Method and device for washing and drying flat glass substrates

FIELD: electronic engineering; group treatment of flat glass substrates.

SUBSTANCE: proposed method for washing and drying flat glass substrates includes following operations: substrate held in magazine is placed in washing bath filled with deionized water, washed out, and then slowly taken out of magazine; while substrates are being taken out of water, they are washed and dried out in nitrogen and organic solvent vapors; upon such treatment substrates are secured in extreme upper position, whereupon magazine is moved up, washed, and dried in the same way as substrates; treated substrates are placed in extreme upper position into magazine and the latter is then removed together with substrates from drying chamber. Device implementing proposed method is also given in invention specification.

EFFECT: enhanced quality of substrate treatment; ability of process automation in flexible production line; simplified design.

2 cl 5 dwg

 

The invention relates to techniques for batch processing of flat glass substrates and can be used in the manufacture of electronic devices, in particular in the washing and drying of glass substrates for liquid crystal displays (also have), semiconductor wafers and photomasks using the "Marangoni effect"

Well-known device for cleaning and drying wafers [1-2], which contains a working tub with a lid, placed in it a nozzle connected with the mains supply of washing liquid and a drying agent, a centrifuge. The fluid flow is directed along the plane of the plates installed in the cartridge, and washed the plate with two sides. Loading products into the working chamber is carried out manually.

The disadvantages of the known devices is that they do not provide high-quality washing peripheral areas, and do not allow to automate the reloading of cartridges with products that limit the operational capabilities of the devices, it is not possible to apply them in a flexible automated production.

In addition, traditional methods of processing wafers [3-4], for example, after surgery, chemical-mechanical planarization, comprising operations centrifugation, washing and drying, do not provide the desired quality of processing due to the fact that after the first operations on the surface of the square is Steen remain the suspension particles in the form of water signs which will cause defects that are invalid in the manufacture of microelectronic devices. As the sizes of the elements of the devices are reduced, these defects can become destructive.

Known installation of washing and drying [5], designed for batch processing of thin plates used, for example, in microelectronics. Plates strengthen the grid of the medium on the rotating element and washed with water by the method of comminution. Then produce drying them when rotating at high speed simultaneously with continuous purging with dry nitrogen. Spray nozzles are located above the plates in order to apply the wash liquid on their surface during rotation. Include a change of the rotating elements of different sizes, adapted to the different sizes of grids.

A disadvantage of the known device is that the surface of the processed wafers remain water marks, which is the reason for marriage in the further manufacture of the devices.

In addition, the device provides dual overload of processed products from cartridge net media, as previous and subsequent operations on substrates produced in the cassettes. It is not possible to use the known method and device in a flexible automated production.

From the most famous is closest to the technical essence is a method and apparatus for rinsing and drying semiconductor wafers [6].

The method is that the substrate set in a cassette, load a tub of the washing associated with the line of feed and discharge of deionized water, and washed them. When this water is supplied into the tub of the washing from the bottom and overflows from the upper part of the tub of the washing, forming a stream from above. The substrate is washed by immersing them in the thread above with a mechanism for maintaining the cartridge. After washing the cartridge with the substrate is removed from the water-removal mechanism. At this time of the substrate in place out of the water washed with a solution of water and vapor of organic solvent, which reduces the surface tension of the solution and due to this the surface of the substrate are cleaned with water and small particles. As a result, the surface of the substrate quickly without heating dried.

The processed wafer is unloaded through the cover into the drying chamber by means of removal of the cassette.

The disadvantages of the known method and device for its implementation are the low efficiency of the washing and drying process, due to the fact that the washing and drying of the plates is carried out together with the cassette, and in places of contact carrier (cassette) with a processed wafer accumulated water droplets, which in the drying process are not removed. The presence of these water droplets, as in all other devices affects the education defecto the subsequent processing operations of the plates, that reduces the reliability of the items, given the declining trend of the order of 0.35 μm.

In addition, the device requires additional mechanisms: mechanism of the cassette tape is loaded, the retention mechanism cassettes in the tub of the washing mechanism removed from the bath, mechanism unload from the drying chamber. Moreover, this discharge is accomplished by lifting the tape up through the cover of the camera. Then it is transported to the subsequent operation is already using other vehicles.

On the one hand, complicates the device and, on the other hand, does not provide the ease of unloading and does not allow to use this design in a flexible automated production, for example, in the manufacture of liquid crystal displays (also have), which provides a single process cartridge and unified mechanisms for loading and unloading the processed substrate, and integrated transport system between the individual modules.

The use of a single mechanism, the cartridge is loaded into the processing chamber and removing it reduces the quality of the wafer handling due to possible insertion pollution mechanism of the cartridge is loaded into the processing chamber and remove blank cartridges.

The technical result of the invention is to improve the quality of processed substrates, and the ability to use egov flexible automated production, simplifying the design. This technical result is achieved in that in the method of washing and drying flat glass substrates, namely, that of the substrate set in a cassette, load a tub washing with deionized water, washed them, and then slowly raise them out of the water in the drying chamber and dried in nitrogen vapor and organic solvent, for example isopropyl alcohol, first carry out group vertical movement of the substrate from the cassette, and in the process of exit of the substrate from the water washed and dried in nitrogen vapor and organic solvent, and recording the processed substrate in the highest position, then move up the cassette, washed, dried it similarly to the substrates and processed substrates are loaded into the highest position in the cartridge, which then together with the substrate unloaded from the drying chamber.

Device for cleaning and drying flat glass substrates containing a bath of cleaning substrates associated with the line of feed and discharge of deionized water, drying chamber, connected with the supply line to the vapor mixture of nitrogen and organic solvent, the cover tape to the substrate, the vertical movement mechanism of the cassette is further provided with a platform for cassettes mounted on the mechanism for vertical movement of her follower substrates and rigidly attached to the upper part of the mechanism for vertical movement of the follower is installed in a through hole of the platform, the dimensions of the pusher choose less than the internal dimensions of the length and width of the cassette, and the mechanisms of vertical travel of the platform and pusher installed in corrugated tubes, in addition, the drying chamber is made with the possibility of rotation around the axis of the hinge and provided with a holder made with grooves similar to and aligned with the grooves of the cassette, with the possibility of vertical movement of the actuator and provided with two tabs that interact with the end face of the cassette in their extreme upper and lower positions.

Separate vertical movement of the substrate using the plunger and the cartridge through the mechanism of vertical movement of the cassette provides a hillshade peripheral areas of the substrate, prevents the accumulation of water in places of contact of the substrate with the tape. And execution of the pusherprovides minimal point contact of the substrate and of the pusher. It provides high-quality washing and drying of the substrate. The dimensions of the pusher is chosen so that it is freely held in the cartridge during its vertical movement.

Fixation of the processed substrates in the extreme upper position by means of the holder allow you to plug the em automatically reload them into the blank cartridge when climbing up to the upper end position.

And "the drying chamber made with the possibility of rotation around the axis of the hinge" performs the function of the cover, while providing the possibility of transporting the cassettes with the wafers to the next operation, excluding the operation of lifting and unloading of the drying chamber with additional mechanisms of loading and unloading, manipulators and other

In addition, when the camera is open at the top position on the platform set the following cassette for processing substrates. But through the mechanism of vertical movement of the cassette is first lowered into the bath mounted on the platform of the cartridge, and then after a time delay mechanism vertical movement of the substrate pusher with the substrate. This eliminates damage to the plates when the failure of one or both actuators mechanisms of vertical movement of the cassette and wafers.

The characteristic mechanisms of vertical travel of the tape and substrate installed in the corrugated pipe is also focused on improving the quality of treatment, because it removes the pollution of the working volume in their vertical movement in it.

Thus, those in the formula of the features of the invention are new, obviously not derived from the task, and all aimed at the achievement of the technical result is to increase the quality of processed substrates and the ability to provide a flexible automated process, simplifying the design. Therefore, the proposed set of attributes corresponds to the patentability criteria of "novelty", "inventive step", "industrial applicability".

The invention is illustrated by drawings, which schematically: figure 1 - General view of the device of the washing and drying flat glass substrates; figure 2 - device cleaning and drying, side view; figure 3 - position of the substrate in the grooves of the cassette; 4 - device with the processed wafers (extreme top position) and the lid open; figure 5 - pusher group vertical movement of the substrate.

The proposed device cleaning and drying flat glass substrates (1, 2, 4) consists of the following main elements: media (cassette) 1 flat glass substrates 2, 3 vertical movement of substrates and mechanism 4 vertical movement of the cartridge, the plunger 5 to move the substrate 2 madeplatform 6 to move the cassette 4, 7 baths for deionized water, camera 8 for nitrogen gas and a vapor of isopropyl alcohol container 9 to obtain a mixture of nitrogen gas and a vapor of an organic solvent (isopropyl alcohol), the holder 10 for glass substrates as they move upward, the movable rod 11 to move from the rear side is I 10, the pneumatic cylinder 12 for opening and closing the camera 8, the tabs 13 for holding the holder 10 in the extreme positions, the dual cylinder 14 to move the latches 13, corrugated pipes (bellows) 15 for sealing the junction of the mechanisms of vertical travel of 3.4 with a bath 7. The extreme lower position of the platform 6, the pusher 5, the cassette 1 with glass substrates are shown in Fig 1, position I and position II shows the glass substrate and the plunger 5 in the upper end position when the substrate underwent the process of cleaning and drying.

The operation of the device is as follows.

The cartridge 1 with glass substrates mounted on a movable platform 6, which together with the plunger 5 of the substrate is in the upper end position and the camera is open (Fig 4). Then the camera 8 by means of pneumatic cylinders 12 and hinge 16 is closed and the actuator 4 and the pinion 17 starts moving down the platform 6 from the cassette 1. 4÷6 seconds (time delay adjustable) from the actuator 3 and the pinion 18 starts moving down the plunger 5 with the substrate 2. Separate the lowering of the cartridge and pusher with substrates eliminates damage to the substrate when the failure of one or both actuators mechanisms of vertical movement of the cassette and wafers.

For the period of time from the start of movement of the cassette to the beginning of the movement of the pusher 5 (4÷ 6 seconds) of the glass substrate 2 are located in the slots of the cassette 1 is not less than half its height. In such position relative to each other, the cartridge and the substrate continues to move vertically downward. In the lower extreme position comes first cassette 1, then the substrate 2 (figure 1, position I). During handling of the cassette and wafers down open valves 19, 20 and by passing nitrogen gas through the barbaterom 21 organic solvent, such as isopropyl alcohol 22, rapidly evaporates, mixes with nitrogen and through the valve 20 is supplied into the chamber 8.

Deionized water is supplied into the tub 7 from below through the pipeline 23 and shimmers in the upper part of the tub into the drain pipe 24. From the lower end position, first there is a vertical movement upward of the substrate. Since the dimensions of the pusher (Fig 1) is less than the internal dimensions of the length and width of the cassette, it rises freely together with the wafers inside the cassette.

At the exit of the substrate from the surface of deionized water vapors of an organic solvent, such as isopropyl alcohol, in accordance with the Marangoni effect [1, 6] adsorbed on the tip of the meniscus (figure 2 shows for one plate), where the vapours of the organic solvent reduces the surface tension and the resulting mixture of isopropyl alcohol and water in the meniscus moves from area G (high concentration of isopropyl alcohol and low surface tension) to D (low concentration of isopropyl alcohol and high surface tension). The gradient of the surface tension as a result of this effect removes water and small particles of dirt from the surfaces of the substrates as they come out of the deionized water in the tub.

As you move up the substrate is cleaned and dried part is fixed in the grooves of the holder 10 and are fixed in them (figure 1, position II). Moreover, since the thickness and the wall 25 of the pusher 5, made(figure 5) is chosen so that it ensures minimum contact substrate 26 and the pusher (figure 1), it eliminates the accumulation of water (and contaminants) at the site of contact. Then start moving the platform 6 from the cassette 1. As the substrate, the cassette 1 as the deionized water is cleaned, dried and their vertical grooves captures the substrate 2 and the upper extreme position of its end surface 27 fully pushes the holder 10 together with the rods 11 (figure 1, position II). During movement of the holder 10, the tabs 13 are opened with the rods 11. After the arrival of the holder in the upper extreme position (figure 1, position II) it is fixed in this position by the clamps 13, driven twin cylinder 14. Then the valves 19, 20 block the flow into the chamber 8 a mixture of nitrogen with pairs of isopropyl alcohol, pneumatic cylinder 12 opens the camera 8 (figure 2). The cartridge 1 with ocimene and dried substrate 2 is removed from the platform 6 and then transported to the next operation in a known manner. On the platform install another cartridge with the substrate for cleaning and drying.

Thus, the method and the device for its implementation provides high-quality washing and drying of the substrate, using the Marangoni effect, prevents the accumulation of moisture on the peripheral areas of the substrate, causing defects on subsequent operations of the manufacturing of microelectronic devices, the ease and convenience of conducting the process of cleaning, drying and unloading the substrates. There is possibility to use technical solutions in a flexible automated production.

The company has developed design documentation technical development project installation cleaning of the substrates of the LCD screens.

Sources of information taken into account

1. A.S. 1763055 A1, CL VV 3/02, 1992.

2. French patent No. 2559688. CL. WV 3/02, 1985.

3. Post - CMP Marangoni drying eliminates defects, journal of European Semiconductor, appril 2004., c.51-54.

4. U.S. patent No. 451984, CL. WV 3/02, 1986

5. U.S. patent No. 3727620. CL. WV 3/02, 1973

6. U.S. patent No. 5520744, CL. H01L 21/00, 1996 (prototype).

1. Method of washing and drying flat glass substrates, namely, that of the substrate set in a cassette, load a tub washing with deionized water, washed them, and then slowly raise them out of the water in the drying chamber and dried in nitrogen vapor and organic RA is the solvent, for example isopropyl alcohol, characterized in that the first exercise group vertical movement of the substrate from the cassette, and in the process of exit of the substrate from the water washed and dried in nitrogen vapor and organic solvent, and recording the processed substrate in the highest position, then move up the cartridge, washed, dried it similarly to the substrates and processed substrates are loaded into the highest position in the cartridge, which together with the substrate is then discharged from the drying chamber.

2. Device for cleaning and drying flat glass substrates containing a bath of cleaning substrates associated with the line of feed and discharge of deionized water, drying chamber, connected with the supply line to the vapor mixture of nitrogen and organic solvent, the cover tape to the substrate, the vertical movement mechanism of the cassette, wherein the device is further provided with a platform for cassettes mounted on the mechanism for vertical movement of her follower substrates madeand rigidly attached to the upper part of the vertical movement mechanism of the substrate mounted in a through hole of the platform, the dimensions of the pusher choose less than the internal dimensions of the length and width of the cassette, and the mechanisms of vertical movement of cassatie substrates installed in corrugated tubes, in addition, the drying chamber is made with the possibility of rotation around the axis of the hinge and provided with a holder made with grooves similar to and aligned with the grooves of the cassette, with the possibility of vertical movement of the actuator and provided with two tabs that interact with the end face of the cassette in the extreme upper and extreme lower positions.



 

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