The way to create an inkjet printhead, the printhead for ejection of the liquid and the mask mnogoploskostnoe level
The present solution relates to thermal inkjet. More specifically relates to a method and device accurate polymer jets containing epoxide, polyimide, or other negative action photoresistive material, using methods of direct imaging. The way to create an inkjet printhead includes a stage of application of the package of thin-film layers on the surface of a semiconductor substrate, applying a single layer slowly slivaushiesia polymer package of thin-film layers, irradiation slowly slivaushiesia polymer low dose of electromagnetic energy sufficient to underexposure and stitching slowly slivaushiesia polymer to the desired depth, to transfer the image of the jet and exposure to a large dose of electromagnetic energy sufficient to overexposure and stitching slowly slivaushiesia polymer, except where the camera is liquid cavity, the image transfer liquid cavity, and includes the manifestation of those parts only of the layer slowly slivaushiesia polymer, where the migrated image of the jet is located with the location of the corresponding rollernogo holes and moved the Oia liquid cavity. These features make it possible to reduce the cost of the printhead and the cost of manufacture and increase the duration of its operation. 3 S. and 7 C.p. f-crystals, 10 ill. This invention relates to thermal inkjet, in particular to polymeric ink jet nozzle for direct imaging. More specifically, this invention relates to a device and method for obtaining accurate polymer jets containing epoxide, polyimide, or other negative action photoresistive material, using methods of direct imaging.Thermal inkjet printers usually have a printhead mounted on a carriage that moves back and forth across the width of the paper or other medium feed in a printing device. The printhead includes a system of nozzles (also referred to as nozzles) that are directed to the surface of the paper. Filled with paint (or other liquid) channels nourish the jets ink from the reservoir feeder paint. Applied to the individual elements of the directional scattering of energy (such as resistors) energy heats the ink in the nozzles, causing the ink to form a bubble and Vitali the GII to paint or liquid, which fall under the nature, scope and principle of the present invention. Because the ink is pushed out, the bubble bursts, and more paint fills the channels from the reservoir, providing repetition release paint.Existing designs of inkjet printheads have difficulties in manufacturing, problems with life and with accuracy the direction of ink on paper. Received currently printheads are applying paint slot in the substrate, the barrier transition (barrier transition takes through the channels of the paint to the resistor determines the amount of camera-heated, the material of the barrier transition is thick photosensitive material, which is superimposed on the substrate, is irradiated, is manifested and cures) and jilleroo cost (zyclara fee is way out from the camera, heated, which is determined by the barrier transition; Gilera fee is usually obtained electrolytic formation of Nickel (Ni) and then covered with gold (AU), palladium (Pd) or other noble metals for corrosion resistance; the thickness gyklarnas Board and diameter rollernogo holes is adjusted to provide repeated squeezing drops when heated). In the process of manufacturing the special adhesives to attach. If Gilera fee is crooked or if the adhesive incorrectly connects jilleroo charge with a barrier transition, the result is poor regulation of the trajectory of ink droplets, and the performance or service life of the printhead is reduced. If the combination of printhead is incorrect or Gilera fee is jammed (uneven in its flatness), the paint will be sprayed in the direction from its corresponding trajectory, and the quality of the print is reduced. Because Gilera fee is a separate part of the printing heads of a traditional design, the thickness required to prevent warping or distortion during the manufacturing process requires that the height (relative to the thickness of gyklarnas Board) rollernogo hole was higher than that needed for thermal efficiency. Usually separate Gilera fee is attached to a separate matrix printhead on a semiconductor wafer, which contains a lot of printheads. It is desirable to have a method, which allows you to place sicklemia Board all at once over the entire semiconductor wafer with increased productivity, and ensures accurate placement of the jet is maintained disadvantage, associated with this increased height of the ink in the channel of the jet is that it requires more energy to eject ink. Moreover, high quality printing requires a higher resolution, and therefore, smaller drops of ink. So you want a more subtle Gilera fee, which only can be made. In addition, since the amount of squeezing paint each drop becomes smaller, the printhead needs more jets to create this sample in a single pass of the printhead over the print media at a fixed speed printing. To prevent overheating of the printhead due to the increased number of nozzles it is necessary to reduce the amount of energy used on the jet.There is a method of creating an inkjet printhead containing semiconductor substrate having a lot of feed fluid slits passing through the semiconductor substrate and connected to the set input fluid channels on the reverse side of the substrate (patent US 5686224).This same patent also known printhead for ejection of the liquid containing the substrate and the mask mnogoploskostnoe level.However, e is sumego element, which was replaced after the passage of ink.An object of the invention is to provide a method of obtaining printhead and printhead has a low cost and long-term operation of the printhead.This object is achieved due to the fact that the way to create an inkjet printhead containing semiconductor substrate having a lot of feed fluid slits passing through the semiconductor substrate and connected to the set input fluid channels on the reverse side of the substrate stage includes applying a package of thin-film layers on the surface of a semiconductor substrate, applying a single layer melanocephalus polymer package of thin-film layers, exposure melanocephalus polymer low dose of electromagnetic energy sufficient to underexposure and stitching melanocephalus polymer to the desired depth, to transfer the image of the jet and exposure to a large dose of electromagnetic energy sufficient to overexposure and stitching melanocephalus polymer, except where the camera is liquid cavity, the image transfer liquid cavity, and on the nozzle is positioned with the positioning of the respective rollernogo holes, and the migrated image of the liquid cavity is located with the location of the corresponding openings of the liquid cavity.Moreover, stage applying melanocephalus polymer may optionally include stage selection melanocephalus polymer from the group consisting of different layers photocopieuse polymer and optical dyes, mixtures photocopieuse polymer and optical dyes, and photocopieuse polymer.Stage application melanocephalus polymer may optionally include stage selection melanocephalus polymer from the group consisting of different layers photocopieuse epoxide and optical dyes, mixtures photocopieuse epoxide and optical dyes, and photocopieuse epoxide.Stage applying a layer melanocephalus polymer may also optionally include a stage of deposition of the layer melanocephalus polymer thickness 8-34 microns.Stage image transfer nozzle and image liquid cavity may also include exposure melanocephalus polymer of electromagnetic energy through a mask mnogoploskostnoe level or exposure melanocephalus polymer is as low dose of electromagnetic energy using a template.The task is also achieved by the fact that inkjet printhead for ejection of the liquid containing semiconductor substrate manufactured as described above and contains a package of thin-film layers that are attached to the surface of the semiconductor substrate, and a package of thin-film layers further comprises dispersing the energy element and defines a feed fluid slot, single layer melanocephalus polymer having made the jet, and melanochlamys polymer deposited on a package of thin-film layers, the nozzle is located above the scattering energy of the element and a single layer melanocephalus polymer is made liquid cavity, while the liquid cavity is located above the feed fluid slot, and the input fluid channel located on the back side of a semiconductor substrate and extending in a feed fluid slot.This object is achieved also due to the fact that the mask mnogoploskostnoe level is used for the above-described method and contains permeable quartz substrate,
made according to the pattern layer of semi-permeable dielectric material is, unesenny performed to pattern the layer of semi-permeable dielectric material.Moreover performed on the template layer is semi-permeable dielectric material may be semi-permeable in the optical wavelength interval 365-436 nm.In addition, made according to the pattern layer of semi-permeable dielectric material may be FeO2.The invention is illustrated by drawings, where:
In Fig. 1A presents a top view of the individual nozzle of the preferred option.In Fig. 1B presents in isometric cross-section of the nozzle, showing the basic design.In Fig.2A2H shows the stage the preferred option for creating a jet on the spot. Presents a view along arrow a-a of the jet with Fig.1A.In Fig. 3A presents a top view of the print head having multiple nozzles.In Fig. 3B shows the bottom view of the printhead shown in Fig. 3A.In Fig.4 shows the print cartridge, which uses a print head that can be used in the present invention.In Fig.5 shows a printing mechanism that uses the print cartridge that has a print head, which may be the exploring variants of the invention.In Fig. 6B presents the pattern of the mask, which can be used in the preferred embodiment of the invention.In Fig.7A presents a top view of a preferred variant of the invention.In Fig.7B presents a side view of a preferred variant of the invention, showing the relevant dimensions used to determine the incoming jet.In Fig. 8 shows a graph representing the design of the timing of recharge and discharge based on the ratio of the heights of the incoming jet preferred option.In Fig.9A9G shows a stage of a method of creating a single-layer version of the jet in place.In Fig.10A10E shows the results of a method of creating a mask mnogoploskostnoe level used in the preferred embodiment of the invention.The invention relates to a new method of obtaining the polymer jet, which creates a sandwich of many materials photocopieuse layers over the substrate and which does not require Nickel gyklarnas Board or material barrier transition. Each photocopieuse layer has a different degree of crosslinking for a given intensity of energy. In addition, the invention encompasses topologies in the shape of a hat-cylinder. Cylindropuntia jet can be obtained by variation of process parameters to optimise the performance of ejection of droplets. This topology cylindrophinae design has several advantages over the design with straight walls or linear conical configuration. Luggage cylindropuntia incoming jet, which produces liquid droplets, it can be easily determined by liquid chamber cavity and the chamber of the nozzle. The size and shape of each camera, as it appears when looking in the jet is determined by using a master mask or set of masks. Masks allow you to adjust the inlet diameter outlet diameter and volume of the chamber heating in relation to the thickness or height rollernogo layer. The height of the chamber of the nozzle and the height of the chamber liquid cavity shall be regulated independently for optimum process stability and versatile design. By adjusting the shape, size and height of the chambers of the nozzle and the liquid cavity, the designer can adjust the drop size, drop shape and reduce the effect of the reverse leakage (the part of the bubble which pushes the paint, which extends in a direction opposite to the direction of vital cylindropuntia jet). In addition, this cylindropuntia topology allows the feed liquid to the grooves, which guide the fluid to the nozzle, positioned at a distance from the scattering energy of the element that is used to eject the liquid, lowering the possibility of the bubble to get into the feed fluid path, to create the blockage.Polymer jet for direct imaging usually contains two or more layers of negative actions photoresistive materials with slightly different degrees of resolution. The degree of resolution based on different materials, each layer having a different molecular weight, physical composition or optical density. In the manner given in example, which uses two layers, on a substrate applied a "slow" photoresist, which requires the crosslinking electromagnetic energy with an intensity of 500 MJ/cm2. In the inkjet printhead, this substrate consists of a conductive material and has a package of thin-film layers deposited on its surface. Fast photoresist, which requires the crosslinking electromagnetic energy with an intensity of 100 MJ/cm2, is applied to the layer of slow photoresist. After curing is up> to define a liquid chamber cavity. The intensity is high enough for knitting both the upper and lower layers. Photoresistive layers of the substrate is then exposed through another mask electromagnetic energy low intensity of 100 MJ/cm2to determine the camera jet. It is important that the intensity of the second radiation was low enough so that the lower cyclery layer of slow photoresist, which is under ICLARM hole, not race.The polymeric material is well known in the field of integrated circuits due to its ability to smooth the surface of the thin-film micro-relief. Empirical data show that the differences in topography gyklarnas Board can be maintained depth of 1 μm. This characteristic is essential to ensure the continuous trajectory of the drop.In addition, there are many different polymers having negative effects photoresistive properties. Examples of polymeric materials include polyimide, epoxide, polybenzoxazole, benzocyclobutene and solely. Professionals understand that there are other negative actions photoresistive polymer materials that fall under the essential substance of the second polymeric material slow photoresist can be obtained from the quick photoresist, which has no dye or has a small amount of dye. In another embodiment, the layer of polymeric material coated with a thin layer of dye. Alternative ability to create slow photoresists contain a mixture of polymers with different molecular weights, with different characteristics wavelength absorption, with different speeds manifestations and use of the pigments. Professionals understand that there are other ways of slowing the photosensitivity of the polymer, which fall within the nature and scope of the invention.In Fig. 1A presents a top view of the individual jet (also called a nozzle or hole) using a preferred variant of the present invention. Top cyclery layer 34 consists of bystrotverdeyushchego polymer, such as photocopieuse epoxy resin (such as SU8, developed by Ibeam) or photocopieuse polymer (such as OCG, well-known in the technique). Top cyclery layer 34 is used to define the shape and height rollernogo holes 42. Immersed in cyclery layer are feeding the liquid of the slot 30 and the liquid cavity 43. Fluid, such as paint, liquid flows in the cavity 43 through the feed idcore pushes out the remaining liquid from the nozzle 42. View along a-a shows the direction of consideration of cross-sections in subsequent figures.In Fig.1B presents in isometric cross section of a single nozzle, as shown in Fig.1A, completely solid head for applying thermal inkjet. Bottom cyclery layer 35 is deposited over the package of thin-film layers 50, which are processed in separate layers and is introduced to the surface of the semiconductor substrate 20. Taken as an example, the nozzle 42 has a diameter of 16 μm, a liquid cavity 43 length of 42 μm and a width of 20 μm, the upper cyclery layer 34 with a thickness of 6 μm and the lower cyclery layer thickness of 6 μm. Semiconductor substrate 20 is etched after deposition of a package of thin-film layers 50 with providing a feed fluid channel 44, which delivers fluid to gigastorage the slots 30 (not shown). The feed fluid slots 30 are defined in the package of thin-film layers 50.In Fig. 2A2H shows the different steps of the method used to create alternatives of the invention.In Fig.2A shows a semiconductor substrate 20 after processing with the introduction of a package of thin-film layers 50, which includes element of the energy dissipation of 32. Package templatezone semiconductor substrate 20 after as the lower cyclery layer 35 consisting of melanocephalus polymer is applied on top of the package of thin-film layers 50. Melanochlamys polymer is applied using conventional equipment for coating by centrifugation, such as manufactured by the firm of Carl Sass KG. The method of coating by centrifugation, associated with the appropriate equipment, ensures the formation of a flat surface, as melanochlamys polymer 35 fills the pitcher fluid of the slot 30 and the surface of the package of thin-film layers 50. Taken as an example of the method of coating by centrifugation consists in spraying a layer of resist on a semiconductor wafer using centrifugeuse equipment at 70 rpm with an acceleration of 100 rpm/s and time of spraying 20 C. the Plate is then ceases to rotate with the slowdown of 100 rpm/s and rest 10 seconds Then the plate is centrifuged for 30 s at 1060 rpm with an acceleration of 300 rpm/s with a coating of resist over the entire plate. Alternative methods of application of the polymer include a coating on rollers irrigation, extrusion, spraying, and dipping. It is clear that there are other ways of applying polymer layers, making optical dye (such as Orange 3, about 2 wt.%) or photocopieuse polyimide or photocopieuse epoxy transparent polymeric material. With the introduction of colour for stitching material requires a greater amount of electromagnetic energy than for the material is not mixed with the dye.In Fig. 2C shows the result of the application of the top rollernogo layer 34 consisting of bystroszhigaemoy polymer, the lower cyclery layer 35.In Fig.2D shows a strong intensity of electromagnetic radiation 11 attached to the upper rollerdome layer 34 and the lower rollerdome layer 35. The energy input electromagnetic radiation should be sufficient to cross-link, as the top rollernogo layer 34 and the lower rollernogo layer 35 in radiation areas (as shown in Fig.2D, 2E and 2F in the form of zones crossed by X-shape). In an embodiment, taken as an example, this stage is performed using the setup Soft SVG at 300 MJ with focal deviation +9 µm. This stage determines the shape and area of the liquid cavity 43 in the jet.In Fig. 2E shows the next stage of the method, on which a lower intensity of electromagnetic energy 12 is applied to the upper rollerdome layer 34 and the lower rollerdome layer 35. The total anerobe when a combination of both), is sufficient only for knitting bystroszhigaemoy polymer in the upper rollernom layer 34. In an embodiment, taken as an example, this stage is performed using the setup Soft SVG when 60,3 MJ with a focal offset +3 μm. This stage determines the shape and size rollernogo holes 42.In Fig. 2F shows how exposure preferred option. Instead of using two masks (one for determining the liquid cavity, as in Fig.2D, and one to determine rollernogo holes 42, as shown in Fig.2E) uses only one mask. This approach reduces the possible errors of alignment when using two separate masks. This mask consists of three sections of different densities on icline hole (see Fig.6A and Fig.6B) forming a mask mnogoploskostnoe level. One plot is essentially permeable to electromagnetic energy. The second section is partially impervious to electromagnetic energy. The third section is completely impervious to electromagnetic energy.The first section allows the strong intensity of electromagnetic energy 11 to pass through the mask with full stitching and determines sicklemia layers, where photocopyingfree deletion in the development process. The second section is designed to pass only low-intensity electromagnetic energy 12 by stitching the upper rollernogo layer 34, while the material for the second plot in the lower rollernom layer 35 remains unstitched. The third section (completely impermeable) is used to determine the shape and area rollernogo holes 42. Since electromagnetic energy cannot pass through this third phase, slivaushiesia polymer under an impenetrable third area of the mask is not exposed to radiation and, thus, removed later at the development.In Fig.2G shows the stage of manifestation method, where the material in the upper rollernom layer 34 and the lower rollernom layer 35, including material in recostada the slots 30, is removed. Taken as an example of the method used to install for the manifestation of Solitec 7110 with 70 seconds manifestations in NM (N-organic) at 1000 rpm, 8 seconds of mixing in IFC (isophthalic acid) and MMP at 1000 rpm, 10 sec rinsing IFC at 1000 rpm for 60 sec rotation at 2000 rpmIn Fig. 2H shows the result after etching is carried out by Tetramethylammonium (TMAH) back side (see U. Schnakenburg, W. Benecke and P. Lange, TMANW Etchants for Silicon Micromachining, Tech. Dig. 6thIn Fig. 3A presents an example of the print head 60, which contains many ilersich holes 42 created at the top rollernom layer 34 and the lower rollernom layer 35. Sicklemia layers are applied to the package of thin-film layers 50, which is deposited on the semiconductor substrate 20.In Fig.3B shows the opposite side of the print head 60, showing the feed fluid channels 44 and the feed liquid of the slots 30.In Fig.4 illustrates a variant of the printing cartridge 100, which uses a print head 60. This print cartridge may be similar to the cartridge NRA supplied by the company Hewlett-Packard Co. Print head 60 is connected to the flexible printed circuit Board 106, which pairs the control signals from the electrical contacts 102 printhead 60. The liquid contained in the reservoir for the fluid 104, which has a feed liquid to the node from which, for example, visible tube 108 and the discharge tube (not shown). The liquid is stored in the tube 108 and is supplied to the print head 60 through the discharge tube.In Fig.5 shows an example of the inkjet recording device 200, the device Hewlett-Packard Deskjet 340 (SA), use the print cartridge Assembly 100 from Fig.4. Noserialmice mechanism 260. The print cartridge 100 is moved across the width of the carrier 230 on the site of the carriage 240. The input mechanism 260 and the node of the carriage 240 together form a node of the move to transport the carrier 230. When information is recorded on the media, it is ejected to the output tray 220.In Fig.6A shows the individual mask mnogoploskostnoe level 140; it is used for molding rollernogo holes 42 in an alternative embodiment of the present invention. Impervious area 142 is used to determine the shape and area rollernogo holes 42. Partially impervious area 144 is used to define the shape and area of the liquid cavity. Permeable section 146 is essentially permeable to electromagnetic energy, and this mask defines the portions of the upper rollernogo layer 34 and the lower rollernogo layer 35, which are sewn together and are not deleted when the manifestation. Form an impenetrable plot 142 coincides with the geometric shape of partially impervious area 144 in order to optimize the development process.In Fig. 6B shows a preferred variant of a separate mask mnogoploskostnoe level 150, in which the geometric shape of impervious area 152 differs from geometryfactory image, which provides a separate form definition liquid cavity and forms rollernogo holes. This technology provides the optimum design of liquid-propellant cavity to provide fast re-filling, the degree reverse rebound and maximum density of the set of nozzles on the printhead. When a liquid drop is discharged from the nozzle, the drop is the main form of the body and following behind the tail, which together form the volume drops. A method of directly forming an image provides the optimal design rollernogo holes 42 to provide an adequate volume of produced fluid, the configuration of the tail released fluid and forms a liquid when it is in the jet, which minimizes the destruction of liquids on the flight path to the media. Permeable section 156 is essentially permeable with respect to electromagnetic energy, and this mask defines such areas top rollernogo layer 34 and the lower rollernogo layer 35, which are sewn together and are not deleted when the manifestation. In this embodiment taken as an example, the mask has a permeability of permeable section 156 is essentially 100%, the permeability of partially nephron is to have a different shape allows you to place the feed liquid slits 30 away from the scattering energy of the element 32 to reduce the possibility of ingestion reverse rebound of the bubble, thus preventing the exit of air through the jet.In addition, due to its ability to regulate the thickness of the lower rollernogo layer 35 and the upper rollernogo layer 34 with the ability to regulate certain forms of liquid cavity and rollernogo holes can be obtained the main structure of the jet.In Fig. 7A presents a top view of the preferred construction of the jet. Icline hole 174 is of a round shape, and the liquid cavity 172 is rectangular in shape. In Fig.7B presents a side view of the jet, as shown by the arrow BB in Fig.7A. Top cyclery layer 168 has an upper height of the nozzle 162, which together with the area rollernogo holes 174 determines the amount gyklarnas camera 176. Bottom cyclery layer 170 has a lower height of the nozzle 164, which together with the area of the liquid cavity 172 determines the volume of the liquid chamber cavity 180. The total height of the nozzle 166 is the sum of the upper height of the nozzle 162 and the lower height of the nozzle 164. The lower the height of the nozzle 164 to the top height of the nozzle 162 defines a critical parameter, the ratio of the heights, where:
The RATIO of HEIGHTS = BOTTOM HEIGHT of the NOZZLE / UPPER ALTITUDE ALTITUDE JET
This attitude heights adjusts the volume to repopulate the jet liquid to eject the liquid.In Fig.8 presents a graph which shows the relation between the time of replenishment from the relationship of the height and volume of the emissions from the relationship of the height is taken as an example of a nozzle with a diameter of 16 mm with a length of the fluid cavity 42 μm and a width of the liquid cavity 20 μm. Using this graph allows the designer printhead to choose the thickness of the layer to the desired shape propelling droplets.In Fig. 9A9F shows the stage of the alternate version of the invention, which uses a single layer melanocephalus polymer and applies the underexposure and overexposure melanocephalus polymer under the action of electromagnetic energy as a method of forming the individual layers.In Fig. 9A presents the processed semiconductor substrate 20, which has a package of thin-film layers 50 drawn on it, which contains the scattering power element 32 and the feed liquid of the slot 30.In Fig. 9B shows the application layer melanocephalus material 34 on the package of thin-film layers 50 and filling recostada slots 30.In Fig.9C shows the irradiation layer melanocephalus polymer 34 low dose of electromagnetic energy 12 for obregonia polymer to the desired depth. Taken as an example, the irradiation is 60,3 MJ.In Fig. 9D shows the irradiation layer melanocephalus polymer 34 large dose sufficient to overexposure and the joining layer melanocephalus polymer 34, except where the camera is liquid cavity. Taken as an example, exposure of 300 MJ.In Fig. 9F shows an alternative stage of the method with respect to shown in Fig. 9C and Fig.9D, using a single mask having mnogoploskostnye levels, allowing the use of different doses of electromagnetic energy for irradiation layer melanocephalus polymer 34. This method provides the exact combination rollernogo holes 42 and the liquid chamber cavity 43 while reducing the number of stages of the method.In Fig.9F shows the manifestation, where unstitched material is removed from the liquid chamber cavity and gyklarnas camera. Gilera camera has a small taper at the input due to the lesser of blending material in the depth layer melanocephalus polymer 34, because the dye and other materials mixed in the weakening of electromagnetic energy, when it penetrates.In Fig.9G shows the final result after etching TMAG Tg. 10A10E shows the results of stages of the method used to produce masks mnogoploskostnoe level in the methods of production of the individual masks to get Windows in rollernom layer.In Fig.10A shows a quartz substrate 200, which is permeable to electromagnetic energy used for irradiation photocopieuse polymer used to create ilersich layers. A quartz substrate 200 should be of a suitable optical quality.In Fig.10B shows a quartz substrate 200 with a layer of semi-permeable dielectric material 210 is deposited. This is taken as an example material is iron oxide (FeO2). On the semi-permeable layer of dielectric material 210 is covered with a layer of impervious material 220, such material is chromium. As FeO2and chromium can be deposited using conventional electron beam napylitel. The layer of the negative effects of photoresist is applied on the layer of opaque material 220, is irradiated by electromagnetic energy and manifests itself, leaving photoresist sections 230, which determine the shape and size of the liquid chamber cavity.In Fig.10C shows the cut is then taken as an example by way of etching is the etching of chromium in standard KTI-tub. A quartz substrate 200 is then subjected to another traditional method of etching to remove a semi-permeable dielectric material 210 with the formation of a semi-permeable layer 212. When as a semi-permeable dielectric material 210 is used Fe2taken as an example of the method is plasma etching using plasma SF6or CF4. The remaining photoresist 230 is then as follows.In Fig.10D another layer of photoresist is then applied on the quartz substrate 200, is irradiated to determine the shape and area rollernogo holes, then appears to create rollernogo template 240.In Fig.10E shows the result after the quartz substrate 200 is etched to remove the impermeable layer 222, where cyclery template 240 is not hosted, creating a template rollernogo holes 224 impermeable layer. In the case when the opaque material is chrome, taken as an example by way of etching is wet chemical etching, so that a semi-permeable dielectric layer 212 is exposed to the etching method.A method of directly forming an image with a polymer jet is simple, NGIA. It provides greater design flexibility and tight control of the size of the jet by providing independent adjustment of the geometric dimensions rollernogo holes and the liquid cavity. The design of the mask mnogoploskostnoe level allows the use of a single exposure to provide their own combination of jet and liquid cavity with improved performance and density.Although we have shown different forms of incoming jets, other incoming form using the above methods, which fall within the nature and scope of the invention.The invention relates more hard for directional control of the jet fluid and smaller drops for fine resolution required for resonant clear photo. In addition, the invention simplifies the manufacture of the printhead, which reduces the cost of production, makes possible high-speed volumetric mileage and increases the quality, reliability and compatibility printheads. Preferred and alternative embodiments of the invention show that can be created a separate form of jet related to additional areas style="text-align:center; margin-top:2mm;">
Claims1. The way to create an inkjet printhead containing semiconductor substrate having a lot of feed fluid slits passing through the semiconductor substrate and connected to the set input fluid channels on the reverse side of the substrate, wherein the stage includes applying a package of thin-film layers on the surface of a semiconductor substrate, applying a single layer melanocephalus polymer package of thin-film layers, exposure melanocephalus polymer low dose of electromagnetic energy sufficient to underexposure and stitching melanocephalus polymer to the desired depth, to transfer the image of the jet and exposure to a large dose of electromagnetic energy sufficient to overexposure and stitching melanocephalus polymer, except, where is the camera liquid cavity, the image transfer liquid cavity, and includes the manifestation of those parts of the single layer melanocephalus polymer, where the transferred image of the jet is located with the location of the corresponding rollernogo holes, and the migrated image of liquids which/p>2. The method according to p. 1, characterized in that the stage of applying melanocephalus polymer additionally includes a step of selecting melanocephalus polymer from the group consisting of different layers photocopieuse polymer and optical dyes, mixtures photocopieuse polymer and optical dyes, and photocopieuse polymer.3. The method according to p. 1, characterized in that the stage of applying melanocephalus polymer additionally includes a step of selecting melanocephalus polymer from the group consisting of different layers photocopieuse epoxide and optical dyes, mixtures photocopieuse epoxide and optical dyes, and photocopieuse epoxide.4. The method according to p. 1, characterized in that the stage of applying a layer melanocephalus polymer additionally includes a step of applying the layer melanocephalus polymer thickness 8-34 microns.5. The method according to p. 1, characterized in that stage image transfer nozzle and image liquid cavity includes additional irradiation melanocephalus polymer of electromagnetic energy through a mask mnogoploskostnoe level.6. The method according to p. 1, characterized in that stage image transfer nozzle and isobetanin energy use pattern and exposure melanocephalus polymer low dose of electromagnetic energy using a template.7. Inkjet printhead for ejection of the liquid containing semiconductor substrate, characterized in that manufactured by the method according to any of paragraphs.1-6 and includes a package of thin-film layers that are attached to the surface of the semiconductor substrate, and a package of thin-film layers further comprises dispersing the energy of the element, and determines the input fluid slot, single layer melanocephalus polymer having made the jet, and melanochlamys polymer deposited on a package of thin-film layers, the nozzle is located above the scattering energy of the element and a single layer melanocephalus polymer is made liquid cavity, while the liquid cavity is located above the feed liquid of the slot and the feed fluid channel located on the back side of a semiconductor substrate and extending in a feed fluid slot.8. Mask mnogoploskostnoe level, characterized in that is used for implementing the method according to any one of paragraphs.1-6 and includes permeable quartz substrate made according to pattern the layer of semi-permeable dielectric material deposited on a permeable quartz substrate and p is historical material.9. Mask mnogoploskostnoe level under item 8, characterized in that the pattern layer is semi-permeable dielectric material is semi-permeable in the optical wavelength interval 365-436 nm.10. Mask mnogoploskostnoe level under item 8, characterized in that the pattern layer of semi-permeable dielectric material (212) is FeO2.
SUBSTANCE: manufacturing method of head substrate for fluid ejection represents provision of silicon substrate containing on its surface layer of etching mask, which has opening, the formation of the first deepening in surface of the silicon substrate by means of anisotropic etching, the formation of the second deepening containing opening in the surface of the first deepening, thereby opening goes in the direction of the other surface of the silicon substrate, being inverse surface to the surface of a silicon substrate and the formation of the inlet channel by anisotropic etching of silicon substrate from surface having the second deepening. Fluid ejection head contains silicon substrate having element of energy generation on its surface that is configured with possibility to generate energy for liquid ejection and the inlet channel for liquid supply to the element of energy generation.
EFFECT: invention provides stable manufacturing of substrate for fluid ejection heads with form accuracy and high efficiency of technological process.
7 cl, 17 dwg
FIELD: technological processes.
SUBSTANCE: invention is related to head that ejects liquid, which carries out printing by means of drops ejection onto carrier, device that ejects liquid and method of liquid ejection. Liquid-ejecting head, in which liquid is ejected from ejection channel due to application of energy to liquid, besides ejection channel comprises one ledge having convex shape and arranged inside ejection channel, the first area for maintenance of liquid surface, which must be related to liquid in the form of column stretched outside from ejection channel, when liquid is ejected from it, and, in condition when the first area is created, the second area, to which liquid must be sucked in ejection channel in direction opposite to direction of liquid ejection, and which has hydraulic resistance that is lower than hydraulic resistance of the first area, at the same time the first area is created in direction, in which ledge shape convexity is inverted from distal end of ledge, and the second area is created on both sides from ledge.
EFFECT: possibility to arrange moment of ejected liquid separation as occurring earlier and to reduce tail of flying drop of liquid.
19 cl, 37 dwg
FIELD: printing industry.
SUBSTANCE: in method for arrangement of slot for supply of ink into semiconducting substrate for jet printing head, the first structural element is formed by means of multiple application of electric energy discharge to the first side of semiconducting substrate or by means of abrasive material application on the first side of semiconducting substrate, vibration is imparted to tool opposite to the first side, besides tool vibrates with a certain frequency and at a certain distance from the first side for formation of the first structural element, material of semiconducting substrate is removed from the second side for formation of the second structural element, besides at least part of the first and second structural elements crosses for formation of slot for ink feed, which passes through semiconducting substrate, and for removal method is used, which has been selected from group, including wet etching, dry etching, laser treatment, sand drilling, treatment with abrasive jet, rotary-vibration drilling, cutting with saws and mechanical treatment in machines.
EFFECT: fast formation of slot for ink feed in semiconducting substrate for jet printing head with low costs.
19 cl, 14 dwg
FIELD: printing industry.
SUBSTANCE: invention relates to method for liquid ejection to eject liquid from ejection channel by application of energy to liquid. Method includes the following stages: liquid is put in motion along ejection channel, which comprises, in cross section, relative to direction of ejection, two ledges inside the channel, then liquid surface that is arranged on both sides of two ledges and in area between two ledges in channel in direction opposite to direction of liquid ejection is pulled so that liquid arranged in specified area is joined to liquid in the form of column and is in contact with distal ends of two ledges, and them liquid in the form of column is separated from liquid arranged in specified area to eject liquid from ejection channel, so that liquid arranged in specified area is in contact with distal ends of two ledges.
EFFECT: invention makes it possible to reduce formation of satellites (secondary drops) and to accordingly improve quality of printing.
6 cl, 37 dwg
FIELD: printing industry.
SUBSTANCE: method to make a silicon substrate for a liquid-ejecting head, having the first surface, opposite to the second surface, includes the following stages: provision of a layer on the second surface of the silicon substrate, besides, this layer has a lower etching speed compared to silicon, when exposed to the silicon etchant; partial removal of the layer to open a part of the second surface of the silicon substrate, besides, this opened part surrounds at least one part of the layer; and moist etching of the specified layer and opened part of the second surface of the silicon substrate with application of the silicon etchant, in order to form a channel of liquid supply, stretching from the second surface to the first surface of the silicon substrate.
EFFECT: simplified formation of ink supply channel and reduced time of substrate making.
12 cl, 22 dwg
FIELD: process engineering.
SUBSTANCE: method of producing said head including silicon substrate and inlet channel comprises: producing silicon substrate including isolating layers on first surface and mask layers with etching holes substrate other surface. Note here that said insulating layer is located in section extending from position opposite section between adjacent mask layer holes, and producing holes by etching section of silicon substrate so that etched section extends to insulated layer section opposite aforesaid hole. Silicon substrate located between adjacent holes is subjected to etching so that secintion on its first surface may be thinner than that on its second surface.
EFFECT: higher hardness of thus produced head and higher efficiency.
5 cl, 35 dwg
SUBSTANCE: method for processing a substrate of head for ejecting the fluid includes the stage of providing the substrate and the stage of providing a deepened section on the rear surface of the substrate by ejecting fluid in a linear form from the rear surface of the substrate, and by processing the rear surface of the substrate by laser light which passes along the fluid and in the liquid.
EFFECT: increased mechanical strength of the substrate.
9 cl, 10 dwg
SUBSTANCE: photosensitive composition contains a cation-polymerisable compound, an acid photogenerator having an anionic part and a cationic part, as well as a salt having a cationic part having anyone of a quaternary ammonium structure or a quaternary phosphonium structure, and an anionic part. The anionic part of the salt is substituted with the anionic part of the first acid obtained from the anionic part of the acid photogenerator, to form a second acid having acid strength lower than that of the first acid. The cation-polymerisable compound is an epoxy resin. The acid photogenerator is at least a compound selected from a group comprising a sulphonic acid compound and other sulphonic acid derivatives, a diazomethane compound, a sulphonium salt, an iodonium salt, a sulphonimide compound, a disulphonic compound, a nitrobenzene compound, a benzoin tosylate compound, an iron arene complex, a halogen-containing triadine compound, an acetophene derivative, and a cyano group-containing sulfatoxim. The method of forming a pattern involves preparing a substrate on which the photosensitive composition is provided. A portion of the composition is then exposed to light to cure the exposed portion. The cured portion is then heated. The liquid ejection head has a part with an outlet channel for ejecting liquid. The part with the outlet channel is formed from cured material made from said composition.
EFFECT: invention increases heat resistance of the photosensitive composition and increases accuracy of forming a pattern.
13 cl, 4 dwg, 5 tbl, 9 ex
SUBSTANCE: invention relates to an ink-jet printer in which the operation of restoring is performed in the print head for ejecting ink, and to a method for restoring the print head in the ink-jet printer. The ink-jet printer comprises a print head that can eject ink. The device also comprises a transportation unit, which serves for transportation of a recording medium along the transportation path passing the printing position in which printing can be performed on the printing carrier by the print head. The cutter which can cut the printing carrier. The restoring unit to perform operations of restoring the print head. The control unit to control the restoring operation performed by the restoring unit based on the number of passes which is the number of times that the cut-off part of printing carrier, which is cut off by the cutter, passes the printing position.
EFFECT: proposed invention provides the systematisation of the process of restoring the print head taking into account cutting of the carrier.
14 cl, 13 dwg
FIELD: printing industry.
SUBSTANCE: in the invention the ink jet printing head is designed, comprising an element provided with an ejection port for ejecting the ink. The said ink jet printing head additionally comprises a water-repellent layer comprising a cured product of the condensed product obtained by condensation of the hydrolyzable silane compound comprising an epoxy group, and a hydrolyzable silane compound comprising a perfluoropolyether group on the surface of the said element on the side where the ejection port comes.
EFFECT: improved quality of printing.
16 cl, 8 dwg, 1 tbl