Dielectric anti-flash coating composition and its production process

FIELD: electronic engineering; anti-flash coatings for gas panels.

SUBSTANCE: proposed composition production process does not include high-temperature treatment and environmentally harmful operations. Anti-flash coating is produced from dielectric composition incorporating 2 - 5 mass percent of silicon oxide and 95 - 98 mass percent of photo-exposable material based on epoxy and acrylic resins; composition is applied in layer of 2 - 5 μm in thickness and exposed.

EFFECT: enhanced mechanical strength and lighting characteristics of coating and environmental friendliness of its production process; reduced labor consumption and cost.

2 cl, 5 ex

 

The group of inventions relates to the field of electronic technology and can be used in the manufacture of gas discharge display panels (GUI).

Known composition to reduce blagovesta surface containing 5÷25 wt.% electrically conductive material on the basis of thiophene, 0,5÷3 wt.% remasterise material and solvent from the group consisting of alcohol and deionized water [RF application No. 97107486 / 09, H 01 J 31/00, 9/00, 1999].

The disadvantage of this structure is that the products having anti-glare surface on its basis, can not be processed at temperatures up to 600°With irreversible reactions between the components of the composition, destructive anti-glare surface.

The known method of forming the antiglare coating on the surface Steklovolokno, which consists in activating the surface of the aqueous solution of SnCl, processing it in an aqueous solution of AgNO3, the chemical copper plating for 3÷15 minutes at the temperature of the copper plating solution 30÷65° [U.S. Pat. U.S. No. 4379184, 427-169, 1983].

The disadvantage of this method is the use of precious metals in the complex process of forming the anti-reflective coating.

Known dielectric composition for anti-reflective coating containing a low-melting glass (LPS) [U.S. Pat. UK No. 1390888, N 01 7/00, 1975]./p>

The disadvantage of this composition is that when used for forming anti-reflective coating on Steklovolokno cannot be obtained heat-resistant coating due to the presence of low-melting glass Frits.

The known method of forming anti-reflective coating, which consists in applying to Steklovolokno layer of dielectric powder compositions containing a low-melting glass, fusing and etching in a solution of nitric acid [U.S. Pat. Of the Russian Federation No. 2152912, 03 17/04, 2000].

Although this method allows you to get frosted surface with the required parameters, it is very time consuming due to the long production cycle of anti-reflective coatings that are critical to the climatic conditions of the technological process that requires the use of expensive equipment, environmentally harmful due to the use of FSC on the basis of lead oxide and acid etching residues LPS.

Closest to the proposed dielectric composition in a group of inventions on the totality of symptoms is the dielectric composition for anti-reflective coatings comprising silicon oxide [RF patent №2070749, H 01 J 17/49, 1996 - prototype].

The disadvantage of this dielectric composition is that when used for forming anti-reflective coating on Steklov dloce it is impossible to obtain a mechanically stable coating, because no strong fastening particles of silicon oxide on steklomontage.

Closest to the proposed method in a group of inventions on a set of attributes is a method of forming anti-reflective coating, which consists in applying to Steklovolokno layer of a dielectric composition comprising silicon oxide, followed by treatment for fastening layer [RF patent №2070749, H 01 J 17/49, 1996 - prototype].

The disadvantages of this method are the low mechanical strength of the formed anti-reflective coating, a great complexity, instability of the process of applying a layer of a dielectric composition and environmental harm.

The task of the group of inventions is to obtain mechanically strong anti-glare coating with high lighting environmentally friendly way, with low complexity and cost.

Specified single technical result in the exercise of invention the object substance is achieved by the fact that the known dielectric composition for anti-reflective coatings comprising silicon oxide optionally contains photoexposure dielectric material based on epoxy and acrylic resins in the following ratio, wt.%:

the cu oxide is mnie 2÷5
photoexposure dielectric
material based on epoxy95÷98
and acrylic resins

Introduction in the dielectric composition is taken in a given amount of photoexposing dielectric material based on epoxy and acrylic resins, curable upon exposure to ultraviolet radiation, allows you to get steklomontage anti-reflective coating with high mechanical strength, with the lighting settings that meet the requirements of the indicators, the formation of which excluded high-temperature processing and environmentally harmful operations.

Specified single technical result in the exercise of invention the object of the method is achieved by the fact that in the known method of forming anti-reflective coating, which consists in applying to Steklovolokno layer of a dielectric composition comprising silicon oxide, followed by treatment for fixing layer, the layer is applied with a thickness of 2÷5 μm of the dielectric composition including silicon oxide and optionally containing photoexposure dielectric material based on epoxy and acrylic resins in the following ratio of components is, wt.%:

the silicon oxide2÷5
photoexposure dielectric
material based on epoxy95÷98
and acrylic resins

and provide exposure for fastening layer.

This method, which uses a dielectric composition comprising photoexposure dielectric material based on epoxy and acrylic resins, allows to obtain a mechanically strong anti-glare surface, which provides high lighting options due to the polymerization of resins included in photoexposure dielectric material, in which there is no high-temperature treatment and environmentally harmful operations.

Conducted by the applicant's analysis of the prior art, including searching by the patent and scientific and technical information sources, and identify sources that contain information about the equivalents of the claimed group of inventions as object-matter, and object method, allows to establish that the applicant is not found counterparts for both substances and method of the claimed group, characterized by signs, identical to all essential characteristics as dielectric p. the texts and songs, and the way the claimed group of inventions, and the definition of the list of identified unique prototypes, as the most similar set of features analogues, has identified a set of essential towards perceived by the applicant to the technical result of the distinctive features for each of the stated objects of the group are set out in the claims.

Therefore, each of the objects of the claimed group of inventions to meet the requirement of "novelty".

Additional search known solutions in order to identify characteristics that match the distinctive features of the selected prototypes signs for each of the objects of the claimed group of inventions is not necessary for the expert in the obvious way from the prior art, so as not identified technical solutions, which would reveal the composition of the dielectric composition, providing a mechanically strong anti-glare coating with lighting options, otvechaem the requirements of the indicators, due to the use of a dielectric composition comprising silicon oxide, photoexposing dielectric material based on epoxy and acrylic resins in the following ratio, wt.%:

the silicon oxide2÷ 5
photoexposure dielectric
material based on epoxy95÷98
and acrylic resins

Not identified technical solutions, in which the anti-reflective coating was formed in a way which excludes high-temperature processing and environmentally harmful operations due to the formation of a layer thickness of 2÷5 μm of the dielectric composition including silicon oxide and photoexposure dielectric material based on epoxy and acrylic resins in the following ratio, wt.%:

the silicon oxide2÷5
photoexposure
material based on epoxy95÷98
and acrylic resins

with subsequent exposure of the layer.

Thus, each of the objects of the claimed group of inventions to meet the requirement of "inventive step".

Anti-glare coating reduces the coefficient of reflection of light from external sources, is formed on the outer surface of the front stekloplastika indicator.

For forming anti-reflective coating of the indicator using the dielectric is historical composition, including silicon oxide and photoexposure dielectric material based on epoxy and acrylic resins.

Use dielectric composition photoexposing dielectric material allows to fix the particles of silicon oxide between himself and Steklovolokno due to polymerization of the resin included in photoexposing dielectric material, and its simultaneous partial penetration in Steklovolokno.

Anti-glare effect of the coating depends on the surface topography defined by the number and distribution of particles of silicon oxide is formed on steklomontage layer.

Optimal surface topography on steklomontage is provided through the use of dielectric composition with the following ratio of components, wt.%:

the silicon oxide2÷5
photoexposure dielectric
material based on epoxy95÷98
and acrylic resins

When the content in the dielectric composition of silicon oxide is less than 2 wt.% weakly expressed anti-glare effect of the coating, as particles of silicon oxide are rare on the surface Steklovolokno.

If the stake is the amount of silicon oxide is more than 5 wt.%, the coating has a dense packing of particles of silicon oxide, plots uncovered surface Steklovolokno almost none and the result is a surface with a high degree of roughness, which reduces the brightness and clarity of the image.

The number photoexposing dielectric material varies depending on the amount of silica required to obtain a given anti-glare effect.

To obtain the dielectric composition of the mixed powder of silica with a specific surface area (30÷40)·103cm2/g photoexposure dielectric material based on epoxy and acrylic resins, taken in prescribed quantities.

Prepared dielectric composition applied on the precleaned surface Steklovolokno, for example, by the method of screen printing.

The dielectric composition can also be applied to the outer surface of the front dielectric plates are assembled and sealed indicator.

For applying the required quantity of particles of silicon oxide and their optimal allocation to steklomontage, providing anti-glare effect, and for the formation of mechanically strong anti-reflective coating layer of the dielectric composition is applied with a thickness of 2÷5 microns.

If the thickness is less than 2 μm, if estvo particles of silicon oxide is insufficient for the formation of rough surfaces and the effect of antiblik missing.

If the thickness is more than 5 μm, the coating will have a surface with a high degree of roughness, which reduces the brightness and clarity of the indicator.

After applying a layer of a dielectric composition carry out drying at a temperature of 120÷130°C.

Then Steklovolokno or sealed indicator with a layer of the dielectric composition is placed in the installation for carrying out exposure and carry out the exposure.

As a result of exposure to ultraviolet radiation from a dielectric composition is the process of curing (polymerization) of the resin included in photoexposing dielectric material based on epoxy and acrylic resins, thereby fixing particles of silicon oxide between themselves and steklomontage. Particles of silicon oxide is formed on steklomontage rough matte surface, providing anti-glare effect with high lighting options, the formation of which excluded high-temperature processing, resulting excludes defects such as variation of flatness of steklomontage, defects in the anti-glare coating associated with securing therein of foreign matter (lint, dust, etc.) after annealing.

An advantage of the invention is the possibility of a restoration layer dialect the systematic composition at the stage of its application.

For example, for forming anti-reflective coating on the outer side of the front glass plate of the assembled and filled with a working gas mixture of the gas-discharge display panel is formed by screen printing a layer of the dielectric composition with a thickness of 4 μm. Carry out drying at a temperature of 120÷130°C for 15÷20 minutes. Then carry out the curing of the dielectric composition with ultraviolet rays for 40÷45 minutes.

For forming anti-reflective coating has been used dielectric compositions the following compositions.

Example 1

The dielectric composition includes, in weight%:

the silicon oxide3
photoexposure dielectric
material based on epoxy97
and acrylic resins

Example 2

The dielectric composition includes, in weight%:

the silicon oxide2
photoexposure dielectric
material based on epoxy98
and acrylic resins

Example 3

The dielectric composition includes the, wt.%:

the silicon oxide5
photoexposure dielectric material
on the basis of epoxy95
and acrylic resins

Anti-glare effect of the coatings formed from the dielectric compositions including silicon oxide and photoexposure dielectric material based on epoxy and acrylic resins in a ratio of components presented in examples 1÷3, allows to obtain a highly efficient reduction of glare.

Example 4

The dielectric composition includes, in weight%:

the silicon oxide1,9
photoexposure dielectric
material based on epoxy98,1
and acrylic resins

The anti-reflective coating obtained after curing, has a flare, the minimum scattering of reflected light.

Example 5

The dielectric composition includes, in weight%:

the silicon oxide5,2
photoexposure dielectric
material based on epoxy94,8
and acrylic resins

The anti-reflective coating formed on the basis of this composition has a high degree of roughness, which reduces the brightness and image clarity, greatly impairs the readability of the information from the GUI.

Thus, the proposed group of inventions allows to obtain mechanically strong anti-glare coating with high optical and electrical characteristics, the formation of which excluded high-temperature processing modes.

1. Dielectric composition for anti-reflective coatings comprising silicon oxide, characterized in that it further comprises photoexposure dielectric material based on epoxy and acrylic resins in the following ratio, wt.%:

The silicon oxide2÷5
Photoexposure dielectric
material based on epoxy
and acrylic resins95÷98

2. A method for forming anti-reflective coating, which consists in applying to Steklovolokno layer of a dielectric composition comprising silicon oxide, with sleduyushei processing for fixing layer, characterized in that the layer is applied with a thickness of 2-5 microns of dielectric compositions including silicon oxide and optionally containing photoexposure dielectric material based on epoxy and acrylic resins in the following ratio, wt.%:

The silicon oxide2÷5
Photoexposure dielectric
material based on epoxy
and acrylic resins95÷98

and provide exposure for fastening layer.



 

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15 cl, 1 ex, 1 tbl

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