on the surface of the optical component, are recesses or protrusions conical shape, structure arranged with a pitch less than or equal to the wavelength of light used in the environment, and the lower portions of structures that are located next to each other, are connected to each other, and

the effective refractive index in the direction of the depth of the structures gradually increases towards the base and corresponds to the S-shaped curved line.

The fourth invention offers a master of the form, including:

many of the structures located on the surface of the base,

patterns are recesses or protrusions conical shape,

patterns are arranged with a pitch less than or equal to the wavelength of light used in the environment, and the lower portions of structures that are located next to each other, are connected to each other, and

the change of the effective refractive index in the direction of depth of the optical element formed using structures gradually increases towards the base of the optical element and corresponds to the S-shaped curved line.

In this image the shadow of the S-shaped channel includes a reverse S-shaped, that is Z-shaped. In addition, in the case where structures are protrusions that protrude from the surface of the base, the lower part of the structures is called the land side of the base structures. When structures are grooves that are deep from the surface of the base, the lower part of the structures is called the land-side of the hole structures.

In the first, third and fourth variants of the invention, the primary structure is preferably arranged periodically in the form of a structure of a square lattice or structure quasicontinuously lattice. Here, the rectangular lattice means a regular rectangular lattice. Quasicontinuously grating means, unlike a regular rectangular lattice, distorted regular rectangular lattice. In particular, when the patterns are linearly quasicontinuously lattice is a square lattice obtained by stretching and distortion of the regular rectangular lattice in the direction of the linear placement. When structures are in the form of an arc, quasicontinuously lattice is a square lattice obtained by distorting a regular rectangular lattice in the shape of an arc or a tetragonal lattice obtained is left by the distortion of a regular rectangular lattice in the shape of an arc and pulling and distortion in the direction of its placement in the shape of an arc.

In the first, third and fourth variants of the invention, the structure preferably periodically arranged in the form of a structure of a hexagonal lattice or structure quasistatically lattice. Here hexagonal lattice means a regular hexagonal lattice. Quasistatically grating means, unlike a regular hexagonal lattice, distorted regular hexagonal lattice. In particular, when the patterns are linearly quasistatically lattice is a hexagonal lattice obtained by stretching and distortion of the regular hexagonal lattice in the direction of the linear placement. When structures are in the form of an arc, quasistatically lattice is a hexagonal lattice obtained by distorting a regular hexagonal lattice in the shape of an arc or a hexagonal lattice obtained by distorting a regular hexagonal lattice in the shape of an arc, and stretching and distortion in the direction of its placement in the shape of an arc.

In the first to fourth embodiments of the invention structure with a conical shape or structure with the form of bars arranged with a pitch less than or equal to the wavelength of light used in the environment, and the lower portions of structures that are located next to each other, connect the us with each other. This allows smooth changes of the effective refractive index in the direction of the depth of the structures. Thus, the effective refractive index in the direction of the depth of the structures can be changed so that it gradually increases towards the base and may be represented by an S-shaped curved line.

In addition, the change of effective refractive index in the direction of the depth of the structures in such a way that the effective refractive index gradually increases towards the base and may be represented by an S-shaped curved line, the edge of the light becomes fuzzy, which can reduce the reflected light on the surface of the base.

Advantages of the invention

As described above, in accordance with the present invention can be provided an optical element having good antireflective characteristics. In particular, when the structure is made high, can be achieved with good antireflective characteristics.

Brief description of drawings

On figa schematically shows in plan representing an example configuration of the optical element in accordance with the first embodiment of the present invention. On FIGU shows in plan with a partial increase of the optical element provided on figa. The piano is GS shows a view in cross section along the tracks T1, T3, figv. On fig.1D shows a view in cross section along the tracks T2, T4, figv.

Figure 2 shows a graph representing an example of the profile of the refractive index of the optical element in accordance with the first embodiment of the present invention.

Figure 3 shows a perspective view with a partial increase of the optical element, is presented in figure 1.

On figa shows a schematic view representing an exemplary layout of the structures 3 having the shape of a cone or in the shape of a truncated cone. On FIGU schematically shows a view representing an exemplary layout of the structures 3 having the shape of an elliptical cone or the shape of a truncated elliptical cone.

Figure 5 shows in sectional view representing an example of a form structure.

On figa-6C shows diagrams for describing the determination of the transition point.

On figa shows a perspective view representing an example configuration of the roller master molds for the manufacture of the optical element in accordance with the first embodiment of the present invention.

On FIGU shows in plan with an increase in the roller surface of the master form on figa.

On Fig schematically shows a view representing an example of a device configuration of the scanner used during the exposure patterns of the type "the eyes of the moth".

Naviga-9C shows a processing circuit for describing the example of the method of manufacturing the optical element in accordance with the first embodiment of the present invention.

On figa-10C shows a processing circuit for describing the example of the method of manufacturing the optical element in accordance with the first embodiment of the present invention.

On figa schematically shows in plan representing an example configuration of the optical element in accordance with the second embodiment of the present invention. On FIGU shows in plan with a partial increase of the optical element provided on figa. On figs shows a view in section along the tracks T1, T3, ... figv. On fig.11D shows a view in section along the tracks T2, T4, - on 11 Century

On figa shows in plan representing an example configuration of the master disk for manufacturing the optical element in accordance with the second embodiment of the present invention. On FIGU shows in plan with an increase of the surface of the master disk on figa.

On Fig shows a schematic view representing an example of a device configuration of the scanner used during the exposure of the structure type, the eyes of the moth.

On figa schematically shows in plan representing an example configuration of the optical element in accordance with a third embodiment of the present invention. On FIGU shows in plan with a partial increase of the optical element provided on figa. On IGS shows a view in section along the tracks T1, T3 - figv. On fig.14D shows a view in section along the tracks T2, T4, - figv.

On figa schematically shows in plan representing an example configuration of the optical element in accordance with the fourth embodiment of the present invention. On FIGU shows in plan with a partial increase of the optical element provided on figa. On figs shows a view in section along the tracks T1, T3, ... figv. On fig.15D shows a view in section along the tracks T2, T4, figv.

On Fig shows a perspective view with a partial increase of the optical element provided on Fig.

On figa view schematically represented in terms of representing an example configuration of the optical element in accordance with the fifth embodiment of the present invention. On FIGU shows in plan with a partial increase of the optical element provided on figa. On figs shows a view in section along the tracks T1, T3, figv. On fig.17D shows a view in section along the tracks T2, T4, figv.

On Fig shows a perspective view with a partial increase of the optical element provided on Fig.

On Fig shows in sectional view representing an example of a form structures of the optical element in accordance with the sixth embodiment of the present invention.

On Fig shows a view in section, before the bringing of the configuration example of the optical element in accordance with the seventh embodiment of the present invention.

On Fig schematically shows a view representing an example configuration of a liquid crystal display device in accordance with the eighth embodiment of the present invention.

On Fig schematically shows a view representing an example configuration of a liquid crystal display device in accordance with the ninth embodiment of the present invention.

On Fig shows a graph representing the profiles of the refractive index in Examples 1-3 and Comparative example 1.

On figa-24C shows a diagram representing the shape of the structures in Examples 1-3.

On Fig shows a graph representing the reflective properties of Examples 1-3 and Comparative example 1.

On Fig shows a graph representing the reflective characteristics of Example 3 and Comparative example 1 when the height of the structures varies from 200 nm to 500 nm.

On figa-27C shows a diagram representing the shape of the structures in Examples 4-6.

On Fig shows a graph representing the profiles of the refractive index in Comparative examples 2-4.

On Fig shows a graph representing the reflective characteristics in Example 7 and Comparative examples 2 and 3.

On figa shows the AFM image formed surface of the master form in Example 8. On FIGU shows the profile in the cross-section of the AFM image shown in figa

On Fig shows a graph representing the antireflective characteristics of Example 8 and Comparative examples 5 and 6.

Detailed description of the invention

Embodiments of the present invention will be described with reference to the attached drawings in the following order.

1. The first version of the implementation (an example in which patterns are arranged linearly in two-dimensional hexagonal lattice structure).

2. The second variant of implementation (an example in which patterns are two-dimensional in the form of an arc in a hexagonal lattice structure).

3. A third option implementation (an example in which patterns are linear in the two-dimensional structure of the tetragonal lattice).

4. The fourth option implementation (an example in which secondary structures are in addition to the primary structures).

5. The fifth option implementation (an example in which in-depth patterns formed on the surface of the base).

6. The sixth version of the implementation (an example in which patterns in the form of bars are one-dimensional).

7. The seventh version of the implementation (an example in which instead of the structures formed thin film).

8. The eighth version of the implementation (first use in display devices).

9. The ninth version of the implementation (the second example of application in display devices).

On figa schematically shows in plan representing an example configuration of the optical element in accordance with the first embodiment of the present invention. On FIGU shown partially with increasing view in plan of the optical element provided on figa. On figs shows a view in section along the tracks T1, T3, figv. On fig.1D - shows a view in section along the tracks T2, T4, ... figv.

The optical element 1 is suitably used in various optical components used for displays, optoelectronic equipment, optical data transmission (fiber optic means), solar cells, lights, etc. In particular, one of the polarizing elements, a lens, an optical waveguide material of the window and the display element can be, for example, presents, as an optical component. Examples of the polarizing element includes a polarizer and a reflective polarizer.

The optical element 1 includes a base 2 and structure 3 formed on the surface of the base 2. Patterns are conical protrusions. The lower portions of the structures 3, which are located next to each other, are connected to each other so that they are superimposed on each other. Among neighboring structures 3 near the structure 3 is predpochtitelno located in the direction of the track. This is due to the fact that the structures 3 are arranged so that they are as close as possible to each other in such a position where they can be easily manufactured using the method described below. The optical element 1 has an antireflective function for the light that falls on the surface of the substrate on which the formed structure 3. Below, as shown in figure 1, two axes orthogonal to each other on one main surface of the base 2, are called the X-axis and Y-axis, and the axis perpendicular to the main surface of the base 2, is called the axis Z. in Addition, when the gaps 2A are present between the structures 3, slight uneven shape is preferably provided in the gaps 2A. By providing such a slight uneven shape can be further reduced reflectivity of the optical element 1.

Figure 2 shows an example of the profile of the refractive index of the optical element in accordance with the first embodiment of the present invention. As shown in figure 2, the effective refractive index in the depth direction (direction along the Z-axis in figure 1) of the structures 3 is gradually increased towards the base 2 and is modified so that it corresponds to the plotted S-shaped curved line. Thus, the profile of the refractive index has a single inflection point N. Place the bend conforms to the shape of the side structures 3. Due to the change of the effective refractive index thus limit for light becomes fuzzy. This reduces the reflected light, which allows to improve the antireflective characteristics of the optical element 1. The change of the effective refractive index in the direction of depth preferably is a monotone increasing. Here the S-shaped channel includes a reverse S-shaped, that is Z-shaped.

In addition, the change of the effective refractive index in the direction of depth is more preferably on the upper side and/or side of the base structures 3 than the average value of the "tilt" of the effective refractive index, and more preferably greater on the upper side and on the side of the base of the structures 3, than this average value. This helps to ensure a good antireflective characteristics.

Lower the base 2 and the structure 3, the components of the optical element 1 described in order.

Base

The base 2 is a transparent base having transparency. The base 2 consists mainly of, for example, of transparent synthetic polymer resin, such as polycarbonate (PC) or polyethylene terephthalate (PET)or glass, but the base material 2 is not limited specifically to these materials.

The base 2, for example, has the form of a film, sheet, plate or block, but the shape of the base 2 is not limited specifically these forms. The shape of the base 2 is preferably selected and determined in accordance with the shape of the main body of various optical devices for which you want to provide the desired antireflective function, such as displays, optoelectronic devices, optical data transmission, solar cells and lighting devices, or in accordance with the form of sheet or film antireflective component mounted on these optical devices.

Structure

Figure 3 shows a perspective view with a partial increase of the optical element, is presented in figure 1. Many of the structures 3, which are the projections are located on the surface of the base 2. Structure 3 periodically and two-dimensional placed with a small step, which is less than or equal to the wavelength of light used in the environment, for example, with a step, essentially equal to the wavelength of visible light. The wavelength range of light used in the environment represents, for example, the wavelength range of ultraviolet light, the wavelength range of visible light or range of wavelengths of infrared light. Here, the wavelength range of ultraviolet light is a wavelength range of from 10 nm to 360 nm. The range is Lin wavelength of visible light is a wavelength range from 360 nm to 830 nm. The wavelength range of infrared light is a wavelength range of 830 nm to 1 mm

Structure 3 of the optical element 1 have a configuration that includes multiple rows of tracks Tl, T2, T3 (below collectively referred to as "track T"), which are provided on the surface of the base 2. Here the track is an area where the structures 3 are arranged linearly in rows.

In relation to two adjacent tracks T structure 3 located on one track, shifted by a half pitch relative to the structures 3 arranged on another track. In particular, in two adjacent tracks T, in intermediate positions (positions shifted by half step) between the structures 3 arranged on one track (for example, T1), placed structure 3 located on the other track (e.g., T2). As a result, as shown in figv, in three adjacent rows of tracks (T1 to T3) of the structures 3 are arranged so that they form a structure of a hexagonal lattice or structure quasistatically lattice with the centers of the structures 3 arranged at the points a1 to A7. In the first embodiment, the structure of a hexagonal lattice means a regular structure of a hexagonal lattice. In addition, patterns quasistatically grating means, in contrast to the regular structure of a hexagonal lattice, the structure of the hexagonal lattice and, which is stretched and distorted in the direction of the continuation of the track in the direction of the axis X).

When the structures 3 are arranged so that they form a structure quasistatically lattice, as shown in figv, step P1 placement (the distance between a1 and A2) of the structures 3 in the same track (for example, T1), preferably, longer than the step placement of the structures 3 between two adjacent tracks (for example, T1 and T2), that is, the step P2 (for example, the distance between al and A7 or A2 and A7) of the structures 3 in the directions of ±θ relative to the direction of the continuation of the track. By placing structures 3 thus the packing density of the structures 3 can be further improved.

The lower portions of the structures 3 is connected, for example, some or all of the lower parts of the adjacent structures 3. By connecting the lower parts of the structures to each other so that the effective refractive index in the direction of the depth of the structures 3 can be smoothly changed. As a result, may be provided with S-shaped profile of the refractive index. In addition, due to the connection of the lower parts of the structures to each other can be increased packing factor structures. Here at figv, United part formed in the case when all of the adjacent structures 3 are connected to each other, which are indicated as solid black circles. In particular, the connection with formirovanii between all adjacent structures 3, between adjacent structures 3 in the same track (for example, between a1 and A2 or between the structures 3 on adjacent tracks (for example, between a1 and A7 and between A2 and A7). To achieve a smooth profile of the refractive index and good antireflective characteristics of the compounds preferably are formed between all adjacent structures 3. In order to easily form a connection by using the manufacturing method described below, the connection is preferably formed between the adjacent structures 3 in the same track. In the case where the structures 3 are periodically arranged in the form of a structure of a hexagonal lattice or structure quasistatically lattice, for example, patterns 3 are connected to each other in the direction of the symmetry of the 6-th order.

On figa shows the approximate placement of the structures 3 having the shape of a cone or in the shape of a truncated cone. On FIGU shows the approximate placement of the structures 3 having the shape of an elliptical cone or the shape of a truncated elliptical cone. As shown in figa and 4B, the structure 3 preferably are connected to each other so that their lower parts are superimposed on each other. By connecting structures 3 with each other can thus be obtained S-shaped profile of the refractive index, and the packing factor of the structures 3 can be increased. Patterns of predpochtitel is but connected to each other in areas smaller than or equal to 1/4 of the maximum values of the range of wavelengths of light used in the environment based on the length of the optical path taken with consideration of the refractive index. Thus, it can be achieved with good antireflective characteristics.

Preferably the height of the structures 3, respectively, installed in accordance with the wavelength of light intended for transfer. In particular, the height of the structures 3 preferably is 5/14 or more and 10/7 or less than the maximum values of the range of wavelengths of light used in the environment, more preferably 2/5 or more and 10/7 or less than the maximum value and, in addition, preferably 3/7 or more and 10/7 or less than the maximum value. When the height is 5/14 or greater than the maximum value, the reflectivity can be suppressed to 0.3% or less, essentially over the entire visible range from 400 nm to 700 nm. When the height is 2/5 or greater than the maximum value, the reflectivity can be suppressed to 0.1% or less in the visible range from 400 nm to 700 nm. When the height is 10/7 or less than the maximum values, the structures 3 are easily formed by using the production method described below. When transmit visible light, the height of the structures 3 preferably ranges from 150 nm to 500 NMTOKEN dimensions (height H/step R occupancy) of the structures 3 preferably set in the range from 0.81 to 1.46. If the ratio is less than 0,81 reflecting characteristics and the transmission characteristics of tend deterioration. If the ratio is greater than 1,46, deteriorating property release during production of the optical element 1 and a tendency to complication correct reading of the received duplicate.

It should be noted that, in the present invention the ratio defined by the formula (1)below:

where H represents the height of the structures 3, and P represents the average step placement (average period).

Here, the average step R occupancy is defined by the formula (2)below:

where P1 represents the step of placing in the direction of the continuation of the track (the period in the direction of the continuation of the track) and P2 represents the step of placing in the directions of ±θ relative to the direction of the continuation of the track (where θ=60°-δ, δ preferably 0°<δ≤11° and more preferably 3°<δ≤6°) (the period in the direction of θ).

In addition, the height H of the structures 3 is a height H2 in the direction of column structures 3 (see figure 3). Here the direction of the column direction (Y axis direction)orthogonal to the direction of the continuation of the track (X axis direction) on the surface of the base. H is the H1 in the direction of the continuation of the track structures 3 preferably less than the height H2 in the direction of column. This is because when the optical element 1 is manufactured by the method described below, the height HI in the direction of the continuation of the track structures 3 can be easily reduced compared to the height H2 in the direction of the column.

In figure 3, each of the structures 3 have the same form.

However, the shape of the structures 3 is not limited to this. Structures 3 having two or more different shapes may be formed on the surface of the base. In addition, the structure 3 may be formed integrally with the base 2.

In addition, the structures 3 are not required to have the same size ratio. Structure 3 can be made so that they will have a certain distribution in height (e.g., in the range from about 0,81 up to 1.46 aspect ratios). By placing the structures 3 having the distribution of the height dependence of the reflectivity on wavelength can be reduced. Therefore, can be implemented in the optical element 1, having a good antireflective characteristics.

Here the distribution of height means that the surface of the base 2 are structures 3 having two or more values of the height (depth). Thus, this means that the structures 3 having a reference height, and the structures 3 having a height that is different from the reference you what the notes, located on the surface of the base 2. Structures 3 having a height that is different from the reference height, are, for example, on the surface of the base 2 periodically or aperiodic (accidentally). For example, the direction of the continuation of the track, the direction of the column or the like can be presented as an example of frequency.

Preferably the structure 3 comprise, for example, polymeric resins, curable under the influence of ionizing radiation, which utverjdayut ultraviolet radiation or electron beams, or of thermosetting polymer resin, which utverjdayut under the influence of heat. It is most preferable structure 3 mainly composed of a polymer resin, curable under the action of ultraviolet light, which utverjdayut when exposed to ultraviolet rays.

Figure 5 shows a view in section, with the increase representing an example of a form structures. Preferably the side structures 3 gradually widens towards the base 2 and will change so that the plotted shape corresponding to the square root of the S-shaped curved line represented in figure 2. This form side can provide a good antireflective characteristics and to improve the ease of transmission structures 3.

Top 3t structures 3 has, for example, flat fo the mu or narrowed part of the protruding shape. When top 3t structures 3 has a flat shape, the ratio of the areas (St/S) square St flat surface on top of the structures to the area's isolated grid preferably decreases with increasing height of the structures 3. This allows us to improve the antireflective characteristics of the optical element 1. Here the unit lattice is a hexagonal lattice or quasireligious lattice. The ratio of the areas of the lower part of the structures (the ratio of the areas (Sb/S) square Sb lower part of the structures to the area's isolated grid preferably close to the ratio of the areas of peaks 3t. In addition, a layer with a low refractive index having a lower refractive index than that of the structures 3 may be formed on top 3t structures 3. By forming such a layer with a low refractive index can be reduced reflection.

The side structures 3, except for the upper part of the 3t and the bottom portion 3b, preferably has a pair of first point of change and the second point Pb of the changes that are formed in this order in the direction from the top of 3t to the lower section 3b. As a result, the effective refractive index in the depth direction (in the direction of the Z axis in figure 1) of the structures 3 can have one point of inflection.

Here the first change point and the second point of change is defined in the following way.

As shown in figa and 6B, when the lateral side from the top of 3t to the bottom portion 3b of the structures 3 is formed by connecting a number of smooth curved surfaces in the direction from the top of 3t to the lower section 3b of the structures 3 violation of smoothness in the connection points, connection points are the points of transition. Transition point coincide with the points of inflection. Although the points of connection between the differentiation cannot be made exactly this point of inflection, adopted as a limit, also called here the inflection point. When the structures 3 have the above-described curved surface, the inclination in the direction from the top of 3t to the lower section 3b of the structures 3 preferably becomes smoother at the first point of the transition and then becomes steeper in the second point Pb transition.

As shown in figs, in the case where the side surface from the top of 3t to the bottom portion 3b of the structures 3 is formed by connecting a variety of smooth curved surfaces continuously in the direction from the top of 3t to the lower section 3b of the structures 3, the transition point is determined as follows. As shown in figs, the point on the curved line, which is closest to the point of intersection of the two tangents at two points of inflection that are on the side of the structures, is called the transition point.

Structure 3 preferably have one step St on the side between the top 3t and the lower section 3b. When the structures 3 are one step St can be obtained above the profile of the refractive index. In other words, the effective refractive index in the direction of the depth of the structures 3 may gradually increase towards the base 2 and at the same time may change so as to draw an S-shaped curved line. Examples of steps include the step with the slope and parallel to the step, and the step slope is preferred. This is because, when the step St is a step with the slope, it becomes easier to migrate compared with the case where the step St is a parallel step.

Step tilt is a step that is not parallel to the surface of the base, and inclined so that the side wall extends in a direction from the upper part to the lower section of the structures 3. A parallel step is a step that is parallel to the surface of the base. Here is a step St represents the area defined above the first point of the transition and the second point Pb transition. It should be noted that the step St does not include a flat surface on the tops of the 3t or curved surface, or flat surface between the structures.

Given the ease of formation of the structure 3 preferably have a conical shape, which is axisymmetric, with the exception of the bottom portion is connected to the adjacent structures 3, or conical shape, obtained by extrusion or by compressing the conical shape in the direction of the track. Examples of conical shape include a shape in the form of a cone, in the shape of a truncated cone, a shape of an elliptical cone shape in the form of a truncated elliptical cone. Here, as described above, the conical shape corresponds to the concept, which includes the form of an elliptical cone and a truncated form of the elliptic cone in addition to form in the shape of a cone in the form of a truncated cone. In addition, the shape of a truncated cone is a shape obtained by removing the upper part of the form in the form of a cone from the mold in the form of a cone. The form of a truncated cone is a shape obtained by removing the upper part of the form in the form of an elliptical cone. In addition, the shape of the structures 3 is not limited to these forms, and you only need to have a form in which the effective refractive index in the direction of the depth of the structures 3 is gradually increased towards the base 2 and changed to what was circinalis S-shaped. In addition, as described above, the conical shape includes not only a full conical shape, but also a conical shape having a step St on the side.

Structure 3 having the shape of an elliptic cone, constitute a structure having a conical shape in which the bottom part is made in the form of an ellipse, in the form of elongated or oval with a major axis and a minor axis, and with the top having a tapered protruding shape. Structure 3 having a tapering shape in the form of an elliptical cone, constitute a structure having a conical shape in which the lower part has the shape of an ellipse elongated element or oval with a major axis and a minor axis, and the top has a flat surface. When the structures 3 have the shape of an elliptical cone or in the shape of a truncated elliptical cone structure 3 preferably located on the surface of the base so that the main axis of the lower part of the structures 3 is directed towards the continuation of the track in the direction of the axis X).

The cross-section of the structures 3 is changed in the direction of the depth of the structures 3 so that it fit the above profile of the refractive index. Preferably the cross-section of the structures 3 monotonically increases with increasing depth of the structures 3. Here the cross-section of the structures 3 on the mean cross-section, which is parallel to the surface of the base hosting structure 3. The cross-section structures preferably varies in the depth direction so that the ratio of cross-sectional patterns 3 different depths corresponds to the profile of the effective refractive index at these depths.

The roller configuration wizard-form

7 shows an example configuration of the roller master molds for manufacturing the optical element having the above described configuration. As shown in Fig.7, roller master form 11 includes many structures 13 in the form of grooves, located on the surface of the master form 12 in the form of a cylinder or columns. Structure 13 posted by periodically and two-dimensional increments of less than or equal to the wavelength of light in the environment where used the optical element 1, for example with a step, essentially equal to the wavelength of visible light. Patterns 13 are located on the surface of a cylindrical or in the form of columns wizard-form 12, for example, concentric or spiral. For example, patterns 13 are connected with the lower parts of some or all of the adjacent structures 3. Here at figv, the provisions of sections compounds formed when all of the adjacent structures 3 are connected to each other, indicated by solid black circles. Patterns 13 are used DL the formation of the protruding structures 3 on the surface above the base 2. Master form 12 may consist of, for example, of glass, but the material is not specifically limited to this.

A method of manufacturing optical element

Next, with reference to Fig-10 describes an example of a method of manufacturing the optical element having the above described configuration.

A method of manufacturing an optical element according to the first embodiment is a method in which the process of manufacturing a master-form optical disks combined with the etching process. The manufacturing method includes a step of forming a layer of resist, which consists in forming a layer of resist on the master form, the step of exposure, consisting in forming latent image patterns such as "eye of the moth" on the layer of resist, the stage of manifestation, which consists of the manifestation of the layer of resist, which was formed latent image, the step of etching, consisting in the manufacture of roller master form, and the stage of replication, which consists in the manufacture of the substrate of the duplicate.

Device configuration display

First, with reference to Fig described device configuration document used during the exposure patterns of the type "the eyes of the moth". The device display is made on the basis of a recording device of an optical disk.

The source of the laser light 21 is own the th light source for exposure of the resist, formed on the surface of the master form 12 that is used as a recording medium, and generates an oscillating, for example, the laser beam 15 for recording with a wavelength of λ = 266 nm. The laser beam 15 emitted from a source 21 of the light - laser falls in a straight line, as a collimated beam, and enters the electro-optic modulator (AMR) 22. The laser beam 15 transmitted through the electro-optic modulator 22 is reflected by the mirror 23 and is directed to the system 25 of the optical modulation.

The mirror 23 includes a polarizing beam splitter and has a function that reflects one polarized component and transmits the other polarized component. Polarized component passed through the mirror 23, take on the photodiode 24, and the electro-optic modulator 22 is controlled in accordance with the signal received polarized component to perform phase modulation of the laser beam 15.

In the system 25 of the optical modulation of the laser beam 15 is focused by a collecting lens 26 on the acousto-optic modulator (AOM) 27, which consists of a glass (SiO2), etc. After the laser beam 15 is modulated in intensity by using acousto-optic modulator 27 and the expanded laser beam 15 collyriums using a collimating lens 28. The laser beam 15 emitted from the system 25 of the optical modulation is recognized using the arkala 31 and is directed to the movable optical table 32 horizontally and in parallel.

The movable optical table 32 includes a beam expander 33, and the lens 34 of the lens. The laser beam 15 is directed to the movable table 32 using the extender beam 33 receives the desired shape, and then it is sent on the layer of resist master form 12 through the lens 34 of the lens. Master form 12 is placed on the turntable 36, which is connected to the motor 35 of the spindle. Then perform the step of exposing the layer of resist by alternately irradiating the layer of resist laser beam 15 during rotation of the master form 12 and moving the laser beam 15 to the height of the master form 12. The resulting image is, for example, essentially elliptical shape with a major axis along the circumference. The laser beam 15 is moved with the aid of the moveable optical table 32 in the direction indicated by the arrow R.

The device display includes a mechanism 37 management for forming the layer of resist latent image corresponding to a two-dimensional structure of a hexagonal lattice or quasistatically lattice, shown in figv. The mechanism 37 includes a block 29 format specifies the module 30. Block 29 format includes a module polarity inversion, and the inversion module polarity controls the timing when the resist layer is irradiated with a laser beam 15.

The setting module is 30 controls the acousto-optic modulator 27 in accordance with the output signal from the module to the inversion of polarity.

In the device display signal with inversion of the polarity of the format block is synchronized with the rotation controller of a recording device for generating a signal for each track so that two-dimensional patterns are spatially connected to each other, and intensity modulation is performed by using acousto-optic modulator 27. Due to the formation of patterns with a constant angular velocity (CAV) and the corresponding number of turns, with appropriate modulation frequency and the corresponding step of filing a hexagonal or quasistatically structure of the grating can be recorded on the layer of resist.

Following the individual steps of the method of manufacturing the optical element in accordance with the first embodiment of the present invention are described one after the other.

The step of forming a layer of resist

First, as shown in figa, prepare master form 12 in the form of a cylinder or column. Master form 12 is, for example, a glass master form. Next, as shown figv, the layer 14 of the resist formed on the surface of the master form 12. The layer 14 of the resist may consist of, for example, from organic or inorganic resist of the resist. Examples of the organic resist include resists type novolak and resists to chemical strengthening. In addition, examples of reorganizes the second resist include oxides of metals, containing one or more transition metals, such as tungsten and molybdenum.

Phase display

Next, as shown figs using the device scanner described above, the layer 14 of the resist is irradiated with a laser beam (beam exposure) 15 during rotation of the master form 12. At this stage, the entire surface of the layer 14 of the resist exhibit by alternately irradiating the layer 14 of the resist with a laser beam 15, while the laser beam 15 is moved in the direction of the height of the master form 12. In the latent image 16, which tracks the trajectory of the laser beam 15, is formed on the entire surface of the layer 14 of the resist, for example, with a step, essentially equal to the wavelength of visible light.

Stage manifestations

Further, the developer drops applied to the layer 14 of the resist during rotation of the master form 12, the layer 14 of the resist is subjected to manifestation, as shown in figa. When the layer 14 of resist is formed using a positive resist, the exposed area, outdoor laser beam 15 has a high dissolution rate in the developer compared to the unexposed area. As a result, as shown in figa, the structure corresponding to the latent image (exposed section) 16, is formed on the layer 14 of the resist.

Phase etching

Further, for example, the surface mA is Ter-form 12 is etched using as a mask the structure (the structure of the resist layer 14 of the resist formed on the master mold 12. In particular, alternately perform etching and ashing. Thus, as shown in figv can be obtained recesses shaped in the form of an elliptical cone or the shape of a truncated elliptical cone with a main axis directed towards the continuation of the track, i.e. patterns 13. In addition, the glass master form having a depth, comprising three or more values of the thickness of the layer 14 of the resist (selectivity: 3 or more)can be manufactured to produce high aspect ratio structures 3. In addition, by appropriate control of processing time, consisting of travelmania and ashing, may be formed with a step on the side of the structures 13. The etching is preferably performed in a dry etching. Examples of dry etching, which can be used include plasma etching and the etching reactive ion (RIE). In addition, as the etching method, for example, you can use an isotropic or anisotropic etching.

Thus, it can be obtained roller master 11 having a structure in the form of a hexagonal lattice or structure in the form of quasistatically grid.

The stage of obtaining replica

Then the roller m is erased form 11 and the base 2, such as acrylic sheet, which is caused curable by ultraviolet polymer resin is injected into tight contact with each other. After curing by ultraviolet polymer resin is overiden under ultraviolet irradiation, the base 2 is cut off from the roller master form 11. As a result, as shown in figs receive a corresponding optical element 1.

In accordance with the first embodiment of the structure 3 are of conical shape and the effective refractive index in the direction of the depth of the structures 3, gradually increasing towards the base 2 and changing so that the plotted S-shaped curved line. As a consequence, the boundary for the light becomes fuzzy because of the effect of the form of the structures 3, which reduces the reflected light. Thus, it can be achieved with good antireflective characteristics. In particular, when the structure 3 is made high, can be achieved with good antireflective characteristics. In particular, when the height of the structures 3 preferably is not less than 5/14 and not more 10/7, more preferably from 2/5 to 10/7 and, in addition, preferably from 3/7 to 10/7 maximum value of the wavelength of light used in the environment, can be achieved particularly good antireflective characteristic is cteristic. In addition, because the lower parts of the adjacent structures 3 are connected to each other so that they are superimposed on each other, the packing factor of the structures 3 can be increased, and the structure 3 can be easily formed.

Preferably, the effective profile of the refractive index in the direction of the depth of the structures 3 is modified so that the plotted S-shape, and structure placed within the structure of (quasi-) hexagonal lattice or structure (quasi-) rectangular lattice. In addition, each of the structures 3 preferably has a structure with axial symmetry or structure obtained by extrusion or compression structure with axial symmetry in the direction of the track. In addition, the adjacent structures 3 are preferably connected to each other near the base. This configuration allows to provide antireflective structure with high performance, which can be manufactured more simply.

When the optical element 1 is produced by using a method in which a process for manufacturing a master-form optical disks combined with the etching process, the time (the exposure time)required for the manufacture of a master form, can be significantly reduced compared with the case where the optical element 1 is produced during exposure of an electron beam is m Thus, the performance of manufacturing the optical element 1 can be improved substantially.

When the shape of the upper part of the structures 3 is a flat and not tapered shape, the durability of the optical element 1 can be improved. The separation optical element 1 from the roller master form 11 can also be improved. When the step of the structures 3 is an inclined step, easy transfer can be improved compared with the case when is a parallel step.

The second option exercise

The configuration of the optical element

On figa schematically shows in plan representing an example configuration of the optical element in accordance with the second embodiment of the present invention. On FIGU shows in plan with a partial increase of the optical element provided on figa. On figs shows a view in section along the tracks T1, T3, - figv. On fig.11D shows a view in section along the tracks T2, T4, - figv.

In the optical element 1 in accordance with the second embodiment, the track T are of the form in the form of an arc, and patterns 3 are in the form of an arc. As shown in figv, in three adjacent rows of tracks (T1 to T3), the structures 3 are arranged so that the formed structure quasistatically lattice with the centers of the structures 3, u is contained in the points a1-a7. Here patterns quasistatically grating means, in contrast to the structure of a regular hexagonal lattice structure of a hexagonal lattice, the deformed along the shape in the form of an arc of tracks T. alternatively, structure quasistatically grating means, in contrast to the regular structure of a hexagonal lattice, the structure of a hexagonal lattice, which has been distorted along the direction of the arc tracks T and stretched and distorted in the direction of the continuation of the track in the direction of the axis X).

Except for the above-described configuration of the optical element 1, the configuration is the same as in the first embodiment, and its description is omitted.

The configuration of the master disk

On Fig shows an example configuration of a disk master molds for manufacturing the optical element having the above described configuration. As shown in Fig, disc master form 41 has a configuration in which multiple structures 43 in the form of recesses are located on the surface of the master form 42 in the form of a disk. Patterns 13 are arranged periodically and two-dimensional increments of less than or equal to the wavelength of light in wavelengths in the environment where used the optical element 1, for example, with a step, essentially equal to the wavelength of visible light. For example, patterns 43 are arranged on concentric tracks is whether the spiral path.

Except for the configuration of the disk master form 41 described above, the configuration is the same as that of the roller master form 11 in the first embodiment, and the description here is omitted.

A method of manufacturing optical element

Initially, the device scanner used to prepare the disk master form 41 having the above-described configuration will be described with reference to Fig.

The moving optical table 32 includes the extender beam 33, the mirror 38 and the lens 34 of the lens. The laser beam 15 is directed to the moving optical table 32, is formed into a desired beam shape by using a spreader beam 33 and then sent on a layer of resist on the master form 42 in the form of a disc 42 through the mirror 38 and the lens 34 of the lens. Master form 42 is placed on the turntable (not shown), which is connected to the motor 35 of the spindle. Then the step of exposing the layer of resist is performed by intermittent irradiation of a layer of resist on the master form 42 by a laser beam, while the master form 42 rotates and the laser beam 15 is moved in the radial direction of rotation of the master form 42. The resulting latent image is essentially elliptical shape having the major axis in the circumferential direction. The laser beam 15 is moved in the movement of the moving optical table 3 in the direction the arrow R.

The device display shown in Fig includes mechanism 37 management, intended for forming the layer of resist latent image in the form of patterns from two-dimensional hexagonal lattice or quasistatically lattice, shown figure 11. The mechanism 37 includes a block 29 format specifies the module 30. Block 29 format includes a module polarity inversion, and the inversion module polarity controls the timing at which the resist layer is irradiated with a laser beam 15. Specifies the module 30 controls the acousto-optic modulator 27 in accordance with the module output inversion of polarity.

The mechanism 37 management synchronizes the intensity modulation of the laser beam 15 to be performed using the AOM 27, the rotation speed of the drive motor 35 of the spindle and the speed of movement of the moving optical table 32 for each track so that they get a two-dimensional patterns of the latent image, spatially related to each other. Rotation of the master form 42 is controlled with a constant angular velocity (CAV). In addition, application frameworks do, using the appropriate number of revolutions of the master form 42 provided by the motor 35 of the spindle corresponding to the modulation frequency of the intensity of the laser, provided the AOM 27, the corresponding step of the laser beam 15, asked by the moving optical table 32. Thus, the layer of resist to form a latent image, having a structure of a hexagonal lattice or structure quasistatically grid.

In addition, the control signal module inversion polarity gradually change so that the spatial frequency (density patterns of the latent image, P1: 330, P2: 300 nm; P1: 315 nm, P2: 275 nm; or P1: 300 nm, P2: 265 nm)becomes homogeneous. More specifically, the exposing is performed when the period of irradiation of the resist layer with a laser beam 15 is changed for each track, and the modulation frequency of the laser beam 15 is carried out by means of the mechanism 37 control so that P1 becomes equal to approximately 330 nm (315 nm or 300 nm) on each track T. Thus, the modulation is controlled so that the period of irradiation of the laser beam becomes shorter, as the position of the track becomes more remote from the center of the master form 42 in the form of a disc. Thus, it may be formed of nano-structure in which the spatial frequency is uniform throughout the substrate.

Next will be described an example of a method of manufacturing an optical element in accordance with the second embodiment of the present invention.

First the master-form 41 in the form of a disk manufactured using the same method is, as in the first embodiment, except that a layer of resist formed on the master mold in the form of a disc, exhibit, using the device scanner having the above described configuration. Next, the wizard-form 41 in the form of a disk and the base 2, such as acrylic sheet, which was applied polymer resin, cured by UV light, is introduced into tight contact with each other. After curing-curing with UV light, the polymer resin by irradiating ultraviolet light, the base 2 is separated from the master form 41 in the form of a disk. Thus, the receive optical element in the form of a disc. Then the optical element in the form of a disc cut on the optical element 1 having a desired shape such as a rectangle. In accordance with this produce the desired optical element 1.

In accordance with the second embodiment, as in the case where the structures 3 are arranged linearly, can be obtained the optical element 1 with good antireflective properties and high performance.

A third option exercise

On figa schematically shows in plan representing an example configuration of the optical element in accordance with a third embodiment of the present invention. On FIGU shows the form in terms of the partial magnification of the optical element, presented at Figo. On figs shows a view in section along the tracks T1, T3, ... figv. On fig.14D shows a view in section along the tracks T2, T4, ... figv.

The optical element 1 in accordance with the third embodiment differs from the first variant of realization of the fact that in three adjacent rows of track structure 3 structure tetragonal lattice or structure quasicontinuously lattice. Here patterns quasicontinuously grating means, in contrast to the structure of a regular rectangular lattice, the structure of the tetragonal lattice, which is stretched and distorted in the direction of the continuation of the track (direction of the X axis). When the structures 3 periodically placed within the structure of tetragonal lattice or structure quasicontinuously lattice, for example, the structures 3 are arranged next to each other in the directions of symmetry of the 4-th order. In addition, as a result of additional stretching and distortion of the tetragonal lattice structure 3 can also be placed next to the structures 3 in the same track and layout is achieved with a high packing density, in which one structure is located next to the structures not only in the direction of the symmetry of the 4-th order, but also in two positions on the same track.

In two adjacent tracks T in the intermediate clause the provisions (provisions shifted by a half pitch) between the structures 3 arranged on one track (for example, T1), structure 3 is placed on another track (e.g., T2). Therefore, as shown in figv, in three adjacent rows of tracks (T1 to T3), the structures 3 are arranged so as to form the structure of the tetragonal lattice or structure quasicontinuously lattice so that the centers of the structures 3 are located at points a1-A4.

Preferably the height of the structures 3 is set appropriately in accordance with the wavelength of light intended for transfer. For example, when transmit visible light, the height of the structures 3 preferably ranges from 150 nm to 500 nm in this method of manufacturing. Step P2 in the direction of 0 relative to the track T, for example, is from about 275 nm to 297 nm. In addition, the structure 3 may be made so that they have a certain distribution in height.

Step P1 placement of structures 3 on the same track preferably is longer than the step P2 placement of the structures 3 between two adjacent tracks. In addition, the ratio P1/P2 preferably satisfies the ratio of 1.4<P1/P2<1,5, where P1 represents the step of placing structures 3 in the same track and P2 represents the step of placing the structures 3 between two adjacent tracks. By choosing such kilowog the range packing factor structures, shaped in the form of an elliptical cone or in the shape of a truncated elliptical cone, can be increased. Therefore, can be improved antireflective characteristics.

In the third embodiment may be retrieved optical element 1, having a good antireflective characteristics and high productivity, as in the first embodiment.

The fourth option exercise

On figa schematically shows in plan representing an example configuration of the optical element in accordance with the fourth embodiment of the present invention. On FIGU shows in plan with a partial increase of the optical element provided on figa. On figs shows a view in section along the tracks T1, T3, ... figv. On fig.15D shows a view in section along the tracks T2, T4, ... figv. On Fig shows a partial enlargement view in perspective of the optical element provided on Fig.

The optical element 1 in accordance with the fourth embodiment differs from the optical element in accordance with the first embodiment so that the optical element 1 additionally includes a secondary structure 4 formed on the surface of the base 2, and these patterns are connected to each other via the secondary structures 4 between them. The same parts as the first embodiment, marked with the same numbers of reference positions, and their description is omitted. It should be noted that in the fourth embodiment, the structure 3 is designated as the primary structure 3 to avoid confusion between the structures 3 and the secondary structures 4.

Secondary structure 4 is designed as recesses or projections, which are made smaller than the primary structure. For example, the secondary structures 4 are small raised areas having a height smaller than that of the primary structures 3. In addition, when the height of the secondary structures 4 is less than or equal to approximately 1/4 of the maximum value of the wavelength of light used in the environment, based on the length of optical path adopted taking into account the refractive index, the secondary structures 4 contribute to procewaterhouse function. For example, the height of the secondary structures 4 is approximately from 10 nm to 150 nm. Secondary structure 4 may consist, for example, from the same material as the base 2 and the primary structure of the 3, but preferably consist of a material having a lower refractive index than the material constituting the base 2 and the primary structures 3. This is due to the fact that the reflectivity can be further reduced. In addition, in the above description, in the main, was described case, when p is ruinae structure 3, and secondary structures 4 are projections, but the primary structure 3 and the secondary structures 4 can be made as a donation. Moreover, the relationship between the projections-recesses may be reversed between the primary structures 3 and the secondary structures 4. In particular, when the primary structures 3 are made as ledges, secondary structure 4 can be made as a donation. When the primary structure 3 is made as a hollow, secondary structure 4 can be implemented as tabs.

The secondary structures 4 are, for example, on some or all of the areas between the primary structures. In particular, preferably the secondary structures 4 are provided on the most intimate areas between the primary structures 3, and the primary structures 3 are connected to each other via the secondary structures 4 are provided at the nearest stations. Thus, the packing ratio of the primary structures 3 can be increased. In addition, the secondary structures 4 may be located in other areas than the areas between the primary structures. A component of the spatial frequency of the secondary structures 4 are preferably higher than the frequency components converted from the period of the primary structures 3. In particular, a component of the spatial frequency of the secondary structures 4 are preferably two times or more, and Bo is her preferably four times or more greater than the component of the frequency converted from a period of the primary structures 3. Preferably component of the spatial frequency of the secondary structures 4 is not an integer multiple of the frequency component of the primary structures 3.

From the point of view of ease of formation of the secondary structures 4, as shown in figv, secondary structure 4 preferably include some or all of the positions indicated by solid black circles, where the primary structures 3 having the shape of an elliptical cone shape in the form of a truncated elliptical cone or the like, are located next to each other. In this arrangement the secondary structures 4 are formed between all adjacent structures 3, between adjacent neighboring structures 3 in the same track (for example, between a1 and A2 or between the structures 3 on adjacent tracks (for example, between a1 and A7 and between A2 and A7). When the primary structures 3 are placed periodically in the form of a structure of a hexagonal lattice or structure quasistatically lattice, such as primary structures 3 are arranged next to each other in the direction of the symmetry of the 6-th order. In this case, preferably, the secondary structures 4 are provided on adjacent sites and the primary structures 3 are connected to each other via the secondary structures 4. In addition, when the gaps 2A are present between the primary structure of the AMI 3, as shown in figv, from the point of view of increasing the packing factor, the secondary structures 4 are preferably formed in the gap 2A between the primary structures 3. Secondary structure 4 can be formed as adjacent areas of the primary structures 3 and the gaps 2A. In addition, the provisions that formed secondary structure 4, is not limited to the specific examples described above. Secondary structure 4 can be formed on all surfaces of the primary structures 3.

In addition, from the viewpoint of improving the reflection characteristics and transmission characteristics of at least one type of small protrusions and recesses, such as small uneven area 4A, preferably formed on the surface of the secondary structures 4.

In addition, to obtain the optical element 1, having a good antireflective function and a small dependence on wavelength, small uneven area 4A of the secondary structures 4 are preferably formed so that it has a component of the spatial frequency with a high frequency, a period which is shorter than the period of the primary structures 3. For example, as shown in Fig, preferably provided wavy small uneven area 4A. Small uneven area 4A may be formed, for example, by appropriate selection of the conditions of etching, such as RIE) (reagent the second ion etching) in the manufacturing process of the optical element or material for the master form. For example, uneven plot 4A can be formed using a glass Pyrex or (registered trademark) as the material for the master of the form.

In the fourth embodiment, since the secondary structures 4 are additionally formed on the surface of the base 2, can be obtained S-shaped profile of the refractive index. Thus, it can be achieved with good antireflective characteristics. However, since the optical element 1 in accordance with the first embodiment, it includes located next to the structure directly connected to each other, the packing factor of the optical element 1 is higher than that of the optical element 1 in accordance with the fourth embodiment. Therefore, the optical element 1 in accordance with the first embodiment has an S-shaped profile of the refractive index, which is more smoothly than that of the optical element 1 in accordance with the fourth embodiment. Thus, when the structure 3 is high, the optical element 1 in accordance with the first embodiment can have the best antireflective characteristics than that of the optical element 1 in accordance with the fourth embodiment.

The fifth option exercise

On figa schematically p is the cauldron view in plan, representing a configuration example of the optical element in accordance with the fifth embodiment of the present invention. On FIGU shows in plan with a partial increase of the optical element provided on figa. On figs shows a view in transverse section along the track Tl, T3, figv. On fig.17D shows a view in section along the tracks T2, T4, figv. On Fig shows a perspective view with a partial increase of the optical element provided on Fig.

The optical element 1 in accordance with the fifth embodiment differs from the optical element according to the first embodiment of implementation because many of the structures 3 in the form of recesses are located on the surface of the base. The shape of the structures 3 is a notch obtained by reversing the ledge of the structures 3 in the first embodiment. Therefore, the effective refractive index in the direction of depth (in the Z axis direction on Fig) of the structures 3 is gradually increased toward the base 2 and is modified so that it corresponds to an S-shaped curved line. It should be noted that, when the structures 3 are grooves, as described above, the areas of the holes (the input sections of the grooves) of the structures 3 in the form of recesses defined as the lower parts, and the lowest areas (the deepest parts of the grooves) to the NRA is the making of the depth of the base 2 is defined as vertices. In other words, the upper and the lower portion is defined using patterns 3 that are unrealistic. In this case, the effective refractive index, shown in figure 2, gradually increases in a direction from the bottom portion to the top. In addition, in the fifth embodiment, since the structures 3 are grooves, the height H of the structures 3 in the formula (1), etc. is replaced by the depth H of the structures 3.

The fifth option is the same as the first variant of implementation, except for the above description.

In the fifth embodiment, since it is used in excavation, obtained by reversing the ledge of the structures 3 in the first embodiment can be achieved the same effect as in the first embodiment.

In addition, in the fifth embodiment, the lower portions of the adjacent structures 3 are connected to each other so that the patterns found in nearby lower parts. Therefore, it is unlikely that in the optical element 1 in accordance with the fifth embodiment of the wall between the structures will be damaged as compared with the optical element having thin walls formed between the neighboring structures. In accordance with this can be improved durability of the element.

The sixth option exercise

On Fig shows in section the rspective, representing a configuration example of the optical element in accordance with the sixth embodiment of the present invention. As shown in Fig, the optical element 1 in accordance with the sixth embodiment differs from the first variant the fact that the optical element 1 includes patterns 5 in the form of columns, which run in one direction on the surface of the base, and structure 5 are one-dimensional on the base 2. It should be noted that elements that match in the sixth and in the first embodiment denoted by the same numbers of reference positions, and their descriptions are omitted here.

The effective refractive index in the depth direction (Z axis direction on Fig) structures 5 gradually increases towards the base 2 and is modified so that the plotted S-shaped curved line. Thus, the profile of the refractive index has a single inflection point N. In addition, patterns in the form of columns can be connected to each other so that the parts of the structures in the form of bars superimposed on each other or can be connected to each other so that the areas between structures in the form of bars represent the secondary structure. In this case, by modifying the width of the structures in the form of bars, these structures can be connected to each other is AK, their plots are superimposed on each other.

Structure 5 have a cylindrical surface which is uniformly proceeds in one direction (Y axis direction). Plot (plot XZ)obtained by the slice structures 5, perpendicular to the direction of the ridge, is of such shape in cross-section, which is the same or similar to the profile of the refractive index shown in figure 2.

In accordance with the sixth embodiment, the change of the effective refractive index in the direction of the depth gradually increases towards the base 2 and draws an S-shaped curved line. Therefore, the boundary for the light becomes fuzzy because of the effect of the form of structures 5, which can reduce the reflection of light. Thus, it can be obtained the optical element 1, having a good antireflective characteristics.

The seventh option exercise

On Fig shows in sectional view representing an example configuration of the optical element in accordance with the seventh embodiment of the present invention. As shown in Fig, the optical element 1 in accordance with the seventh embodiment differs from the first variant of realization of the fact that the gradient film 6 formed on the base instead of the structures 3. It should be noted that the same parts as in the first embodiment, which are the same numbers of reference positions, and their description is omitted.

Gradient film 6 is a film consisting of a material whose composition gradually varies in the depth direction (thickness direction), so that the refractive index in the direction of depth changes gradually. The refractive index on the side surface of the gradient film 6 is lower than on the side of the base (the border crossing). The effective refractive index in the direction of the depth gradually increases towards the base 2 and change what is plotted on the S-shaped curved line. Therefore, the boundary for the light becomes fuzzy, which reduces the reflected Swettenham way, antireflective characteristics of the optical element can be degraded.

Gradient film 6 can be formed, for example, by spraying. Examples of the formation of a film by sputtering include a method in which two types of target material simultaneously sprayed in a certain ratio, and the method in which the content of the process gas contained in the film, appropriately modified when performing reactive sputtering, this changes the speed of the process gas stream.

In accordance with the seventh embodiment can be achieved the same effects that pervom embodiment.

The eighth option exercise

The configuration of the liquid crystal display device

On Fig shows an example of the configuration of the liquid crystal display device in accordance with the eighth embodiment of the present invention. As shown in Fig, the liquid crystal display device includes a back light 53 that emits light, and the liquid crystal panel 51, which in time and space modulates light emitted from the backlight 53, to display the image. Polarizers 51A and 51b, which are optical components, respectively, are located on two surfaces of the liquid crystal panel 51. The optical element 1 is located on the polarizer 51b located on the side surface of the liquid crystal display panel 51. In the present invention, the polarizer 5 lb having the optical element 1 located on one main surface, called antireflective polarizer 52. Antireflective polarizer 52 is an example of antireflective optical component.

Next, the back-light 53, the liquid crystal panel 51, polarizers 51A and 51b and the optical element 1 constituting the liquid crystal display device will be described sequentially.

Back podsi the ka

For example, as a backlight 53 you can use back-lighting direct type back light through the edges or back light flat light source. Backlight 53 includes, for example, the light source reflecting plate and the optical film. For example, fluorescent cold cathode lamp (CCFL), a fluorescent lamp, a hot cathode (HCFL), an organic electroluminescence (OEL), inorganic electroluminescence (IEL), light emitting diode (LED) or the like, are used as light source.

LCD panel

Examples of the display mode that can be used for the liquid crystal panel 51 includes a twist-nematic (TN) mode, supertwist-nematic (STN) mode, vertical alignment (VA)mode, in-plane switching (IPS), optically compensated dual mode birefringence (OCB)mode, ferroelectric liquid crystal (FLC)mode liquid crystal dispersed polymer (PDLC) mode change the primary and secondary phases (PCGH).

Polarizers

Polarizers 51A and 51b, respectively, are provided, for example, on the two surfaces of the liquid crystal panel 51 so that their axes of transmission are orthogonal to each other. Each of the polarizers 51A and 51b allows transmission through only the underwater of the orthogonal polarized components of the incident light and blocks other components by absorption. Each of the polarizers 51A and 51b can be a elongated along one axis of the hydrophilic polymer film such as a film of polyvinyl alcohol film, partially formalized polyvinyl alcohol or partially saponified film of a copolymer of ethylene and vinyl acetate, with dichrosim substance such as iodine or micrococci pigment, absorbed in the hydrophilic polymer film. A protective layer such as a film from triacetylcellulose (TAS) is preferably formed on two surfaces of each of the polarizers 51A and 51b. When the protective layer thus formed, the base 2 of the optical element 1 is preferably also used as a protective layer. This is because in this configuration, the antireflective polarizer 52 may be made more subtle.

Optical element

The optical element 1 is the same as in the first-seventh embodiments, implementation, and its description will be eliminated.

In accordance with the eighth embodiment, since the optical element 1 is located on the surface of the display device, liquid crystal display, antireflective function display surface of the liquid crystal display device can be improved. Thus, it can be improved the visibility of the LCD display.

Nine-the first variant implementation

The configuration of the LCD device display

On Fig shows an example of the configuration of the liquid crystal display device in accordance with the ninth embodiment of the present invention. The liquid crystal display device differs from the device according to the eighth variant implementation that includes a front element 54 on the front side of the liquid crystal panel 51, and also includes the optical element 1 on the front surfaces of the liquid crystal panel 51 and/or the front and rear surfaces of the front element 54. On Fig shows an example in which the optical element 1 is performed on the entire front surface of the liquid crystal panel 51, and the front and rear surfaces of the front element 54. For example, an air gap is formed between the liquid crystal panel 51 and the front element 54. The same parts as in the eighth embodiment, are denoted by the same numbers of reference positions, and their description is omitted. It should be noted that in the present invention, the front surface is a surface on the side of the display surface, i.e. the surface on the side of the viewer, and the back surface is a surface on the side opposite to the display surface.

The front element 54 presents yet the front panel or the like, used for the purpose of providing mechanical, thermal protection and protection from atmospheric influences and features of the design for the front surface (the audience) liquid crystal panel 51. The front element 54 has, for example, the leaf shape, the shape of the film or plate. Examples of the material of the front element 54 includes glass, triacetylcellulose (TAC), polyester (TRAY), polyethylene terephthalate (PET), polyimide (PI), polyamide (PA), aramid, polyethylene (PE), polyacrylate, polyethersulfone, polysulfone, polypropylene (PP), dietetically, polyvinyl chloride, acrylic polymer resin (emission spectra obtained for pure) and polycarbonate (PC). However, the material is not limited specifically to these materials, and you can use any material that has transparency.

In accordance with the ninth embodiment, the visibility of the liquid crystal display device can be improved, as in the eighth embodiment.

Examples

Below the present invention is specifically described based on examples, but is not limited to the examples.

Examples of the present invention are described in the following order.

1. The research profile of the refractive index and shape of structures

2. The study of other forms of structures

3. Study the number of steps in the profile of the refractive index of

4. Study characteristics are reflected in the texts, using actually made samples

1. The research profile of the refractive index and shape of structures

S-shaped profile of the refractive index was adopted, and the form of structures, which achieves the profile of the refractive index was determined during the simulation. In addition, the interdependence between the profile of the refractive index and reflectivity was investigated by simulation.

Example 1

As shown in Fig adopted the profile of the refractive index, the effective refractive index of which corresponds to an S-shaped curved line. Then they determined the shape of the structures, which provides the above-described profile of the refractive index. On figa shows the result.

Example 2

As shown in Fig adopted the profile of the refractive index, the effective refractive index of which corresponds to an S-shaped curved line and in which the tip is changed more abruptly than in Example 1. Consequently, it was determined the shape of the structures, which allows to obtain the above-described profile of the refractive index.

On FIGU shows the result.

Example 3

As shown in Fig adopted the profile of the refractive index, the effective refractive index of which corresponds to an S-shaped curved line and in which con is IR varies much more cool than in Example 1. Then they determined the form of structures, which allows to obtain the above-described profile of the refractive index. On figs shows the result.

Comparative example 1

As shown in Fig took linear profile of the refractive index. Then determined the form of structures, which provides the above-described profile of the refractive index. As a result, were obtained structure having the form of a hanging bell (not shown).

Assessment reflectivity 1

First identified reflecting the ability of each of the above indices of refraction in the case where the height of the structures was 300 nm. On Fig shows the results. It should be noted that Fig, because the optical thickness was determined on the basis of the bottom surface structures, the relationship between the increasing and decreasing profile of the refractive index opposite are presented in figure 2.

The following can be seen on Fig.

When the linear profile of the refractive index (Comparative example 1), the reflectivity R is more than 0.1%, essentially, in the whole range of visible light from 400 nm to 700 nm. In contrast with S-shaped profiles of the refractive index (Examples 1-3) reflectivity R was less than 0.1%, essentially, in the whole range of visible light from 400 nm to 700 nm. In private the tee, S-shaped profiles of the refractive index (Examples 2 and 3), which abruptly changes at the ends of the base and on the air side, are satisfactory in terms of the effect of preventing the reflection in the visible range.

Assessment reflectivity 2

As for the linear profile of the refractive index (Comparative example 1) and the profile of the refractive index (Example 3), which have better characteristics in Examples 1-3, were determined by the characteristics of the reflection obtained when change the height of the structures. On Fig shows the results.

The following is evident from Fig.

When the height of the structures is 200 nm, the reflectivity of S-shaped profile of the refractive index (Example 3) is higher than the linear profile of the refractive index (Comparative example 1). Therefore, the characteristics of the reflection S-shaped profile of the refractive index deteriorate.

When the height of the structures is 250 nm, the reflectivity of S-shaped profile of the refractive index (Example 3), decreases for shorter wavelengths and the average reflectance in the visible range from 400 nm to 700 nm is improved in comparison with the linear profile of the refractive index (Comparative example 1). Therefore, when the height of the structures is 5/14 (250 nm) or more of the wavelength of 700 nm, S-about asny profile of the refractive index functions efficiently and reflectivity R< 0,3% can be achieved, essentially over the entire visible range from 400 nm to 700 nm. In addition, in the wavelength range from 400 nm to 550 nm when the height of the structures is 5/14 (below 200 nm) or more wavelength 550 nm, can be achieved reflectivity R<0,3%.

When the height of the structures is 300 nm, 400 nm or 500 nm, the reflectivity of S-shaped profile of the refractive index (Example 3) decreases in the visible range from 400 nm to 700 nm compared with the reflectivity of the linear profile of the refractive index. Therefore, the characteristics of the reflectivity of the S-shaped profile of the refractive index is improved. In particular, the best antireflective effect (R<0,1%) can be obtained in the visible range from 400 nm to 700 nm.

When the height of the structures is 300 nm, the reflectance at 700 nm, which is the longest wavelength on the edge of the wavelength range of approximately 0,08%. Thus, when the height of the structures is 2/5 (280 nm) or more and preferably 3/7 (300 nm) or more of the wavelength of 700 nm, the S-shaped profile of the refractive index is effectively functioning, and reflectivity R<0,1% can be achieved, essentially, in the whole range of visible light from 400 nm to 700 nm.

Given the ease of manufacture, maximum height of structures preference is sustained fashion is approximately 1.0 μm (step 700 nm, the size ratio of 1.4) in the range of visible light. Thus, the height of the structures is preferably 10/7(1 μm) or less than a wavelength of 700 nm.

Given the above description, the height of the structures is preferably 5/14 or more and 10/7 or less than the maximum values of the range of wavelengths of light used in the environment, more preferably 2/5 or more and 10/7 or less than the maximum value and additionally preferably 3/7 or more and 10/7 or less than the maximum value.

Evaluation form structures

The following is evident from figa-24C and 25.

The shape of the structures, which provides a profile of the refractive index shown in Fig, represents in cross section the form of the square root of the S-shaped profile of the refractive index, and this form gradually widens towards the base. In addition, among the structures shown in figa-24C, patterns having a shape of a truncated cone with a flat top (Example 2: figv and Example 3: figs) can provide especially good antireflective characteristics.

In addition, as shown in Fig, the lower portions of the adjacent structures are connected to each other, as indicated by the presence of flat parts 3A, formed on the lower parts of the structures. This allows a profile of the refractive index, which postopen which increases towards the base and draws an S-shaped curved line. It should be noted that the small structures, such as secondary structure, can be formed on the surface without entering the lower parts of structures in contact with each other.

2. The study of other forms of structures

Forms other than shown on figa-24C, were determined by means of calculations.

Example 4

Identified patterns resulting from stretching of the structures 3 in Example 3, 1.5 times in the direction of the y axis On figa shows the result.

Example 5

Identified patterns resulting from stretching of the structures 3 in Example 3, 1.5 times in the direction of the axis X. On FIGU shows the result.

Example 6

Was determined the shape of the structures resulting from the reversal of recesses and projections of the structures 3 in Example 2. On figs shows the result.

Evaluation form structures

Even in structures elongated in the direction of axes X and Y, or in the structure in which recesses and protrusions were reversed, was obtained profile of the refractive index, similar to those shown in Examples 2 and 3. Therefore, the forms (Examples 4-6) structures shown in figa-27C, helping to achieve a good antireflective properties.

In addition, structures that are elongated in directions of axes X and Y, as in Examples 4 and 5, can be easily manufactured, and can be increased packing factor.

3. Study the number of steps in the profile of the refractive index of

The reflectance spectra of the profile of the refractive index, which has two or more inflection points, and the profile of the refractive index, having one point of inflection S-shaped profile of the refractive index)were determined, and the results were compared with each other.

Example 7

Was adopted the same S-shaped profile of the refractive index, as in Example 3, i.e. the profile of the refractive index, having one point of inflection.

Comparative example 2

As shown in Fig, was adopted the same profile of the refractive index, as in Comparative example 1, i.e. a linear profile of the refractive index.

Comparative example 3

As shown in Fig adopted the profile of the refractive index, which has three inflection points.

Comparative example 4

As shown in Fig adopted the profile of the refractive index, which has five points of inflection.

Assessment reflectivity

Determined reflectivity of each of the above-described profile of the refractive index in the case where the height of the structures was 500 nm. On Fig shows the results. It should be noted that Fig, because the optical thickness was determined on the basis of the bottom surface structures, the relationship between increase and decrease profile showing the El refractive opposite are presented in figure 2.

The following is clear from Fig.

When the height of the structures is 500 nm, the S-shaped profile of the refractive index (Example 7) forms the best antireflective effect than the profiles of the refractive index, having two or more points of inflection (Comparative examples 3 and 4) and the linear profile of the refractive index (Comparative example 2).

Here, when the height of the structures is 500 nm or more, the S-shaped profile of the refractive index (Example 7) tends to generate the best antireflective effect than the profiles of the refractive index, having two or more points of inflection (Comparative examples 3 and 4) and the linear profile of the refractive index (Comparative example 2).

4. The study of reflectivity using actually made the samples In Example 8 below, the height H of the structures of the optical sheet, the steps P1 and P2 of the placement and the size ratio was defined as follows.

First, the shape of the surface is made of optical sheet was observed using an atomic force microscope (arm). Then the height H and the steps P1 and P2 accommodation structures was determined by the profile obtained using AFM. In addition, the ratio (=height H/step P2 placement) was determined using the height H and pitch P2 of the host.

Example 8

Initially prepared glass is Yu roller master form having an outer diameter 126 mm, and a layer of resist formed on the surface of the glass roll master form as follows. That is, the photoresist was diluted with a diluent in a ratio of 1/10, and diluted resist was applied onto the surface of the glass roll master shape in the form of columns (by immersion) to obtain a thickness of approximately 70 nm, the result of which was formed a layer of resist. Then a glass roller master form that is used as a recording medium, transferred to the device platen roller master of the form shown in Fig. In the display layer of the resist latent image, having a structure quasistatically lattice in three adjacent rows of tracks formed on the resist layer so as to form the shape of one of the spiral.

In particular, the area where I was supposed to be shaped structure exhibiting quasistatically lattice, was irradiated with laser beams having a power of 0.50 mW/m, which reaches the surface of the glass roll master molds for forming structure exhibiting quasistatically lattice in the form of grooves. It should be noted that the thickness of the layer of resist in the direction of the columns of rows of tracks was approximately 60 nm, and the thickness of the layer of resist in the direction of the continuation of the tracks was approximately 50 nm.

Then,exposing layers of resist on a glass roller master the form of the development processing, the exposed areas of the layer of resist dissolved to perform manifestations. In particular, the unmanifest glass roller master form was placed on a rotary table displaying device (not shown). Developer dropwise applied to the surface of the glass roll master form, while the glass roll master form is rotated together with the rotating table for the display of a layer of resist on the surface. Thus, the obtained glass roller master form with a layer of resist having openings in the form of patterns quasistatically grid.

Then alternately handled etching and the ashing processing for glass roller master of the form, using the device for etching roller. Thus was formed the structure in the form of conical structures (cavities). Here, with the proper adjustment of the processing time in the processing of etching and ashing processing was formed of a single step on the side of the structures. It provides the shape, the effective refractive index of which in the direction of the depth of the structures gradually increases towards the base and modified, which corresponds to an S-shaped curved line. On figa and 30B shows the shape of the formed surface is made master of the form. This form structures t is the train can be measured by observation using SAM (scanning electron microscope) or the like instead of the estimates using AFM (scanning atomic force microscope).

Here mytravelguide device roller is a device etching plasma with an electrode in the form of a column, and is designed so that the electrode is in the form of a column is inserted into the cylindrical hole of the glass roll master form and perform the plasma etching of the cylindrical surface of the glass roll master of the form.

Ultimately, the complete removal of the layer of resist using ashing O2got a glass master form type "eye of the moth", having the structure quasistatically lattice in the form of recesses. The depth of the recesses in the direction of the column was greater than in the direction of the continuation of the track.

Then a glass roller master form type "eye of the moth" was introduced in intimate contact with the sheet TAS (triacetylcellulose), which was applied curable under the action of ultraviolet light polymer resin, and then they were disconnected from each other, exposing the curing by exposure to ultraviolet rays. Then was obtained optical sheet having a major surface on which there are many structures. The height H of the structures of the optical sheet amounted to 230 nm, the step P1 of the placement amounted to 300 nm, the step P2 of the placement amounted to 270 nm, and the size ratio (N/P2) amounted to 0.9.

In the above-described processing is was made the required optical sheet.

Assessment reflectivity

Reflective optical sheet manufactured as described above were evaluated using device evaluation (V-550), supplied by JASCO Corporation. On Fig shows the results.

Comparative example 5

The reflective characteristics of the optical sheet having a surface on which it was posted, many of the structures having the form of a cone, defined in the simulation. On Fig shows the result.

Conditions of the simulation are presented below.

Accommodation: hexagonal lattice.

Height H: 200 nm.

The steps P1 and P2: 300 nm.

The ratio (H/P2): 0,7.

Shape: the shape of a cone (without S-shaped profile of the refractive index).

Polarization: none.

Comparative example 6

The reflective characteristics of the optical sheet having a surface on which it was posted, many of the structures having the form of a hanging bell, defined in the simulation. On Fig shows the results.

Conditions of the simulation are presented below.

Accommodation: hexagonal lattice.

Height H: 300 nm.

Steps P1 and P2 accommodation: 300 nm.

The ratio (H/P2): 1,0.

Shape: the shape of a hanging bell (form without S-shaped profile of the refractive index).

Polarization: none.

In the Table before the taulani configuration Example 8 and Comparative examples 5 and 6.

Example 8Comparative example 5Comparative example 6
The result of the surface observationfiga figv (AFM image)--
The lattice structure ofQuasistatically grilleHexagonal latticeHexagonal lattice
The shape of the lower partEllipseCircleCircle
Step P1 (nm)300300300
Step P2 (nm)270300300
The height H (nm)230200300
The ratio (H/P2)0,90,71,0
Form S-shaped profile of the refractive index)Form in the shape of a coneThe shape of the hanging bell
PolarizationAbsentAbsentAbsent

The following can be seen on Fig.

In Example 8, the reflectivity shows a tendency of a slight increase at larger wavelengths in the wavelength range from 400 nm to 650 nm, but it is much smaller than in Comparative example 5, in the wavelength range from approximately 400 nm to 650 nm. In particular, the characteristics with a low degree of reflection, such as reflectance of 0.2% or below, are achieved at a wavelength of 550 nm at which the power of vision of a person is the best. It should be noted that the increase in reflectance at longer wavelengths associated with the height of the structures. Therefore, the increase in reflectivity can be suppressed by changing the height of the structures in Example 8 to about 300 nm, which represents the height of structures in Comparative example 6.

In contrast, in Comparative example 5, the reflectivity shows a tendency of gradual increase, along with increasing wavelength in the range of d is in wavelengths from 400 nm to 650 nm. In addition, in Comparative example 6, the increase in reflectivity is suppressed at longer wavelengths in the wavelength range from 400 nm to 650 nm, but antireflective characteristics in Example 8 is better than in Comparative example 6 in all of the above wavelength range. In particular, Example 8 is better than Comparative example 6 in the sense of antireflective characteristics at a wavelength of 550 nm, where the ability to see the person is the best. Here, when the height of the structures in Example 8 is modified to approximately 300 nm, which represents the height of structures in Comparative example 6, the structure having an S-shaped profile of the refractive index are significantly better antireflective characteristics.

From the above description it is obvious that a good antireflective characteristics can be achieved when the effective refractive index in the direction of the depth of the structures gradually increases towards the base and draws an S-shaped curved line.

Embodiments of, and Examples of the present invention are, in particular, described above. However, the present invention is not limited to the above-described variants of implementation and Examples, and various modifications can be made in accordance with different desired characteristics based on those of the technical ideas of the present invention.

For example, numerical values, shapes, materials and configurations, are presented as Examples in the embodiments and Examples are merely examples, and other numerical values, shapes, materials and configurations may be used if necessary.

In addition, the configuration of the above-described embodiments can be combined with each other unless they are within the essence of the present invention.

In addition, in the above-described embodiments, the implementation of the case where the present invention is applied to the liquid crystal display device, has been described as an example, but the present invention can also be applied to other display devices, in addition to the device's LCD display. For example, the present invention can be applied to various display devices such as display on a CRT (cathode ray tube), a plasma display panel (PDP), a display based on the electroluminescence (EL) and display - emitter of electrons in the surface conductivity (SED).

In addition, in the above-described embodiments, the implementation of the case where the optical element 1 is produced by using a method in which a process for manufacturing a master shape in the optical disks combined with the etching process, has been described as an example. However, the method is for manufacturing the optical element 1 is not limited to this any method may be adopted if it can be manufactured optical element having an S-shaped profile of the refractive index, the effective refractive index of which in the direction of the depth gradually increases towards the base. For example, the optical element can be manufactured by exposing the electron beam or the like. Alternatively, the optical element can be manufactured by performing a gradient coating film obtained by mixing hollow silicon or the like, while the ratio of the hollow silica is modified so that the effective refractive index changes gradually, or using gradient films obtained by reactive sputtering.

In addition, in the above-described embodiments implement a layer with a low refractive index may be additionally formed on the surface of the base 2, which were formed structure 3. Preferably, a layer with a low refractive index, mainly consists of a material having a lower refractive index than the material constituting the base 2, structure 3 and the secondary structures 4. Examples of the material of such layer with a low refractive index include organic materials such as fluorocarbon p is polymer resin and inorganic materials with low refractive index, such as LiF and MgF2.

In addition, in the above-described embodiments, the implementation of the optical element can be manufactured through heat transfer. In particular, the optical element 1 can be manufactured by heating the base, consisting mainly of a thermoplastic polymer resin, and subsequently pressing stamp (form), such as roller master form 11 or disk master form 41 of the base, sufficiently softened in the heat processing.

In addition, in the above-described embodiments, the implementation of the case where the antireflective polarizer was obtained by applying the present invention to the polarizer, has been described as an example, but the present invention is not limited to this example. Antireflective optical components, in addition to the polarizer can be obtained by applying the present invention to the lenses, the optical waveguide window material, item display, etc.

In addition, in the above-described embodiments has been described a case where the profile of the refractive index is S-shaped with a single inflection point, but the other inflection point may be additionally provided at least at one end of the S-shaped profile of the refractive index. Even so, essentially S-shaped profile index PR is lalania can be achieved with good antireflective characteristics. In particular, when the height of the structures is small, get a significant effect antireflective characteristics. The inflection point on one end of the profile of the refractive index can be obtained, for example, by forming the upper part of the structures 3 in such a way that the upper part is a protrusion with a curved surface. The inflection point on the other end can be obtained, for example, molding of the bezel on the lower section of the structures 3 such that the rim extends towards the base.

EXPLANATION of REFERENCE POSITIONS

1OPTICAL ELEMENT
2BASE
2AGAP
3STRUCTURE PRIMARY STRUCTURE
3tTOP
3bThe LOWER PART
BEZEL
4SECONDARY STRUCTURE
4AUNEVEN PLOT
5PATTERNS
6GRADIENT FILM
11ROLLER MASTER FORM
12MASTER FORM
13PATTERNS
12AGAP
51LCD PANEL
51AThe POLARIZER
51bThe POLARIZER
52ANTIREFLECTIVE POLARIZER
53BACKLIGHT
54FRONT
PaThe FIRST TRANSITION POINT
PbThe SECOND TRANSITION POINT
NThe INFLECTION POINT
StSTEP

1. Antireflective optical element, containing:
the base and
many of the structures located on the surface of the base,
structure the tours are recesses or protrusions conical shape,
moreover, patterns are arranged with a pitch less than or equal to the light wavelength region of wavelengths in the environment of use of the specified element, and the lower portions of structures that are located next to each other, are connected to each other,
thus the effective refractive index in the direction of the depth of the structures gradually increases towards the base and corresponds to the S-shaped curved line,
moreover, patterns are only a step on the side surface of the structures.

2. The optical element according to claim 1, in which the patterns have the shape of an elliptical cone,
the effective refractive index in the direction of the depth of the structures has a single inflection point, and
this inflection point is consistent with the shape of the side structures.

3. The optical element according to claim 1, in which
the side surface structures gradually widens towards the base and changed so that the line-side surface in the cross section of the structure corresponds to the shape of the line that displays an amount equal to the square root of the effective refractive index structures in the direction of the depth of the structures.

4. The optical element according to claim 1, wherein the specified region of wavelengths of light in the environment element is a wavelength region of visible light.

. The optical element according to claim 1, in which the height of the structures is 5/14 or more of the maximum value of the wavelength of light in the environment of use of the element.

6. The optical element according to claim 1, in which the height of the structures is 2/5 or more of the maximum value of the wavelength of light in the environment of use of the element.

7. The optical element according to claim 1, in which the change in effective refractive index in the direction of the depth of the structures on the side of light incidence and/or on the side of the base of the structures is greater than the average value changes of the effective refractive index along the entire depth of the structures.

8. The optical element according to claim 1, in which the lower portions of structures that are located next to each other, are connected to each other so that they are superimposed on each other.

9. The optical element according to claim 1, additionally containing secondary structure located between said structures, located next to each other,
the secondary structures are grooves or protrusions that are less than the specified patterns,
moreover, the lower portions of these structures are connected to each other by means of secondary structures, located between them.

10. The optical element according to claim 1, in which the most similar to each other patterns are in the direction to which Oki.

11. The optical element according to claim 1, in which patterns are of conical shape, which is axisymmetric, with the exception of the bottom portion is connected with the neighboring structures, or have a conical shape obtained by stretching or compression of the above forms in the direction of the track.

12. The optical element according to claim 1, in which the patterns are arranged periodically in the form of a structure of a square lattice or structure quasicontinuously grid.

13. The optical element according to claim 1, in which the patterns are arranged periodically in the form of a structure of a hexagonal lattice or structure quasistatically grid.

14. Optical element, containing:
base; and
many of the structures located on the surface of the base,
patterns are recesses or protrusions in the form of columns, which run in one direction on the surface of the base,
moreover, patterns are arranged with a pitch less than or equal to the wavelength of light in the environment of use of the element
and the lower portions of structures that are located next to each other, are connected to each other,
thus the effective refractive index in the direction of the depth of the structures gradually increases towards the base and corresponds to the S-shaped curved line,
moreover, patterns are unities is nnow step on the side surface structures.

15. The display device containing the optical element according to any one of claims 1 to 13.

16. Antireflective optical component containing:
the optical component; and
many of the structures located on the surface of the optical component,
patterns are recesses or protrusions conical shape,
moreover, patterns are arranged with a pitch less than or equal to the wavelength of light in the environment of use of the component, and the lower portions of structures that are located next to each other, are connected to each other,
thus the effective refractive index in the direction of the depth of the structures gradually increases towards the base and corresponds to the S-shaped curved line,
moreover, patterns are only a step on the side surface of the structures.

17. Antireflective optical component according to item 16, in which the optical component is a polarizing element, or lens, or an optical waveguide, or the material of the window, or display item.

18. Master form that contains:
base; and
many of the structures located on the surface of the base,
patterns are recesses or protrusions conical shape,
moreover, patterns are arranged with a pitch less than or equal to the wavelength of light in the environment of use, and lower parts of the structure is, located next to each other, are connected to each other,
thus the effective refractive index in the direction of depth of the optical element formed by using these structures gradually increases towards the base of the optical element and corresponds to the S-shaped curved line,
moreover, patterns are only a step on the side surface of the structures.

19. Master form p, in which the substrate has a disk shape, a cylindrical shape or the shape of the column.



 

Same patents:

FIELD: physics.

SUBSTANCE: invention relates to an optical film, particularly used on a display surface in a liquid crystal display, a method of making said film, an antiglare film, a polariser with an optical layer and a display device. The optical film has a base and an optical layer on the base. The optical layer has a surface with an irregular shape, and the irregular shape is obtained by applying a coating material containing fine particles and a resin onto the base, distributing the fine particles densely in some portions and sparsely in other portions by convection which occurs in the coating material, and curing the coating material. The resin contains 3 wt % or more but not more than 20 wt % of a polymer; the fine particles are organic fine particles having average diameter of 2 mcm or more but not more than 8 mcm; the ratio ((D/T)×100) of the average diameter D of fine particles to the average thickness T of the film of the optical layer is 20% or more but not more than 70%, and image definition in transmitted light, measured using an optical comb with width of 0.125 mm, is 45 or higher. Surface roughness is equal to zero. On the other side, a completely flat surface results in the problem a clearly visible reflected image.

EFFECT: invention prevents reflection and influx of black colour by creating a smooth wave-like profile which cannot be measured as surface roughness.

51 cl, 21 dwg

FIELD: physics.

SUBSTANCE: optical film has a moth-eye relief structure, having multiple protrusions which include multiple slanting protrusions that are inclined relative the primary surface of the film in essentially the same direction when viewing the primary surface of the film from above. The slanting protrusions lie on the periphery of the optical film and are inclined into the film when viewing the primary surface of the optical film from above. The method of making the film includes a step of applying a physical force to the moth-eye structure so as to slant said multiple protrusions. Said step includes a polishing sub-step which involves polishing the moth-eye structure in a predetermined direction.

EFFECT: providing directivity of optical properties of the optical film.

19 cl, 26 dwg

FIELD: measurement equipment.

SUBSTANCE: method involves shaping of a reflector based on organic plastic material and non-organic substance with reflection coefficient of not less than 0.9 by preparing a mixture of initial components under pressure. As organic plastic material there used is a mixture of fluorine and polycarbonate; as non-organic substance - titanium dioxide, at the following component ratio, wt %: polycarbonate 100; fluorine 3.5-5.0; titanium dioxide 0.5-1.0. Forming can be performed by pressing at pressure of 800 to 1500 atm and at temperature of 240-270°C to thickness of not less than 2 mm or by casting at pressure of 750 to 1500 atm and at temperature of 280-290°C to thickness of at least 2 mm. Polycarbonate with melt flow-behaviour index of 2-60 g/10 min can be used as polymer material.

EFFECT: enlarging processing methods, temperature interval of processing, reducing cost and material consumption.

4 cl, 1 dwg

FIELD: physics.

SUBSTANCE: antireflection film has on its surface a moth eye structure which includes a plurality of convex portions, wherein the width between the peaks of adjacent convex portions does not exceed the wavelength of visible light. The moth eye structure includes a sticky structure formed by connecting top ends of the convex portions to each other and the diameter of the sticky structure is smaller than 0.3 mcm. The aspect ratio of each of the plurality of convex portions is less than 1.0, and the height of each of the plurality of convex portions is shorter than 200 nm.

EFFECT: reduced light scattering.

29 cl, 69 dwg

FIELD: physics.

SUBSTANCE: antireflection film has, on its surface, a moth-eye structure including a plurality of convex portions such that a width between vertices of adjacent convex portions is not greater than a wavelength of visible light, wherein the moth-eye structure includes a sticking structure formed when tip end portions of the convex portions are joined to each other. The diameter of the sticking structure is greater than or equal to 0.3 mcm and density of the number of sticking structures per unit area of the plane of the antireflection film is lower than 2.1 units/mcm2.

EFFECT: reduced light scattering.

29 cl, 69 dwg

FIELD: physics.

SUBSTANCE: antireflective film which reduces reflection of visible light on the surface of a substrate has a wavelength dispersion structure for causing a first wavelength dispersion of visible light passing through said antireflective film, and contains wavelength dispersion material for causing a second wavelength dispersion of visible light passing through said antireflective film. Visible light in the range from 380 nm to 780 nm, passed through the antireflective film, has light transmission fluctuation which is less than 0.5% of the transmission value at wavelength of 550 nm. The method of making the film involves depositing a visible light-cured resin onto the substrate which has a UV absorbing component in order to form a film; forming a rough part on the surface of the film, having a plurality of protrusions; the space between peaks of neighbouring protrusions is equal to or less than the wavelength of visible light; irradiating the film with visible light on the side of the substrate and curing the film to form an antireflective film.

EFFECT: preventing wavelength dispersion of light passing through the antireflective film, which creates a display colouring which is different from the colour of the display itself.

8 cl, 16 dwg

FIELD: physics.

SUBSTANCE: optical element has a base and a large number of structures lying on the surface of the base. The structures are protrusions or depressions and lie with spacing which is less than or equal to the wavelength of light under conditions of use. The effective refraction index in the direction of the depth of the structures gradually increases towards the base, and the curve of the effective refraction index has two more points of inflexion. The structures can be arranged in form of a hexagonal array, a quasi-hexagonal array, a quadrilateral array or a quasi-quadrilateral array. The structures have two or more steps between the peak and the bottom part of the structures and have a peak and/or a bottom part; or the structures have a curvilinear surface and become wider from the peak to the bottom part; or change in the effective refraction index in the direction of the depth of the structures on the upper side of the structures is greater than the average value of the effective refraction index on the slope of the structure; or change in effective refraction index in the direction of the depth of the structures on the side of the base of the structures is greater than the average value of the effective refraction index on the slop of the structure.

EFFECT: improved antireflection properties of optical elements.

30 cl, 93 dwg

FIELD: physics.

SUBSTANCE: optical film has a base with convex structural components which are two-dimensionally and orderly formed directly on its surface, and a solid coating layer on the surface of the base, having said structural components. The surface of the solid coating layer has a continuous wavelike shape which matches the shape of structural components of the surface of the base. The maximum amplitude (A) and minimum wavelength (λ) of the continuous wavelike surface are essentially constant, and the ratio (A/λ) of the maximum amplitude (A) to the minimum wavelength (λ) is greater than 0.002 but not greater than 0.011. The film has full light transmission factor of 92% or higher, dullness of 1.5% or less, internal dullness of 0.5% or less and opacity of 0.7% or less.

EFFECT: improved anti-glare properties and contrast.

18 cl, 22 dwg

FIELD: electricity.

SUBSTANCE: method for manufacture of the element produced by way of micro-treatment includes the following stages: generation of a resist layer on the stamping mould, exposure and development of the layer generated on the stamping mould for formation of a structure within the resist layer, placement of the stamping mould with a structure created in the resist layer onto an electrode and the stamp mould etching for an uneven shape formation on the stamping mould surface to obtain an element produced by way of micro-treatment. An uneven shape is formed on the electrode surface so that at the etching stage anisotropic etching is performed in a direction slanted relative to the stamping mould surface. The etching device contains a reservoir for the etching reaction and the first and the second electrodes positioned on opposite sides in the reservoir. The first electrode has an accommodation surface for accommodation of the substrate having an uneven surface shape so that anisotropic etching is performed in a direction slanted relative to the substrate surface.

EFFECT: provision for manufacture of an element having uneven structures slanted relative to the normal and the substrate surface at least in two different directions or having multiple areas wherein the structures slanting direction may be varied.

9 cl, 59 dwg

Optical element // 2451311

FIELD: physics.

SUBSTANCE: optical element has a base and primary and secondary structures lying on the surface of the base and representing a protrusion or depression. The primary structures are arranged in form of a plurality of rows of tracks on the surface of the base with spacing equal to or less than the wavelength of visible light. The secondary structures are smaller than the primary structures. Other versions of the optical element are possible. The secondary structures can be made between the primary structures and on adjacent areas, and the primary structures are connected to each other by the secondary structures. The spatial frequency of the secondary structures is higher than the frequency obtained based on the period of arrangement of the primary structures. The primary structures are made periodically in the configuration a hexagonal or quasi-hexagonal array or a tetragonal or quasi-tetragonal array and lie along the orientation of the corresponding symmetry. The secondary structures can be arranged on surfaces of the primary structures. The lower parts of adjacent structures can overlap each other.

EFFECT: improved antireflection characteristic and high technological effectiveness.

21 cl, 56 dwg, 1 tbl

Infrared reflector // 2510055

FIELD: chemistry.

SUBSTANCE: infrared reflector consists of a metal substrate, characterised by that it is coated with a layer of zirconium nitride and chromium nitride of general formula (ZrxCr1-x)1-yNy with x ranging from 0.15-0.7 and y ranging from 0.01 to 0.265. The method of production involves producing a metal substrate; depositing a layer of zirconium nitride and chromium nitride on said substrate by physical vapour deposition using a target which contains 15-70 wt % zirconium, with the remaining part consisting of chromium and impurities which are inevitable in the treatment process, and injecting nitrogen with a neutral carrier gas in ratio of 4/16 to 16/16 while simultaneously sputtering zirconium and chromium.

EFFECT: designing an infrared reflector, having high heat reflecting power and high resistance to high temperatures in corrosive or oxidative media.

17 cl

FIELD: physics.

SUBSTANCE: method involves defining surfaces of a glass structure to be made in form of alternating parallel and/or curvilinear strips, while also determining coefficients of reflection, transmission and absorption, refraction indices, geometric shapes and dimensions of the strips and the required change in said parameters both along and across the strips, as well as the need to distribute the strips into zones with different light transmission characteristics so that, at given angles or ranges of incidence angles of rays, only the required part of rays of the required wavelength range passes in a directed manner through the entire glass surface. For each angle of incidence in the 0-90° range, the total percentage of directed light transmission is calculated as a ratio of the total area of the output surface, through which rays pass, to the area of the whole first receiving surface, and strips are made on surfaces of the glass structure by further processing the outer surface of the glass and/or gluing a film with strips made in advance, and/or by placing in laminated glass between layers.

EFFECT: providing selective control, according to a predetermined law, of values of light flux and direction of rays passing through a glass structure depending on angles of incidence.

8 cl, 12 dwg

FIELD: chemistry.

SUBSTANCE: composition consists of 90-96 wt % of a base - mixture of polydimethylsiloxane (40-60 wt %) and polymethylphenylsiloxane (60-40 wt %) liquid with viscosity of 3000-40000 mm2/s at temperature of 20°C and 4-10 wt % thickener - silicon dioxide. The composition has a refraction index of 1.4100-1.4300, penetration value of 160-280 units, and operates in the temperature range from (-70°C) to (+300°C).

EFFECT: improved properties of the composition.

2 tbl, 12 ex

FIELD: physics.

SUBSTANCE: radiation diffracting film has a viewing surface and an ordered periodic array of particles embedded in the material of the array. The array of particles has a crystalline structure, having (i) a plurality of first crystal planes of said particles that diffract infrared radiation, where said first crystal planes are parallel to said viewing plane; and (ii) a plurality of second crystal planes of said particles that diffract visible radiation. When the film is turned about an axis perpendicular to the viewing surface and at a constant viewing angle of said film, visible radiation with the same wavelength is reflected from the second crystal planes with intervals equal to about 60°.

EFFECT: designing a film for authenticating or identifying an object.

23 cl, 5 dwg

FIELD: physics.

SUBSTANCE: optical film has a moth-eye relief structure, having multiple protrusions which include multiple slanting protrusions that are inclined relative the primary surface of the film in essentially the same direction when viewing the primary surface of the film from above. The slanting protrusions lie on the periphery of the optical film and are inclined into the film when viewing the primary surface of the optical film from above. The method of making the film includes a step of applying a physical force to the moth-eye structure so as to slant said multiple protrusions. Said step includes a polishing sub-step which involves polishing the moth-eye structure in a predetermined direction.

EFFECT: providing directivity of optical properties of the optical film.

19 cl, 26 dwg

FIELD: physics.

SUBSTANCE: method according to the invention includes the following steps: providing a mould for making a soft contact lens, the mould having a first mould half which forms a first moulding surface, which forms the front surface of the contact lens, and a second mould half which forms a second moulding surface, which forms the rear surface of the contact lens, said first and second mould halves configured to be connected to each other such that a cavity forms between said first and second moulding surfaces; feeding a mixture of monomers of lens forming materials into the cavity, where said mixture of monomers includes at least one hydrophilic amide-type vinyl monomer, at least one siloxane-containing (meth)acryalide monomer, at least one polysiloxane vinyl monomer or macromer and about 0.05 to about 1.5 wt % photoinitiator, where the lens forming material is characterised by the capacity to be cured by UV radiation having intensity of about 4.1 mW/cm2, in about 100 s; and irradiating the lens forming material in the mould for 120 s or less with spatially confined actinic radiation in order to cross-link the lens forming material to form a silicone hydrogel contact lens, where the contact lens made has a front surface, formed by the first moulding surface, opposite the rear surface formed by the second moulding surface, and a lens edge formed in accordance with spatial confinement of the actinic radiation.

EFFECT: making silicon hydrogel contact lenses whose edges are defined not by touching moulding surfaces, but by spatial confinement of radiation, which enables to reuse the mould to make high-quality contact lenses with good reproducibility.

18 cl

FIELD: physics.

SUBSTANCE: method involves local laser deposition of a layer of transparent or opaque material on the surface. Laser deposition is carried out on mirror reflecting adjacent surfaces or coatings of plates already mounted in an interferometer in the gap between surfaces. The gap is filled with a medium which forms a film upon laser irradiation, and the surface is locally irradiated with laser radiation. Thickness of the deposited layer of material can be controlled during deposition by interference measurement of deviation of the length of the optical path of the light beam between the mirror reflecting surfaces of the interferometer plates from the resonance length for the interferometer. The laser beam can scan the surface, wherein its intensity can be modulated with the length of the optical path between the mirror reflecting surfaces.

EFFECT: correcting the shape of surfaces of optical components already mounted in an optical device.

3 cl, 1 dwg

FIELD: physics.

SUBSTANCE: laser radiation focused on the surface of a photosensitive layer is modified on depth in proportion to the power density of the radiation propagating in the photosensitive layer. Before entering a focusing lens, the laser radiation is collimated into a parallel beam whose diameter is smaller than the entrance aperture of said lens and is shifted in parallel to the optical axis by a value where one of the edges of the longitudinal section of the exposing radiation cone in the photoresist layer becomes parallel to the optical axis of the focusing lens. In the second version, an immersion liquid is further placed in the interval between the output lens of the focusing lens and the surface of the photosensitive layer.

EFFECT: high diffraction efficiency of kinoform lenses by reducing loss on counter slopes of zones by increasing the gradient of the slopes formed directly during direct laser writing.

2 cl, 4 dwg, 1 tbl

FIELD: physics.

SUBSTANCE: method according to the invention involves adding to a reaction mixture an effective amount of a compound which reduces protein absorption, hardening said mixture in a mould to form a contact lens and removing the lens from the mould with at least one aqueous solution.

EFFECT: making silicone-hydrogel contact lenses with low protein adsorption, which are comfortable and safe to use, and do not require high production expenses.

23 cl

Optical monocrystal // 2495459

FIELD: physics.

SUBSTANCE: monocrystals are designed for infrared equipment and for making, by extrusion, single- and multi-mode infrared light guides for the spectral range from 2 mcm to 50 mcm, wherein a nanocrystalline structure of infrared light guides with grain size from 30 nm to 100 nm is formed, which determines their functional properties. The monocrystal is made from silver bromide and a solid solution of a bromide and iodide of univalent thallium (TIBr0.46I0.54), with the following ratio of components in wt %: silver bromide 99.5-65.0; solid solution TIBr0.46I0.54 0.5-35.0.

EFFECT: reproducibility and predictability of properties, avoiding cleavage effect, resistance to radioactive, ultraviolet, visible and infrared radiation.

FIELD: polymer materials.

SUBSTANCE: invention provides composition containing from about 50 to about 80% of component selected from group consisting of di(meth)acylate of ethoxylated bisphenol A, di(meth)acylate of non-ethoxylated bisphenol A, di(meth)acylate of propoxylated bisphenol A, epoxy(meth)acrylates of bisphenol A, and mixtures thereof; from more than 0 to about 30% of component selected from group consisting of tetrahydeofuryl (meth)acrylate, isobornyl (meth)acrylate, cyclohexyl (meth)acrylate, and mixtures thereof; from more than 0 to about 15% of component selected from group consisting of dipentaerythritol penta(meth)acrylate, trimethylolpropane tri(meth)acrylate, pentaerythritol tri(meth)acrylate, tri(meth)acrylate of ethoxylated or propoxylated trimethylolpropane, tri(meth)acrylate of ethoxylated or propoxylated glycerol, pentaerythritol tetra(meth)acrylate, bis-trimethylolpropane tetra(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and combinations thereof. Such composition is suited to manufacture eyeglass lenses.

EFFECT: expanded possibilities in manufacture of polymer-based lenses, including multifocal ones.

21 cl, 3 tbl, 18 ex

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