Method for plasma deposition of polymer coats and installation for its realisation

FIELD: electricity.

SUBSTANCE: treated samples are placed in vacuum chamber. Vacuum chamber is filled with reaction gas, which contains at least one gas-monomer capable of plasma polymerisation. Plasma is generated by means of ignition and maintenance of double-staged glowing discharge in two spatially separated discharge volumes, and polymer coat is deposited onto surface of treated sample. The first discharge volume is separated from the second discharge volume with the help of perforated electrode, size of holes in which exceeds 0.1 mm. Treated sample is installed on electrode, which is placed in the second discharge volume opposite to perforated electrode. To electrode that serves as holder of treated sample, potential of shift is supplied versus perforated electrode. In the first discharge volume there might be various types of gas discharge used: inductive high-frequency discharge, capacitance high-frequency discharge, DC discharge. Discharge may be maintained in pulse form. In process of plasma polymerisation distance is adjusted between perforated electrode and electrode that serves as holder of treated sample.

EFFECT: independent control of polymer coat deposition speed, structure and properties of deposited coat with high efficiency of technological process.

14 cl, 1 dwg

 

The invention relates to a plasma coating on the metal and the dielectric substrate, and more particularly to a technology of plasma polymerization and equipment used for this type of technology.

Currently, there are various methods of plasma polymerization and installation used for carrying out polymerization processes.

In the European application EP 0152256 A2 (IPC G02 1/10 published 21.08.1985) describes how plasma deposition of polymeric coatings on optical products and installation for its implementation. The current task is to create on the surface of optical products (lenses) polymer coating. Damage to the protective coating should prevent stains from oil or grease on the surface of the product. The known method is in the ignition and maintenance of high-frequency discharge in a mixture of oxygen and hydrocarbons, which are preferably used aliphatic hydrocarbons. In the discharge plasma is placed the substrate on which the discharge volume is deposited polymer coating having the desired properties. Installation for implementing the method includes a vacuum chamber with the pumping system gas supply system in a vacuum chamber of a reactive gas, a gas discharge device with two electrodes connected is connected to the source of high frequency voltage, and the holder with the treated sample placed between the discharge electrodes.

In U.S. patent US 4693799 (IPC SS 3/24, published 15.09.1987) disclosed a method of deposition of a polymer coating on the film is transported between the electrodes through the bit amount, which generates plasma using pulsed high-frequency discharge device. Bit volume is filled with a mixture of hydrocarbons or mixture organometallics compounds. Optimal temporal characteristics of the discharge are selected depending on the reaction gas. The obtained coating film has a low coefficient of friction, high durability, high strength, and the film itself with its use does not require additional lubrication. Installation for implementing the method includes a vacuum chamber with means of evacuation and filling of the chamber, the reaction gas. The processed film is transported by the tape drive mechanism between the electrodes, connected to a pulsed high-frequency voltage source.

In another method of plasma deposition (international application WO 91/12092, IPC B05D 3/06, 3/14, 3/00, 3/02, published 22.08.1991) for applying a protective anti-corrosion coatings on steel substrate used low-temperature plasma of gaseous hydrocarbons. The generation of the square is semi through ignition direct-current discharge between the discharge electrodes. Machined steel substrate acts as a cathode in the discharge device. The anodes are installed around the cathode and supplied magnetic system generating protective magnetic field on their surface. As sources of magnetomotive force are used magnetrons. Working gas capable of plasma polymerization, served with inert gas in a vacuum chamber at the stage of preliminary processing of the substrate in the deposition process organosilanols film on the treated substrate.

There is also known a method for plasma deposition of polymeric coatings, including the filling of the discharge chamber, the reaction gas containing at least one capable of plasma polymerization, gas-monomer, ignition and maintenance periodic-pulsed gas discharge with a repeating sequence of pulses (RF Patent No. 2190484, IPC B05D 3/06, published 10.10.2002). In the process of plasma polymerization is deposited polymer coating on the surface of the sample, which move through a bit of volume. In particular, the quality of the processed sample was aluminum foil, which is connected to a pulsed current source and functioned as the anode. Over the aluminium foil was placed Assembly of hollow cathodes. To keep the electrons in the discharge volume at which inalas external magnetic system, which in the cavity of the vacuum chamber was created drop down to the center of the discharge chamber inhomogeneous stationary magnetic field.

Installation for implementing the method for plasma deposition of polymer coatings includes a vacuum chamber with the pumping system gas supply system reaction gas containing acetylene and nitrogen, and a gas discharge device providing the ignition and maintenance periodic-pulsed gas discharge. The discharge electrodes of the devices are connected through the matching system to the source of pulse-periodic high-frequency signals.

In the method of forming the polymer coating, is described in European application EP 0002889 A2 (IPC C08F 2/52 published 11.07.1979), generation of plasma is performed by the ignition of the glow discharge. The metal substrate on which is deposited polymer coating that functions as a passive electrode high-frequency capacitive discharge. Opposite the discharge electrode is connected to the source of high frequency voltage. As the reaction gas monomer in the well-known method used fluorinated hydrocarbon gas.

The closest analogue of the invention is a method for plasma deposition of polymer coatings and installation for its implementation, which are disclosed in international the th application WO 99/27156 (IPC SS 16/44, published 03.06.1999). The method is similar is in the process of plasma polymerization coating, deposited on the metal surface of the processed sample. The deposition process is performed by generating plasma using a gas discharge device, ensure the ignition and maintaining a discharge in the constant current mode and pulse mode.

At the anode set is processed metal sample, pump discharge chamber to a predetermined vacuum level and fed into the reaction chamber a mixture of gases containing unsaturated aliphatic hydrocarbon gas-monomer (acetylene) or fluorine-containing gas-monomer and depolymerizes gas (nitrogen)to achieve a given pressure in the chamber. The partial pressure depolymerizes gas is selected in the range from 50% to 90% of the total pressure of a mixture of gases. The electrodes serves voltage required for ignition of the electric discharge, resulting in a generated plasma with positive and negative ions and radicals of unsaturated aliphatic hydrocarbons and depolymerizes gas. In the process of plasma polymerization on the surface of the anode and the processed sample is formed of a polymeric coating with hydrophilic or hydrophobic properties depending on the choice of the reaction mixture gas is in and discharge parameters. Using high-frequency discharge polymer coating can be applied on a ceramic or polymer samples.

Plant intended for implementing the method for plasma deposition of polymer coatings, contains a vacuum chamber with pumping gas, which includes rotary and diffusion pumps. Vacuum chamber is connected to the supply pipe of acetylene and nitrogen. Discharge device consists of a Central electrode that receives the processed sample, and peripheral grounded electrodes. The Central electrode serves as the anode connected to the positive pole of the power source. Peripheral electrodes serve as cathodes and form a bit of volume.

The known method is similar allows to obtain coatings with high adhesion for subsequent coating and high corrosion resistance. However, the application of polymer coatings in the implementation of the method occurs with insufficient speed. In addition, in the process of coating deposition from a mixture of reactive gases containing acetylene and nitrogen, are formed sufficiently large particulates of dust due to agglomeration of the polymers. Getting on the processed sample, such particulate degrade the quality of the applied coating.

When implementing the above method is in-analogues in the near-cathode regions of the discharge constant current or near-electrode regions of high-frequency discharge is generated fast electrons, providing effective dissociation of the source gas and the formation of radicals of the monomers, of positive and negative ions. In the near-electrode regions initiated the process of combining the monomers in the chain. Formed in the near-electrode regions of the polymer chain monomers, atoms and ions depolymerizes gas is diffused into the volume of plasma that fills the bit period, including in the area of the treated samples.

As a result of experimental studies, it was found that in the process of plasma deposition of polymer coatings on the sample that serves as the anode, the rate of coating deposition is directly proportional to current, current to the sample. Thus, the deposition rate of the coating is directly dependent on the migration of charged particles in the treated sample. While the structure of the deposited coating and properties of polymer coatings depend on the concentration of monomers, located in the discharge volume, and speed of polymerization.

At the same time, it is known that the combustion of the glow discharge, the increase in the discharge current, i.e. an increase in current on the processed sample is accompanied by an increase in the cathode potential drop. In this case, increases concentration and energy of electrons in the near-cathode region of the discharge that causes the growth of the end of the ation of the monomers in the discharge volume and increase the rate of polymerization. Consequently, during the process of plasma polymerization using known methods cannot be used independently adjusting the concentration of the monomers and the polymerization rate in a discharge to control the structure and properties of the deposited coating, and simultaneously to adjust the deposition rate of the polymer coating.

The present invention is based on the technical tasks associated with the implementation of continuous process of plasma deposition of polymer coatings with high speed and enabling independent control of the deposition rate of the polymer coating, and the structure and properties of the coating.

Solving these technical problems can improve the productivity of the production process by independent speed control of coating deposition and properties of deposited polymer coating in accordance with specified requirements.

The achievement of the technical result is ensured in the process of plasma deposition of polymer coatings, which includes the following: the location of the processed sample in a vacuum chamber, filling the vacuum chamber, the reaction gas containing at least one capable of plasma polymerization, gas-monomer, the generation of plasma and the deposition of polymer clay the aqueous coating on the surface of the specimen during plasma polymerization.

Generating plasma according to the present invention, is realized by means of the ignition and maintenance of two-stage glow discharge in two spatially separated bit volumes. The first bit volume is separated from the second bit of volume by means of a perforated electrode, the hole size (cross-sectional holes) which exceeds 0.1 mm the Given minimum size of the holes of the perforated electrode corresponds to the radius of the Debye (Debye radius shielding), calculated for the parameters of the plasma glow discharge generated in the first discharge. The processed sample is mounted on the electrode, which is placed in the second bit of the volume opposite the perforated electrode. Then served on the electrode that serves as a sample holder, a positive or negative bias potential relative to the perforated electrode.

The technical result is achieved due to leakage the following physico-chemical processes and phenomena.

The way in which plasma deposition of polymer coatings with adjustable processing properties, based on the use for the generation of the two-stage plasma glow discharge. In the first stage of discharge is the primary dissociation of the gases entering into the composition of the reaction, see the si, the formation of monomers and polymerization monomers. Using the second stage discharge creates a directional flow of a chemically active particles and polymer chains forming the polymer coating on the surface of the processed sample.

The ignition and maintaining a glow discharge in the first discharge is carried out using a gas discharge device. When the parameters of a gas-discharge device including an electric power supplied to the electrodes, the partial pressure of the components of the reaction gas, the geometry of the electrodes, the size of the interelectrode gap, changes the dissociation rate of the reaction gas, the concentration of monomers and the length of the polymer chains formed in the first discharge. Control of the properties of the polymer coating in the specific process can be performed by changing the voltage applied to the discharge electrodes, and/or by changing the distance between the perforated electrode and the electrode serving as a holder of the processed sample.

The use of perforated electrode separating the first and second bit volumes allows independent control of deposition rate and coating properties. To do this, the size of the holes formed in the perforated electrical wiring in the ode, must be greater than the Debye radius, which is calculated according to the parameters of the plasma generated in the first discharge, and is for the average parameters of the glow discharge of 0.1 mm At a selected distance in a glow discharge plasma is the shielding of the electric field of the charged particles generated in the electrode gap, which allows the chemically active particles (radicals to monomers, electrons and ions) and the primary polymer chains to freely diffuse from the first bit of the second bit amount, which is the processed sample. The formation of polymer coatings on the surface of the processed sample is the result of the interaction of chemically active particles formed in the first discharge surface of the sample in the second bit size.

When changing the potential of the sample mounted on the electrode, changing the flow rate of the particles and, consequently, the deposition rate of the polymer coating. However, the properties of the deposited polymer coating and its structure will be determined by the characteristics of the polymer chains formed in the first discharge, i.e. depending on the processes in the first stage discharge device.

In the first discharge can IP olsavica high-frequency induction discharge. In this case, the concentration of monomers and the primary polymer chains in the first discharge is regulated by changing the amount of power supplied to the plasma through the inductor. The deposition rate of polymer coating independently adjustable by changing the electrode potential, which has processed the sample, relative to the perforated electrode and, accordingly, relative to the plasma glow discharge.

In the first discharge can be ignited and maintained high-frequency capacitive discharge between the discharge electrodes, one of which uses a perforated electrode. Control of the properties of the polymer coating and the deposition rate of the coating in this embodiment of the method is similar.

It is also possible ignition and maintenance in the first discharge glow DC discharge between the discharge electrodes, as one of them use the perforated electrode.

High-frequency discharge or DC discharge can be used in the first discharge in the form of a pulsed discharge. As is known, the transition from the stage of breakdown of the discharge gap to the stationary phase of the development of the discharge concentration of electrons increases in a short period of time on several what about the orders. At the transition stage of discharge, the average energy of the electrons is much higher than the steady state discharge. It is also known that the processes of excitation, ionization and dissociation of molecules depend essentially on the average energy of the electrons, therefore, a short pulse processes in the transitional stages of discharge are more effective in comparison with the stationary phase of the discharge. The increase in the rate of dissociation, in turn, leads to an increase in the concentration of radicals of the monomers in the discharge volume. As a consequence, increases the rate of polymerization.

The duration of the pulse discharge voltage shall not be less than the time required to achieve the maximum rate of formation of radicals of the monomers. The optimal value of the pulse width of the discharge range from 10 μs to 100 MS.

The lifetime of the radicals in the discharge volume after the termination of the power of the discharge is significantly longer than the lifetime of electrons, so the interval between pulses of the discharge must be greater than the time of departure of the electrons on the walls of the chamber but less than the lifetime of the radicals in the discharge volume. Preferably, the interval between pulses of the discharge is selected from 10 µs to 100 MS.

Depending on the composition of the reaction gas and the specified properties of polymer coatings bias potential, p is given to the electrode, an employee of the holder of the processed sample may be either positive or negative polarity. The magnitude of the potential bias is mainly regulated in the range from 50 to 500 C. the speed control plasma deposition of polymer coating on the treated sample can be performed by changing the position of the electrode installed in the second discharge relative to the perforated electrode. In this case, the deposition rate of chemically active particles on the surface of the processed sample depends on the distance between the electrodes, which is regulated in the process of plasma polymerization.

Technical results are achieved when using the installation for plasma deposition of polymer coatings, which includes a vacuum chamber, a gas discharge device, the power supply system of gas-discharge devices, the holder of the processed sample, and a system for pumping gas from the cavity of the vacuum chamber and the delivery system in a vacuum chamber of a reactive gas.

Gas discharge device according to the present invention, is made of two-stage and consists of two spatially separated bit quantities between which it is installed perforated electrode with openings not less than 0.1 mm the Given minimum size hole at back is the second in the perforated electrode is determined by the value of the Debye radius, designed for the characteristics of plasma glow discharge, which is light and support in the first discharge. The second bit of the volume opposite the perforated electrode is an electrode that serves as a holder of the processed sample. Power system discharge device includes a voltage source that is connected to the perforated electrode that serves as a holder of the processed sample.

Glow discharge in the first discharge can be generated using a generator of high-frequency induction discharge. In another embodiment, the first stage discharge device oscillator high-frequency capacitive discharge, includes two discharge electrodes, one of which is perforated electrode. To power a gas-discharge device may be a voltage source, providing the generation of voltage pulses with the aim of ignition and maintenance of the first discharge pulse of high-frequency discharge.

The discharge in the first discharge can be generated by using the generator glow discharge DC, includes two discharge electrodes, one of which uses a perforated electrode. The generator discharge which can be performed in a pulsed mode.

Hereinafter the invention is explained in the description of a specific example of implementation and the accompanying drawing (see figure 1), which shows a diagram of the installation for plasma deposition of polymer coatings.

As an example implementation of the invention describes the method for plasma deposition of polymer coatings and install designed for implementing the method, when used in the first discharge of the generator high-frequency capacitive discharge, operating in pulsed mode.

The installation used in the process of plasma deposition of polymer coatings, part of the plasma-chemical reactor includes a vacuum chamber 1, the system 2 pumping gas, the pipe 3, the supply system reaction gas discharge device and power supply system of gas-discharge devices. Discharge device made of two-stage and consists of two spatially separated bit of volume. In the first discharge is the discharge electrode 4 and the perforated electrode 5 made in the form of steel mesh with an opacity of 90%. In this example of the invention the perforated electrode 5 is at ground potential. The minimum cross-sectional dimension of the holes 6 formed in the perforated electrode 5, is equal to 2 mm, i.e. the value the more positive of the Debye radius, designed for plasma glow discharge and of 0.1 mm Perforated electrode 5 separates the first bit amount from the second bit of the volume located between the back side of the perforated electrode 5 and the electrode 7 is installed on the processed sample 8.

The interelectrode distance in the first discharge between the discharge electrode 4 and the perforated electrode 5 is 12 cm and can be adjusted (before process) in the range from 10 to 15 cm Interelectrode distance in the second discharge between the perforated electrode 5 and the electrode 7 serving as a holder of the processed sample 8 is 3 cm and can be adjusted during processing in the range from 1 to 5 cm due to the application of the mechanism for moving the electrode 7 (not shown).

Power system discharge device includes a source of pulses of high frequency voltage (UN) 9 that is connected to the discharge electrode 4 and the source bias voltage (Ann) 10. This perforated electrode 5 is grounded, and the electrode 7 serving holder of the processed sample 8, is connected to the positive pole of the source of bias voltage 10.

Method for plasma deposition of polymer coatings is carried out using the above installation is key, as follows.

Before the beginning of the process of plasma deposition cavity of the vacuum chamber 1 is pumped through the system 2 pumping gas until the level of residual pressure of ~10-3PA. After that first bit volume was filled through the pipe 3, the supply system of the reaction gas, the reaction gas containing gas-monomer capable of plasma polymerization. As the reaction gas in this example of the invention was used, a mixture of acetylene and nitrogen in equal volume fractions when the total pressure of the mixture gas of 5 PA.

When applying pulses of high-frequency voltage to the discharge electrode 4 with a source of high-frequency voltage 9 between the electrode 4 and the grounded perforated electrode 5 were lit pulsed high-frequency capacitive discharge. Electric power supplied to the bit interval from the source of high frequency voltage was 200 watts. With an interelectrode distance of 12 cm discharge voltage was 1000 C.

The pulse duration of the high-frequency voltage was varied in the range from 10 µs to 100 MS. During this interval of values of pulse duration power glow discharge was maintained in a pulsed mode. Under these conditions reaches a maximum speed of formation of chemically active particles due to sharp is velichenie mean electron energy at the transition stage glow discharge: from breakdown to the steady-state discharge. In the near-electrode areas 11 of the high-frequency discharge generated fast electrons, which carry out efficient dissociation of the reaction gas in the area 12 of the plasma glow discharge. Under the influence of fast electrons generated radicals monomers, positive and negative ions diffusing into the region 12 where there is a Union formed of monomers in the polymer chain.

When applying to the electrode 7, which has processed the sample 8, the positive potential bias value 250 In a relatively grounded perforated electrode 5 occurs the current ~200 mA. Potential bias was applied to the electrode 7, the source bias voltage 10 connected between the electrodes 5 and 7. The magnitude of the potential bias was changed in the control process of the deposition rate in the range from 50 to 500 In using an adjustable voltage source offset 10.

Flowing between the electrodes 5 and 7 current characterizes the transfer of negatively charged particles from the first bit of volume to the sample 8 through the second bit size. While the deposition rate of the polymer coating on the sample 8 is directly proportional to the electric current flowing to the electrode 7.

The transfer of chemically active particles and the resulting polymer chains of the first bit of volume in storoymaterialy volume was carried out through the openings 6, made in the perforated electrode 5. When the size of the holes more than the Debye radius, i.e. more than 0.1 mm for the parameters of the glow discharge in the first discharge negatively charged particles with neutral chemically active particles freely moved from the first bit of the second bit size. Due to the particular choice of the size of the holes 6 were shielding in the region of the holes of the electric field caused by the separation of opposite charges.

Polymer coating on the surface of the processed sample 8 was formed as a result of the interaction of chemically active particles and the primary polymer chains from the surface. The speed of deposition of the polymer coating was carried out by changing the magnitude of the positive potential bias in the range of 50÷500) or by moving the electrode 7 together with the treated sample 8 relative to the perforated electrode 5. Adjusting the position of the electrode 7 was carried out using a controlled mechanism for moving the electrode (not shown) in the range interelectrode distances from 1 to 5, see changing the magnitude of the potential bias from 50 to 500 In the electric current carried to the electrode 7 and sample 8, respectively, was increased from 20 d is 300 mA. Accordingly increased and the deposition rate of the polymer coating on the sample 8.

In the process of deposition of polymer coatings on the sample 8 was made regulation of the structure and properties of deposited coatings regardless of the processes occurring in the second bit of the volume, i.e. regardless of the current speed of the coating deposition. As a result of the research it was found that the structure and physico-chemical properties of the coating formed on the surface of the processed sample 8, depend on the concentration of chemically active particles (monomers which are in the first discharge, and the speed of polymerization.

Thus, by changing the power supplied to the bit period of the first bit of volume you can adjust the properties of the applied coatings. If you increase the DC glow discharge increases the magnitude of the electrode potential drop. Because of this increased concentration of electrons and increases the energy distribution of electrons in the electrode areas 11 glow discharge. The increase in the concentration and energy of the electrons in the first discharge, in turn, directly affects the rate of formation of radicals of the monomers and ions.

In this example of the invention was made independent regulirovanie hydrophilic properties of the polymer coating, deposited on the sample 8, and the deposition rate of the coating. By regulating the discharge current in the first discharge at a fixed deposition rate of the coating in the second discharge on the surface of the sample 8 was applied polymer coating with high hydrophilic properties. Boundary angle polymeric coating does not exceed 20°. At the same time, boundary angle polymeric coating deposited during plasma polymerization in the case of installation of the sample 8 on one of the discharge electrodes (4 or 5) in the first discharge, i.e. using a single-phase gas discharge device, amounted to 83°.

The obtained experimental data indicate the possibility of polymeric coatings with desired structure and set properties at high productivity process for plasma deposition at the expense of independent regulation of the rate of formation of polymers and the deposition rate of the coating.

In the above example embodiment of the invention used a certain type of glow discharge (high-frequency capacitive) and a particular connection to the system power supply to the electrodes of the discharge device, however, this does not preclude the use of other types of discharge. So, for example, to generate a gas discharge in the PE the PTO bit amount can be applied to high-frequency induction discharge or DC discharge. However, possible other embodiments of the invention, providing for the submission to the perforated electrode negative potential bias to organize the flow of positively charged particles on the surface of the sample. The use of such immaterial changes is determined by the specific requirements of chemical composition and properties of the coating. These properties primarily include: hydrophilic or hydrophobic properties, adhesion and sorption properties.

The invention can be used in various technological processes for the deposition of polymeric coatings on the treated surface for various purposes. The method of plasma deposition and plant intended for its implementation, can in particular be applied during deposition of hydrophilic coatings, anticorrosive coatings and adsorbing surfaces.

1. Method for plasma deposition of polymeric coatings, including the location of the processed sample in a vacuum chamber, filling the vacuum chamber, the reaction gas containing at least one capable of plasma polymerization, gas-monomer, the generation of plasma by ignition and maintaining a gas discharge, and precipitation of the polymer pokrytiya the surface of the specimen during plasma polymerization, characterized in that the generation of plasma is realized by means of the ignition and maintenance of two-stage glow discharge in two spatially separated bit volumes, with the first bit volume is separated from the second bit of volume by means of a perforated electrode, the size of the holes which exceeds 0.1 mm, the processed sample is mounted on the electrode that serves as a holder of the processed sample, which is placed in the second bit of the volume opposite the perforated electrode, and serves on the electrode that serves as a holder of the processed sample bias potential relative to the perforated electrode.

2. The method according to claim 1, characterized in that the first discharge ignite and sustain a high-frequency induction discharge.

3. The method according to claim 1, characterized in that the first discharge light and support high-frequency capacitive discharge between the discharge electrodes, as one of them use the perforated electrode.

4. The method according to claim 1, characterized in that the first discharge light and support the DC discharge between the discharge electrodes, as one of them use the perforated electrode.

5. The method according to claim 1, characterized in that the first discharge light and support the imp is sny category.

6. The method according to any one of claims 1 to 5, characterized in that the potential bias adjust in the range from 50 to 500 C.

7. The method according to any one of claims 1 to 5, characterized in that in the process of plasma polymerization regulate the distance between the perforated electrode and the electrode serving as a holder of the processed sample.

8. Installation for plasma deposition of polymer coatings containing a vacuum chamber, a gas discharge device, the power supply system of gas-discharge devices, the holder of the processed sample, and a system for pumping gas from the cavity of the vacuum chamber, the supply system in a vacuum chamber of a reactive gas, wherein the gas discharge device is made of two-stage and consists of two spatially separated bit quantities between which it is installed perforated electrode with openings not less than 0.1 mm, while in the second bit of the volume opposite the perforated electrode placed electrode that serves as a holder of the processed sample, the power supply system of gas-discharge device includes a source of bias voltage, to which connected perforated electrode that serves as a holder of the processed sample.

9. Installation according to claim 8, characterized in that as a first stage discharge device used in the IAOD generator high-frequency induction discharge.

10. Installation according to claim 8, characterized in that as a first stage discharge device used generator high-frequency capacitive discharge, includes two discharge electrodes, one of which is perforated electrode.

11. Installation according to claim 10, characterized in that the generator of high-frequency capacitive discharge is made with the ability to work in a pulsed mode.

12. Installation according to claim 8, characterized in that as a first stage discharge device used generator DC discharge, includes two discharge electrodes, one of which is perforated electrode.

13. Installation according to item 12, characterized in that the generator of the DC discharge is made with the ability to work in a pulsed mode.

14. Installation according to one of claims 7 to 10, characterized in that the electrode that serves as a holder of the processed sample made with the possibility of movement relative to the perforated electrode.



 

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12 cl, 11 dwg

FIELD: nanotechnology.

SUBSTANCE: present invention pertains to semiconductor nanotechnology, in particular, to thin-film material science, and can be used in modern technology, especially the fast growing technology of integral circuits. To deposit thin stoichiometric films of binary CdTe compound, the following technological operations are carried out. Successive processing of the substrate surface is carried out at 210-390°C using vapours of cation- and anion containing reagents-precursors of dimethylcadmium and methallyl telluride mixed with a gas carrier. Intermediate removal of tellurium from the surface of the substrate is carried out, which is in excess after formation of the stoichiometric CdTe compound. Removal is done by treatment with a reagent-precursor, which forms a volatile compound with the tellurium.

EFFECT: obtaining high quality thin stoichiometric films of binary CdTe compound are obtained without geometrical and chemical defects.

4 cl, 9 dwg

FIELD: metallurgy.

SUBSTANCE: invention refers to a SiC plate with an outer diameter of six inches and to a method of its fabrication. To achieve that a polycrystalline SiC is being grown from at least one side of a small diameter plate surface made out of a mono crystalline α-SiC up to a dimension when its outer diameter corresponds to a manipulation device of an existing line for semiconductors fabrication; and than the polycrystalline SiC received out of the mono crystalline SiC on the surface of the plate is ground to achieve the SiC of a bigger diameter with a double structure where the polycrystalline SiC has been grown around the outer periphery of the smaller diameter plate out of the mono crystalline α-SiC.

EFFECT: economise fabrication of a semiconducting device on the base of a SiC an existing line of devices fabrication on the base of SiC is used so as to achieve the possibility to manipulate the plate of a smaller diameter made out of SiC.

5 cl, 4 dwg

FIELD: semiconductor nitride heterostructure growing technology; manufacture of various optical and electronic instruments and devices.

SUBSTANCE: proposed method using molecular-beam epitaxy for growing multilayer semiconductor nitride heterostructure that has substrate with template layer covered with semiconductor layers includes substrate heating, nitridation of substrate surface layer by feeding ammonia flow to substrate surface, formation of template layer by simultaneous supply of aluminum atoms and ammonia flow thereto until desired thickness of template layer is attained, this being followed by growing overlying semiconductor layers by way of molecular-beam epitaxy; substrate is heated to 1100-1200 °C, ammonia and aluminum flows are supplied in proportion of NH3/Al = 100-400.

EFFECT: reduced density of template-layer crystal lattice inherent flaw density, enhanced quality of heterostructure overlying semiconductor layers.

1 cl, 1 dwg

FIELD: metallurgy.

SUBSTANCE: interior electrode for forming shielding film is installed inside plastic container with port and it supplies gaseous medium inside plastic container; it also supplies high frequency power to external electrode located outside plastic container, thus generating plasma of discharge on interior surface of plastic container and creating shielding film on interior surface of plastic container. The interior electrode for forming shielding film consists of a gas supplying tube containing gas propagation path and designed for supply of gas medium and of an insulating element screwed into the end part of the tube so, that it is flushed in it; the insulating element is equipped with a gas outlet communicating with the gas propagation path.

EFFECT: development of electrode for efficient forming of shielding film.

12 cl, 9 dwg

FIELD: metallurgy, crystals.

SUBSTANCE: invention relates to technology of products of polycrystalline diamond, received from the mixture of methane and hydrogen in plasma discharge. It is implemented bottom layer preparation by bite on it of grooves with formation of ground, corresponding configuration of complete product. Grooves are implemented of width, constituting doubled film thickness of complete product and depth, exceeding width. It is grown on bottom layer adamantine film from the mixture of methane and hydrogen in discharge and it is separated from bottom layer in the form of complete product.

EFFECT: simplification of receiving of complete products of polycrystalline diamond.

FIELD: polymer materials.

SUBSTANCE: invention relates to technology of manufacturing conducting polymer films and coatings (layers) for use in electrical engineering, electronics, and optoelectronics. Provided heat-resistant polymer layer contains iodine-doped polymer layer based on 1-amino-9,10-anthraquinone and showing conductivity from 10-2 to 102 Ω-1cm-1. Indicated layer is prepared by polymerization of 1-amino-9,10-anthraquinone vapors at reduced pressure under cathodic direct current discharge at preferred temperature between 150 to 300°C, which ensures required vapor pressure over a period of time preferably 5 to 30 min, sufficient to achieve required layer thickness at any combination of polymerization process parameters. Thus formed layer is doped with iodine vapors. Discharge current intensity ranges from 5 to 100 mA, preferably 15 to 30 mA.

EFFECT: optimized polymer layer preparation parameters.

7 cl, 1 tbl

The invention relates to the field of deposition of carbon by decomposition of gaseous compounds by microwave plasma-discharge and can be used, for example, polycrystalline diamond films (wafers), from which is produced the output window powerful sources of microwave radiation, such as gyrotrons required for additional plasma heating in fusion devices

The invention relates to physics and chemistry of polymers

The invention relates to the technology of production of amorphous silicon films

The invention relates to technologies for films of amorphous silicon and can be used in modern optoelectronics and integrated optics to create thin-film solar cell and transistor matrix large area for liquid crystal displays

The invention relates to the technology of thin film deposition and can be used for the manufacture of templetonia silicon solar cells, photosensitive materials for optical sensors and thin-film transistors with large displays

FIELD: metallurgy.

SUBSTANCE: invention relates to device for plasmochemical sedimentation from vapor phase of winding type for formation of coating layer on film. Film (22) is kept between couple of mobile drums, located at side of outlet and side of inlet of sedimentation section (25) relative to direction of movement of film (22). Then film (22) is forced to move linear into place of sedimentation. Distance between lattice for dispersion (37) and film (22) is kept constant, and quality of layer is homogeneous. Film is heated by means of metallic strip (40), simultaneously moving at reverse side of film. Movable drums are lifted from the position of sedimentation into position of self-cleaning, and film (22) can be separated from lattice for dispersion (37). Self-cleaning can be implemented on the way of sedimentation on film, closing slot of mask (51) by shutter (65) and, thereby, preventing dispersion of cleaning gas.

EFFECT: invention provides receiving of layer's high quality ensured by feeding of reactionary gas evenly to sedimentation area of film, and it is possible to implemented self-cleaning process of sedimentation area on the way of sedimentation on film.

19 cl, 7 dwg

The invention relates to the field of materials for microelectronics
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