Method and device for manufacturing a matrix for disk media

 

(57) Abstract:

Usage: the production area of the matrix to disk media. The inventive installation has the power applying on a substrate a photosensitive layer, the block exposure of the photosensitive layer in accordance with the recorded and stored information, the unit manifestations of the photosensitive layer and the metallization of the substrate from the side shown in the layer of photoresist and the unit application of the metallic coating. The various blocks of the installation are located in one building, each of which has a device for receiving the substrate, and transporting mechanism located in the housing has at least one conveying device to capture substrates installed with the possibility of lateral movement in two directions oriented at some angle to each other, and move up and down. 2 C. and 22 C. p. F.-ly, 17 ill.

The invention relates to the production of matrices for disk media.

The term "media" means media audio and/or video and/or data carriers and other media such as CD-ROMs, and the media, shotable the 002455 described method and installation for the manufacture of a matrix of disk storage media.

In accordance with this method, the substrate used for forming the matrix, automatically move with the transport mechanism from one block to another and treat each of the blocks including a block drawing of a photoresistive layer. The disadvantage of this method is the complexity of its implementation and the inability to implement the necessary technological operations.

Described in the aforementioned patent device for the manufacture of a matrix of disk storage media contains several blocks of applying a photoresistive layer on a substrate, provided with a receiving units of the substrate, and transporting mechanism having a node to capture the substrate mounted with the possibility of horizontal and vertical movement. A disadvantage of this device is its complexity and the inability to implement the necessary technological operations.

The aim of the invention is the establishment of efficient and compact design, which in turn are consistent operation without operator intervention.

According to the invention this objective is achieved by the fact that different units are housed in the same building and have the device on the cotton device substrate, installed with the possibility of lateral movement in two directions oriented at an angle to each other, and moving up and down inside the case.

In the installation of the proposed design of the substrate can be moved in the specified order using the transport mechanism between the receivers ' blocks until each block with the substrate independently performs the necessary operations.

The invention is explained in more detail below when considering the proposed design is schematically represented in the attached drawings.

Fig. 1 is a schematic front view of the installation is made according to the invention, Fig. 2 is a schematic illustration of a top view of the different blocks installation made according to the invention, Fig. 3 depicts a cross-section of the installation shown in Fig. 1 and Fig. 2, figs. 4 depicts a front view of an installation for removing the substrate from the stack and transfer it to the transport mechanism, Fig. 5 is a top view of the installation shown in Fig.4, Fig.6 depicts a top view of the cleaning mechanism and the first layer of the coating and the photoresist is s in Fig.7, Fig.9 is a front partial cut unit manifestations and plating, Fig.10 depicts a front view of the device for applying the contact rings on the substrate, Fig. 11 is a top view of the device depicted in Fig. 10, Fig. 12 depicts a front view of the device for the clamping ring on the substrate, Fig.13 depicts a top view of the device shown in Fig. 12, Fig.14 depicts the mechanism is engaged, as shown, immersion in a bath of electrolyte, Fig.15 depicts an enlarged view of part of the mechanism shown in Fig.14, Fig.16 depicts a front view of the unit, where the produced matrix undergoes fine processing, Fig.17 depicts a top view of the unit shown in Fig.16.

The installation shown in Fig.1-3, has a housing 1 closed during normal operation in which there are blocks 2-7. Design blocks 2-7, as a rule, is that each of them can be completely removed and if necessary replace the blocks with the same or other functions.

Along the top panel along its entire length lies beam 8, a part of the transporting mechanism. The slider 9 is made with the possibility of back-postupatel not shown). On the slide 9 is mounted which is located perpendicular to the beam 8 beam 10 along which, as shown by arrows B, the reciprocating moves the slider 9'. Beam 10 is used to fasten the conveying devices 11 and 12 with the fingers-hooks that are installed with the possibility of radial movement. Conveyors 11 and 12 perform the reciprocating movement (drive not shown).

When the fingers 13 are pulled outward in the radial direction, the conveying device mounted on the substrate, and when the fingers slide inside, the substrate is captured by the hooks on the ends of the fingers so that it can be raised by appropriate devices and moved in the housing by means of the above-described transport mechanism.

As will be clear from the drawings 1-3, the entire plant body can be subdivided into three located one above the other compartment 14-16. In the upper compartment 14 is actually the entire transport mechanism. Located in the lower compartment 15, which in turn can be divided into compartments in accordance with the placement of blocks 2-7, as shown in Fig.1 and Fig.2, contains a variety of the following devices obrany in Fig.3. In the lower compartment 16, thereby subdivided in accordance with the arrangement of blocks 2-7, are AIDS - electronic equipment, containers with liquids and more. Typically, auxiliary means are located on the sliders so that when repairs or other works they can move out of the case and back in the transverse direction.

In block 3 provided with an opening through which the installation may be placed in the holder holds a stack of substrates, usually glass discs. Near the hole is a mechanism in detail is shown in Fig. 4 and Fig.5, reaching the substrate from the stack and pushes her to the transporting mechanism.

As shown in Fig. 4, the substrate, for example, glass discs, stacked inside the housing in a stack, one above the other.

The mechanism shown in Fig.4 and Fig.5, is fastened on the frame installation support 17 with the lead screw 18 driven in rotation is connected to it by the engine 19.

Lead screw passes through a threaded coupling 20, fixed to the rotation around the axis of the screw 18 by means not shown in the drawing. With threaded coupling 20 is connected to one end of the arm 21 that is installed with who is and the drawing of the actuator and with the possibility of reciprocating movement along the lead screw.

At the free end of the manipulator mounted three suction cups facing up.

When the stack of the substrate 22 is placed in the installation, the arm 21 with an appropriate mechanism is moved under the stack, set on its axis and moves up until the suction Cup 23 will abut against the lower substrate 22 in the stack. This provision is monitored by the sensor 24 mounted on the manipulator. In suction cups by means not shown in the drawing, creates a pressure below atmospheric, whereupon the lower substrate 22 is removed from the stack, remaining near the container. From this position one of the transporting device 11 or 12 lift the substrate from the arm 21.

As will be clear from the further, in certain stages of the manufacture of the media is moist. For this and need devices 11 and 12, one of which moves the dry substrate, and the other is wet, to avoid undesired contamination of the substrate and the installation itself.

After the substrate 22, performed usually in the form of a glass disc, rises devices 11, 12, it goes up in the space of the compartment 14 through the window 25 in the wall 26 closing the compartment 15 from above, and then pout the coating layer and a layer of so-called lacquer coating or photoresist.

As schematically shown in Fig.6, in block 27 has a rotary table 28, located inside the Cup-shaped device whose shape corresponds to the shape of the device, is presented in more detail in Fig.9.

In addition, in block 27 has two inlet pipes 29 and 30 that are installed with the possibility of rotation around the axes 31 and 32, respectively, and the cleaning unit, installed with the possibility of rotation around the vertical axis and with the possibility of reciprocating movement in the vertical direction, for example, brush 34, mounted to rotate around a horizontal axis.

While the substrate is rotated while on the table 28 and the inlet pipe 29 on its surface is sprayed with the liquid for washing, in this case, deionized water. During the supply of washing liquid to the surface of the substrate is also cleared brush 34 is installed over the substrate. After cleaning the substrate, the brush again returns to the position shown in Fig.6, located above the tray 35 which is connected with the drain pipe 36, through which merges water flowing from a brush. After washing through the pipe 29 is applied to the first coating layer. Then the material for the final forestrelated over the entire surface of the substrate.

In addition, with a bowl-shaped tray 37 are connected to the suction pipe 38 for the pumped vapors.

After application of the lacquer coating or layer of photoresist substrate using the device transport mechanism is delivered in block 39 for drying.

For drying lacquer coating has a duct with horizontal pipe shown on the drawings in block 39. The turntable 40 is at least partially placed inside the pipe 41 through the opening in its bottom wall. On this table for holding the substrate 18 has three suction cups 42, which generates a pressure below atmospheric. The turn table is provided United with him driving motor 43.

The substrate 22 is placed on the turntable by means of a transporting mechanism available through the top wall of the socket 41 of the window that can be closed by a cover 44 attached to one end of the arm 45. The arm 45 is mounted on a vertical shaft 46 can be rotated around its axis by a motor 47.

The shaft 46, mounted on a support 48 can move up and down by means of the control cylinder 49. To open the hole in the upper wall of the socket 41, the cover 44 is necessary is oznaczenie on the same Fig.7 by the dashed lines.

After setting the substrate on the turntable ventilation channel is closed by turning the cap in the opposite direction. Then a fan (not shown) in vent forced air flow. Heat are heating coil 50, positioned across the air channel. In Fig.7 spiral shown rotated 90orelative to its actual position.

As will be further clear from Fig.7, the ventilation channel for narrowing between the rotary table and heating coils have aperture 51, necessary to ensure that the air flow is directed to the substrate on the turntable, was more uniform.

After the hot drying air through the ventilation channel some time to let the cold air for cooling the substrate.

Practically found that the hot air it is advisable to skip for about three minutes, and the cold - seven. The result is a significant reduction in the time required for drying lacquer or photoresistive layer. Still drying is usually carried out in a separate furnace, which took about 1 h

m layer of photoresist is sent to the block 52 for recording media of the desired information. In block 52 has a rotary table 53, through which the conveying mechanism is set to the substrate 22 with a lacquer or photoresistive coating. In addition, the block 52 is typically a laser device 54 and the optical system 55, through which the light beam is directed to lens 56, mounted on the holder 57. To move the holder 57 in the guide 58 on the substrate mounted on the rotating table, he fixed on the shaft 59 driven drive mechanism 60.

Thus, the resistive layer is exposed in accordance with the recorded information.

After the exposure, the substrate 22 is sent to the block 61 by means of the transporting mechanism.

As shown in detail in Fig.9, for receiving the substrate in a block 61 has a table 62 made with the possibility of rotation around the vertical axis driven by a motor 63.

The turntable 62 is located in a Cup-shaped device 64, which summarized below drain pipe 65.

In the upper part of the Cup-shaped device 64 has an annular groove 66, the inner wall of which is slightly below the outer wall, as seen from Fig.9. The groove 66 is connected the pipe 67 to deny the axis by the drive mechanism 69. On the shaft fortified arm 70. At the end of the manipulator 70 fortified many tubes for supplying different liquids when the end of the manipulator over the cylindrical hub, as shown in Fig.9.

From this position the arm 70 may move to a position where its end fortified with there pipes will be located above the pallet 71 (Fig.2) so that it will be able to collect all of the liquid drained from the pipes, including fluid for flushing of pipes.

For clarity, shown schematically in Fig.2 manipulator and pipes 72 are not shown in their normal position above the pallet, and in a different position.

On another vertical shaft 73, is made rotatable with the drive from device 74, a pointing device 75, which includes three lens 76. Lens 76 catch the laser beam passing in the direction indicated by the arrow B, after its passage through the substrate treated with the above-described manner. The intensity of the light captured by the lens depends on the configuration received photoresistive layer that allows you to control whether the process of manufacture of the layer as needed.

Through tubes consistently serves a variety of fluids. First sneaky. When the manifestation of the photoresistive layer in such a way, as a rule, produce the above-described control by using a laser and lens system 76.

Thereafter, the remaining photoresist and/or the upper side of the substrate 22 metallservisa when applying the respective liquids. Usually Nickel plated.

After processing at block 61 photoresistive layer deposited on the substrate 22, and installation of manipulators 75 and 70 near the Cup-shaped device substrate is directed transporting mechanism in the next block 77 on the support plate 78 (Fig. 15) mounted on the upper end of the arm 79, which occupies when receiving substrate vertical position, as shown in Fig. 14. From this position the arm 79 is set by the governing cylinder (not shown) connected to the arm 79 by means of rod 80, the rotation around the horizontal axis 81 in the position indicated in Fig.14 dashed lines.

Thus, the substrate 22 is placed on top of the compression springs 82 mounted within the support plate 78.

Then the substrate is put in contact with a thin metal ring, made of stainless steel or Nickel is Yong mechanism installation of the metal contact rings 83, it is shown in Fig.11 and Fig.12.

This mechanism has a rack 84, mounted with a possibility of vertical movement by means of the control cylinder 85.

On the rack 84 has a vertical shaft 86 on which is mounted one end of the arm 87.

The shaft 86 with the arm 87 is installed with the possibility of rotation around its vertical axis by means of the control cylinder 88 mounted on the rack, the piston rod 89 which is connected to the shaft 86.

At the free end of the arm 87 is installed plate 90. The plate is attached to the disk 91, relatively rotating it around the axis 92. For rotation of the plate 91 it is connected with the piston rod 93 of the control cylinder 94 mounted on the arm 87.

The plate 91 is made of three slots 95 in such a way that the distance from the axis 92 to each of the slits increase their length. In the slots 95 are vertical studs 96, connected to the ends of the radially arranged about the axis 92 of the rod 97. Rod 97 are in the slide 98, mounted on the plate 90 with the possibility of longitudinal movement.

It is clear that when the plate 91 forward and backward by means of the control cylinder 94, the rod 97 is moved in anzah.

Rings 83, lying in a pile on the stand or something else, are located near the unit 77, for example, at position 86, shown schematically in Fig.10.

The top ring is lifted by means of the mechanism shown in Fig.10 and Fig. 11. First nominated fingers manipulators 99, then they are set below the top ring, then the rotation and vertical movement of the arm 87 fingers closed and grab the top ring of the stack. Then the corresponding vertical movement and rotation of the arm 87 ring is installed over the substrate, located on the base plate 81.

After that, the substrate with the ring shall be secured to the base plate 78 for further processing.

The mechanism shown in Fig.12 and Fig.13, located in block 77, serves to put on clamping ring 101.

As mostly clear from Fig.15, the clamping ring 101 is in the context of L-shaped, so that when assembling his paw with o-ring 102 formed on the ring 83, and the other paw a bit advocated support plate 78.

On the outer circumference of the support plate 78 is located at an equal distance from each other three pin 103 so that they release the ring 101. The short part of the slots are open at the points located on the lower inner side of the clamping ring, and a long side located on its circumference.

The mechanism shown in Fig.12 and Fig.13, for donning and subsequent removal of the clamping ring 101, includes a support device 105, movable in vertical direction by means of the control cylinder 106. On the supporting device has a vertical shaft 107, which strengthened the free end of the arm 108. The shaft 107 together with the pointing device 108 is configured to rotate around its Central axis that is installed on the supporting device of the steering cylinder 109, the piston rod of which is connected to the shaft 107.

At the free end of the arm 108 by means of vertical shaft 110 is attached to the disk 111, driven in rotation around its Central axis Manager of the cylinder 112 mounted on the pointing device 108. Another plate 113 is mounted on the bottom side of the disk 111 by bolts 114. For accurate setting of the plates 111 and 113 with respect to each other bolts are in the slots 115.

The plate 113 fortified bolts 116 at equal distances from each other. On the lower ends of the bolts have heads 117 located in the curved grooves 118, the opening 119, facing the upper side of the clamping ring. Through these holes in the corresponding vertical movement of the arm 108 with a fortified it by parts and the rotation of the disks 111 and 113 around the shaft 110 heads 117 are inserted into the grooves 118 or removed from them.

As a result of rotation of the manipulator 108 clamping ring 101 is moved into position above the support plate 78, as shown in Fig.15, and then down so that the pins 103 are moved inward through the vertical part of the L-shaped slots 104 and clamping ring 101 is mounted on the ring 83. Then the clamping ring is rotated by turning a control cylinder 112 interconnected plates 111 and 113 and is captured by the plates 111 and 113 through bolts 116. As a result of rotation of the pins 103 will be located at the end of the horizontal portions of the slots 104. Then the plates 111 and 113 are rotated into the position in which the head 117 will go around the grooves 119 so that the disks 111 and 113 can be raised on the bolts 116, leaving the clamping ring on the base plate 78.

Then pressed thus the substrate 22 and pressed against her ring 83 stainless steel rotation is set, as shown by the dashed lines n the willows which established the base plate 78 is pressed against it by the substrate 22, as shown by the dashed lines in Fig.14.

As can be seen from Fig.14, the plate 123 is installed with the possibility of her moving in front of the hole 122 in the casing 121 and has a channel 124 designed for metallization of the surface of the substrate. As the plate 123 can be quickly replaced by a plate with another channel, the channel size can be adjusted.

In addition, in the bath posted by the receiving device 125, which is a large number of metal, usually Nickel, balls 126. In the depicted construction, the distance between the receiver 125, containing Nickel beads, and a processed substrate may be relatively small, approximately 35 mm, which allows you to quickly apply a uniform coverage of the substrate.

As shown in Fig. 14, in the wall of the casing 121, bordering hole 122, along the arc of a sector with an angle of approximately 50oare the channels 127 for liquids. Through these holes fresh electrolyte passes in the direction indicated by the arrow C, parallel to the surface of the substrate 22.

Thanks to the fresh electrolyte is provided with high quality coating of Nickel on the surface of the substrate.

Nickel plated as it usually happens in such processes.

Thus, in this block on a substrate applied a thick coating.

After a sufficiently thick coating, the base plate 78 will return back and together with the substrate is washed with hot deionized water. Then, the base plate will return to the position shown in Fig.14, after which the clamping ring 101 is removed by performing in reverse order of the operations performed when dressing. Then, the substrate coated with the thus coated, which now covers and mounted on the substrate ring 83, through the transporting mechanism is placed on a rotary manipulator 128, located in the next block 129. The construction of the rotating arm 128 is in General similar to the above-described design of the manipulator 21. The substrate is placed on the cradle 1 in block 12 by means of a manipulator 128 that is installed with the possibility of vertical movement and rotation around the vertical axis.

The thus treated substrate is delivered from the unit through a door (not shown) and the substrate can in the usual manner, for example by hand, removed from under formed as described above, ohvatyvajushee surface up then the plate goes light is shown schematically source 132, mounted on the arm 133 that is installed with the possibility of rotation around the vertical axis, for the manifestation of the residual varnish or photoresist remaining on the rear part made of a matrix. Then on placed on the turntable matrix is set to the spray mechanism 134 mounted on one end of the arm 135 (Fig.16, 17). The arm 135 is arranged to move up and down as described above, by means of the control cylinder 136 and the rotation around the vertical axis with the horizontal control cylinder 137.

The spray mechanism 134 shown in Fig.16 at the position at which the sensor 138, mounted on the turntable 131 (not shown in Fig.16), is sprayed washing liquid for cleaning.

Through the spray device 134 on the matrix 138 is then applied lacquer coating. For this purpose, the arm 135 moves down so that the receiving ring 139 which is connected to the housing 140 mounted on the arm 135 and surrounding the spray mechanism rests on the conical surface of the Cup-shaped device 141, inside the casing, resulting honey external wall of the receiving ring 139 and the bottom edge 142 is formed a space 143 to collect the remnants of varnish. The receiving ring 139 is connected to the housing 140 by means of the pins 144 and the corresponding L-shaped slots forming a bayonet connection with its quick release, while receiving ring 139, when it will accumulate a certain amount of varnish can be easily removed and cleaned.

Finally, the processed matrix is unloaded from the unit for storage or for transmission to other equipment.

During the housing 1 is closed and blocks processing of substrates through pipe 145, which runs between the casing and grille 146, served fresh air.

The sequence of the different blocks may differ from those shown on the drawings.

However, preferred is the location of the block 51 at one end of the housing 1, as such equipment unit as a laser device and an optical system that contain sensitive items that require constant care.

This location of this equipment in a building provides convenient access to it.

In addition, the need to have a variety of storage media, in which the substrate used for forming the matrix, automatically move with the transport mechanism from one block to another and treat each of the blocks including a block drawing of a photoresistive layer, wherein the blocks further include a drying unit photoresistive layer, the block exposure photoresistive layer in accordance with store information, block manifestations photoresistive layer and the metallization side of the substrate carrier shown photoresistive layer, and the unit application of the metallic coating, the said blocks and transporting mechanism placed inside closed during normal operation of the housing, and conveying mechanism is moved in a horizontal plane in two directions oriented at a certain angle to each other.

2. The method according to p. 1, characterized in that the drying unit photoresistive layer substrate is placed in a closed duct, through which pass first warm and then cold air.

3. Device for the manufacture of a matrix disc storage media that contains multiple blocks, such as block application fatores the ISM, having at least one transport node to capture the substrate mounted with the possibility of horizontal and vertical displacement, characterized in that it further comprises a drying unit photoresistive layer, the block exposure photoresistive layer in accordance with store information, block manifestations and metallization for the manifestation of photoresistive layer and the metallization side of the substrate carrier shown photoresistive layer, and the unit application of the metallic coating, with blocks and transporting mechanism placed inside closed during normal operation of the housing and transporting host is installed with the possibility of lateral movement in two directions oriented at a certain angle to each other.

4. The device according to p. 3, characterized in that the unit application of the photoresistive layer with moveable relative to the vertical axis of the block tubes to feed on the upper surface of the substrate washing liquid, the material for the first coating layer and photoresistive material, and site clean-up brush set can move vertically and rotate around its vertical axis.

6. The device according to PP.3 to 5, characterized in that the drying unit photoresistive layer provided with a duct for the installation of the substrate, the node bandwidth warm and then cold air through the duct and the site will heat the air passing through the duct.

7. The device according to p. 6, characterized in that the upper wall of the duct is a window for accommodating the substrate, closed by a cover that is installed movably in the vertical direction can be rotated around the vertical axis.

8. The device under item 6 or 7, characterized in that the duct is made aperture in front of the place of the substrates in the duct.

9. The device according to PP.3 to 8, characterized in that in the manifestations of the photoresistive layer and the metallization of the substrate on the optical drive installed pipes for conveying liquids in the processing layer of photoresist and plating.

10. The device according to p. 9, characterized in that it comprises a pallet associated with drainage pipe and disposed about the rotary table, and a tube for fluid mounted to rotate on this pallet.

11. Ustroyen lenses and mounted around the rotary table can be rotated around a vertical axis, and a laser light source mounted beneath the rotary table with the possibility of transmission through the substrate of the light from the laser source to the lens when analyzing the quality of the substrate shown by the photoresist layer.

12. The device according to PP.2 to 11, characterized in that the power applying metal coating on the substrate is shown with a layer of photoresist is supplied with a reference node for receiving the substrate mounted with the possibility of rotation around the horizontal axis between a position corresponding to the receiving substrate, and a position at which the substrate is on the support site is immersed in a container of electrolyte.

13. The device according to p. 12, characterized in that the block coating gripper Assembly is mounted on the end of the manipulator and is equipped with multiple fingers that are installed with the possibility of reciprocating movement in a radial direction relative to the axis of the capture site when lifting the annular parts intended for installation on a substrate.

14. The device according to PP.12 and 13, characterized in that the coating is supplied installed with the possibility of rotation around the vertical axis, second additional arm which smoa fact, that the clamping ring and the bearing Assembly is provided with pins or L-shaped grooves forming a detachable connection with the fastening of the clamping ring on the support site.

16. The device under item 14 or 15, characterized in that the clamping mechanism clamping ring provided with a holder mounted to rotate relative to the second arm, and a stud fixed to the holder and projecting from its lower side, made with the heads can be installed in the slots of the clamping ring, concentrically arranged around the axis of rotation of the holder.

17. The device according to PP.12 to 16, characterized in that the position at which the reference node is located in the bath electrolyte, the substrate is opposite the hole in the casing is placed in a vessel containing granules of the material for forming the coating, the device is equipped with a node create a flow of fresh electrolyte, passing along facing the inside of the casing side of the substrate.

18. The device according to PP.3 to 17, characterized in that the inside of the body has a removable plate with a window, the center of which coincides with the center of the window in the case.

19. The device according to PP.3 - 18, characterized in that the displacement and rotation around its axis with a second manipulator, provided on the end unit of the lifting of the substrate when placed on the stand and remove the stand of the substrate supplied to this manipulator transport node.

20. The device according to PP.3 to 19, characterized in that it is provided with a block containing a rotary table that has formed the matrix facing the coating at the bottom side, and a third additional arm is made to rotate around its vertical axis with the light source during exposure of the matrix in the area remaining on it a layer of photoresist.

21. The device according to p. 20, characterized in that the block with a turntable and a third additional manipulator equipped with a fourth optional optical drive installed with the possibility of reciprocating movement in the vertical direction, while the fourth additional manipulator posted by spray to be applied on the top surface of the matrix, the washing liquid or varnish.

22. The device according to p. 21, characterized in that the sprinklers are located in the annular casing, the lower edge of which is bent in the upper direction inside the casing.

24. Device according to one of paragraphs. 3 to 23, characterized in that the two transport node for the capture substrate is installed to be movable in upper and lower directions independently of one another on the slide installed with the ability to move in two directions oriented at an angle to each other.

 

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