The composition for artificial amber and method for producing artificial amber

 

(57) Abstract:

Usage: for artificial amber, as heat-resistant coatings, composite materials, molded products. The inventive composition for artificial amber includes 100 wt.h. solution polyglycerylmethacrylate unsaturated monomer or oligomer; 25 to 100 wt.h., rosin and 1 to 7 wt.h. succinic acid. The components of the composition are mixed and the mixture utverjdayut - radiation when the radiation dose is 8 to 20 mrad at room temperature. 2 S. p. f-crystals, 2 tab.

The invention relates to the production of artificial amber on the basis of unsaturated polyester and rosin and can be used as heat-resistant coatings, composite materials, molded products.

Natural amber is a complex mixture of organic substances, namely volatile terpenes and sesquiterpenes, soluble diterpenoids (alcohols, ethers, aldehydes, resin acids and insoluble cross-linked polymer, comprising 75-80% by weight of amber.

Natural amber is characterized by variable chemical composition. A distinctive feature of Baltic amber, succinite, from ambers other fields assessesthe is a composition for artificial amber, including the solution of polyglycerylmethacrylate unsaturated monomer or oligomer and rosin. Part of amber is the initiating system - peroxide, and a curing accelerator.

The method of obtaining artificial amber consists in mixing a solution of polyglycerylmethacrylate unsaturated monomer or oligomer, followed by curing. Curing is carried out using an initiating system at room temperature for 90 days. Get material of similar properties with natural amber (melting point, density, high gloss after polishing).

A disadvantage of the known technical solution is the duration of the curing process, the non-technological process due to the use of explosive peroxides, not sufficiently high hardness, heat resistance, resistance to organic solvents.

An object of the invention is to increase the hardness, heat resistance, resistance to organic solvents, the simplification of the curing process.

The problem is solved in that the composition for artificial amber, including the solution of polyglycerylmethacrylate unsaturated monomer or the a, wt.h.:

The solution polyglycolide-

inattesa in unsaturated

the monomer or oligomer 100 Rosin 25-100 Succinic acid 1-7

The problem is solved in a method of producing artificial amber, which consists in mixing a solution of polyglycerylmethacrylate unsaturated monomer or oligomer and rosin, with subsequent solidification, optionally use succinic acid, the components of the composition are mixed and the mixture utverjdayut-radiation when the radiation dose is 8 to 20 Mrad at room temperature.

According to the invention using 40-45% solution of polypropylenglycol in styrene (resin I, mark MON-609-21), 33-35% solution of privateenglishportal in styrene (resin II, grade M-1), 45-50% solution of polietilenglikolmonostearat in methyl methacrylate (resin III, mark EDL-2), 42-45% solution of polietilenglikolmonostearat in triethylene glycol dimethacrylate (resin IV, mark MON-609-26), the examples use pine rosin can be applied spruce or pine rosin.

P R I m e R 1. To 100 wt.h. molten pine rosin (Tsize= 68aboutWith, GOST 5,65-68) add to 3.6 wt.h. succinic acid (GOST 6341-75). Obrazovanja exposure 21 h at the dose of 200 rad/c). With the release of 98.5% receive transparent brittle material, similar to rosin.

P R I m m e R 2. To 100 wt.h. molten rosin was added with stirring to 100 wt. including unsaturated polyester resins MO-609-21 (TU-6-05-1306-70) - resin I. the Resulting homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 15 Mrad. With the release of 98.3% receive transparent brittle material.

P R I m e R 3. The example is similar to example 2. As the unsaturated polyester resin used resin PN-1 (MRTU 6-05-1082-67) - resin II. With the release of 98,1% receive transparent brittle material.

P R I m e R 4. The example is similar to example 2. As the unsaturated polyester resin used resin EDL-2 (OST 6-05-431-78) - resin III. With the release 98,0% receive transparent brittle material.

P R I m e R 5. The example is similar to example 2. As the unsaturated polyester resin used resin MON-609-26 (TU 6-05-191-92-71) - resin IV. With the release of 98,1% receive transparent brittle material.

P R I m e R 6. To 100 wt.h. resin I at a temperature of 65aboutWith added under stirring to 100 wt. including powdered rosin to form a homogeneous mixture, and 7 wt.h. succinic acid dissolved in 3 ml of ethyl sprta. The resulting mixture is then poured into the p R I m e R 7. To 100 wt.h. molten rosin added under stirring 7 wt. including succinic acid and 100 wt.h. resin I. the Resulting homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 15 Mrad. With access to 98.4% receive transparent solid material.

P R I m e R 8. The example is similar to example 7. As the resin used resin II. With the release of 98.3% receive transparent solid material.

P R I m e R 9. The example is similar to example 7. As the resin used resin III. With the release of 98,1% receive transparent solid material.

P R I m e R 10. The example is similar to example 7. As the resin used resin IV. With the release of 98.2% receive transparent solid material.

P R I m e R 11. The example is similar to example 7. The original mixture is irradiated to an absorbed dose of 20 mrad (the exposure time 28 h). With the release of 98,7% receive transparent solid material.

P R I m e R 12. To 50 wt.h. molten rosin added under stirring to 100 wt.h. resin I. the Resulting homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 12 Mrad (the exposure time of 17 h). With access to 98.6% receive transparent solid material which is easily machined and polished.

P R I m e p 13. To 50 wt.h. molten CMU and is irradiated to an absorbed dose of 12 Mrad. With access to 98.4% receive transparent solid material which is easily machined and polished.

P R I m e R 14. To 50 wt.h. molten rosin added under stirring to 5.4 wt.h. succinic acid and 100 wt.h. resin I. the Resulting homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 12 Mrad. With access to 98.4% receive transparent solid material which is easily machined and polished.

P R I m e R 15. The example is similar to example 12. The original mixture is irradiated to an absorbed dose of 15 Mrad. With the release of 98,8% receive transparent solid material which is easily machined and polished.

P R I m e R 16. The example is similar to example 15. As the resin used resin II. With access to 98.6% receive transparent solid material which is easily machined and polished.

P R I m e R 17. The example is similar to example 15. As the resin used resin III. With the release of 98.2% receive transparent solid material which is easily machined and polished.

P R I m e R 18. The example is similar to example 15. As the resin used resin IV. With access to 98.4% receive transparent solid material which is easily machined and polished.

P R I m e R 19. To 50 wt.h. RA is a homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 15 Mrad. With the release of the 98.9% receive transparent solid material which is easily machined and polished.

P R I m e R 20. The example is similar to example 19. As the resin used resin II. With the release of 98,7% receive transparent solid material which is easily machined and polished.

P R I m e R 21. The example is similar to example 19. As the resin used resin III. With the release of 98.5% receive transparent solid material which is easily machined and polished.

P R I m e R 22. The example is similar to example 19. As the resin used resin IV. With access to 98.6% receive transparent solid material which is easily machined and polished.

P R I m e R 23. To 33 wt.h. molten rosin added under stirring to 100 wt.h. resin I. the Resulting homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 8 mrad (11 h). With access to 98.6% receive transparent solid material which is easily machined and polished.

P R I m e R 24. The example is similar to example 23. The original mixture is irradiated to an absorbed dose of 12 Mrad. With the release of 98,7 % receive transparent solid material which is easily machined and polished.

P R I m e R 25. To 33 wt.h. molten rosin on the up in the form and irradiated to an absorbed dose of 12 Mrad. With the release of 98,8% receive transparent solid material which is easily machined and polished.

P R I m e R 26. To 100 wt.h. resin I at a temperature of 65aboutWith added under stirring portions 33 wt.h. powdered rosin to form a homogeneous mixture. The mixture is then poured into the form and irradiated to an absorbed dose of 15 Mrad. With the release of 98.3% get a solid opaque material that is easily processed.

P R I m e R 27. The example is similar to example 26. As the resin used resin II. With the release of 98.2% get a solid opaque material that is easily processed.

P R I m e R 28. To 33 wt.h. molten rosin added under stirring to 100 wt.h. resin II. The resulting homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 15 Mrad. With the release of 98.5% receive transparent solid material which is easily machined and polished.

P R I m e R 29. The example is similar to example 26. As the resin used resin III. With the release 98,0% get a solid opaque material that is easily processed.

P R I m e R 30. The example is similar to example 28. As the resin used resin III. With the release of 98.3% get a solid transparent material, notorioulsy resin IV. With the release of 98.2% get a solid opaque material that is easily processed.

P R I m e R 32. The example is similar to example 28. As the resin used resin IV. With the release of 98.5% get a solid transparent material, which is easily processed and polished.

P R I m e R 33. The example is similar to example 25. The original mixture is irradiated to an absorbed dose of 15 Mrad. With the release of the 98.9% receive transparent solid material which is easily machined and polished.

P R I m e R 34. To 33 wt.h. molten rosin added under stirring to 1.3 wt.h. succinic acid and 100 wt.h. resin II. The resulting homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 15 Mrad. With access to 98.6% get a solid transparent material, which is easily processed and polished.

P R I m e R 35. The example is similar to example 34. As the resin used resin III. With access to 98.4% get a solid transparent material, which is easily processed and polished.

P R I m e R 36. The example is similar to example 34. As the resin used resin IV. With access to 98.6% get a solid transparent material, which is easily processed and polished.

P R I m e R 37. To 25 wt. including raspravleny blachut to poglosheniy dose of 10 Mrad (the exposure time 14 h). With the release of 98,8% receive transparent solid material which is easily machined and polished.

P R I m e R 38. The example is similar to example 37. As the resin used resin 11. With the release of 98,7% get a solid transparent material, which is easily processed and polished.

P R I m e R 39. The example is similar to example 37. As the resin used resin III. With the release of 98.5% get a solid transparent material, which is easily processed and polished.

P R I m e R 40. The example is similar to example 37. As a starting resin used resin IV. With the release of 98,7% get a solid transparent material, which is easily processed and polished.

P R I m e R 41. To 25 wt.h. molten rosin added under stirring to 1.0 wt.h. succinic acid and 100 wt.h. resin I. the Resulting homogeneous mixture is then poured into the form and irradiated to an absorbed dose of 10 Mrad. With the release of 98.9 per cent get a solid transparent material, which is easily processed and polished.

P R I m e R 42. The example is similar to example 41. As the resin used resin II. C output 98,7% get a solid transparent material, which is easily processed and polished.

P R I m e R 43. The example is similar to the GKO treated and polished.

P R I m e R 44. The example is similar to example 41. As a starting resin used resin IV. With the release of 98,8% get a solid transparent material, which is easily processed and polished.

In table. 1 shows the elemental composition of artificial amber with different mass ratio of resin and rosin.

In the IR spectra of artificial amber (invention) contains absorption bands characteristic of natural amber: 1140, 1160, 1250, 1740 cm-1(the absorption bands of stretching vibrations of C = 0 and C-O-C groups esters); 940 cm-1(the absorption band of deformation vibrations of Oh carboxyl group); 1700-1710 cm-1(vibrations of C=O carboxyl group); 3450 cm-1(stretching vibrations HE carboxyl group); 885, 1410, 3090 cm-1(the absorption band of the valence and deformation vibrations of C-H unsaturated connection type CR1R2= CH2; 995, 1420, 1660, 1800, 3090 cm-1(absorption band unsaturated bond-CH = CH2); 1380, 1455, 2875, 2930 cm-1(bands of deformation and stretching vibrations of C-H groups of CH2and CH3).

In table. 2 presents data on physico-chemical properties of artificial amber, depending on the conditions of obtaining it. For the OI rosin on the fragility and solubility in organic solvents, but with a higher melting temperature. Radiation polymerization of a mixture of resin and rosin at a ratio of 1: 1 (see example 2 table. 2) also leads to the formation of fragile product, but less soluble in alcohol, ether, turpentine. The introduction of succinic acid in the original composition increases the hardness and thermal stability of the polymer product and reduces its solubility in organic solvents. Physico-chemical properties of this artificial amber close to gedanite, varieties of Baltic amber, which is more fragile (the hardness of 1.5-2 on the Mohs scale) and greater solubility in organic solvents compared to succinite.

With the increased amount of resin in the original composition to the ratio of resin and rosin equal to 2:1 (see examples 12-22 table. 2), formed of a solid transparent polymer material. Using succinic acid as a component of the original composition also increases the hardness, thermal stability and reduces the solubility in organic solvents formed of polymeric material (see examples 13, 14, 19-22 table. 2). Physico-chemical properties of this artificial amber close to succinite. It is easy to Ola and rosin, equal to 3: 1 and 4:1 (see examples 25, 33-36, 41-44), increases thermal stability, hardness artificial amber and reduces its solubility in organic solvents. This mixture can be obtained artificial amber, close to or identical with succinite on physico-chemical properties and thermal stability, hardness and resistance to organic solvents superior natural amber (see examples 33, 41).

Thus, the composition for artificial amber according to the invention and the method of its production, allows to obtain a transparent artificial amber with high hardness, heat resistance, resistance to organic solvents, the application of radiation of the method of the curing composition simplifies the technology of preparation of artificial amber.

1. The composition for artificial amber, including the solution of polyglycerylmethacrylate unsaturated monomer or oligomer and rosin, characterized in that it additionally contains succinic acid in the following ratio, wt.h.:

The solution polyglycerylmethacrylate unsaturated monomer or oligomer 100

Rosin 25 - 100

Succinic acid 1 - 7

2. The method of obtaining Iskusstvennyi, followed by curing, characterized in that it further impose succinic acid, the components of the composition are mixed and the mixture utverjdayut-radiation when the radiation dose is 8 to 20 Mrad at room temperature.

 

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