A method of obtaining a thin magnetic films

 

(57) Abstract:

Usage: the invention relates to a technology for thin ( 0.1 micron) magnetic films using the method of ion implantation of magnetic elements in the substrate material and can be used in microelectronics and computer science, in particular for the manufacture of magnetic and magneto-optical storage media. The technical result of the invention consists, first, in the improvement of the magnetic characteristics of the film by reducing the number of radiation defects and, secondly, reduce the time of implantation and cheaper process. The essence of the invention: substrate use terephthalate. Implantation of iron ions in the substrate is performed with a dose of 1016--1017ion/cm2when the flux density of ions 6X1012-1014ion/cm2c.

The invention relates to a technology for thin ( 0.1 micron) magnetic films (TDM) using the method of ion implantation of magnetic elements in the substrate material and can be used in microelectronics and computer science, in particular, for the manufacture of magnetic and magneto-optical storage media. Such films are characterized by high mechanical the local method [1] receive TDM in the semiconductor. The method consists in the fact that in the silicon substrate implanted ions of the magnetic elements with energy E = 10 - 500 Kev; the dose (D), determined from the relation D = n d, where n is the concentration of atoms implanted elements in the material TDM, d set the thickness TMP; flux density of ions (j) lying in the range of 6 to 1012- 6 to 1013ion/cm2C. However, the resulting TDM consist of fine ferromagnetic silicides with low values of magnetization.

The known method [2] obtain ferromagnetic film implantation in solid substrate of fast ions of transition elements of the iron group. To extend the frequency range and improve the magnetic characteristics of the ferromagnetic film as the substrate used, quartz, and irradiate it at densities of ion flux j = 6 to 1012- 9 of 1013ion/cm2with doses of D = 5 1016- 1017ion/cm2. For example, implantation of a substrate of fused quartz on the accelerator ILU-3 ions56Fe+with energy E = 40 Kev, a dose of D = 8 1016ion/cm2when the density of the ion flux j = 6 to 1013ion/cm2with were synthesized TDM with effective saturation magnetization 4000 Gauss.

However polupravilnykh mechanical characteristics and the relatively high cost of the material.

Now lie more promising are magnetic and magneto-optical medium, in which the substrate using a polymeric material is polymethylmethacrylate (PMMA) [3, 4].

A method of obtaining TDM in PMMA [5]. This method is the closest to the claimed and, therefore, selected as a prototype. The method consists in the following. Plane-parallel plate of PMMA with a thickness of 1 mm bombarded in a vacuum chamber of an ion-beam accelerator ILU-3 ions Fe+with energy E = 40 Kev, a dose in excess of 1017ion/cm2and the density of the ion flux j < 2,4 1013ion/cm2C. by ferromagnetic resonance, transmission electron microscopy, Auger spectroscopy was revealed the formation of a ferromagnetic film consisting of fine particles-Fe with cross-sectional dimension of from 5 to 100 nm. The effective saturation magnetization 4Meffranged from 500 to 10,000 Gauss.

However, for TDM in PMMA requires a large dose of ion irradiation of Fe+(> 10 ion/cm2) and the low density of the flow of ions, which leads to a significant increase in time of implantation, i.e. the cost of the process, and to increase the number of radiation defects OI the invention, is, first, to improve the magnetic characteristics of the film by reducing the number of radiation defects and, secondly, reduce the time of implantation and the cheapening of the process.

In the production method of thin magnetic films in polymers, including the implantation of iron ions in the substrate to solve the task as a substrate used polyethylene terephthalate (PET), and the implantation is performed with a dose of 1016- 1017ion/cm2when the flux density of ions 6 1012- 1014ion/cm2.

We experimentally found that the energy is E = 40 Kev minimum dose formation in TDM PET is Dmin= 2 1016ion/cm2that an order of magnitude less than for the synthesis of TMP in PMMA. With increasing implantation dose dependence of the saturation magnetization in the PET has an extreme character with a maximum at D 1017ion/cm2(equal to 4Meff~ 6500 GS at the maximum). At the same time, the maximum effective saturation magnetization for TDM synthesized in PMMA, under the same conditions, can only be achieved if the dose of > 4 1017ion/cm2and equal to 4Meff~ 4500 Gauss, which is 70% lower than for PET.

The flux density ionography. On the one hand, the larger j is, the less the exposure time at a given dose. On the other hand, it is known that at high j is the degradation of the polymer. So the high j the density of the ion flow is limited. The temperature of the polymer during implantation significantly depends on the quality of thermal contact with the cartridge-holder. When using the original thin PET film as a substrate thermal contact is quite bad, and we experimentally it was found that the maximum flux density of ions in this case should not exceed 3 to 1013ion/cm2C. While ensuring good thermal contact, for example, by gluing, the flux density of ions can be increased to 1014ion/cm2C.

Let's look at specific examples.

Example 1. As the substrate used was 3 μm PET film caused by 0.04 μm, the metallic coating. The use of such film was allowed to make a fairly good thermal contact with the sample holder in the irradiation process. Ion implantation of Fe+was performed on ion-beam accelerator ILU-3 at room temperature with energy E = 40 Kev, a dose of D = 1017ion/cm2when the raft ferromagnetic film. The effective saturation magnetization is equal to 4Meff~ 6500 GS, which is approximately three times greater than the values obtained in PMMA at the same implantation dose.

Example 2. The original PET film shown in example 1, is bombarded by ions of Fe+with E = 40 Kev, a dose of D = 1017ion/cm2when the value j = 1,2 1013ion/cm2C and the temperature of the substrate, variable in the range from 20 to 150oC. the Obtained ferromagnetic film had an almost constant value of the effective saturation magnetization equal to 6000 Gauss.

Example 3. The original PET film shown in example 1, is bombarded by ions of Fe+with E = 40 Kev, a dose of D = 3 1016ion/cm2and j = 2,4 1013ion/cm2c at room temperature of the substrate. The obtained film had a magnitude of the effective saturation magnetization equal to 950 Gauss.

Example 4. The original PET film shown in example 1, bombard at room temperature, the substrate with ions of Fe+with E = 40 Kev, j = 2.4 to 1013ion/cm2and with a dose of D > 1017ion/cm2namely, with D = 2.4 to 1017ion/cm2. Effective saturation magnetization of the resulting films was equal to 3200 HS, both for PET and PMMA samples (the conductors// Ed.: C. Y. Petukhov, I. B. Khaibullin, M. M. Zaripov. - A. S. N 1114246 (USSR).

2. A method of obtaining a ferromagnetic films on solid substrates// ABT. : A. A. Bukharev, A. C. Kazakov, I. B. Khaibullin, N. R. Yafaev. - A. S. N 1347789 (USSR).

3. M. Kh. KREIDER. In the world of science. - 1987. - N 12. - S. 46 - 58.

4. Magnetic completely with medium and method for making the same//Inv. Kazufumi. Ogawa. - US Patent N 4751100.

5. V. Petukhov, V. Zhikharev, M. Ibragimova, E. Zheglov, V. Bazarov, I. Khaibullin. Ion synthesis of the granular ferromagnetic films in polymethyl-methacrylate. - Sol. St. Comm. - 1996. - V. 97, - N. 5. - P. 361 - 364. (Prototype).

A method of obtaining a thin magnetic films, including the implantation of iron ions in the polymer substrate, wherein the substrate using a polyethylene terephthalate, and the implantation of an exercise performed with a dose of 1016-1017ion/cm2when the flux density of ions 61012-1014ion/cm2c.

 

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