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Evaporator for vacuum application of thin films of metals and semiconductors

Evaporator for vacuum application of thin films of metals and semiconductors
IPC classes for russian patent Evaporator for vacuum application of thin films of metals and semiconductors (RU 2507304):
C23C14/24 - Vacuum evaporation
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FIELD: metallurgy.

SUBSTANCE: evaporator is made from carbon material with a recess for arrangement of sputtered material in the form of a groove located normally to a gravitational field intensity vector and having the type of a trapezoid in its cross section. A trapezoid base that is lower in relation to the gravitational field is lower than an upper one. With that, an insert in the form of a volumetric element from W or Mo or Ta is arranged in the groove.

EFFECT: increasing gravitational stability of molten metal; reducing sputtering; increasing effective wetting surface; improving a directivity pattern and reducing a non-controlled dispersion angle of sputtered materials.

2 cl, 2 dwg

 

The invention relates to the technology of thin films and can be used in vacuum deposition of films of Au, Ag, and an alloy of Au - Ge or Ge.

A device for vacuum evaporation Japan's bid No. 56-116873, heater tileorassi forms made of TiB2 ceramics or BNb or carbon covered with a film of refractory metal of W, Mo, TA using explosion with the purpose of improving the wettability hanging from Au, Ag, Pt.

The disadvantage of this heater is the low life of the film obtained by the method of the explosion, in fact, a single use due to the dissolution of thin films of W, Mo, TA in melts portions of the metals Au, Ag, Pt, and an alloy of Au-Ge, the small effective surface wetting and low gravitational stability of spherical melt of data portions, uncontrolled opening angle of the sputtered material.

The present invention is the reduction of the sub-samples of the metals Au, Ag and an alloy of Au-Ge or Ge, reducing splashing, increasing the gravitational stability of the melt, increasing the effective surface wetting, improved pattern and reducing uncontrolled opening angle of the sprayed materials of Au, Ag and an alloy of Au - Ge or Ge.

This technical result is achieved by the fact that in the evaporator for vacuum deposition of thin films of metals poluprovodnikov of a carbon material (mainly graphite brand GT-1, GOST 17022-81) completed excavation for placement of the sprayed material as grooves located normal vector of the gravitational field strength and has a cross-sectional view of a trapezoid, the bottom, relative to the gravitational field, the base being smaller than the upper, while placed in the groove insert is made in the form of a volume element of W or Mo or TA. The size of the volume element insertion is selected so that the angle of the angle of the sprayed precious metal or semiconductor was less than the angle which is formed uncontrolled heterogeneity thickness of the resulting film. New in this technical solution is the simultaneous limitation of the opening angle of the sputtered material and gravitational stabilization of the melt sample.

The evaporator shown in figure 1, a view in longitudinal and in cross section operates as follows. Before you begin evaporator 1 inside the grooves 2 on the insert from the volumetric element 3, made of refractory materials W or Mo or TA, from top to place a portion 4 of one of the materials of AU or Ag or an alloy of AU - Ge, or Ge, pump out the air to a pressure of 10-5-10-7PA, produce heat up to the temperature of evaporation and melting of the sample, and the sample wets the insert and gravity stabilized within the notches, and then produce a spray.

<> A specific example of the evaporator used to produce thin films AU or Ag from 5 to 20 nm for substrate sizes of 48×60 mm with distance from the evaporator to the substrate 150 mm Evaporator figure 2 shows in longitudinal and in cross section. This vaporizer is made in the form of a cylindrical or rectangular rod 1 with a length of 100 mm of carbon, the recess 2 with a length of 40 mm is formed in the form of grooves, the cross section of which has the form of a trapezoid with a height of 3 mm size 2×3 mm, on the bottom base, the size of which is 2 mm, placed the insert 3 wire W with a diameter of 0.8 mm length 20 mm

1. The evaporator for vacuum deposition of thin films of metals and semiconductors, are made of carbon, characterized in that it is made with a recess to accommodate the spraying material in the form of grooves, located normal to the vector of gravitational field strength and has a cross-sectional view of a trapezoid, the bottom relative to the gravitational field, the base being smaller than the upper, while in the groove placed the insert in the form of a volume element of W, or Mo, or TA.

2. The evaporator according to claim 1, characterized in that it is made in the form of a rod of carbon, while the volume element is a wire from W, or Mo, or TA.

 

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