Method of obtaining metal nanoparticles on base surface
FIELD: metallurgy industry.
SUBSTANCE: invention refers to field of nanotechnology, to method of creation of metal nanoparticles on surface of base. Method involves preliminary application of metal thin-film coating on base surface and exposure of resultant coating to high-energy ion beam till coating melting and formation of variform nanoparticles of coating material on base surface. In order to create nanoparticles with diametre up to 100 nm, metal thin-film coating with thickness up to 20 nm from material with melting temperature up to 1500°C is applied on base made of inorganic glass or ceramised glass or oxidised silicium and is exposed to 1-3 pulses of nanosecond duration of powerful ion beam (PIB) composed of 70% C+ and 30% H+ with energy 300 KeV and current density 5-50 A/cm2.
EFFECT: formation of nanoparticles of various forms and sizes without change of base electrical properties with reduce of exposure time to 60-180 nanosec.
The invention relates to the field of nanotechnology and can be used to create various substrates of metal nanoparticles. The use of such nanoparticles to create a variety of nanoelectronic devices, catalysts, gas sensors will increase the sensitivity of electronic devices to improve the efficiency of the catalytic and chemical processes.
A method of obtaining nanoparticles (Patent RF №2242532, MPK7 SS 4/00, B01J 2/02, B22F 9/00, publ. 20.12.2004), including the dispersion of the molten material, the supply of the liquid droplets of the material in the plasma is formed in an inert gas at a pressure of 10-1-10-4PA, cooling in an inert gas formed in the above-mentioned plasma liquid nanoparticles before hardening and coating the obtained solid nanoparticles to the media.
The disadvantages of this method are the high energy costs required to obtain molten material having a high melting point, a possible formation of an oxide on the surface of the drops when cooling even in an inert gas and a minor (small) adhesion resulting solid nanoparticles with the media.
A method of obtaining nanoparticles of metals (S.J.Henley, J.D.Carey and S.R.P.Silva. Pulsed-laser-induced nanoscale island formation in thin metal-on-oxide films. Physical Review B, V.72, 2005), which consists in applying a layer is of atalla (Au, Ag, Ni, Mo, Ti) to a thickness of 20 nm on the pre-oxidized silicon wafer with subsequent irradiation of 50 pulses of KRF excimer laser with a duration of 25 NS, and a wavelength of 246 nm, causing the melting of the metal layer and the subsequent formation of nanoparticles with a size of 10-40 nm due to Nesmachniy melt the surface of SiO2.
The disadvantages of this method are the need to use multiple effects of radiation on the specified system for nanoparticles, a strong change of the reflection coefficient of the laser radiation by melting a thin metal layer on the first radiation pulses, a high cooling rate of the melt is related to the transparency of the layer of SiO2for a given wavelength, which limits the structural-phase state of the obtained nanoparticles and their shape, in particular nanoparticles are amorphous state and due to the rapid cooling of the particles do not have time to acquire a spherical shape, which is necessary for application in sensors and catalysts.
Closest to the claimed is a method for the Pt nanoparticles with a size of 10-20 nm on the surface of SiO2(Yingbin Hu, David G. Cahill and Robert S. Averback, Dewetting and nanopattern formation of thin Pt films on SiO2 induced by ion beam irradiation, Journal of Applied Physics, V.89, No. 12, 15 June 2001, P.7777-7783)that includes applying a layer of Pt with a thickness from 3 to 10 nm on the pre is sustained fashion oxidized silicon wafer and the subsequent irradiation of this system is continuous (not pulsed) beam krypton ions with an energy of 800 Kev to a dose of not more than 6×10 15ion/cm2however , a single ion impacts with the specified parameters is not enough to melt all the platinum layer and the formation of nanoparticles, and requires additional heating of the silicon wafer up to 620°C.
The disadvantage of this method is the high heat load on the silicon wafer caused by high energy ions and a long exposure time is continuous beam, required for a set dose of 6×10 ion/cm2when the magnitude of the ion current, equal to 100, and the need for additional heating to 620°C. the High thermal load on the surface layers of silicon, resulting in obtaining of metallic nanoparticles with a melting point above 1000°C, leads to the redistribution of dopant in the silicon substrate and the change in its electrical characteristics and, consequently, deterioration of parameters of electronic devices produced on this substrate. As the authors of the minimum time of exposure to the ion beam in this case is 20 minutes.
The present invention is to provide a method for obtaining nanoparticles of metals on the surface of the substrate by exposing the ion beam on the pre-deposited on a substrate a thin-film metal coating for the formation of nanoparticles of various shapes without reaching the surface the displacement of the substrate to high temperature, leading to change of the electrical properties of the substrate while reducing the time of this impact to 60-180 NS.
This technical result is achieved in that in the method for production of metal nanoparticles on the surface of the substrate, based on the impact on pre-printed on the surface of the metal thin-film coating by ion beam of high energy to the melting temperature of the coating and formation on the surface of the substrate, the nanoparticle coating material of various shapes, for nanoparticles with a diameter up to 100 nm, a metal coating from a material with a melting temperature up to 1500°C with thickness up to 20 nm act 1 to 3 pulses of intense ion beam composition 70% C+and 30% of N+with the energy of 300 Kev nanosecond duration with a current density of 5-50 A/cm2while the substrate using inorganic glass, Sitall or oxidized silicon. For nanoparticles of aluminum with a mean diameter of 95 nm is irradiated film of aluminum with a thickness of 15 nm on the substrate made of inorganic glass by an ion beam with a current density of 30 A/cm2one pulse duration of 60 NS. For nanoparticles of Nickel with a diameter of 84 nm is irradiated film of Nickel with a thickness of 5 nm on the substrate made of the glass-ceramic ion beam with a current density of 10 A/cm2one pulse duration of 60 NS. To get the NAS is particles with a mean diameter of less than 80 nm impinges on the thin-film metal coating 2-3 surge pulses of nanosecond duration.
The sizes of the formed nanoparticles of metals set by the thickness of the thin-film metal coating, the melting point of the coating material, the contact angle of wetting of the molten substrate material and the value of the density of the ion beam current. The angle of incidence of the ion beam is set normal to the sample surface. The authors set a powerful ion beam: a composition of 70% With+and 30% of N+energy 300 Kev, a current density of 5-50 A/cm2one-three pulse irradiation time of 60 NS for the metallic coating thickness up to 20 nm and the melting temperature up to 1500°C for nanoparticles with size up to 100 nm. Moreover, the lower limit of the density of the ion beam current corresponds to the irradiation of materials with the lowest thickness of the coating, and the upper limit of the density of the ion current materials irradiation with the greatest coating thickness (20 nm). At the same time to reduce the average size of the formed nanoparticles using the number of pulses of irradiation is greater than 1. During the repeated irradiation is a partial evaporation of the metal nanoparticles, the reduction of its volume and therefore size. The application of this method provides for the formation of nanoparticles of aluminum on a substrate made of inorganic glass, glass-ceramic with a mean diameter of 95 nm upon irradiation of a film of aluminum with a thickness of 15 nm by a single pulse of high-power IO the aqueous beam with a current density of 30 A/cm 2. The increase in the number of pulses of irradiation up to 2 decreases the average diameter of the nanoparticles of aluminum to 90 nm, while increasing to 3 pulses the average diameter decreases to 86 nm.
The formation of metal nanoparticles on the surface of the substrate is achieved by a fast pulse heating not only the metal film and the underlying layers of the substrate, which ensures the presence of the metallic coating in the molten state 1-2 ISS and the formation of nanoparticles of different shapes. When used for metals decisive factors influencing the size and shape of the resulting nanoparticles are metal melting temperature, the contact angle between the edge of the melt and the substrate, the coefficient of surface tension of the melt, the melting temperature and thermal conductivity of the substrate material and the radiation mode of a powerful ion beam. When the contact angle between the edge of the melt and the substrate lower than 90°, the resulting nanoparticles have discopathy or hemispherical shape, and with a contact angle exceeding 90°, almost spherical in shape.
For deposited on a dielectric substrate made of inorganic glass aluminum thin film coatings with thickness up to 20 nm, having a melting point of 660°C, when exposed to 1 pulse MIP observed melting of the coating at all is azimah irradiation (at the current density of the beam in the range of 5-50 A/cm 2). Shorter (compared to the case with continuous ion impact) the presence of aluminum in the liquid state (1-2 µs) due to the smaller depth of the heated layer leads to the formation on the substrate surface of metal nanoparticles with a size of 95 nm and their conglomerates due to the low adhesion of aluminum to the substrate and poor wetting of the aluminum melt the substrate material (inorganic glass, Sitall, oxidized silicon). At the same time, the impact of the MIP with the specified parameters does not change the electrical properties of the substrate. The increase in the number of pulses of irradiation MIP to 2 leads to a reduction in the average diameter of the formed nanoparticles to 90 nm due to partial evaporation of the material of the nanoparticles. Irradiation of 3 surge pulses reduces the average diameter of the nanoparticles to 86 nm.
For Nickel, having a melting point of 1453°C, a higher ratio of surface tension and a lower value of adhesion to the substrate, there is the formation of nanoparticles with a smaller average diameter (up to 84 nm). While the number of nanoparticles formed on the unit area of the surface of the substrate, is increased in comparison with aluminum.
To implement the proposed method of obtaining particular importance is the choice of thickness of the thin-film metal coating and radiation mode. The most effect is ate for aluminum coating thickness of 15 nm was irradiated powerful ion beam with an ion current density of 30 A/cm 2one impulse; for Nickel coating thickness of 5 nm irradiation MIP with j=10 A/cm2one pulse.
The method of obtaining metal nanoparticles on the surface of the substrate is as follows.
Example 1. On the surface of the substrate from a glass-ceramic ARTICLE-50 under vacuum (5·10-6-1·10-5mm Hg) at a temperature not exceeding 150°C, is applied by the method of thermal evaporation of thin-film coating of aluminum of a thickness of 15 nm. After cooling, the substrate is coated with an aluminum coating is installed in the device located in a vacuum chamber technology accelerator "Temp" and is irradiated with a powerful ion beam directed normal to the sample surface and consisting of 30% H+and 70% With+, with an energy of 300 Kev, the average current density of 30 A/cm2duration 60 NS. When this occurs, the melting of the thin-film coating of aluminum and the formation of nanoparticles of aluminum. The size and shape of the nanoparticles was determined using optical and atomic force microscopy. The average diameter and density of the nanoparticles obtained in a single exposure MIP, was 90 nm and 108cm-2respectively.
When exposed to similar floor 2 surge pulses get the aluminum nanoparticles with an average diameter of 90 nm, and the irradiation of 3 pulses the average diameter of the nanoparticles is meniaetsa to 86 nm.
Example 2. On the surface of the substrate from a glass-ceramic ARTICLE-50 under vacuum (5·10-6-1·10-5mm Hg) at a temperature not exceeding 150°C, is applied by the method of thermal evaporation of thin-film coating of Nickel with a thickness of 5 nm. After cooling the substrate with the coating installed in the device located in a vacuum chamber technology accelerator "Temp", and was irradiated with high-power pulsed ion beam directed normal to the sample surface and consisting of 30% H+and 70% With+, with an energy of 300 Kev, a current density of 10 A/cm2duration 60 NS. When this occurs, the melting of the thin film coatings of Nickel and the formation of nanoparticles of Nickel. The size and shape of the nanoparticles was determined using optical and atomic force microscopy. The average diameter and density of the nanoparticles obtained in a single exposure MIP, was 84 nm and 3.5·109cm-2respectively.
When exposed to similar floor 2 surge pulses get the Nickel nanoparticles with an average diameter of up to 81 nm.
Thus, the inventive method provides for the formation of metal nanoparticles on the surface of the substrate using high-power pulsed ion beam of nanosecond duration, resulting in a reduction in heat and preservation of the properties of the substrate that is set for the manufacture of high-precision electronic devices.
1. A method for production of metal nanoparticles on the surface of the substrate, including the impact on pre-deposited on the surface of the substrate metal thin-film coating by ion beam of high energy to the melting temperature of the coating and formation on the surface of the substrate, the nanoparticle coating material of various shapes, characterized in that for nanoparticles with a diameter up to 100 nm, a metal coating from a material with a melting temperature up to 1500°C with thickness up to 20 nm effect 1-3 pulses of nanosecond duration with a powerful ion beam composition 70% C+and 30% of N+with the energy of 300 Kev with a current density of 5-50 A/cm2while the substrate using inorganic glass, Sitall or oxidized silicon.
2. The method according to claim 1, characterized in that for obtaining the aluminum nanoparticles with a mean diameter of 95 nm is irradiated film of aluminum with a thickness of 15 nm, deposited on a substrate made of inorganic glass, one pulse of high-power ion beam with a current density of 30 A/cm2and a duration of 60 NS.
3. The method according to claim 1, characterized in that to obtain the Nickel nanoparticles with an average diameter of up to 84 nm is irradiated film of Nickel with a thickness of 5 nm deposited on a substrate made of a glass-ceramic, one pulse of high-power ion beam with a current density of 10 A/cm2and a duration of 60 NS.
4. The method according to claim 1, the tives such as those that for nanoparticles with an average diameter of less than 80 nm impinges on the thin-film metal coating 2-3 pulses MIL nanosecond duration.
SUBSTANCE: invention concerns methods of antiwear multiple plating and can be used in machine building, motor-car, mining and petroleum industry. Method includes vacuum-plasma coating TiZr and (Ti,Zr)N. The first is applied microlayer TiZr, then it is implemented thermomechanical activation of layers surface by means if its ionic bombardment, after what it is coated layer on the basis of titanium and zirconium nitride (Ti,Zr)N. Deposition of layers TiZr, (Ti,Zr)N and ionic bombardment are repeated at least three times, at that the last is coated layer (Ti,Zr)N. Ionic bombardment is implemented by means of titanium and zirconium ions with power 0.8-1.0 keV at temperature 450-500°C. Coating of plating layers is implemented by means of evaporation of two titanic and one zirconium cathode.
EFFECT: increasing of endurance and thermodynamic stability of materials.
2 cl, 1 tbl, 1 ex
FIELD: technological processes.
SUBSTANCE: method includes forming of permeable skeleton structure from contacting fibres and their integration into entity using thermal processing up to diffusive penetration. After that, working element is coated with layer of aluminium 5÷12 μm thick using magnetron sputtering in vacuum by flat magnetron with disbalanced magnetic field. At least 95% aluminium is used as a target. Before coating, the surface of working element is activated using ionic source. After the coating, the working element undergoes homogenising annealing, until aluminium penetrates into the surface of working element on at least 1.5 μm.
EFFECT: burner's working element lifetime significantly increases.
FIELD: technological processes.
SUBSTANCE: invention is related to methods of quasi-crystalline materials, particularly films of Al-Pd-Re, Al-Fe-Cu composition that might be used due to their unique qualities in bearings, applied as protective coatings in different fields of machine building, aircraft industry and reactor building. Layerwise application of materials is carried out by method of cathode spraying in Penning cell. Number of sections and materials of cell cathodes are selected in accordance with composition of quasi-crystalline film. Then protective coating AI2O3 is applied and vacuum annealing is carried out. Total thickness of quasi-crystalline film is formed at the account of thickness change and total quantity of applied layers. As materials that are applied together with aluminium, materials from the following groups are selected: Cu, Fe, Cr, Co, V, Ni, Ti, Mn, Pd, Ru, Re, Rh, Tr, Mn, Mo, Os, Si, Mg, Li.
EFFECT: preparation of quasi-crystalline films of stable composition, which possess high technological properties - electric conductivity, heat conductivity and solidity.
3 cl, 3 dwg, 4 ex
SUBSTANCE: device comprises at least one operation zone that can be evacuated and through which a cloth passes during treatment. The module for continuous cutting the cloth is mounted directly in the operation zone. The cloth can be cut completely or partially before its winding so that the individual strips of the cloth can be fed to different drums without any contact with the ambient.
EFFECT: expanded functional capabilities.
15 cl, 3 dwg
FIELD: production of superconductors; synthesis of superconducting inter-metallic joint in films, niobium stannite NB3Sn for example; electrical and radio industries.
SUBSTANCE: proposed method is used in forming multi-level superconducting scheme inside film non-superconducting coat. Proposed method includes joint ion-plasma spraying of targets of initial metals at deposition of film non-superconducting coat from solid solution of metals on substrate. Film coat thus obtained is acted on by flow of ionized particles relative to one another at rate and energy sufficient for initiating reaction of inter-metallization and dissipation at preset depth from surface of coat for forming multi-level superconducting scheme inside film non-superconducting coat. Change in depth of levels and connection of sections of levels of different depth is effected through change of energy of flow and depth of dissipation from larger magnitudes to lesser ones.
EFFECT: enhanced efficiency.
FIELD: modification of surfaces of friction parts working in aggressive media under fretting corrosion conditions.
SUBSTANCE: proposed method includes treatment with charged particle beams for forming gradient structure from hard nitrides, carbides and softer oxides; treatment with beams of charged particles is carried out by beams of gas-and-metal composition containing ions of transition metals and active or inert gases; then, alkali-free chemical oxidation or passivation and treatment with beams of charged particle is performed; gas-and-metal composition contains ions of elements possessing high tendency to passivation.
EFFECT: enhanced efficiency.
2 cl, 1 dwg, 2 ex
FIELD: methods of deposition of protective coatings.
SUBSTANCE: the invention is pertaining to the methods of deposition of protective coatings applied to details of power and transport turbines and, in particular, of gas turbines of aircraft engines. The offered method provides for deposition on the metallic details of the complex protective coating consisting of a set of microlayers. The microlayers consist of intermetallic compounds (IMC), multicomponent condensation alloys (MCCA), oxides (O) and the transient microlayers (TM)of the implanted atoms. The method includes the following operations: cleaning of a detail surface; modification of the detail surface; deposition of the condensation coating of a multicomponent alloy; formation of the transient microlayers by ion implantation; deposition of the intermetallic layers by the method of a diffusion metallization or a ionic-plasma spraying and an annealing; formation of the transition layers by ion stirring action; deposition of the oxide layers by a controlled annealing, a slip method or by electron-beam spraying; modification of the coating outer surface by implantation; an additional treatment of the coating. The technical result of the invention is production of protective coatings with a set of improved characteristics, and also an essential increase of the service life of components of machines.
EFFECT: the invention ensures improved characteristics of protective coatings and an essential increase of the service life of components of machines.
15 cl, 2 dwg, 1 tbl, 12 ex
FIELD: methods of production of antiemission coatings.
SUBSTANCE: the offered invention is pertaining to formation of coatings and may be used for production of antiemission coating on grids of powerful oscillating tubes. The offered method includes formation of a layer of the tube grid material carbide, application of a layer of zirconium carbide from a metallic plasma of the vacuum-arc discharge at the temperature of the grid above 300°C, formation of shaping of a surface layer of platinum and an annealing. The technical result of the invention is development of a method of production of the intermetallic antiemission coatingPt3Zr having improved operational features.
EFFECT: the invention ensures production of the intermetallic antiemission coating with improved operational features.
1 tbl, 4 dwg
FIELD: metallurgy; aircraft industry; power machine-building industry; methods of treatment of articles with an equiaxial structure made out of heat-resistant alloy.
SUBSTANCE: the invention is pertaining to the field of metallurgy, in particular, to a method of treatment of an article with an equiaxial structure made out of heat-resistant alloy, that may find application in the aircraft industry and power machine-building industry at production of component parts of a hot tract of gas-turbine engines. Apply a coating out of heat-resistant nickel alloy for a monocrystalline casting onto an article with an equiaxial structure made out of a heat-resistant nickel alloy. Then conduct hardening by the first vacuum thermal treatment of the article with production of a coating within the range of temperatures from the annealing temperature up to the temperature of dissolution of the hardening γ - phase of the heat-resistant alloy. After that the surface of the article with the applied coating is exposed to the plastic deformation. Then carry out the second vacuum thermal treatment of the article with the received coating within the range of temperatures from the annealing temperature up to the temperature of dissolution of the hardening γ-phase of the heat-resistant alloy of the article. The technical result consists in extension of the service life of the turbines working vanes made out of the heat-resistant alloys not-containing the rare and expensive alloying elements, in decreased labor input, power consumption and overall cost of production of the gas-turbine engines.
EFFECT: the invention ensures extension of the service life of the turbines working vanes made out of the heat-resistant alloys, decreased labor input, power consumption and overall cost of production of the gas-turbine engines.
3 cl, 1 ex, 1 tbl
FIELD: mechanical engineering.
SUBSTANCE: method comprises applying a protective covering on the metallic surface, modifying the layer of metal bulk in the vicinity of the covering to a depth of at least 0.2 mm, and making the interface sublayer between the modified layer and covering, which contains both the modified structure and agent for protecting covering.
EFFECT: enhanced corrosion resistance.
FIELD: metallurgy industry.
SUBSTANCE: invention refers to mechanical engineering and may be used in aircraft engine manufacturing and energy turbine manufacturing. Implantation of ions of one of the following chemical elements Cr, Y, Yb, C, B, Zr, N or their combination is performed with further application of multilayer coating with alternate layers (Ti-TiN-Ti-TiAIN) or (Zr-ZrN-Ti-TiAIN) or (Cr-CrN-Ti-TiAIN) or (Zr-ZrN-TiAlN) or (Zr-TiAlN-Ti-ZrN) in vacuum, at that number of layers is 12-1560. In particular cases of invention performance thickness of coating layer is from 10 nm to 2 mcm at general thickness of coating from 5 mcm to 30 mcm. After application of each layer of metal or coating, ion implantation is performed. Application of each layer of coating is performed simultaneously with ion implantation by alloying ions N, Cr, Y, Yb, C, B, Zr. Ion implantation is performed at ions energy 300-1000 eV and ions implantation dose 1010 to 5·1020 ion/cm2.
EFFECT: improvement of coating resistance to salt corrosion, dust and drop-impact corrosion with simultaneous improvement of endurance, cyclical strength and decrease of labor intensity during implementation.
8 cl, 4 tbl, 1 ex
SUBSTANCE: invention relates to a device for implantation of nitrogen ions into a component (5) made from aluminium alloy and a method of treating aluminium alloy. The device has an ion source (6), which supplies nitrogen ions which are accelerated by extraction voltage, and first apparatus (7-11) for regulating the initial beam of ions (fl'), emitted by said source (6), with formation of an implanting beam (fl). The source (6) is based on electron cyclotron resonance, which produces the initial beam (fl') of polyenergetic ions, which are implanted into component (5) at temperature below 120°C. Implantation of these polyenergetic ions of the implanting beam (fl), regulated using said control apparatus (7-11), takes place simultaneously at a depth which is regulated by extraction voltage of the source. Invention allows for improving mechanical properties of the component.
EFFECT: invention can be used in plastic treatment during mould construction from aluminium alloy.
16 cl, 3 dwg
SUBSTANCE: invention relates to vacuum ion-plasma technology, used for modification of products' surfaces and can be used in machines-, instrument making and other fields. For substratum it is implemented plasma application in vacuum of nanostructured film coating at temperature, less than 0.3Tf of substratum material. Application of coating laser is implemented at switching on of one or several plasma source up to thickness L, corresponding L < Rc + ΔRc, where Rc - mean depth of space power distribution, extracted at elastic events of atoms in coating, nm, ΔRc - 0.5 of lateral dimension of impact series of atoms in coating, nm, irradiation of coating layer by high-energy ions beam of implanter up to radiation dose φ > δ2/k·(FD)ef, 1/nm2, where: δ - thickness of mixed substratum layer and applied coating, equal to 1nm, (FD)ef, = (FDc+FDs)/2, FDc -energy, extracted at elastic event of atoms in layer, FDs - energy, extracted at elastic event of atoms in substratum , k=0.6·10-4 nm5eV-1, and following plasma spraying of layers up to receiving of coating of required thickness. At application of multiple coating specified procedures are implemented in one vacuum volume, and substratum is repeatedly moved from plasma source to implanter. Plasma spraying of coating layer can be implemented at switching on of one or several plasma source of coating layer with simultaneous and persistent irradiation by high-energy ion beams of implanter. There are applied nanostructured coatings with high adhesion for one working chamber charging, that exceeds productivity of process.
EFFECT: development of effective application method of nanostructured film coatings.
3 cl, 5 ex
FIELD: process engineering.
SUBSTANCE: part surface is preliminary prepared, part and current conducting material are placed in zone of machining to be, then pumped out. Now negative potential is fed to the part and, independently, to current conducting material. Then vacuum arc on current conducting material is excited to produce plasma. The part surface is subjected to bombardment, cleaning and heating by ions of current conducting material, and the latter is accumulates on the part surface. Note here that accumulation of the said material is carried out in presence of reactive gas comprising inert gas and at least one element from the group consisting of carbon, nitrogen and oxygen. First, a layer representing a composite material is formed containing carbides and, then a layer representing a composite material containing metal nitrides and/or oxides.
EFFECT: longer life and stability.
2 cl, 1 tbl, 4 ex
SUBSTANCE: invention refers to electric apparatus building and to systems of electric power supply, particularly to methods of application of coating on interrupting aluminium contacts of electric commutating devices. The method consists in ion-plasma sputtering of chromium copper on a treated contact at reference voltage on it of 90-120 V and at multiple changes of voltage during sputtering up to 1000-1200 V and back to a reference one and at frequency 1-2 times per each micrometer of sputtered coating thickness. At voltage 1000-1200 V duration of sputtering is 0.2-0.4 from time of coating sputtering of a micron thickness. Chromium copper alloyed with yttrium at amount of 0.2-0.6 wt % is used for sputtering.
EFFECT: increased operation life of aluminium current conducting parts of electric commutating devices.
1 dwg, 2 tbl, 1 ex
SUBSTANCE: invention relates to surface treatment of metals, particularly it relates to facilities for treatment of details in non-self-maintained glow discharge and can be used in mechanical engineering, automobile and armature engineering. Facility contains vacuum chamber, padding for location of details, power supply, connected to negative contact with padding, by positive - with chamber's body, thermoemission electrode, the second power supply, connected to negative contact with thermoemission electrode, by positive - with chamber's body. Facility also contains additional cored cylindrical electrode and additional regulated direct voltage source. Internal diametre of additional electrode increases geometry of treated detail and provides angle of sight of ion flux on the surface of treated detail from zero up to critical. Herewith additional electrode is co-axial located between thermoemission electrode and treated detail. Additional regulated direct voltage source by negative contact is connected to padding, and by positive - with additional electrode.
EFFECT: increasing of details' endurance limit and power inputs decreasing.
FIELD: technological processes.
SUBSTANCE: invention is related to method for manufacture of tubular target and may find application in manufacture of flat LC-display screens according to thin-film technology. Tubular target consists of tube made of molybdenum or molybdenum alloy with oxygen content of less than 50 mg/g, density of more than 99% from theoretical density and average size of grain across axial direction of less than 100 mcm and bearing tube made of non-magnetic material. Metal powder is produced from Mo or Mo alloy with average size of particles by Fisher from 0.5 to 10 mcm. Powder is used to fill elastic die mold with application of rod. Cold isostatic pressing is carried out at pressure of 100 MPa<P<500 MPa to produce green compact in the form of tube blank. Then green compact is baked at the temperature of 1600°C<T<2500°C in restorative atmosphere or vacuum. Extrusion is done in holder with heating of tube blank up to moulding temperature of DBTT<T<(Ts minus 800°C), where DBTT is ductile to brittle transition temperature, Ts is melt temperature, with tube production, tube is connected to bearing tube, and mechanical treatment is carried out.
EFFECT: tubular target is produced, which uniformly erodes in process of ion dispersion, has no trend for local increase of dispersion rate and does not result in any contamination of substrate or deposited layer.
51 cl, 1 ex
SUBSTANCE: invention concerns formation techniques of ultrahard alloyed carbonic coating on silicon in vacuum and can be used in devices of micromechanics and in the capacity of coatings for details of infrared optics. Method includes ionisation of alloying element, in the capacity of which it is used nitrogen, and carbon from which cathode is manufactured, by means of vacuum-arc discharge in evacuated vessel and further deposition of carbon ions and alloying element on silicon substrate. For carbon and alloying element ionisation it is used pulsed vacuum-arc discharge. At that at first on substrate there are deposed carbon ions, and then carbon and alloying element ions. Substrate temperature is supported not higher than 373°K. Carbon ions are hastened till the energy 40-100 eV. Alloying element - nitrogen is introduced into evacuated vessel till the pressure in the range 0.001-0.15 Pa. Substrate temperature not higher than 373°K is supported by means of vacuum-arc discharge pulse repetition rate choosing.
EFFECT: increasing of endurance, microhardness, fracture strength of silicon with coating.
3 cl, 3 ex
FIELD: metallurgy, processes.
SUBSTANCE: method includes removal of contaminations from surface of product and its ungreasing, location in the area of product treatment and conductive, creating of vacuum in treatment area, feeding of negative potential to the product and separately to the conductive, actuation on conductive of vacuum arc, burning in vapors of this material with plasma formation, impingement, cleaning and heating of product surface by ions of conductive, collection and diffusion of conductive ions at negative potential in the range 0-500 V. Collection and diffusion of conductive ions is implemented by two stages. At the first stage it is implemented diffusion process and collection of ions with receiving of modified layer based on elements of product material and conductive or diffusion layer with external interlayer made of conductive. After it into area of treatment it is fed reacting gas and implemented the second stage of process with collection and diffusion of ions in medium of reacting gas. At that time of the first and the second stage are chosen from ratio 1:(2-7) and during the second stage, at least, one time it is aborted feeding of reacting gas for time which is equal to 0.02-0.12 from duration of the second stage.
EFFECT: increasing of metallic products erosion resistance at holding of its high fire resistance and endurance against salt corrosion.
5 cl, 13 ex, 1 tbl
FIELD: metallurgy, coating.
SUBSTANCE: method includes actuation gas feed into evacuated vessel, pulsed lasing of plasma stream and high-energy ion beam and its alternate action to support in distance. Discrete plasma stream is created by means of firing of high-current high-voltage diffusive discharge which is formed by means of passing through stationary plasma of magnetron discharge of current pulse duration 10-6...1 s, density 0.3-100 A/sm2 and repetition rate till 103 Hz. Specified distance is chosen more than time of plasma recombination of high-current high-voltage diffusive discharge in volume of evacuated capsule. Effect to support by pulsed beam of high-energy ions is implemented with energy which is not more than 106 eV and with repetition rate till 103 Hz. At that it is implemented rejection of high-voltage fault of accelerating gaps from secondary electrons of actuation gas and plasma electrons.
EFFECT: providing of high velocity of coating, ability to effect on coating features and increased adherence of coating to support.
6 cl, 3 dwg, 2 ex
SUBSTANCE: method of producing heat-resistant material for protective coating involves dissolving a polymeric binder in a solevent, where the binder is in form of poly(o-hydroxyamide), which is a product of polycondensation of dichloride of isophthalic acid with 3,3'-dihydroxy-4,4'-diaminodiphenylmethane in a solvent in molar ratio of reagents ranging from 1:1:7 to 1.05:1:15, and mixing with carbon nanofibres or carbon nanoclusters, obtained through hydrolysis of methane on a Ni/MgO catalyst with length of fibres from 50 to 100 mcm and diametre from 20 to 60 nm until obtaining a homogeneous composition.
EFFECT: obtained finished material is heat-resistant, is highly adhesive and has protective properties when deposited on surfaces of varying chemical nature.
3 cl, 5 ex