Method of coatings application by plasma spraying and device for its implementation
FIELD: technological processes.
SUBSTANCE: invention relates to coatings ion-plasma sputtering on items in vacuum method and device for its implementation and can be used in metallurgy, plasma chemistry and machine-building industry. Items are placed inside plasma device comprising target from sputtered material. Performing imposition of configured electric and magnetic fields under conditions of glowing plasma discharge, plasma flow compression and its local focusing in target top center to form local plasma spot within 1 mm2 on its surface. Device includes plasma cell placed inside vacuum chamber and during operation filled with plasma-forming gas. Cell is formed between two parallel arranged plates and comprises aligned cathode, target from sprayed material, anode and focusing electrodes. Cathode is made in form of rod-shaped target holder. Sputtering items are fixed in one of focusing electrodes. Cathode with target is installed inside hollow cylindrical magnet having axial magnetization.
EFFECT: result is production of high quality coating while reducing device power consumption.
2 cl, 2 dwg
SUBSTANCE: system for creation of magnetic field of magnetron device includes two installed opposite to each other unbalanced magnetron, on inner surface of which there are fixed implemented of homogeneous material targets and each of which allows oriented in opposite directions internal and external annular magnetic poles. External pole of one magnetron and external pole of other magnetron allow opposite polarity. System allows also two installed opposite to each other high-speed, cooled balanced magnetrons, at inner surface of which there are fixed mosaic faces and each of which allows oriented in opposite directions internal and external annular magnetic poles. In spaces between two couples of unbalanced and balanced magnetron which are located between its annular magnetic poles of the same polarity, are located installed opposite to each other two ion sources with cold cathode implemented in the form of oriented in opposite directions internal and external annular magnetic poles. External pole of each ion source allows polarity, opposite to polarity of external poles of nearest to it unbalanced and balanced magnetron. In two other spaces between two couples of unbalanced and balanced magnetrons which are located between its external annular magnetic poles of different polarity, there are located installed opposite to each other two arc sources of metallic ions with stabilising coils. Method includes following operations: installation of products in planetary carrousel, ion etching and activation of products by means of unbalanced magnetrons, additional activation of products by means of ion source, generating gas ions, heating of products, application of primary coating by means of unbalanced magnetrons, application of secondary coating up to thickness 10 mcm by means of simultaneous using of unbalanced magnetrons and balanced magnetrons, application of main layer of coating by means of simultaneous using of unbalanced and balanced magnetrons, application of main layer with multilayer nanocrystalline structure by means of simultaneous using of unbalanced magnetrons and balanced magnetrons and arc-discharge sources.
EFFECT: increase in efficiency and versatility of process.
5 cl, 2 dwg
SUBSTANCE: invention relates to etching in a vacuum through magnetron sputtering. The method involves sputtering a metal strip (2), moving over at least one counter electrode (3,3',7) made from conducting material in a vacuum chamber (1), in which plasma is formed in the gas near the metal strip (2) so as to form radicals and/or ions which act on this metal strip (2). A holding magnetic circuit (4) is placed above the metal strip (2). The counter electrode (3,3',7) contains a movable surface, which is moved through rotation and/or translational motion relative the metal strip (2). The said surface is moved during etching and is continuously cleaned using a cleaning device (5, 5', 10), mounted beyond the limits of the plasma before repeated effect of the plasma.
EFFECT: higher quality and efficiency of etching in a continuous process.
17 cl, 3 dwg
SUBSTANCE: invention relates to a method of etching through magnetron sputtering in a vacuum chamber (2) of a metal strip (4), moving on a supporting roll (3) opposite a counter electrode (5). In the gas near the metal strip (4), plasma is formed so as to form radicals and/or ions which act on the strip (4). At least one closed magnetic circuit (7), the width of which is essentially equal to the width of the metal strip (4), is chosen from a group of at least two closed magnetic circuits (7) of different and fixed width. The chosen magnetic circuit (7) is then moved so as to position it opposite the metal strip (4) and the moving metal strip (4) is etched.
EFFECT: uniform processing of the entire surface without damaging the supporting roll.
21 cl, 2 dwg
SUBSTANCE: invention relates to a source of filtered vacuum arc plasma (versions) and a method of generating filtered plasma. The plasma is filtered using a filter with a plasma-guide bent at a right angle, provided with at least three extra magnetic coils, placed in the region of the bending of the plasma-guide. According to other embodiments, the source has several cathodes and several outlet openings.
EFFECT: magnetic coils and other elements of the filter, including the system of cross ribs and magnetic trap with actute-angle geometry in the plasma-guide channel, provide for the required efficiency of passage of the plasma through the filter, reduced loss of plasma and reduced output of undesirable particles from the plasma filter.
31 cl, 14 dwg, 1 ex
FIELD: metallurgy; spraying cathodes for application of coats in vacuum chamber; manufacture of articles provided with coats.
SUBSTANCE: proposed cathode has at least one solid target (2) mounted on metal membrane (3). Side of membrane (3) directed from target (2) has cooling passage with delivery line (9) and drain line (10) for cooling fluid and cavity (7) for at least one magnetic system (5) which is located in bath (6) which is sealed relative to membrane (3) and is not subjected to action of cooling fluid. Cathode is located on load-bearing structure (12) which has hollow body (13) hermetically closed relative to interior of vacuum chamber (18); it is used for communication of magnetic system (5) and cavity (7) with atmosphere beyond vacuum chamber (18). Cooling passage is made in form of closed water supply pipe (4) closed over perimeter of section with at least one flat side (4a) which is in heat-conducting connection with membrane (3). Membrane (3) and surfaces of water supply pipe (4) directed away from membrane (3) are subjected to atmospheric pressure through load-bearing structure (12) beyond vacuum chamber (18). Such construction of cathode enhances transfer of heat from target to cooling fluid excluding penetration of it into vacuum chamber.
EFFECT: enhanced operational and economical efficiency.
8 cl, 6 dwg
SUBSTANCE: process is two-staged: at the first stage, a micron-thickness carbon coating is deposited by graphite spraying by kiloelectronvolt ion beam in the vacuum environment. The second stage involves thermodynamic heating of the coating in the vacuum environment by accelerated second-length electron beam to provide the solid-phase graphite transformation into carbine. The process of direct solid-phase graphite transformation into carbine providing a high probability of carbine formation is carried out at temperature 1500-1600 K for 1-2 s.
EFFECT: higher effectiveness of the process ensured by optimising the technological parameters of achieving stable solid-phase graphite transformation into carbine by the high-intensive electron beam specifying the high content of carbon phases with sp-valent electron hybridisation.
2 cl, 2 dwg, 1 ex
SUBSTANCE: invention relates to nanoelectronics and nanoelectromechanics and can be used in various fields of modern nanoindustry, microelectronics, alternative energy, etc. The wear-resistant nanostructured coating is made of nanocomposite metal-ceramic material obtained on ceramised substrate by ion-beam sputtering, and has a structure consisting of granules of the metal phase with an average diameter of 2-4 nm, isolated by the metal phase, at that the concentration of the metal phase constitutes 30-56 at. %.
EFFECT: creation of nanostructured metal-ceramic coating having high wear resistance and stability of the parameters.
1 ex, 1 dwg
SUBSTANCE: invention relates to nanoelectronics and nanoelectromechanics and can be used in various fields of modern nanotechnology industry, microelectronics, alternative energetics, etc. The nanostructured coating is formed from the nanocomposite ceramic-metal material of the composition (CO86Nb12Ta2)x(SiOn)100-x, obtained on ceramised substrate by ion-beam sputtering and having a structure consisting of granules of the metal phase with an average diameter of 2-4 nm, isolated by the continuous ceramic phase, at that the concentration of the metal phase is 20-40 at.%.
EFFECT: improved properties of the coating.
2 cl, 1 dwg
SUBSTANCE: invention relates to the technology of application of nanostructured coatings and can be used in nanoelectronics and nanoelectromechanics. The coating is prepared from the metal-ceramic composite with the structure (Co86Nb12Ta2)x(SiOn)100-x. Precipitation of the composite is carried by ion-beam sputtering to provide formation of granules with the metallic phase with an average diameter of 2-4 nm, isolated by the continuous ceramic phase. The concentration of the metal phase while sputtering is selected in the range of 20-40 at.%.
EFFECT: obtained coatings have high hardness and are characterised by high stability of parameters.
2 cl, 1 dwg, 1 ex
FIELD: machine building.
SUBSTANCE: proposed method comprises heating of material to be evaporated by electron beam and measuring thickness of applied coating. Note here that voltage is fed to anode to create voltage between electrodes corresponding to vapor ionisation potential of material being evaporated. Stable discharge is initiated in vapors of evaporated material to maintain constant discharge current by correcting electron beam current at selected voltage. Coating thickness is measured with the help of discharge integrator, its signal being fed to shutter drive to terminate evaporation process at reaching preset coating thickness.
EFFECT: continuous control over thickness and application rate, possibility to make preset thickness of the coating.
1 ex, 7 dwg
FIELD: machine building.
SUBSTANCE: friction part in lubricating medium is designed for operation at contact pressure exceeding 200 MPa. Part surface is textured and before or after texturing it undergoes face-hardening treatment for reduction of part surface friction coefficient. The surface has periodic chain of micro-metre type cavities, the largest length of which amounts from 5 to 500 microns and period is less than half of width of contacting surface.
EFFECT: depth of the said cavities is less or equal to 3 microns that allows shifting to elastic-hydrodynamic lubrication mode.
17 cl, 4 dwg, 3 ex
SUBSTANCE: invention refers to heat treatment. The structural component out of hardened heat resistant steel is subject to heat treatment consisting in hardening of structural component, in tempering of its boundary layer, in quenching and in additional low temperature cooling; also hardening of the structural component and plasma-ion tempering of the boundary layer are carried out per one production stage by means of heating of the structural element to common temperature of hardening and diffusion Th+d above upper critical temperature Ac3, further holding is performed at this temperature till complete austenisation and release of contained carbon and also till desired saturation of boundary layer with a diffusion element.
EFFECT: production of structural component possessing high strength, toughness, higher hardness of boundary layer and therefore with higher fatigue limit.
13 cl, 3 dwg
FIELD: textile fabrics, paper.
SUBSTANCE: invention is related to methods for treatment of fur hair and may be used to improve performance properties of fur semi-finished products and articles. Method includes ion impact at target and sputtering of target material particles onto fur hair. Ion impact at target is realised by regulated focused ion beam. At that target is installed at angle of 40-80° to regulated focused ion beam. Regulated focused ion beam is created by source of ions. Source of ions used is Hall accelerator with closed electron drift.
EFFECT: expansion of control resources of coating application working process, wider variety of colours and shades on fur garments.
3 cl, 1 dwg
FIELD: electronic industry; glass industry; other industries; devices for production of the multilayered optical coatings.
SUBSTANCE: the invention is pertaining to the device for deposition of the multilayered optical coatings and may be used at manufacture of the laser technology at development of the antireflecting coatings and the reflective coatings on the butt surfaces of the semiconductor lasers. The device contains two targets located in the vacuum chamber and two ion beam formers. In the vacuum chamber there is the multi-channel loading port (MCLP) with the substrates. The pairs including the ion beam former and the target are disposed on the opposite sides of the MCLP. The active gas stream former is made with the capability to form more than one stream and to realize feeding of the active gas particles streams to the different sides of the MCLP. The MCLP is capable to change positions of the substrates and to reorient their working surfaces concerning the pairs of the ion beam former and the target. In each indicated pair the target are executed in the form of the units amounting the unit of targets are made as the components composing the targets block with the capability of their mutual replacement or to be replaced by the designated for cleaning reflective target. The automatic control unit is electrically connected with the ion beam formers, the blocks of the targets, the active gas streams former and the MCLP. The invention is aimed at the increase of the efficiency of the production process and at improvement of reproducibility of the process of deposition of the coatings in the continuous production process.
EFFECT: the invention is aimed at the increase of the production process efficiency and improvement of reproducibility of the process of deposition of the coatings in the continuous production mode.
10 cl, 6 dwg
FIELD: vacuum metallurgy; application of coats on articles of complex configuration.
SUBSTANCE: proposed plant includes technological chamber with the following components arranged inside it: crucibles and electronic guns and prechambers for loading/unloading the cassettes with articles to be coated. Each cassette consists of immovable lower bevel gear, vertical support, shaft, upper movable bevel gear and bevel gears for securing the articles on them. Lower bevel gear is mounted on vertical support inside which shaft is mounted for rotation and engagement with upper movable bevel gear. Mounted between movable and immovable bevel gears are bevel gears for securing the articles to be coated. Proposed plant may be used for application of protective coats of all types, as well as metallic, metal-and-ceramic and silicide coats of gradient micro-layer types.
EFFECT: enhanced efficiency.
5 cl, 5 dwg
FIELD: process engineering.
SUBSTANCE: invention relates to application of coating on power turbine stator element surface. This process comprises application of coating by plasma spraying. Coating powder is sprayed at the angle of 55-70 degrees to spraying surface. Rate of burner feed relative to stator element sprayed surface makes 0.5-1.0 m/s. Spraying spot surface area on stator element equals 1.7-5.0 cm2.
EFFECT: no cracks or lamination, higher strength.