The method of magnetron sputtering
(57) Abstract:Usage: the invention relates to the field of thin-film technology and is intended for use in microelectronics and integrated optics. Essence: the proposed method of magnetron sputtering is that the discharge period of the magnetron is applied a constant voltage, but in contrast to the known methods use a working gas containing electronegative component, such as oxygen, parallel to the bit interval connect the electrical capacity, providing resonance with the plasma oscillations in the discharge gap. While the current and voltage in the discharge circuit oscillate with a frequency of about 10 kHz, which prevents the destruction of targets, but also creates reproducible conditions for spraying. The proposed method is the most simple means, for example using a half wave rectifier. 2 Il. The invention relates to the field of thin-film technology and is intended for use in microelectronics and integrated optics.Known methods of magnetron sputtering, namely, that the power to the magnetron exercise history is a series with a constant value of the current strength .A prototype of the proposed method is a method of magnetron sputtering, namely, that to prevent transfer of a glow discharge in an arc parallel to the bit period of switched capacitor .The disadvantage of the prototype method is the relatively low rate of sputtering of ceramic targets due to a lack of reliable, high-speed spray - prevent powerful arcs, leading to local overheating and consequently fracture (cracking) targets.The task, which is aimed by the invention, is expanding Arsenal of technical means of magnetron sputtering by achieving the following technical result: exceptions local overheating of the target uncontrolled arcs. In the absence of local overheating does not occur and destruction of targets, which allows to increase the speed of their spray.This task is solved in that the spray produced in the environment electronegative gas or mixture of gases containing electronegative component parallel to the bit period include an electrical capacitor, which together with bit premenitions the plasma oscillations in the discharge gap [1) Irene and L. Peres C. Pitchford. Current pulses in dc glow dischares in electronegative das mixtures. J. Appl. Phys., 78 (2), 1995, pp. 774-782; 2) Z. Lj.Petrovic and A. V. Phelps. Oscillation of low-current electrical discharges between parallel-plane electrodes. Pysical Review E, v. 47, N 4, 1993, pp. 2806-2838]. When this circuit discharge occurs pulsating current, while attached to the specified system voltage is constant, i.e., the proposed method has advantages of high-frequency magnetron sputtering, which usually requires for its implementation much more complicated and expensive equipment.An example of a specific performance may serve (Fig. 1) the following mode of magnetron sputtering of low-ceramics based on zinc oxide doped with aluminum in a mixture gas of argon (80%) and oxygen (20%): the pressure in the chamber 1 to 410-4Torr, the distance from the target 2 to the anode 3 is 0.1 m, the target area - 0,035 m2the power supply voltage 4 - pulsating (50 Hz, half-wave rectification) 550 V, the capacitance of the capacitor 5, which are parallel bit interval to 1.0 µf. The frequency of oscillation of the voltage discharge is about 10 kHz. The corresponding waveform is shown in Fig. 2. The method of magnetron sputtering, namely, that on the bit interval serves strain is syshestvyut in the presence of electronegative gas, a capacitor and include such electric capacity, which provides a resonance with the plasma oscillations in the discharge gap.
FIELD: application of reinforcing, protective and decorative coats on articles in vacuum.
SUBSTANCE: proposed method includes electric arc spraying of cathode target and treatment of metal plasma flow in crossing electric and magnetic fields in cavity of additional anode of electric arc device. Dependent discharge of reaction and/or inert gas is ignited inside cavity of this additional anode. Metal plasma flow is additionally treated while passing through this discharge. Flow containing ions of gas and ions of material of cathode target settles on surface to be coated; potential of article is below potential of additional anode by 2000 V.
EFFECT: enhanced adhesion strength; high rise of coats at stoichiometric connections.
5 cl, 4 dwg, 3 tbl
FIELD: plasma engineering; application of multi-layer coats in form of thin films made from metals, their oxides, nitrides and other compounds synthesized in the course of plasma chemical reactions on surfaces of articles made from dielectric materials.
SUBSTANCE: proposed device includes magnetron spraying system, power supply system for said magnetron system, gas bleeding-in system, vacuum system and the following components mounted in series: sluice chamber equipped with loading unit, vacuum seal, first reversible chamber, working chamber and second reversible chamber. Magnetron spraying system is mounted in working chamber which is additionally equipped with ion source with belt-type bundle covering the surface of work in way perpendicular to its motion at energy from 0.1 to 10 keV and density of ion flow of 1x1012-1x1015 particles xcm-2xs1 falling at angle of 20-70° relative to normal to surface. Ion source has magneto-conducting housing used as cathode with magnetic system and extended water-cooled anode, emission slot forming belt-type bundle and gas supply system located inside it. Gas supply system is made in form of supply passage cascade located in base of housing. Passages in each cascade are symmetrically divided in two. All passages have similar length. Distance between outlet holes does not exceed 40 mm.
EFFECT: enhanced efficiency of cleaning and activation of surfaces of articles.
7 cl, 9 dwg
FIELD: systems for applying coatings in vacuum, possibly protective coatings in machine engineering and machine tool making industry branches.
SUBSTANCE: electric-arc generator of plasma metal flows includes cooled anode and cathode; cathode holder; igniting electrode, stabilizing solenoid arranged on outer surface of cooled anode; duct for supplying reaction gas, focusing solenoid and additional anode. Focusing solenoid is arranged on outer surface of additional anode. Cathode holder includes electrically insulated sleeve of magnetically soft material whose outer diameter is equal to diameter of end working portion of cathode mounted with gap relative to cooled anode. Invention prevents penetration of cathode holder material into coating, lowers micro-drop and vapor phase creation at time moments of turning off electric arc, increases ionization degree of plasma flow of metal.
EFFECT: improved quality, enhanced adhesion strength of coating.
1 dwg, 1 tbl
FIELD: plasma equipment, namely magnetron type spraying system, possibly used for depositing coatings onto surface of extended sheet materials, for example applying coatings on architectural designation glasses.
SUBSTANCE: magnetron type spraying apparatus includes magnetic unit having magnetic circuit 2 and permanent magnets 3; flat target-cathode 1. Magnetic unit is in the form of extended frame forming closed magnetic system with pole tips 8 turned inside frame. Flat target-cathode 1 is arranged along inner surface of said framework. Thin film deposition is realized simultaneously onto two flat substrates (glasses) moving through window (cavity) of frame.
EFFECT: improved design, possibility for applying low emission coatings onto flat glasses of large surface areas.
9 cl, 4 dwg
FIELD: devices for application of coats in vacuum; application of protective, reinforcing and decorative coats on inner surfaces of articles.
SUBSTANCE: vacuum chamber is provided with revolving substrate for placing the part to be treated and electric arc evaporator for metals. Evaporator consists of arc discharge non-magnetic cathode and anode. Cathode is made in form of cooled hollow cylinder made from evaporable material; control system for control of cathode spot motion in form of coil with solenoids is mounted inside this cylinder. Non-magnetic anode is made in form of vertical plates fitted over circumference along cathode embracing it. Cathode spot motion control unit consists of programmed unit, DC source with negative output for connection with part to be treated, arc current source and feedback unit whose output is connected to programmed unit and input is connected to DC source and output of arc current source. Hollow cylinder has semispherical top. Cathode spot motion control system is provided with magnetic circuit on which multi-sectional coil is fitted with solenoids located in its separate sections. Anode is provided with metal ring and length of vertical plates of anode exceeds length of cathode; plates copy its shape; they are interconnected in their upper parts by means of metal ring. Control unit is provided with adjustable multi-channel current source whose outputs are connected to respective sections of coil and its input is connected to output of programmed unit. Positive output of arc current source is connected to anode and positive output of DC source is connected to anode.
EFFECT: improved quality of coats due to enhanced reliability of cathode spot motion control system.
FIELD: metallurgy; spraying cathodes for application of coats in vacuum chamber; manufacture of articles provided with coats.
SUBSTANCE: proposed cathode has at least one solid target (2) mounted on metal membrane (3). Side of membrane (3) directed from target (2) has cooling passage with delivery line (9) and drain line (10) for cooling fluid and cavity (7) for at least one magnetic system (5) which is located in bath (6) which is sealed relative to membrane (3) and is not subjected to action of cooling fluid. Cathode is located on load-bearing structure (12) which has hollow body (13) hermetically closed relative to interior of vacuum chamber (18); it is used for communication of magnetic system (5) and cavity (7) with atmosphere beyond vacuum chamber (18). Cooling passage is made in form of closed water supply pipe (4) closed over perimeter of section with at least one flat side (4a) which is in heat-conducting connection with membrane (3). Membrane (3) and surfaces of water supply pipe (4) directed away from membrane (3) are subjected to atmospheric pressure through load-bearing structure (12) beyond vacuum chamber (18). Such construction of cathode enhances transfer of heat from target to cooling fluid excluding penetration of it into vacuum chamber.
EFFECT: enhanced operational and economical efficiency.
8 cl, 6 dwg
FIELD: plasma technology; metallization of surfaces of elements of micro-mechanics, filters, delay lines, integral micro-circuits and printed circuit boards.
SUBSTANCE: proposed method consists in cathode spraying of material on target placed in plasma to which negative bias is fed relative to plasma created in buffer gas by outside generator. Transversal size of target is close to transversal size of coat layer; target and substrate are shifted relative to each other at high accuracy of positioning. Rate of motion of target relative to substrate is so selected that preset thickness of coat layer should be obtained. Rate of spraying is regulated by change of plasma generator power. Device proposed for realization of this method has vacuum chamber, units for discharge and admission of working gas, plasma generator in working chamber and metal target consisting of material to be sprayed; it is connected to voltage source creating negative bias on target; device is also provided with dielectric substrate which is subjected to spraying. Target and substrate are movable at high accuracy of positioning relative to each other; size of target is considerably lesser that that of substrate. Plasma source employs inductive RF discharge.
EFFECT: reduced consumption of material for target; enhanced accuracy of obtaining required thickness of coat; improved quality of coat; increased degree of ionization of gas and material sprayed on target.
16 cl, 11 dwg, 2 ex