Making of microstructure on substrate
FIELD: process engineering.
SUBSTANCE: invention relates to making of microstructure on substrate and includes the steps that follow. (A) Production of donor film by making of embossed structure with ledges and recesses at first film material and application of transfer ply on embossed structure. (B) Making of acceptor film by application of glue ply on second film material. (C) Masking of donor film and acceptor film by glue ply. Note here that transfer ply at embossed structure ledges is glued with glue ply. (D) Transfer of glued sections onto acceptor film owing to separation of donor film from acceptor film. This results in formation of the first micro structure in acceptor film and/or in donor film second micro structure if formed to supplement said first micro structure. Besides, invention relates to application of produced substrate as a component of protective structure and to protective element produced as described above and to protected product.
EFFECT: higher efficiency.
25 cl, 29 dwg
The subject of this invention is a method for creating a microstructure on a substrate, the use of the obtained according to the proposed method of the substrate with the microstructure as an integral part of the protective element, and the substrate with the microstructure can be used alone or as part of a micro-optics structure display, and wherein the substrate with the microstructure can provide micromatic or structure of the consideration of micromotives. The subject of this invention is a protective element at least one obtained according to the proposed method the substrate with the microstructure and the substrate with the microstructure, the preferred way is part microoptical structure display, as well as the product, such as a storage medium or a branded product, which is equipped with the proposed protective element.
Storage media, such as valuable documents or identity cards, but also valuable items, such as, for example, branded products, to protect often equipped with security features that allow you to authenticate the data carrier and simultaneously serve as protection against unauthorized duplication. The protective elements can be made of, for example, in the form embedded in the banknote security thread, a protective film for banknotes with a hole, �unesennoe protective strips or self-supporting transfer element, which after its manufacture is applied to the value document.
A special role is played protective elements with variable optical elements, when observed under different angles of view of the observer sees different images, since these items cannot be played even using a high quality copier for color printing. For this purpose, the protective elements can be provided with protective signs in the form of diffractive optical micro - and nanostructures, such as a conventional embossed holograms or other diffractive structures, such as, for example, described in the publications EP 0330733 A1 and EP 0064067 A1.
With some time as security features are also used so-called moire magnifying structure. The fundamental principle of operation of such moire magnifying structures described in the article "The moire magnifier", M. C. Hutley, R. Hunt, R. F. Stevens and p. Savander, Pure Appl. Opt. 3 (1994), pp.133-142,. In short, according to this article the increase in moire pattern is an effect that occurs when observing identical raster imaging objects through the lens raster having approximately the same step. As in each pair of similar rasters thus there is a moiré pattern, which consists of a periodic arrangement and increased, if necessary, �overmuch images of the raster elements of the image.
The lattice period and the diameter of the imaging objects are in the same dimension as that of the microlenses lens. The depicted objects must be prepoznavanje to the naked eye. Smaller patterns are, the more protection against counterfeiting.
All methods of creating displayable objects (elements of mikromotivov), in which the main role for the obtained dimensions are the methods of application, as the printing method, less suitable, due to the small size of the structures. Get the minimum size of the elements of mikromotivov limited resolution of the method of application. This is equally valid for the ways in which microstructures are created by direct printing, and for all the ways in which the fabrication of microstructures includes a technological step with limited resolution, for example the application of the photoresist. In addition, when directly printed microstructures due to the high lateral resolution achieved is limited to a maximum layer thickness of the paint, which limited the maximum achievable contrast.
Therefore, the microstructure or the elements of mikromotivov, the preferred way, are manufactured using structures for stamping. Embossing can be performed with very high bit�solution.
From WO 2009/121578 known method of creating micro-optics structure display, which is created on the substrate embossed embossed structure and the channels are filled with paint. The paint in the recesses forms the elements of mikromotivov, while the excess paint is removed by the squeegee. However, this method remains tinting film, which limits the maximum achievable contrast.
From WO 2009/083146 known method for creating a microstructure that creates an embossed structure, and either closed or filled advectively substance only exaltation or only the recesses in the embossed structure. Advectively material should be chosen accordingly with a high viscosity, that he stayed only at higher elevations embossed patterns, or out respectively with low viscosity to fill the recesses embossed patterns. In order to achieve the desired selective deposition, viscosity napechatanogo material and conditions of the transfer should be exactly coordinated.
So far the prior art does not provide a microstructure for micro-optics structures display simply and with desired quality. An additional issue that arises primarily in the case of metallic microstructures, is that for many metals not to exis�, there is no simple and satisfactory methods for "rough structuring", that is, such a structure as, for example, iridescence or negative fonts are allowed or possible, but only with difficulty.
Accordingly, the object of the invention is to prevent the disadvantages of the prior art and, above all, to offer preferential method of manufacturing a microstructure, which meets the requirements of the motive for micro-optics display structures, particularly for micro-optics magnifying structures. These requirements are: a high resolution micromotives, that is, the smaller the elements, the high contrast and sharp contours in the microscopic range, and the ability macroscopic structuring, regardless of the material elements of mikromotivov.
This problem is solved by a method with the features specified in the independent, paragraph 1 of the claims. The protective element with such a substrate with the microstructure and the product from such substrate with the microstructure indicated in the subsequent dependent claims. Improvements of the invention are subject of dependent claims.
The invention is based on the discovery that you can cover with embossed patterns on the entire surface, that is, as eminences and depressions embossed patterns, and also cover the areas of m�waiting elevations and recesses, then glued together under pressure with the carrier material, which is simply provided with glue, again to separate the embossed structure from the glue-coated substrate, and transferred to the glue-coated substrate is only coated elevations of the embossed structure. Surprisingly, the coating breaks off precisely and ensures sharp contours, making it possible to obtain a microstructure with a high contrast, small size and high accuracy, ideal for micro-optics structures consideration.
A particular advantage of the method lies in the number of degrees of freedom and possibilities of variations it offers.Such advantage is the ability to overlay microscopic and macroscopic structures, also when using coatings that cannot be successfully structure macroscopically. This combination of macroscopic and microscopic structuring is achieved through the interaction of microscopic structured substrate with the microstructure and macroscopically structured substrate motif. When transferring a microstructure on a macroscopically structured substrate motif on both substrates occur complementary microstructure. Another advantage of the proposed method lies in the fact that the microstructure can be another success�additional structured, for example, due to the diffraction structures or other kinds of nanostructural. Another advantage is that the dimensions of the portable parts of the coating can be selected so that each of both source materials (donor foil and the acceptor foil) may be used as the substrate with the microstructure. In addition, each of the starting materials, which (if you use a transparent supporting material) after the transfer is accordingly transparent space, instead of the lens patterns serve as a micro-optics structure consideration.
Special forms of the invention have additional advantages.
So, you can use one microstructure of the substrate with the microstructure for the structuring of additional preferred manner, a colored layer. For this purpose, the substrate with the microstructure is provided with a photoactive layer, i.e. the layer that is modified by irradiation of the material, such as photoresist, and is penetrated by the rays through the (source) of the microstructure, i.e. (source) of the microstructure is used as a mask for exposure. After irradiation, the removal of the soluble areas of the photoactive layer and, if necessary, removing the source of microstructures receive the substrate with the microstructure, which, along with the original mi�restructure, has a microstructure of photoactive material or solely microstructure of photoactive material or a combination of the microstructure of the initial microstructures and the microstructures of the photoactive material of the same size.
A preferred way, the substrate with the microstructure combined with micro-optics structures consideration, especially with structures microfocusing elements such as microlens structure or macroposthonia mirror structures in micro-optics structure consideration. Such micro-optics structure consideration especially noticeable and be remembered, if they have a combination of at least two structures of consideration, which behave in different ways when viewed at different angles. Such combinations are, for example, the first display structure that offers at least two different images, which serve as a first cause or first part of the motif, depending on the angle of the consideration, and for the observer creates a stereographic image of the object with absolute depth information, in combination with the second display structure that offers as a second motive or the second part of the motif reflecting surface, and is created for the observer depicted�e with directional reflection. Combined display structure for this type and the resulting effects are described in detail in PCT/EP 2010/007368 and PCT/EP 2010/007369, and will hereinafter be described in more detail primarily with reference to Fig.17 - Fig.27. These motives or part of the motive microscopic structures display can simultaneously create a simple image using the proposed method.
Microstructure for micro-optics display structures that provide stereographic display with absolute depth information, such as moire magnifying structure, magnifying moire patterns type and magnifying module structures are often manufactured by means of stamping on the substrate and filling the embossed recesses paint. Excess paint is removed with a squeegee, but leaves tinting film (WO 2009/121578). Due to this, on the one hand, limited by the maximum achievable contrast, on the other hand, presumably based on the residual of the render, the background is not good to paint the desired (different) color.
Using the proposed method, the background can be painted in a specific color or in multiple colors. Coloring not only enhances the attractiveness of the display, but also leads to increased contrast, especially in the case of metallic microstructures. If the background is done�is multicolored, then forcibly static elements are formed, against which increased moire elements or increased modulo elements move when tilting micro-optics structure display.
The contrast between the colored background and the microstructures or elements of mikromotivov can be increased even more when the color of the background is enclosed reflective layer. Due to this clearly increases the juiciness of colors, and the effect is particularly preferred, especially in the case of paints with poor coverage.
If the reflecting layer is applied only occasionally, when using a transparent carrier material occurs insignificant when viewed from the top and strong, when considering up to the light, the contrast between the areas with a reflective layer and a non reflecting layer. The clearance areas without reflecting layer may seem transparent.
As the reflective layer and the background paint can be applied over the entire surface or only in some places. If in certain areas there is no background color, then applied there reflective coating directly visible.
In the method of manufacturing a microstructure on a substrate is first made of the donor film coating, due to the fact that the first film material is provided with an embossed structure in the form of the structure of the microstructure, ina embossed structure are coated. The coating can be applied on all embossed structure or only some of it. But in any case, coverage in the relevant area / partial area deposited on the entire surface, i.e. the shape of the cover repeats the embossed structure. This does not mean that at higher elevations, recesses and the lateral surfaces of the elevations should be respectively equal to the amount of the coating material. Typically, the thickness of the coating on the hills and in the hollows of the embossed patterns is significantly greater than on the lateral surfaces of the elevations, which typically lie only a little of the coating material. What is the thickness of the coating on the side surfaces actually depends on many factors and among others by how rounded embossed structure and the angle of the applied coating, such as what angle is applied by metal vapor deposition.
Next make the acceptor coating film due to the fact that the second film material on the entire surface or on part of it put a layer of glue.
The donor foil and the acceptor foil now driving so that both surfaces with a coating or with an adhesive layer in contact with each other, and are pressed together in suitable conditions, that the areas at higher elevations embossed patterns are glued together with adhesives�m layer of the acceptor foil.
Finally, the donor foil and the acceptor foil again separated from each other, for example by separation winding. In this case, the donor coating film remains on sleepsense sections of the film on the acceptor, and acceptor films get first substrate with a microstructure, the microstructure of which accurately reflects the microstructure of the elevations of the donor film. In the case of acceptor film is only partially applied adhesive layer is valid only for the respective partial areas. From the donor film to receive a second substrate with a microstructure, which is complementary to the first substrate with the microstructure, i.e., both the substrate with the microstructure from the point of view of the coating behave like positive and negative.
First, more will be explained the production of the donor film. The donor film has a first film material, which is in principle possible to choose a relatively arbitrary (for example, it may consist of paper or plastic. Preferred are plastic films, such as polypropylene, polyethylene, polystyrene, polyester, mainly from polycarbonate or polyethylene terephthalate. Particularly preferred transparent or translucent film. You should use either suitable for embossing the tape or film must be provided on their surfaces p�egodram for embossing coating. Suitable film and is suitable for embossing coating known to the specialist. Particularly well suited thermoplastics, sew thermoplastics and paints for stamping, such as UV-varnishes. Suitable for embossing the coating can be applied over the entire surface or, for example, also in the form of the motive.
On film material or its suitable for embossing layer under increased pressure and, if necessary, elevated temperature and, if necessary, with the effects of UV radiation cause the desired microstructure in the form of an embossed motif. As a tool for embossing can be, for example, a stamping cylinder or other embossed film. Embossing is performed on sections of film material on which the future of the substrate with the microstructure should have a microstructure. Because the infrastructure is primarily designed for the manufacture of a layer of motive and micro-optics structure display or for the manufacture of micro-optics structures consideration of the motive, the microstructure, preferred way, has the elements of a microstructure with a thickness of about 0.5 μm - about 10 μm and/or depth of the structure is about 0.2 μm to about 20 μm, preferably about 1 μm to about 10 μm. Needless to say, the microstructure may also contain planar areas, and they m�may have positive and negative elements. Elevation and deepening can also at least partially to form an interconnected network.
Embossed structure is applied to the desired coating, the conversion layer on the entire surface or on part of it. However, note that the conversion layer will again be alleviated. So it shouldn't be too much attached to the base, in any case with less force than that attained adhesion power used glue later. Quite a small force of attachment may, if necessary, already be achieved through a suitable choice of materials for the film by embossing or coating, suitable for stamping. But, the preferred way, the substrate is pre-treated to reduce the adhesion. For example, the substrate may be rinsed with water and/or solvents with suitable additives or without them. As appropriate additives are suitable, for example, surfactants, defoamers or thickeners. Additives can also be introduced into the film or coating for stamping. Alternatively, at least a partial area may also be provided to reduce the adhesion layer. Reducing adhesion treatment may be performed before or after embossing. The value for strength of adhesion is also a type of applying a transferable layer.
When�principle, as coating materials are suitable all transparent materials, lateral grip which is not too large. In the case of ductile materials is often difficult to achieve the desired breaking transferable layer to form distinct contours. Also the type of application of coating materials can play a role here. In the case of very thin layers, in principle, possible to transfer with providing a clearer outlines than in the case of thicker layers of the same material. A suitable layer thickness is in the range of approximately 30-500 nm, preferably to about 200 nm. Particularly well suitable metals, metal alloys, mixtures of metals that do not form alloys, layers of metals on each other, the metals after the application is depicted in the form of clusters, in principle, all conceivable combinations are compatible with each other metals. Metal coating, which is preferred, is applied by vapor deposition, primarily by physical vapour deposition (PVD). Particularly preferred metals are aluminum, copper, tin, zinc, silver and gold. Through appropriate combinations you can also get the color of the coating. So far the best results were obtained for aluminum with a strip width of 2 mm and a thickness of a layer of aluminum about 50 nm.
Other coating materials are, for�reamer, metallic paints, heat sensitive paints, layers with pigments, fluorescent pigments, or other creating the effect pigments, liquid crystal layers and other coatings with the effect of color change during movement, such as layers of thin-layer elements, and vysokoemkie layers, such as ZnS. A suitable thickness for the above mentioned coating materials is in the range of a few micrometers. Also the possible combinations of layers. Paint usually nadrachivat, but also possibly creating color layers due to the sublimated dyes. Some of these layers cannot be applied directly to an embossed film or a layer of varnish for stamping, they require the application of the intermediate layer. The intermediate layer is advantageous, for example, in the case of the liquid crystal layer to provide a suitable orientation of liquid crystals. Metallization with the effect of color change when driving normally have a ceramic intermediate layer (e.g., SiO2), which is the preferred way should be fine, otherwise more is not always enforced breaking of a dielectric with clear contours. Due to the thin dielectric or well breaking dielectrics can get the colored layers without the effect of color change during the motion, and due to the insignificant�Uo thickness can be avoided without breaking ensure clear contours. As a rule, should not exceed the thickness of the dielectric layer 300 nm, and the thickness of the dielectric layer also depends on the depth of the embossing and the type and quality of vapor deposition or coating, resulting from case to case also thicker layers are possible.
In addition to the donor film prepared acceptor film. Acceptor film also has a carrier film, and in principle, the same materials as for the donor film. As for the donor film is preferable film thickness of approximately 3 μm to approximately 50 μm, particularly about 5 μm to about 25 μm. Particularly preferred transparent or at least translucent film materials.
This film material is coated on one surface with glue. The adhesive layer may be applied either over the entire surface, or as a motive. Under the glue thus it is necessary to understand the material in subsequent conditions of transfer adhesive or can be made sufficiently adhesive for translation. Suitable, for example, adhesives based on copolymers of vinyl chloride and any heat-seal lacquer (thermoplastic), which in conditions of high pressure and high temperature develop translatable adhesion to the coating. Preferably, if the adhesive layer at room temperature, not adhesive to film materials was Namath�VAT and stored in stacks in reserve. Alternatively, adhesive is applied only when necessary. If the adhesive coating is performed shortly before amerivespa, the adhesive coating may also be stitched structure to bonding the donor film and the acceptor film could be performed at a relatively low temperature, while after a certain time, i.e. during the subsequent separation of the donor film and the acceptor adhesive film is so tied to, on the one hand, the translated sections of the transferable layer can be removed from the donor film with clear edges, and, on the other hand, the glue was no longer prone to blocking on not glued areas. An elegant solution to represent system Dual-Cure. These coating systems adictivos diluted with solvents or water and then dried, the solvent and/or water are removed, usually just due to evaporation. When bonding with the donor film adhesive system still has an adhesive strength at least at elevated temperatures, but also after bonding through secondary exposure or common subsequent irradiation, the adhesive coating is connected so that the glued areas more prone to blocking. Is there still a tendency to block (stickiness) that can be checked by SL�blowing test: covered in stripes of foil about the size of 100 cm 2placed in foot and stacked on top of a load of 10 kg and stored for 72 hours at 40°C. If the segments of the film after this is possible without damaging the coating, without any effort to separate from each other, the coating should be considered as non-sticky.
The adhesives can contain conventional additives, such as softeners for adjusting the softening point, or wetting agents, defoamers, waxes, etc. They can also serve as media for characterizing substances, for example, fluorescent substances, or other heat-sensitive pigments, magnetic pigments and other additives.
Particularly suitable adhesives that can be used in the present invention, is described in DE 102004035979, the scope of disclosure of which in this respect is included in this proposal. This adhesive, primarily dispersion adhesives, which contain at least one component, connected to the radiation, and connected at the expense of short-wave radiation, such as ultraviolet or short wavelength visible radiation, or by electron irradiation, preferably by UV irradiation.
Other suitable adhesives are those in the DE 102008036480 resistive lucky. There are named the approximate compositions, and in this respect they become the subject of this proposal. However, the resistive properties of these adhesives in the present invention are not used.
The thickness of the adhesive layer should be aligned to the thickness of the transferred coating. Provided that the adhesive layer when laminating amenable not too much, in principle it can also be thicker than the transferred coating. In any case, the adhesive layer in the laminating conditions should not reach the transferable layer in the recesses of an embossed structure.
Application of the adhesive layer can be performed according to any of the above ways. A preferred way, the adhesive layer napechatala. Along with drawing on the entire surface, it is also possible to apply to the portion of the surface, for example, in the form of a motif. Thus you can define, in what places the donor film must be bonded to the acceptor foil, that is, in what places should execute the transfer of collateral.
The next step is laminating the donor film and the acceptor film, that is, both films are glued with each other through the adhesive layer. For this purpose, both films are reduced or stacked on each other such that the transferred coating of the donor film and the adhesive layer acceptor films face each other, and then are pressed together, the preferred manner at elevated temperature. This embossed structure of the donor film may be, if necessary, is embossed in the acceptor film. Suitable us�ovia bonding is usually about 60°C-160°C, and the linear pressure is usually from 0.1 N/mm to 15 N/mm. the Exact conditions, of course, depend on the type of glue used. In the case of systems with stitching, if necessary, should be irradiated, or at least glued connection is required to leave for a while, to allow crosslinking. The separation of the donor film and the acceptor film from each other it is necessary to ensure that the adhesive bonding between the coating and the adhesive layer is a solid that can no longer be disconnect in terms of division. The preferred way, at the same time not cemented area of the adhesive layer should not be sticky. In the case of the common heat-seal lacquers usually sufficient to wait for the cooling of varnish. Then you can separate the donor foil and the acceptor foil from each other.
A preferred way, the separation is performed by separation winding. The separation of the donor film and the acceptor film from each other, the coating of the donor film comes off exactly to the contours of the surfaces of the bonding of the coating and the adhesive layer. Since the coating on an adhesive layer is kept substantially better than on the donor film, coating areas (elements of the surface of the transferable layer), which are located at higher elevations embossed structure of the donor film, remain bonded with TC�the energy layer, while all other portions of the coating remains bonded with the donor film. Therefore, translated into the acceptor foil surface coating accurately reflect the location and shape of the elevations of the embossed structure of the donor film. In the case of the translation process at the expense of acceptor film receive the substrate with the microstructure, which has translated the elements of the coating surface, while from the donor film to receive a substrate with a microstructure in which there are no precisely these elements of the surface. The microstructure of both substrates in this respect, complement each other. Then the substrate with the microstructure, preferred way, is equipped with a protective coating.
The proposed method is also perfect for creating multicolor microstructures of the materials from which otherwise cannot be created multicolor microstructure or can be created only with great difficulties. Examples of this are the microstructure of various metals. The following is an explanation of the possibility of creating a multicolor microstructures with reference to Fig.5 and Fig.6.
Embossed structure of the donor film usually has one primary structure and secondary structure. The primary structure is set embossed surfaces. For example, this can be provided that is suitable for embossing the coating is applied in the form of a certain motif, whereby it is possible to perform the embossing only surfaces with coating. Alternative type coarse structuring is to perform a transferable coating multi-color, or include only certain parts of the surface, for example, in the form of a motif. The line width of the coarse structuring is usually over 50 microns, with a tolerance of placement of approximately 300 μm. The secondary structure is defined by the shape of the elevations and recesses of the lettering motif. In the case of this precise structuring line width is on the order of about 2 microns. Another type of primary structuring get if you use modulated places reducing adhesion layer. On plots with reduced adhesion (that is, with a layer with low adhesion or anti-adhesion layer) is transferred transfer layer, in the areas in which reduce adhesion layer is missing or deactivated, the transferable coating is not performed. Alternatively (no primary structure of a donor film), or in addition, the primary structure may also be specified adhesive layer of the acceptor foil.
Primary structure and secondary structure can optionally be combined with a tertiary structure. Similar tertiary structure are, for example, diffraction patterns and refracting structure, still� as embossed holographic patterns. Typical embossed holographic structure is significantly flatter than the secondary structure. Tertiary structure can be either over the entire surface or only at higher elevations or only in the recesses of the secondary structure. Tertiary structure is accordingly also in the transferred coating and vitasnella when transferring the transferable coating in the adhesive layer of the acceptor foil and simultaneously translated along with transferable coverage areas. If the tertiary structure is, for example, a hologram that is embossed in the elevations of the embossed structure of the donor film, this holographic information in the translation process translates into the adhesive layer of the acceptor foil. If the holographic information is embossed in the recesses of an embossed structure, at the time of transfer, she is left with a transferable layer on these sites on the donor film.
According to one embodiment, the tertiary structure can represent, for example, nanostructures, which is embossed as a suitable additional structure in the nail stamping donor film. In this form of nanostructural when using plasmons or resonance phenomena can create additional color or through the use of structures "eye of the moth" - blackening. If the nanostructure is embossed in in�zvyseni embossed structure of the donor film, during transfer to the acceptor foil needs to ensure that nanostructural transferred into the glue. If the opposite is embossed nanostructures are in the recesses embossed patterns, this is not required.
Another option tertiary structure represents nanostructural through a suitable coating. Also in this form of nanostructural when using plasmons or resonance phenomena can create additional color or through the use of structures "eye of the moth" - blackening. These effects are, for example, with coatings of paints based varnished fabrics with metallic nanoparticles. The dyeing effect is probably based on the fact that incident electromagnetic radiation excites a volume or surface plasmons in the nanoparticles and/or resonance phenomena. Preferably the metal nanoparticles have a size of from 2 nm to 400 nm, preferably from 5 nm to 300 nm. Metal nanoparticles can be performed essentially in the form of beads, but can also be made to the preferred direction, primarily in the form of a rotational ellipsoid or in the form of rods or plates. In respect of suitable materials we provide on the volume of disclosure applications WO 2009/083151, which in this respect is hereby incorporated into this description. E�and nanostructured coatings themselves can form a transferable coating or be provided in addition to a bill of coating. They also applied over the entire surface (in any case on the sections of the motive of the donor film on which to perform the translation) and to transfer from the elevations of the embossed structure of the donor film in the adhesive layer of the acceptor foil. All other nanostructured portions of the donor film, that is, plots that are not at higher elevations remain on the donor film. Further, the supply of tertiary structure is described in more detail with reference to Fig.8, Fig.9 and Fig.10.
Obtained after the process of transfer from the acceptor from donor film and the carrier film with microstructure can be used as security features, namely respectively by themselves or in combination with micro-optics structure consideration. If such a substrate with the microstructure itself forms a security feature of the security element, it is in known manner provided with protective layers, adhesive layers and, if necessary, additional functional layers, in order to produce a protective item, such as a security thread. The substrate with the microstructure, which is preferred, can be used without microoptical structure of the consideration, hereinafter explained in connection with Fig.10.
Usually obtained according to the proposed method of the substrate with the microstructures are combined with one or two PT�the structure of consideration of mikromotivov in micro-optics display structure. The substrate with the microstructure in this case forms a layer of mikromotivov microoptical structure display. First of all, micro-optics structure display are micro-optics magnifying structures such as moire magnifying structure, magnifying moire structure type and magnifying module structure, as they are described in the documents DE 102005062132, WO 2007/076952, DE 10 2007 029 203, WO 2009/000529, WO 2009/000527 and WO 2009/000528, the scope of disclosure of which in this respect is hereby incorporated into this application by reference. All these micro-optics magnifying structures contain an image of the motif with microstructures, which when viewed from suitably configured raster consideration reconstructs a predefined specified image. As aptly explained in the aforementioned documents, and you can create a variety of visually appealing effects of magnification and movement that lead to a high recognition factor and a high security against forgery equipped with protective elements. As structures of consideration are micro patterns, but can also use other patterns microfocusing elements. The proposed substrate with microstructures in General can provide the reporting mikromotivov in any micro-optics� the display structures. Examples of micro-optics structures display with the proposed substrate with the microstructure shown in Fig.11 - Fig.13, Fig.15, Fig.18, Fig.21 - Fig.23 and Fig.26 - Fig.29. As seen in these figures, the proposed substrate with a microstructure can be supplied from one side or both sides microfocusing elements (microlens in the figures). In addition, the substrate with the microstructure can be either a separate part of the structure display, have its own supporting material, or it may be built into the structure of microphonemicrophone, i.e. the load-carrying material structure microphonemicrophone can be both a carrying material with microstructure.
In a preferred improvement of the invention, the microstructure offers an image of the motif, which is divided into many cells, which are respectively mapped to the predefined areas of a given image. The lateral dimensions of the mapped areas, the preferred way, ranging from about 5 μm to about 50 μm, especially from about 10 μm to about 35 μm. In the first above-mentioned microoptical moire magnifying the displayed portions of the image cells of the motif are respectively reduced to the predefined display a predetermined image, which Paul�awn fit inside a single cell. In micro-optics magnifying moire structures of the type shown several plots of image cells of the motif together represent one reduced accordingly and, if necessary, linearly depicted displaying a predetermined image, the tension of which more than one cell image of the motif. In the most General case, magnifying a magnifying structure of the module, wherein displayed portions of the image cells of the motif are respectively displayed by the operation module, not a complete cut-predefined specified image.
According to another embodiment of this invention the substrate with the microstructure can also be performed in such a way that they can be used in place structures microphonemicrophone as alternative structures considered in the microoptical display structures. Examples of alternative elements of consideration are shadow masks and slotted masks or inverse shadow and slotted masks, which can be produced very simply, due to the fact that the material of the donor film is supplied with lettering of appropriate size and covered with a transparent coating. After the transfer of the opaque coating elevations of the donor film on the acceptor acceptor film film on participation�Kah elevations is opaque places and pits - transparent places, and each transparent side (shadow mask, flat mask) may be an element of consideration of micromotives. Accordingly, the donor film on the portions of the elevations has a transparent places and pits - places with opaque coverage, and also any transparent or not transparent any place can serve as an element of consideration of micromotives. The advantage of such elements consideration of mikromotivov is that does not require specific focal distance to the considered micromotives, as in a lens structures.
First of all, for the formation of shadow masks and slotted masks for use in microoptical structures display a transparent dimensions compared to the dimensions of the opaque field must be rather insignificant. Preferably the dimensions of the transparent spots are from 1 to 5 μm, particularly preferably from 1 μm to 3 μm. In addition, to prevent that the acceptor the donor film and foil laminating touch on the sections of the grooves and lead to unwanted additional translation surface, here an embossed structure, the preferred way should be implemented in such a way that the surface elements of vozvyshena� have a significantly larger area than the surface elements of the recesses. Accordingly, the elements of consideration of mikromotivov shadow or slotted masks, preferably, formed of a transparent places acceptor film.
Because as part of micromotives, and an integral part of the review of mikromotivov microoptical structure display can be manufactured according to the proposed method, we mikropticheskie structure display can have one manufactured according to the invention a part of mikromotivov or one manufactured according to the invention a part of the consideration of mikromotivov or both of these parts.
However, it should be emphasized that the invention is not limited to these applications. Moreover, the described method may preferably be used in the manufacture of other security elements, for example, when printing, micro-text on paper or film.
The protective elements with the proposed substrate with the microstructure may have additional functional layers, i.e. layers that have any properties that can be confirmed visually or by machine. Therefore, the functional layers contain, for example, dyes, fluorescent substances, heat-sensitive substances, liquid crystals, interfere�ionic pigments, electrically conductive substances, magnetic substances, sitedirectory or svetoprelomlyayuschimi patterns, or combinations thereof. In addition, should provide appropriate layers for application to a securable object, such as an adhesive layer.
The proposed security elements can be used to ensure authenticity of goods of any kind. The preferred way, they are used to ensure the authenticity of valuable documents, such as banknotes, cheques or identity on the basis of plastic cards. However, they can be located on one surface of the valuable document or to be fully or partially recessed into a valuable document. With particular advantage they are used in a valuable document with a hole to close the hole. In this case, the protective element can be viewed from both sides, and in the case of the proposed protective elements, depending on performance, recognized by the same or different motifs. Also negative fonts with thin structures, which can easily be manufactured by the proposed substrate with the microstructure, the clearance can easily be recognized. Such protective elements forger is not practical to simulate.
The proposed substrate with a microstructure or protective elements can be manufactured separately�about, but are usually made in the form of arcs or bands with a plurality of individual units of use. The protective elements can also be provided in the form of bills of materials, it means the arc or tape with many ready and prepared to transfer the security element. In the case of a bill of material structure of the future layers of the security element is prepared, as is known to the specialist, on the raw material in the reverse sequence, in which the structure of the layers must then be protected securities.
The invention still further will be clearly depicted with reference to figures. Indicates that the figures are not to scale and without keeping the proportions. Also shown on the same figure the signs can be used not only in combination with other signs depicted in the corresponding figure. Moreover, as described in connection with the special form of the signs, in General, can be used in the method or substrate of the microstructure or the protective element. In addition, depicts the signs or layers, significant only for the understanding of the described method or the described effects. It is clear that there may be a range of additional features or layers. Identical reference signs denote identical or resp�sponding elements. Shown in:
Fig.1 schematic representation of the banknote with protective elements in the form of an embedded security thread and an affixed transfer element,
Fig.2 schematic representation of the layer structure of one form of implementation of the proposed protective element,
Fig.3 implementation of the proposed method of creating a substrate with a microstructure, the image on the cuts of the donor film and the acceptor film at various steps of the method
Fig.4 an alternative implementation of the proposed method of creating a substrate with a microstructure, the image on the cuts of the donor film and the acceptor film at various steps of the method
Fig.5 implementation of the proposed method, in which the substrate with the microstructure is fabricated with multicolor motif and negative font
Fig.6 alternative implementation of the proposed method, in which the substrate with the microstructure is fabricated with multicolor motif and negative font
Fig.7 technological steps of the proposed method, respectively shown in the top views and section views of donor and acceptor films,
Fig.8 - Fig.10 cuts of the various forms of implementing the proposed substrate with a microstructure with tertiary structures
Fig.11 - Fig.13 sections of the forms of implementation of micro-optics structures display the proposed protective element�s,
Fig.14 is a sectional view of a donor film during manufacture of the substrate with a microstructure for use as a framework for addressing micromotives,
Fig.15 is a sectional view of another form of implementation of the micro-optics structure display of the proposed protective element,
Fig.16 implementation of the proposed method of creating a substrate with a microstructure, the image on the cuts of the donor film and the acceptor film at various steps of the method, and are somewhat uniform in size or complementary microstructures,
Fig.17A enlarged top view of the protective element according to Fig.1,
Fig.17B top view of an alternative proposed protective element,
Fig.18 view of the protective element in the sectional view according to Fig.17A,
Fig.19 and Fig.20 is a schematic view for explaining the principle of operation of micro-optics structures display protective element according to Fig.17A,
Fig.21 - Fig.23 kinds of other forms of implementing the proposed security elements in the cut,
Fig.24 is a top view used in the proposed protective elements ultra thin display structure,
Fig.25 is a section along line 39 according to Fig.25,
Fig.26 and Fig.27 versions of the proposed method of manufacturing micro-optics combined display structures of the first and second micro-optics structure display, and
Fig and Fig.29 sections of alternative forms of implementation of the proposed optical display structures.
The invention will now be explained on the basis of non-limiting examples. Fig.1 shows a schematic representation of the banknote 1, which is equipped with three protective elements 2, 3 and 6 according to the present invention. The protective element 2 is a security thread, which acts on certain "window" areas 4 on the surface of the banknote 1, while located between these areas it is recessed inside the banknote. The protective elements 3 and 6 are pasted transferable elements of any shape. Alternatively, it can also go on the protective elements in the form of a protective film, which are located in or over a window area or a through hole of the banknote.
As a security thread 2, and the conversion elements 3 and 6 may contain micro-optics display structure according to one embodiment of the invention. As explained more above, such a micro-optics structure display is made primarily in the form of moire magnifying structure, in the form of micro-optics magnifying moire patterns type or in the form of magnifying module structure. The principle of operation and the proposed method of manufacture for such structures the following describes more in detail on the basis of the protective element 5 with moire magnifying structure. The protective element 6 is �kombinirovannym protective element. Combined protective elements described in connection with Fig.17 - Fig.27.
Fig.2 schematically shows the layer structure of one form of implementation of the protective element 5, for example a security thread 2 or transferable element 3 according to Fig.1. Here, as in all other figures, shows only part of the layer structure required to explain the principle of operation. The protective element 5 has a supporting material 10 in the form of a transparent synthetic film, such as PET film (polyethylene terephthalate) with a thickness of about 20 μm. On the upper side of the substrate 10 in the form of a raster are the microlenses 11, which is formed on the microlenses (shown by the dash-lines). Thus, the substrate forms an optical spacer layer, which provides the desired constant distance between the microlenses 11 and the elements 14 micromotives. On the basis of the slightly differing lattice parameters of the observer when considering the top through the microlenses 11 see respectively a slightly different partial section of the elements 14 micromotives, the microlenses 11 in General creates an enlarged image of the elements 14 micromotives. Emerging moire magnification depends on the relative differences of the lattice parameters used Bravais lattices. If, for example, the grating periods of two hexagonal lattices differ by 1% you get 100-fold moire magnification. For a more detailed image of the operating principle and preferred locations raster motive and raster microlenses again reference is made to the publication DE 102005062132 and WO 2007/076952, the scope of disclosure of which in this respect is included in this proposal.
However, the above implementation options should not be understood so that the present invention in any way limited to the moire magnifying structure. Moreover, the invention, in General, can be applied to the microoptical display structures, and particularly preferably also magnifying structures overlay modulo (Modulo-Mapping), as described in applications WO 2009/00528 and WO 2009/00527.
Fig.3 depicts the performance of the proposed method. Come from a transparent donor film 20 (Fig.3A), which is covered on one of its main surfaces 22 transparent, suitable for embossing layer 23. Suitable for embossing the layer 23 is embossed embossed structure with elevation and depressions, and depth of structure, the preferred way is in a range from about 0.5 μm to about 10 μm, and the thickness of the line, the preferred way is in a range from about 1 μm to about 10 μm. That is, the surface embossed patterns formed from raised surfaces 25, advanced surface�she was 26 and surfaces on the sides of the elevations 27.
It should be noted, however, that this and all further figures embossed structure for simplified image is always represented as the surface of the substrate a two-dimensional Bravais lattice with a preselected symmetry. Bravais lattice can have, for example, the hexagonal symmetry of the lattice, however, preferred due to the high protection against counterfeiting is a lower symmetry and thus a more General form, especially the symmetry of the lattice with cells in the form of a parallelogram.
The distance between adjacent microlenses 11, the preferred way, it is possible to provide the greatest area of coverage and thus a higher contrast display. Made spherical or aspherical microlenses 11, preferably, have a diameter of from 5 μm to 50 μm and, particularly, the diameter is from 10 μm to 35 μm, and are therefore impossible to detect with the naked eye.
On the bottom side of the transparent substrate 10 is a layer 15 of motive, which also includes having the form of a raster structure identical elements 14 micromotives. Also the structure of the elements 14 micromotives forms a two-dimensional Bravais lattice with a preselected symmetry, for example, with a hexagonal symmetry or symmetry of the lattice with cells in the form of a parallelogram. Layer 15 micromotives way�tsya offered by the substrate microstructure, moreover, the elements 14 micromotives or received by recesses of the embossed structure of the donor film, or correspond to the raised surface elements cover the donor film is transferred to the acceptor film. For fixing the protective element for valuable document is provided for the adhesive layer 16.
As shown in Fig.2 by means of displacement elements 14 micromotives relative to the microlenses 11, Bravais lattice elements 11 micromotives slightly different in their focus and/or the size of its lattice parameters from the Bravais lattice of the microlenses 11 to create the desired effect of moiré magnification. The order of the lattice period and the diameter of the elements 14 micromotives in this case is identical to the lattice period and the diameter of the microlenses 11 is in the range from 1 μm to 50 μm, particularly in the range from 10 μm to 35 μm, whereby the elements 14 micromotives impossible to recognize with the naked eye.
The optical thickness of the substrate 10 and the focal length of the microlenses 11 are so matched to each other that the layer 15 of motive, means and elements 14 micromotives are approximately the focal length of the rectangular structure. In fact, the preferred are embossed patterns with sharp edges, because here the separation of upland and in-depth surface elements may �panatina definite. Depending on the used coating material in practice to achieve the desired breaking of the coating with clear contours also can be very use rounded embossed structures with continuous transitions between elevations and recesses.
It must be made of the substrate with the microstructure of mikromotivov metal element of micromotives, and motive requires that certain portions of the substrate of mikromotivov remain free from metallization. In the case of coatings that can be nadpechatany in the form of a specific motive, such a requirement is not a problem, but metallization in most cases can be made only on the surface, because usually they are applied by vapor deposition, and vapor deposition in the form of a motive is still impossible. Therefore, the portions of the surfaces without metallization shall be made in any other way. In Fig.3 an embodiment of the method uses the so-called "detergent method", as he is known for making so-called "negative fonts. Negative type is a notch of any shape, that is, any pass in the full surface, in an opaque coating. In the case of this invention, in which elements of mikromotivov forces are not coverage throughout top�spine, under negative font understand the lack of elements of mikromotivov the rest of the regular structure of the elements of mikromotivov. In this washing method, the preferred way to metallization on an embossed structure nadrachivat soluble washable paint in the form of the desired area demetallization, and washed off the paint washed off after metallization with it by means of a solvent. Other details of such a cleaning method can be found in the publication WO 99/13157, the disclosure of which in this respect is included in this proposal.
Before applying the conversion coating preferably reduce adhesion processing of the coated surface. For this purpose, for example, an embossed structure on the entire surface is applied washable paint, washable paint washed off again. The application and subsequent wash-out wash-off paint in principle proven to reduce adhesion processing.
As shown in Fig.3B to the surface embossed patterns on the land should be free from elements of mikromotivov, applied washable paint 35. Then the embossed structure across the surface of the vapor deposited metal, and there is a cover 30 which covers as indelible paint 35 and raise the surface 25 and the recessed surface 26 of the embossed patterns. Fig.3B does not show�about, what metal covering more or less strongly covers and side surfaces 27 of the elevations of the embossed structure. What is the thickness of the coating on the side surfaces actually depends on many factors and among others by how rounded embossed structure and from which angle is applied by metal vapor deposition. In any case, the coating is always depicted as a mostly continuous layer, which is formed of raised surface elements 33 on raised surfaces 25, depth of surface elements 34 on depth surfaces 26 and surface elements on the side surfaces 27 and in the exemplary embodiment of elements over the surface, rinse-off paint 35. The thickness of the coating 30, the preferred way, has a dimension of about 50 nm. "Surface elements" unlike surfaces have a certain thickness.
Fig.3 shows the condition after rinsing, rinse-off paint 35 and above her metallization 39. Previously covered with washable paint land is now free from metallization, while the metallization on other areas there is no change. This donor film 20 is now brought into contact with the acceptor foil 50. Acceptor foil 50 is shown in Fig.3A. It consists of a transparent film material 51, which pokreta one of its major surfaces 52 on the entire surface of the transparent adhesive layer 53. Acceptor foil 50 (Fig.3A) and the donor film 20 (Fig.3) are pressed together, the preferred manner at elevated pressure and elevated temperature. During the process of laminating the embossed structure of the donor film 20 optional can be transferred to the adhesive layer 53 of the acceptor foil 50. Accurate laminating conditions depend on the type of glue used. If necessary, may require the irradiation of the composite donor film 20 and the acceptor foil 50, or at least a certain time in order to achieve crosslinking and curing of the adhesive. When the glue has cooled and/or hardened enough, both films are again separated from each other, preferably by separation winding. Thus from the donor film 20 to the substrate 46 with microstructure (Fig.3D) and of the acceptor foil 50 occurs, the substrate 45 with microstructure (Fig.3E). As can be seen in Fig.3E, the substrate 45 with microstructure has only a partial area of its surface raised surface elements 33 of the transferable layer. The plot, which has a raised surface elements 33 transferable layer, corresponds to the portion 28 of the donor film which has been metallized over the entire surface. Of section 29 of the donor film, which through pre-washed paint was removed conversion layer, of course, notcould be transferred raised surface elements transferable layer in the adhesive layer 53 of the acceptor film over the entire surface. Raised surface elements 33 transferable layer form micromatic substrate 45 with microstructure. The primary structure of mikromotivov is determined by the location of surface elements 33, while the exact structure (secondary structure) is determined by the motif stamping. In shown in Fig.3E the form of the motif is then covered with a protective layer 65. In principle, it is reasonable to protect the motive in any way, but this function can also perform any other layer with which the substrate with the microstructure needs to be combined otherwise.
Fig.4 shows an alternative implementation of the proposed method of manufacturing a substrate with a microstructure. This variant of the method is used primarily, if made micromatic has areas that are free from the elements of mikromotivov (e.g., negative type), but there is no convenient method for preliminary formation of this coarse structure (primary structure) in the donor film. This is primarily valid for bills of various metal layers. In this case, the donor film 20, which is, for example, the first film material layer 21 and 23 of the embossing over the entire surface, as shown in Fig.4A, the entire surface is covered by a transferable layer. First of all, the translation�th layer consists of in-depth of surface elements 34, raised surface elements 33 and shown in Fig.4A surface elements on the sections of the side surfaces of the elevations of the layer of stamping. This donor film 20 Kashira with acceptor foil 50, which is only partial sections is provided with an adhesive layer 53. Such acceptor foil 50 is shown in Fig.4B. Here film supporting material 51 on the section 60 is free from the adhesive layer 53. Plot 60 is a garden, which is made from the acceptor foil 50 of the substrate 45 with the microstructure must have elements of mikromotivov. The donor film 20 and the acceptor foil 50 are connected to each other, as described above, under high pressure and at elevated temperature, and then separated again from each other.
The state after the separation shown in Fig.4B and Fig.4D. On the plot on which the acceptor foil 50 glue was applied, the conversion layer has been embossed and transferred elevations of the embossed structure of the donor film to the adhesive layer of the acceptor foil. The substrate 45 with microstructure 45 (Fig.4D) in accordance with this is the motive, which translated is formed raised surface elements 33 of the transferable layer. Formed from the donor film 20 to the substrate 45 with microstructure (Fig.4B) is in accordance with that supplementing the microstructure, and the microstructure in this case�e is metallized over the entire surface with the structure of the "holes" in the plating. The holes are respectively the places of the towering surfaces 25, which raised surface elements 33 transferable layer were transferred to the acceptor foil 50.
Fig.5 shows the performance of the proposed method, which is similar to that shown in Fig.3 the implementation of the method. However, unlike Fig.3 should now be made tri-color motif.
Again emanate from the donor film 20 and the carrier film 21, which has a textured layer 23, is embossed over the entire surface. Embossed structure has a raised surface 25 and the recessed surface 26 (Fig.5A). The embossed surface of the layer 23, if necessary after pre-treatment to reduce the adhesion, the fractional area covered by the first washable paint 35, as shown in Fig.5B. Plot 30' remains free from washable paint. Then across the surface of the vapor deposited first metallization 30. Metallization 30 is only 30' directly on the surface of the layer 23 of stamping, but on all other sites on washable paint 35. On these sites metallization 30 can be cleaned only known way to achieve shown in Fig.5 In the state. Fig.5B and in subsequent figures, the coating 30, in contrast to Fig.3 and Fig.4, depicted also on the side surfaces 27 of the embossed elevations with�of rectory.
The operation of applying indelible ink on partial areas, the subsequent metallization and removal of the metallization on the sections washed over paint now repeated as often as necessary to create the desired iridescence produced motive. In this case, must be made tri-color motif. That is, in General, should be performed applying indelible ink on the surface of three times, causing the plating to the entire surface, and subsequent removal of the metallization areas on washable paint. First, on the part of the surface layer 23 of stamping (Fig.5G) is applied washable paint 36, which may be identical to the previous wash off the paint 35 or not, and it also partially covers the metallization 30. Partial area 31' of the surface remains free. Then vapor deposited second metallization 31, and occurs shown in Fig.5G condition. After rinsing, rinse-off paint 36 and positioned above the wash-off paint areas of the metallization 31 get shown in Fig.5D film that on the first partial area covered by the first metallization 30, and the other partial area - second metallization 31.
Now, as shown in Fig.5E, causing a third wash off the paint 37, which may be identical washable paints 35, 36 or not. Partial UCHASTOK' surface layer 23 of the embossing remains free from washable paint 37. Then put the third metallization 32, and then remove it again on the site, which is located above washable paint 37, together with washable paint. This produces a shown in Fig.I donor film with a transferable layer, which consists of various materials, usually of different colors. On a plot of 38 transferable layer has a gap. On this stretch of the carrier film 21 in the previous metallization was always covered with washable paint, resulting in the metallization was washed with washable paint.
With this donor film should now be created multicolor layer of mikromotivov acceptor in the film. Suitable acceptor foil 50 has a carrier film 51, which on the one main surface 52 across the surface of the applied adhesive layer 53 (Fig.53). For better plausibility next now transfer process, the donor film 20 is again shown directly below the acceptor foil 50. As can be seen in Fig.5I, the donor film 20 has portions 28 with a transferable layer and one section 29 without transferable layer. After laminating the donor film 20 and the acceptor foil 50 and consequent separation of the films to transfer the transferable layer of the acceptor foil 50 get shown in Fig.5K substrate 45 with micromotion, and from the donor film 20 is shown in Fig.5L substrate 45 with m�cremation. The substrate 45 with micromotion again has a motive, which is formed rescheduled raised surface elements 33 of the transferable layer. Pictured here, the substrate 45 with micromotion has such a feature: it shows various types, depending on which side it is viewed. When consideration is shown in Fig.5 By an arrow the direction of the observer sees only a two-tone motif (elements 30, 32 micromotives), but when you look in the opposite direction - the tricolor motif (items 30, 31, 32 micromotives). This is because some of the elements of mikromotivov (three right-wing element of mikromotivov in Fig.5K) "two-layer", because it was made of double plating.
Made from the donor film 20 to the substrate 46 with microstructure is complementary to the substrate 45 with micromotion microstructure, i.e. raised surface 25 is now free from all transferable layer, while the depth of the surface elements 34 transferable layer and the surface elements are transferable layer on the side surfaces of the elevations shown unchanged. "Negative, the font is not metallized section 29, of course, available on both substrates 45, 46 with microstructure. Should indicate that remaining on the substrate 46 with the microstructure of the conversion layer on the side surface�ies elevations actually significant thinner than shown in Fig.5L.
Fig.6 illustrates the method, as in Fig.4, but with the difference that needs to be created the tricolor micromatic, as in Fig.5. As shown in Fig.6A, again on the carrier film 21 is applied to the embossed layer 23 is embossed over the entire surface, wherein the embossment has a raised surface 25, in-depth surface 26 and side surfaces 27 of the elevations. This embossed structure over the entire surface applied to the conversion layer of the first metal 30, wherein the coating consists of raised surface elements 33, depth of surface elements 34 and surface elements on the side surfaces 27 of the elevations. On another film material 51 on one of its major surfaces 52 is applied to the adhesive layer 53. But the coating is performed only on part of the surface, as shown in Fig.6B, whereby there are areas 56 with adhesive and the areas 60 without glue. Donor film according to Fig.6A and acceptor film according to Fig.6B then glued together in a film composite, and bonding can be performed only on the section 56 of the acceptor foil 50. On this stretch of raised surface elements 33 transferable layer 30 bytesready in glue and stick together with him. Fig.6 transferred surface elements of the transferable layer, respectively imaged on the surface of the adhesive layer. On with�IOM fact they can be embossed in the adhesive layer in a more or less strong extent depending on the pressure side. Fig.6B shows the state of the acceptor film 50 after the separation of the winding.
During the further operations of coating and laminating now apply the elements of mikromotivov from other metals. This raises the problem that the adhesive layer 53 after the separation of the winding on all sites on which they are not glued to the metal 30, is still potentially adhesive, at least in the laminating conditions, i.e. at elevated pressure and, if necessary, at an elevated temperature. Therefore, this adhesive layer during further migration would uncontrollably be transferred transferable material layer. In all embodiments of the method, which include multiple transfer surface elements of a bill acceptor layer on the film, therefore, the preferred manner, taking measures in order to deactivate, respectively, prior to the adhesive layer. You can do this in two steps, namely, on the one hand, the changes of the adhesive layer, and on the other hand, the coating of the adhesive layer. A variation of the adhesive layer so that further operations he remains completely inactive, this is the preferred approach for adhesive layers, which may be sufficiently deactivated due to the "stitching". De�ctivate due to the "stitching" is done, the preferred way, before applying further adhesive layers. Alternatively, it is possible to prevent the adhesive layer to participate in further transfers through pleasego coating layer. The choice of such coating layers should pay attention to the fact that they don't soften too much layers to which they are applied.
Fig.6 shows a variant of the method, the coating layers. Fig.6G shows the acceptor foil 50 after first migration (Fig.6B), and already prepared for the next transfer operation. Acceptor film is covered with the cover layer 65, and there is an additional adhesive 54 which is deposited only on the portion of the surface, for example in the form of macroscopic motif. Thus again receive parcels 57 with an adhesive layer and sections 61 without the adhesive layer 54. Another donor film 20, as shown in Fig.6D, put another conversion layer 31 over the entire surface. The conversion layer 31 can also be metal or any other surface. Now cover 31 is transferred to the acceptor foil according to Fig.6G, as previously explained in connection with Fig.6A and Fig.6B. This produces a shown in Fig.6D acceptor film. To deactivate the adhesive layer 54, is now again applied to the cover layer 66 (Fig.6g). On the coating layer 66 is then on the part of the surface is applied to the third adhesive layer 5 (Fig.6I), thereby arise adhesive areas 58 and nucleases sections 62. This acceptor foil 50 is again transferred transferable material layer in the form of elements of mikromotivov. For this purpose, shown in Fig.63 donor film 20, which differs from that shown in Fig.6A and Fig.6D donor films only type of transferable coatings.
Fig.6I depicts the finished substrate 45 with micromotion, which was obtained after the transfer of the transferable layer 32 and covering the covering layer 67 of the acceptor foil 50. Unlike shown in Fig.5 a variant of the method, in an embodiment of the method according to Fig.6 do not receive the substrate with the microstructure of the donor film 20, which is exactly complementary to the substrate 45 with microstructure. Get rather a few of substrate 46 with microstructure, which are respectively partially complementary to the substrate 45 with microstructure.
Unlike the variant of the method according to Fig.5, there also receive a substrate 45 with microstructure, which when considering the above and in consideration of the bottom respectively provides the same species. If needs to be manufactured, the substrate 45 with microstructure (Fig.6M), which offers various kinds, as shown in Fig.5K substrate with the microstructure, then the donor film 20 in Fig.6D should be fitted with a two-layer transfer layer, i.e. PE�uvodna layer or under a transferable layer, there must be a conversion layer 32. If the elements 30, 31, 32 micromotives different levels of transfer partially overlap with one another, it also leads to different types when considering top or review below.
In Fig.6 an embodiment of the method it is impossible to achieve such a precise cast of motives, as in the embodiment of the method depicted in Fig.5. Therefore, it is preferable to avoid the superposition of the individual adhesive layers 53, 54, 55, because the area of overlap, especially when using the substrate of mikromotivov as a layer motif microoptical moire magnifying structure, we should expect the "jumps" of the motive or the imposition of motives. However, this disadvantage can also be converted to the advantage, and get by creating different planes additional effects. Thus, first of all, when choosing different raster motive, as a rule, does not require the imposition of exact register.
For better visualization of the proposed method in Fig.7 accordingly, the donor film 20 and the acceptor foil 50 are contrasted in the context of relevant in top view. In principle represent a variant of the method according to Fig.4. Fig.7A shows a top view of the donor film 20, so to say "from below". The carrier film 21 is embossed directly, i.e. there is no separate embossed layer, and embossing here for simplified�fucking image consists of a regular arrangement of rectangles which form of exaltation. It is clear that the embossing may be performed in any form of patterns, characters or codings. On the donor film 20 on the entire surface of the coating 30, and we can talk about any surface, such as metallization or printed layer. On the top view bottom visible raised surface elements 33 and depth of surface elements 34 of the coating, i.e. the conversion layer. Fig.7B shows the donor film 20 of Fig.7A in section along the line a-A'.
Fig.7B shows the acceptor foil 50 in the top view. Acceptor foil 50 on the portion of the surface covered with adhesive layer 53, and the middle portion 60 in the shape of a rectangle remains free. On this site we look at the major surface 52 of the carrier film 51. Fig.7G again shows a cross section of the acceptor foil 50 according to Fig.7B.
Fig.7D shows the time of lamination of the two films 20 and 50 in cross section. On glued areas acceptor 56 film 50 arise contact areas 70 with a transferable layer 30 and the donor film 20, while on the section 60 without glue acceptor film 50 does not occur contact with a transfer layer 30. Respectively on the section 60 also does not occur in the transfer.
Fig.7E - Fig.7 shows the result of the transfer, and Fig.7E and Fig.7G shows a substrate 46 with a microstructure made of the donor film 20, and Fig.73 and Fi�.7 shows a substrate 45 made of the acceptor foil 50 microstructure. On the top view on a substrate 46 with microstructure (Fig.7E) now still on contact areas 70 are visible available raised surface 25 of the embossed patterns, while at all other stations still have the coating 30. Also towering 60 surface still have a raised surface elements 33 transferable layer.
Made from the acceptor foil 50 of the substrate 45 with microstructure (Fig.73) has now microstructure 40, which is transferred from raised surface elements 33 of the transferable layer. On the section 60 has not been transferred to the conversion layer. Depending on the pressure when laminating the carrier film 51 may have shown are represented by dotted rectangles easy stamping. However, such embossing should not continue and, if necessary, can be compensated for by subsequent re-coating, so that it is no longer perceived by the observer. Translated into the acceptor foil 50 raised surface elements 33 transferable layer are typically a slightly elevated areas. It is noteworthy that the amount of elevation is typically greater than the thickness of raised surface elements 33 of the transferable layer. Not being bound to this explanation, for it presumably meets l�gcoe swelling of the adhesive layer in these areas during conversion method. Microstructure 40 and microstructures 41 of the substrate 46 with the microstructure complement each other.
Of course, you can get the identical result if the acceptor foil 50, the adhesive is applied over the entire surface, and the conversion layer 30 and the donor film 20 is provided only on the corresponding partial area. However, the application of a transferable layer in the form of motive is not possible with all materials of the transferable layer.
Fig.8 - Fig.10 shows exemplary forms of implementing the present invention in which the embossed structure of the donor film 20 is additionally combined with another, more precise structuring. Similar tertiary structure is presented on the example of the diffractive microrelief structures that carry holographic information. Of course, also other possible tertiary structures, such as gratings with a length of the lower harmonics or nanostructures, especially the structure of the "moth eye".
Fig.8 shows the donor film 20 with an embossed carrier tape 21 and deposited throughout the surface of the transferable layer. Embossed structure of the film carrier 21 has a recessed surface 26 without additional tertiary structure and higher surface 81 with a holographic structure. Due to the holographic structures are also appropriately structured PE�evadney layer, as a result, it has a raised surface elements 33, which are at least adjacent to the elevated surface 81 of the surface of the holographic structure. On the opposite surface of the holographic structure may be present or not, it depends on the material of the conversion layer. Napechatanie conversion layers usually have a smooth surface, while the precipitated vapor metallization copy holographic structure of the base. Depth of surface elements 34 transferable layer in the example the implementation of have a smooth surface.
According to one embodiment not shown here can optionally be provided in-depth the surface with the same or different tertiary structure.
With the donor film 20 raised surface elements 33 transferable layer is transferred with additional holographic structure of the acceptor foil 50. Due to this, from the acceptor foil 50 will receive a substrate 45 with micromotion 40. Micromatic 40 has a primary structure, which is determined either by area of application of the transferable layer, or by area of the adhesive layer of the acceptor foil, in addition, secondary structure, which is determined by the motive stamping film carrier 21, and, in addition, tertiary structure in the form of a hologram. Sneaky�HCS 45 with micromotion can be combined with the device of the consideration of micromotives, such as microlenses, micro-optics display structure, for example, as shown in Fig.11.
According to an alternative embodiment, which is depicted, for example, Fig.9, the tertiary structure supplied not raised surface 25, and the depth of the embossed surface structure of the film carrier 21 and the donor film 20. In accordance with this raised surface elements 33 transferable layer in the example implementation are smooth, while the depth of the surface elements 34 transferable layer can reflect the holographic structure of the deep surface 83 in a structured embossing surface 84. In this case, the smooth raised surface elements 33 transferable layer is transferred to the acceptor foil 50, and is made of the donor film 20 to the substrate 46 with microstructure is used to suggest a layer motif with a holographic structure, for example, in micro-optics structure display. Of course, additionally, the substrate 45 with the microstructure of the acceptor foil 50 may also serve as the substrate of mikromotivov in micro-optics structure display.
Alternatively, how in-depth the surface and elevated surface embossed patterns can be fitted with a holographic structure or any other tertiary structure.
�a of Fig.10 shows another variant, in which elevation embossed patterns and deepening of the embossed structure of the donor film 20 does not have a regular pattern. In this example, the implementation of uplifting the surface 25 of the embossed patterns do not have tertiary structure, while the depth of the surface feature a variety of tertiary structures. The conversion layer 30, Fig.10 - metallization, according to this has a raised surface elements 33 without tertiary structure, depth of surface elements 34 without tertiary structure, as well as various in-depth surface elements 84', 84", 84'" with a tertiary structure. After the transfer of the raised surface elements 33 on the acceptor foil 50 arising from the donor film 20 to the substrate 46 with microstructure can be used as a protective element.
Fig.11 and Fig.13 shows a cross-section of the proposed micro-optics display structures for protective elements. Fig.11 shows moire magnifying structure of the security element 5, in which the elements of mikromotivov are offered by the substrate 45 with micromotion how it is obtained, for example, due to the transfer of raised surface elements 33 with a tertiary structure shown in Fig.8 donor film 20 to the acceptor foil 50. The substrate 45 with microstructure has a carrier film 51 and the adhesive layer 53, n� which transferred elements of mikromotivov. Caching with the carrier material 10 provided with microlenses 11, can be performed using additional adhesive layer not shown. Micromatic is viewed through the microlenses 11, through which the observer perceives the lettering motif increased. When viewed from the opposite side, in this case, the observer perceives a holographic image. Because the size of micromotives, i.e. the elements of mikromotivov and the distance between them, are below the resolution limit of the human eye, the observer perceives a holographic image as an image over the entire surface.
Fig.13 shows the form of another implementation of the proposed micro-optics structure display, in which both sides of a layer of mikromotivov deposited microlens 11 to consider micromotives. In this form of implementation elements 14 micromotives consist of raised surface elements 33 transferable layer, as they are depicted, for example, Fig.5K (three shown in the drawing to the right item micromotives of metallization 31 and 32). These elements 14 micromotives can be prepared on the donor film 20 as described in Fig.5, and then transferred to the acceptor foil 50. In shown in Fig.13 the form of the acceptor foil 50 is simultaneously a carrier of the microlenses. Therefore, the ASC�porna film 50 consists of a carrier material 10 of microlenses, microlenses 11 and the adhesive layer 53, which are glued elements 14 micromotives. Then through the adhesive layer 16 is pasted another carrier 10 with microlenses microlenses 11. Then the observer sees both possible areas of consideration accordingly increased moire elements of mikromotivov, and motives may be the same or different.
According to the invention is preferred to use as a carrier film of a film that already embossed microoptical elements of consideration, such as the microlenses. In this case the carrier film can act as a donor film and the acceptor film. A particularly preferred form of implementation of the proposed micro-optics structure display for the protective element 5 shown in Fig.12. In this form of implementation of the micro-optics structure display is made of film carrier 10, on which both its opposite surfaces (main surfaces) of the damage layers 11', 14' nail Polish for stamping. In the layer 11' nail Polish for stamping first bytesready the microlenses 11, then in the layer 14' nail Polish for stamping vytisknout microstructure, and in the recesses of the microstructure are formed subsequent elements of mikromotivov, that is, the layer 14' nail Polish for stamping forms a further layer 15 of micromotives. After embossing of microlenses and micro�of tractor on the microstructures formed by the conversion layer. The procedure is described, for example in connection with Fig.3 and Fig.4. Then the conversion layer Kashira covered with the adhesive layer of the acceptor foil, and then both films are again separated from each other, for example by separation winding. This raised surface elements of the transfer layer remain on the acceptor film, while the depth of the surface elements 34 transferable layer remain in the recesses of the microstructure and form elements of mikromotivov. This state is shown in Fig.12. That is, in the case shown in Fig.12 forms of implementation is provided with microlenses film is used as a donor film.
Alternatively, it is also possible first to form the layer 14' nail Polish for stamping of the microstructure, and then form the layer 11' nail Polish for stamping the microlenses 11. According to other alternatives the microlenses and/or microstructure can also be vicinaty directly suitable for embossing carrier tape. According to additional alternatives first can also be embossed microstructure, and microstructure can be made transferable coating, and raised surface elements transferable layer can be removed by acceptor film, and only then the microlenses will be engraved on the opposite side of the film or deposited ka�by probing on the opposite side of the film. According to other possible alternatives provided with microlenses film can be used as an acceptor film that is provided on the main surface of microlenses, the film can be coated on the opposite major surface of the adhesive layer, this adhesive layer from the donor film is transferred raised surface elements transferable layer in such a way that they form elements of mikromotivov microoptical devices consideration.
The proposed substrate with a microstructure can not only provide a layer of mikromotivov microoptical structure display, but also the device of consideration of micromotives. Such a device consideration of mikromotivov or preliminary step is provided in Fig.14. The donor film 20 consists of a transparent carrier film 21 with an embossed structure, which has a raised surface 25 and the recessed surface 26. It is transparent conversion layer, raised surface elements 33 and depth of surface elements 34. If the raised surface elements 33 are transferred to the acceptor foil 50, from the acceptor foil 50 will receive a substrate 45' microstructure, the microstructure of which is formed the shadow mask, which can be used instead microfocusing elements in qualities� alternative element of consideration. The advantage of such a shadow mask is that it does not require a certain focal length, which often is a problem in the case of microlenses 11.
Fig.15 shows the result of translation raised surface elements 33 of the donor film 20 from Fig.14 on the acceptor foil 50 of the substrate 45' microstructure can be combined with another substrate 45 with microstructure in the protective element 5 with moire magnifying structure. The substrate 45 with microstructure is, for example, the substrate micromotives, as she is depicted in Fig.3E and Fig.4D. Both the proposed substrate 45 and 45' with microstructure glued with each other through the adhesive layer 16.
Fig.16 shows the performance of the proposed method of creating a substrate with a microstructure (similar to the image in Fig.4), and formed microstructure are used to form using photoconductive materials other microstructure. Fig.16A corresponds to the image in Fig.4B, and Fig.16B corresponds to the image in Fig.4D. Formed from the donor film to the substrate 46 with microstructure has a microstructure of raised surface elements 33 and depth of surface elements 44, and formed from acceptor film substrate 45 with microstructure microstructure has �W translated raised surface elements 33. A preferred way, the microstructures are metal microstructures.
Fig.16B, Fig.16 and Fig.I shows how the substrate 46 with the microstructure may be provided with additional or alternative microstructure with a negative photoresist or other sew irradiation of the composition, for example by using UV-sew lacquer. Fig.I, Fig.16TH and Fig.S shown that the substrate 45 with microstructure can be equipped with additional or alternative microstructure with a negative photoresist or other sew rays of the composition. For this purpose, the substrate 46 with microstructure is covered with a photoresist 42 (or running similar composition), and the substrate 45 with microstructure is covered with a photoresist 43 as shown in Fig.16B and Fig.16G. Then be illuminated with light of a suitable wavelength, and irradiation respectively shown marked L arrows. It is obvious that the microstructure act as a mask for exposure of the resist layer. In principle, it would be possible to cover the photoresist 42 or 43 and the opposite surface of the carrier film 21 or 51, and then would have to be irradiated from the opposite side, so that the microstructure can act as a mask for exposure. However, due to a large deletion between mikros�ructure and the photoresist thus achieves less accurate result than when applying a photoresist directly on the microstructure.
Through exposure occurs crosslinking photoresist on exposed areas and thus it becomes difficult soluble, while at shielded sites, it remains readily soluble. Therefore, not sewn, easily soluble parts can be cleaned with a suitable solvent, and is achieved as shown in Fig.16 and Fig.16TH the distance. Here the microstructure 44 or 47 of resistive material located next to the original microstructures of metal. Original metal microstructure and microstructure of resistive material complement each other. Thus, you can achieve interesting effects, primarily through the use of color resistive materials.
Fig.I and Fig.S shows the substrate 46 and 45 with microstructure after etching the source metal microstructures. The substrate now has a microstructure microstructure 44 or 47, if necessary, a color photoconductive material, which are respectively complementary to the original metal microstructure. If necessary, the microstructure 44 can be transferred to the adhesive layer acceptor films like the original microstructure. The same goes for "matching microstructure" of metal surface elements 33 and power�surface elements 44 of photoresist, which is shown in Fig.16TH.
The steps of rinsing and etching may, depending on the materials used, if necessary, also to run concurrently.
Alternatively, a negative working photoconductive materials can also be used positively working photoresistive materials. Positive working photoconductive materials are changed by irradiation so that they become more easily soluble in irradiated areas. Therefore, the substrate 46 with microstructure is covered with a positively working photoresist, as shown in Fig.16B for the negative photoresist after the exposure (Fig.16B) and wash more easily soluble areas of photoresist is formed is shown in Fig.16, the substrate 46 with the microstructure of metallic microstructures 33, 34 and the photoconductive microstructures 48 of the same size. Similarly, the substrate 45 with microstructure receive shown in Fig.16K substrate 45 with the microstructure of metallic microstructures 33 and microstructured photoconductive 49 of the same size. Similar microstructures visible on both sides of the carrier film, if you are using a transparent carrier film, however, the observer sees one side of the metal microstructure, and on the other hand are identical, if necessary, mikros�ructure. A preferred way, the substrate with a microstructure is provided on both surfaces of the microlenses or other elements of the consideration of micromotives, and the lining of a color photoresist allows the metal microstructures to look particularly shiny, as will be further explained in connection with Fig.28 and Fig.29.
If positive working photoresistive material is not applied as shown in Fig.16 and Fig.16K on the side of the metal microstructures, and on the opposite side of the carrier material, and then irradiated from the side of the metal microstructures, it is identical in dimensions with metal microstructures photoresistive microstructure are respectively on the opposite side of the bearing foils. In this case, the metal can be etched microstructure so that there is only photoresistive microstructure.
Microstructural photoresistive materials using metallized areas as a mask for irradiation is described in detail in DE 102008036481.9. Regarding suitable materials and conditions of the method, as well as achievable effects make reference to this application.
Fig.17 - Fig.27 shows a combination of protective elements or micro-optics combination display framework", as well as their production and mode of action. Micro�Opticheskie combined structure display have at least one first micro-optics display structure and the second micro-optics display structure, which differ from each other. A preferred way, the first micro-optics structure display and second micro-optics structure complement display of ultra thin display structure and common motive.
Particularly preferred is a combined display with directional reflection and stereographic display with deep information with each other.
"Stereographic maps with depth information" in the present invention, see display, in which 30-the effect is achieved due to the fact that the left and right eye of the observer are the various types of object that shows the object respectively from the corresponding direction. Of these different types for the observer creates a three-dimensional impression, as explained in connection with Fig.19. Display of this kind can offer and also over only two different types, thereby usually also comes the parallax, that is, when the rotation or the tilt component parts of the image are moving in the foreground relative to the component parts of the image on the background image. Under certain circumstances, for example when turning or tilting, to also look at the object standing in the foreground.
The best-known stereographic maps with absolute depth information�radiation holograms are three-dimensional, for example classical holograms with direct lighting or a computer-generated stereograms. Other examples are images with overflow with microlenses and a magnifying modulo structures or moire magnifying structures with the effect of "deep" or "float", as known from WO 2009/000528 and WO 2005/052650.
"Directionally reflective mappings" in the present invention, see, first of all, display, of which only indirectly receive in-depth or three dimensional effect. Fig.20 explains the operation principle of such mappings, In contrast to the above stereographic maps directionally reflective display does not show parallax, and shows the objects you can't just display so that it looks like they are in front of or behind a given reference plane, for example formed by a protective element reference plane. First of all, the display does not allow absolute depth information, and only the relative destination "ahead/behind", which is based essentially on the experience of the observer, which implies additional information: if the observer it seems that the surface is curved forward, the observer comes to the conclusion that the middle portion of the convex surface with its prospects must lie further ahead than the regional teaching�current. If the display And partially overlaps another display, the observer comes to the conclusion that the appropriate object And should be placed before the object V.
Directionally reflective display are, for example, seemingly convex shaped lenses reflective Fresnel structures (see EP 1570422 and EP 1562758), achromatic diffraction elements with the effect of convexity (see EP 1782108) that seem convex lattice images Mat structure and, above all, the mappings based on the sawtooth microoptical arrays. Using sawtooth micro-optics gratings can create seemingly convex display (PCT/EP 2010/007368), "noisy" display (PCT/EP 2010/007369) and display kinematic effects (EP 0868313).
Common to these directionally reflecting mappings is that, at least partially mirror and almost flat on a linear scale larger surface concedes estimated by an observer by default, the law "angle of incidence = angle of reflection" on a linear scale of larger size, for example due to the fact that due to the effects of diffraction is diffraction of the incident light in a surprise to the observer's direction or it is reflected through not recognizable to the naked eye micromirrors in a surprise to the observer's direction.Directionally reflective display and stereographic display is accordingly quite typical properties and its individual distinctive appearance. Particularly preferred in directionally reflective display is that they, for example, can simulate a typical convex gloss metal surfaces with high transparency, and the observer can recognize deceptive convex metal surfaces with a certain performance, even his own mirror image. The advantage of stereographic maps again is the "real" three-dimensional display. A preferred way, the proposed security elements combine both types of display, making it possible to obtain extremely attractive optical effects that give protective elements particularly high rate of recognition and make them difficult to simulate. Microstructure stereographic maps and, if necessary, also directionally directionally reflective surface of the reflecting mappings can be manufactured in a simple way by means of the proposed method. The following briefly explains some implementation options for micro-optics combined display structures for the proposed security elements.
Fig.17A shows W�protective element 6 according to Fig.1 in top view. The protective element 6 has one the first part 7 of the motif and the second part 8 of the motif, and the first part 7 of the motif is a stereographic display, and the second part 8 of the motif is directionally reflective display. The protective element 6 in the sectional view shown in Fig.18.
As can be seen in Fig.18, the protective element 6 is formed by a film 10, which is coated on both sides with layers 11', 14' nail Polish for stamping. In the layer 11', 14' nail Polish for stamping vytisknout embossed structure, an embossed structure transferable to cover the metal layer, and the raised surface elements of the transfer layer is then transferred to the acceptor film as, for example, described in connection with Fig.3 and Fig.4. Depth of surface elements of the transfer layer remain in the recesses embossed patterns and now form the elements 14 micromotives.
In the layer 11' nail Polish for stamping is embossed with two different structures, namely the microlenses 11 and the chamfer 12, and bevel mirror 12 and form a sawtooth structure. The microlenses 11, together with the elements 14 micromotives form a first micro-optics structure 17 display, which is a stereographic display with depth information, for example, moire magnifying structure.
The principle of operation of the first micro-optics structure 17 display schematically explained in Fig.19. When observation� considers bill 1 (Fig.1), when viewed from above the protective element 6 he sees in the first part 7 of the motif shown in Fig.19 in the form of a point object, and the right eye (RA) sees the object in a different compared to my left eye (LA). The left eye of the observer sees the view of the object in the direction 115, while the right eye he sees the view in the direction 114. Consequently, the right eye perceives the object 112 in place, while the left eye sees the object at location 113. The observer extends straight 114 and 115 to the point 116 of the intersection and makes on the basis of this conclusion that the depicted object at the depth d1 is located behind the plane of the banknote 1. In the second part 8 of the motive, the observer sees the display with convex surfaces, in the example implementation - plastically formed portrait. This effect is achieved by sawtooth patterns of mirror facets 12 with different shape and location. The principle of operation of this second micro-optics structure 18 of the display explained in Fig.20.
As shown in Fig.20, the incident beam 121 of the light is reflected in the direction 122 that is parallel to the direction 122', which would correspond to the direction of the reflection on the surface 120. The same applies to the beams 123 and 125 of the light is reflected in directions 124 and 126. These areas 124 and 126 are parallel to the directions 124' and 126', which are the directions of the reflected�Oia in the reflection on the surface 120. The size of the chamfer 12 is selected so that the observer cannot recognize them without auxiliary means. So bevel 12 in the direction vertical to the plane of the drawing can have dimensions, for example, 15 μm and a height of, for example, 5 μm.
Based on the parameters of the reflection of the second micro-optics structure 18 of the display, the observer comes to the conclusion that the second part 8 of the motif has a convex surface 120 with a depth d2, wherein when displaying plastic portrait, of course, must be simulated somewhat convex surfaces. For beam 121 light settings reflection suggests that the local surface normal points in the direction 127, which is clearly different from the actual macroscopic surface normal.
By directionally reflecting mappings can also be achieved kinematic effects, for example due to the fact that mappings are built through multiple mappings with a sawtooth structure, and separate display with the structure of the saw tooth, respectively, are observed at different view angle. An example of this is shown in Fig.17B.
Fig.17B shows the protective element 6' in the top view, which has a star, consisting of four lines 63, 64, 68, 69. Line 63, 64,68 and 69 are composed of sawtooth structures with chamfers, and sawtooth patterns they�Ute various relief patterns. The parameters of the relief structures are chosen so that the lines 63, 64, 68 and 69 are visible only under certain angle of view. Therefore, if the protective element 6' is tilted or rotated, the observer visible to the respectively other of the lines 63, 64, 68, 69 that the observer perceives as the effect of movement. The background stars can be enriched, for example through additional stereographic display.
Fig.21 shows a variation of the micro-optics combination display framework for the proposed protective element, wherein the first micro-optics structure 17 display has instead microlenses 11 (Fig.18) hollow Micromirror 13, which are formed by embossing layer 13' nail Polish for stamping and applying a reflecting coating. Also made in the example implementation of the chamfer 12 and the second micro-optics structure display 18 is made in the layer 13' nail Polish for stamping. Chamfer 12 can be designed as hollow Micromirror 13 due to the embossing and coating of the mirrors.
Microstructure or elements 14 micromotives can be provided not only in the field of the first micro-optics structure 17 display, but also in the field of second micro-optics structure display 18. In this case, and if the items 14 micromotives colored, convex reflecting surface, �otara is governed by the chamfers 12, also seems a little colour. It works, of course, not only for the form of implementation according to Fig.21, but in General.
Fig.22 shows the structure of a combined micro-optics structure display, in which a hollow Micromirror 13, 14 and microstructure of the chamfer 12 is embossed by themselves in their own layers 13', 14' and 12' nail Polish for stamping. Between the layers 13' and 14' nail Polish for stamping is the first carrier film 10 and between the layers 14' and 12' nail Polish for stamping is a second carrier film 9. In this form of implementation of the first micro-optics structure 17 display and second micro-optics structure of the display 18 are manufactured separately and then caliroots.
First of all, when considering the security element missed in the light of the light of the first light source and micro-optics structure 17 display can have instead of the raster microfocusing elements (raster microlenses or hollow micromirrors) also only one perforated raster 19, as shown in Fig.23. Such perforated raster 19 may be implemented, for example, by periodically arranged holes or a slot in a transparent, for example mirror the metallized layer. The holes may be small incisions. In the form shown the implementation perforated raster passes in the second Mick�opticheskoi patterns display 18, so it get overlay mappings. Of course, in the area 18 may also not be perforated raster.
Furthermore, the proposed protective elements of the second micro-optics structure of the display 18 also may be in the form of diffraction structures. So in the second part 8 of the motive, the preferred way, asymmetrical diffraction gratings are arranged so that the parameters of the convex reflection surface is adjusted if possible aromaticheski, as described for example in WO 2006/013215, the scope of disclosure of which in this respect is hereby incorporated here by reference.
In the case of ultra thin composite structures displaying both parts 7 and 8 of the motif may at least partially overlap each other. Alternatively or additionally, the two parts 7 and 8 of the motif can also be nested into each other in some areas. In this case the surface of both parts 7 and 8 of the motif can be decomposed, for example, by complementary surface elements, and then combined into a common motive. With each part of the motif loses some of its visual information, which is replaced in the corresponding surface elements of visual information, respectively, of another surface element. If the dimensions of the surface elements�s below the resolution of the eye, the observer perceives the individual experience of both parts of the motif and recycles them in a common motive.
Using directionally reflecting mappings can also be brilliant effects and motion effects, such motion effects, as mentioned in US 7,517,578 effects "Rolling Bar" or "Double Rolling Bar". Such effects are described in the application PCT/EP 2010/007369. This application discloses a protective element to the substrate, which has a reflective surface, which is divided into a plurality of reflective pixels, the surface of each pixel of at least one order of magnitude smaller than the surface of the reflective surface, wherein each pixel has at least one reflective facet, which is made in the surface of the substrate, and at least one reflective facet on the surface directed reflects light incident along a predetermined direction in a predetermined orientation direction of the reflection, and the orientation of the facets of different pixels are mostly random variation on the reflective surface.
Under the "pixels" you see a small partial areas of the reflective surface area that may be not only any form of contours, but, above all, should be placed not on a regular �Astra. Chamfer form a periodic or aperiodic sawtooth lattice structure.
Fig.24 shows a portion of the surface of such a protective element, divided by the pixels in the top view, and Fig.25 shows a sectional view of micro-optics structure displayed in Fig.24 along the line 39.
Fig.24 shows an extract from a reflective surface, which is divided into a plurality of reflective pixels 24, of which a small part of the increase shown in Fig.24 in top view. Pixels 24 here square in shape and have an edge length in the region from 10 to several 100 μm. A preferred way, the edge length is not more than 300 μm. First of all, it needs to be in the range of 20 to 100 microns.
Each pixel 24 is described here in the form of the implementation of several reflective chamfers 12 with the same orientation. Chamfer 12 are inclined reflective surfaces of the gratings of the sawtooth shape. However, in the embodiment, not shown here it is also possible that some or all of the pixels 24 may be respectively only one single facet 12.
Fig.25 shows a view in section along the line 39 for three neighboring pixels 241, 242, 243. - Reflectivity coating on the facets 12 are not shown. Grid of pixels 241, 242and 243the sawtooth shape is made on the upper side�e 10' of the substrate 10, and structured in this manner, the upper side, preferably, covered with a reflection coating.
As can be seen in Fig.25, the rise and chamfers 12 in each pixel 241, 242, 243the same. But the slope of the chamfer 12 of the adjacent pixels 241, 242, 243different. In addition, and also the period d7 sawtooth lattice structure of a pixel s different from periods d5 and d6 of the sawtooth grating structures of pixels 241 and 242. Because of the different orientation of the chamfer 12 of the individual pixels 241, 242and 243falling along a predetermined direction of the R light L from each pixel 241, 242, 243aims is reflected in different directions of reflection, as shown schematically in figure 25. Because of the chamfer 12 of 24 pixels always have a different orientation, for the observer is achieved brilliant effect or the effect is comparable to paint a metallic finish.
Different orientation of facets 12 can be adjusted not only by selection of the angle a of inclination of the chamfers 12, but also through different azimuthal angles Relative to the direction F. according to the arrow P1 in figure 24 the azimuthal angle f of facets 12 pixels 241, 242and 243is 90°.
The azimuthal angle of the chamfer 12 of 245 pixel is opposite to approx. 120° (relative�to accept the direction of the arrow P2), and the azimuthal angle f3chamfers pixel is 280 245° (relative to the direction of the arrow P3).
The azimuthal angles can be selected for individual pixels 24 accidentally. First of all, you can select random values from 0 to 360°. For lifting α of facets 12 can be, for example, values in the range of from 10° to 20°, and the range of -20° to -10°. You can also choose the rise of the chamfers of the range, for example, from -20° to 20°. Also, and here again randomly pick UPS.
It is possible that a randomly selected rise and corresponds to a normal distribution. Randomly selected azimuthal angles f can be distributed equally. The lattice period or width of the teeth d of the saw, the preferred way is more than 1 μm and, particularly, more than 3 microns. In addition, the period d of the grating can also be greater than 5 microns. However, the preferred way, it is always selected so that for each pixel 24 has at least two facets 12. First of all, for each pixel 24 can be at least three, four or more of the chamfer 12.
A preferred way, the chamfer 12 is in the form of smooth surface areas. However, it is also possible that the chamfer 12 is curved (e.g., concave or convex). Chamfer 12 can be straight, as in the case of chamfers 12 pixels 241, 242, 243, 245and 2 6. However, it is also possible the passage is not straight (e.g., slight curve), as shown schematically for a pixel 244in the figure 24.
By splitting pixels can create the impression that there is a "noisy" surface (the preferred way on the reflecting surface). Additionally chamfer pixels may be oriented so that at certain angles of consideration occurs simultaneous light "flashing" of many pixels. For this purpose, the reflecting surface area on the substrate is split into at least two partial area, whereby the pixels on the first partial area have a random orientation, while the pixels of the second or other partial sections have respectively for each partial area are all the same or at least almost the same orientation. Light of the light source then the first partial area under many angles is scattered in all directions, while the other partial light on the portions reflected respectively in the narrow angle range. In this case, under most angles of the observer sees only noise mapping with randomly illuminated pixels (brilliant effect), while the other partial sections at right angles very bright light.
If should regulate�atsya optical effects, such as mentioned in US 7,517,578 effects "Rolling Bar" or "Double Rolling Bar", the orientation of facets is selected so that the reflecting surface has a continuous passage of the middle areas of the reflection pixels. Due to this, when tilting the security element with a reflective display continuously consistently bright "flash" of different portions of the surface, which results in the effect of rolling up or down in the direction of the stripes.
Fig.26 and Fig.27 shows the versions of the proposed method of manufacturing micro-optics combined display structures with one first and one second micro-optics structure display. Shown respectively film materials with pre-stamped lenses and sawtooth structures as a second micro-optics structure display, metallization as a transferable layer or elements of mikromotivov or as a reflective layer, and stamping in separate layers of nail stamping. It is clear that as lenses can be used and also other microfocusing elements that microfocusing elements and microstructure can also be embossed directly into suitable for embossing films that other structures such as sawtooth patterns can be used as a second structure mapping�t, and what other transferable layers can be used as metallization. Figures explain only the principle of manufacture.
Fig.26B shown in cross section one acceptor foil 50, which has one carrier film 10, a single layer 11' nail Polish for stamping and one layer 12' nail Polish for stamping. In the layer 11' nail Polish for stamping on sections 7' embossed microlens 11. Sections 7' are followed by plots of the motive of the first micro-optics structure display. In the layer 12' nail Polish for stamping on a plot of 8' embossed sawtooth patterns. On the sawtooth structures subsequently formed second micro-optics structure display. Layer 12 nail Polish for stamping is covered by the adhesive 53. The adhesive layer is very thin, so it is well followed the structures of facets or the saw tooth structure and not "zamatyvaesh".
Fig.26A shows the donor film 20 in principle in the same condition that the donor film of Fig.4A. The donor film 20 has a carrier film 21 and layer 23 of nail stamping. In the layer 23 of nail stamping is embossed microstructure and already equipped with a transferable layer. On a plot of 8" microstructure has the elevation of a large area. The conversion layer forms a raised surface elements 33 and depth of surface elements 34 on sections 7" and an extended raised surface element 33' on the section 8". Plots 7" correspond� plots T on the acceptor foil according to Fig.26B, and parcels 8" correspond to section 8' on the acceptor foil according to Fig.26B.
The donor film 20 chapterwise acceptor foil 50, i.e. the areas 7" caliroots on the portions 7' and 8" Kashira on the section 8'. This raised surface elements 33 transferable layer is transferred to the adhesive 53, and formed elements 14 micromotives, and raised surface element 33' transferable layer is transferred to the sawtooth structure, forming a reflective coating 88. This state is shown in Fig.26B. Usually do not get such a perfect cover 88, as shown in Fig.26B. First of all, the lower parts of steep teeth of a saw in practice often not fully covered. However, since small defects remain hidden from the observer.
Micro-optics combined display structure for the protective element 6, as shown in Fig.26B, now has a stereographic display 17 with in-depth information and directionally reflective display 18. On a plot of micro-optics structure 18 not display embossed lenses 11. The lack of focusing elements recommended in the event that if you use the cover 88, the effects of which should be visible also from the side of focusing elements, for example, when coating with the effect of transfusion of paint. Instead of privileges denied�and microfocusing elements in the relevant area, their action in case of need you can also cancel by napechatanie right on top of clear varnish, and the varnish used to napechatanie, should have the same index of refraction as the material of microfocusing elements.
Alternatively, there are also ways of its manufacture, in which a sawtooth structure has a metallization layer or coating, and only the first micro-optics structure 17 display must be made due to the transfer elements 14 micromotives for the first section 7 of the motif. In this case, section 8" the donor film 20, preferably, has an embossed structure with an elevated surface. If this site is microstructured, for example, so as parcels 7", raised surface elements are carried on an already applied sawtooth structure. Similar micromotives on the section 8, if the coating 88 is a metallization, are practically invisible and do not interfere. In the case of other coatings, if necessary, she can also be seen.
Fig.27 shows the case in which it is made is similar to the structure of the display according to Fig.26 micro-optics structure display, but not on the acceptor film, the donor film. The donor film 20 shown in Fig.27B. She has a carrier film 10, a layer 11 l�ka for stamping and layer 14' nail Polish for stamping. In the layer 11' nail Polish for stamping on sections 7' embossed microlens 11. In the layer 14' nail Polish for stamping on this site is embossed and metallized microstructure. On a plot of 8, i.e. the second portion of the motive performed a sawtooth structure with metallization 88. The sawtooth structure in this example implementation is deeper than the microstructure on the portion 7'.
Fig.27 As shown acceptor Lenka 50 from the carrier film 51, which is covered by the adhesive 53. In the example implementation of the glue covered the entire surface. On film 50 side of the layer of the microstructure of the donor film 20 is applied to the adhesive layer and then removed the separation winding. Achieved at the expense of this state of the donor film 20 shown in Fig.27B.
As can be seen in Fig.27B, were removed raised surface elements 33 of the donor film 20, while the depth of the surface elements 34 remain, and only on the first portions 7 of the motif form the elements 14 micromotives. Micro-optics combined display structure for the protective element 6 as shown in Fig.27B, the rest corresponds to the structure of the display according to Fig.26B.
If section 8 of the motif is not lowered relative to the portion 7 of the motif, as shown in Fig.27B, and is approximately the same height as the portion 7 of the motive, the adhesive layer 53 should only be performed �and fractional portions 7" of the acceptor foil 50. Partial plots 7" correspond to a partial portions 7' of the donor film 20. This prevents that the adhesive layer removed portion of the coating 88. However, if the translation removed certain parts of the cover 88, as a rule, this is harmless, since small defects observer does not notice.
Also it should be mentioned that the second part 8 of the motif does not have to be structured. If, for example, shown in Fig.26B acceptor foil 50 on the surface coated with an adhesive layer 53, completely smooth, the second portion 8 of the motive of a smooth metallic surface. Similar surface of a large size is not moving when tilting the security element, while the first micro-optics structure 17 display it seems that there is a movement.
Particularly preferred embodiments of this invention shown in Fig.28 and Fig.29. Shown protective elements have a micro-optics structure display (moire magnifying structure) with metallic elements of mikromotivov that have a colored background. Additional color layer has a background with a reflective layer.
Metal microstructure, primarily silver metallic microstructure, generally operate on a white background with low contrast. Therefore solenoidality, the preferred way, they have a colored background. For example, in the proposed method, the printing ink by removing unwanted metallic areas with donor film (with remaining elements of mikromotivov) or due to the transfer of elements of mikromotivov acceptor film can be printed microstructure created.
Create background with colored inks can be performed over the entire surface or land, and also in one color or in multiple colors. Monochrome advisable to choose a background that was very different in color from the color micromotives. The greater the difference in color, the better the increase in contrast of the moire-magnified mikromotivov or other mikromotivov.
When a multi-color background, one can achieve additional effects. Multicolored background does not move when tilting the security element, which has a micro-optics structure display with stereographic display, but it forms at the expense of structuring a starting point, before which the motion of the stereographic display is particularly well visible. For example, moire magnifying structure can metal display characters or symbols on a background of another color. Relative to this static multi-color background when tilting the security element moving metal moiré-magnified patterns.
In this sett�Tnom element, as a protective strip plots with different coloring can, for example, to place next to each other (in parallel) in the direction of the strip, or, alternatively, pass each other in the direction of the strips, whereby in the direction of the strips of each other are replaced by areas of different color. Change can occur periodically or aperiodic.
Paint is not limited to any particular method. Can be used as covering and translucent paint. Paint can be water based or solvent based, dry physically (to dry due to the evaporation of liquid components) or solidified by UV. The application of various inks can also be used to overprint. By screening, you can create a continuous color transitions between colors, napechatanie over each other. Instead of colored paints can adictivas, for example, fluorescent paint system with the effect of transfusion of colors, such as paint with thin-layer pigments or compounds with pigments to create other effects.
For paints that are not fully covering can significantly increase their juiciness, if you put them under the special background, in General reflecting layers. As a reflective layer can be used, for example, metal layers of a system with n�relive the flowers, coatings with high refraction and printable layers with metal pigments or pigments to create effects. Suitable metals are, for example, aluminum, copper, chromium, tin, zinc, silver and gold, and alloys of metals. Coatings with high refraction are, for example, coatings of ZnS or TiO2.
The reflective coating may be deposited as a layer of paint over the entire surface or partially. If the reflective coating is applied only to areas that occurs when considering the above minor and stronger on the clearance of the contrast between areas with and areas without reflective coatings. On clearance due to this, you can achieve the effect similar to negative font.
If in certain areas there is no background color, then there is a reflective coating directly visible. Upon such execution background colored sections and sections with a reflective coating replace each other.
Fig.28 shows the protective element 5 with moire magnifying structure that is similar to that shown in Fig.27B protective element design, but without his micro-optics structure display 18. Microoptical structure display protective element 5 has a carrier film 10, on which both sides with layers 11', 14' nail Polish for stamping. In the layer 11' nail Polish for stamping is embossed MICR�lenses 11, and in the layer 14' nail Polish for stamping is embossed microstructure, metallized recesses (depth of surface elements 34) form the elements of mikromotivov. On the microstructure of printed coloured paint 71, and the colored paint is again deposited layer 72 with metallic pigments. In addition, depicted in the form of implementation provides a layer 73 of heat-seal lacquer for connection of the protective element with valuable subject. The deepening of the embossed structure may be substantially deeper than the thickness of the layer of colored paint.
Fig.29 shows similar to Fig.28 the image, and here the elements of mikromotivov formed raised surface elements 33. In other words, if in Fig.28 elements of mikromotivov were performed in the donor film 20, in the form of implementation according to Fig.29 they were transferred to the acceptor foil 50. This corresponds to the form of implementation according to Fig.26B without microoptical structure of the display 18. Shown in Fig.29 protective element 5 has a carrier film 10 with the layer 1 G nail Polish for stamping and embossed in it the microlenses 11. On the opposite the microlenses 11 side of the carrier film contains elements of mikromotivov of raised surface elements 33, transferred to the adhesive layer 53. Also here the contrast and visibility, the metal microstruc�LVL 33 is improved by printing coloured paint 71. To make it more juicy paint color, additional metallization 72. Through a layer 73 of heat-seal lacquer can stick the protective element 5 on a valuable item.
It is clear that also here as lenses can be used other microfocusing elements that microfocusing elements must not already be pre-embossed carrier tape and can also be applied by laminating, protective element may have other functional layers, etc. On the basis of Fig.28 and Fig.29 should only be depicted clearly the principle of creating a background for manufactured offered by way of a microstructure with a layer of paint and, if necessary, with an additional reflective layer.
1. A method of manufacturing a microstructure on a substrate, characterized by the following operations:
(A) the manufacture of the donor film through
(A1) the formation of an embossed structure with raised surfaces and recessed surfaces on at least one partial area of the main surface of the first film material or suitable for embossing layer on at least one partial area of the main surface of the first film material, and rising to the surface and/or recessed surfaces form the desired microstructure,
(A2) coating at least about�in partial section embossed patterns for the formation of transfer layer, wherein the conversion layer has the surface elements are transferable layer to the raised surfaces of the embossed structure, the surface elements are transferable layer on the recessed surfaces of the embossed structure, and surface elements of the transferable layer, uniting raised surface elements and depth of surface elements,
(B) the manufacture acceptor film by applying an adhesive layer on at least one partial area of the main surface of the second film material,
(B) laminating the donor film and the acceptor film through the adhesive layer such that at least one partial area is covered with embossed patterns and a partial area of the adhesive layer come into contact with each other, and the contact area conversion layer on raised surfaces glued together with an adhesive layer of the acceptor foil,
(G) translation of surface elements of the transferable layer to the raised surfaces of the embossed structure of the donor film on the contact area on the adhesive layer of the acceptor layer due to separation from each other of the donor film and the acceptor film, resulting from acceptor film occurs first substrate with a microstructure with a first microstructure, which has translated raised surface elements in re�tion layer, and/or from the donor film raises the second substrate with the microstructure with the second microstructure and the second microstructure is a microstructure from operations (A) no transferred into an acceptor film raised surface elements of the transferable layer.
2. A method according to claim 1, characterized in that during the operation (A2) forms a conversion layer, which has the same or different raised surface elements and the same or different depth of surface elements.
3. A method according to claim 1, characterized in that during the operation (A2) is applied, the preferred way nadrachivat, the conversion layer in the form of single or multi-colored motif, and covered in embossed structure or only one partial area embossed patterns.
4. A method according to claim 1, characterized in that during the operation (A2) a transferable layer is vapor deposited.
5. A method according to claim 1, characterized in that during the operation (A2) coating for the formation of transfer layer is applied to the whole of the embossed structure, and before the operation (A2) the partial plot embossed patterns applied removable transferable coating layer, and after the operation (A2) applied to the whole of the embossed structure of the coating is removed with located above removable transferable coating layer of the plot.
6. Method according to one of claims.1-5, characterized in that cooperate (A2) and if necessary, the operation of applying a removable coating of transferable layer and removing the removable coating over the coating transfer layer is repeated at least once, with a towering formation of various surface elements of the transferable layer and different depth of surface elements of the transferable layer will be covered with various partial sections of the embossed structure.
7. A method according to claim 1, characterized in that at least one partial area embossed patterns form a multilayer transfer layer.
8. A method according to claim 1, characterized in that all of the raised surface elements of the transfer layer of the donor film for a working operation is transferred to the adhesive layer of the acceptor foil.
9. A method according to claim 1, characterized in that the sequence of operations (A2), (B), (C) and (D) are repeated at least once, and during the operation (B) of the adhesive layer is applied, respectively, at different partial areas of the main surface of the second film material.
10. A method according to claim 1, characterized in that during the operation (A) in rising to the surface and/or recessed surface embossed patterns provide additional structure, the preferred image of the holographic structure and/or nanostructures.
11. A method according to claim 10, characterized in that dopolnitelnyekonsultatsii transferred to the adhesive layer of the acceptor foil.
12. A method according to claim 1, characterized in that
- on the first substrate with a microstructure or a second substrate with a microstructure on a surface, the preferred image on the surface of which is provided a microstructure on at least one partial area applied UV-sew lacquer or working has a negative photoresist, resulting in the microstructure and the coating of UV-sew lacquer or working has a negative photoresist, when viewed at right angles to the substrate surface with a microstructure at least partially overlap each other,
- coating of UV-sew lacquer or working negative photoresist using the microstructure as a mask for exposure is irradiated by light rays of a suitable wavelength, with the result that the coating not covered by the microstructure of the parts sewed together,
- not crosslinked coating areas are removed, resulting in a substrate with the microstructure and the accompanying microstructure of UV-crosslinked lacquer or working has a negative photoresist, and that
- optional, remove the microstructure, while the complementary microstructure of UV-crosslinked lacquer or working negative photoresist remains,
moreover, UV-sew lacquer or working has a negative photoresist may be colored or colorless, or may be used UV-sew� lucky or photoresists of different colors.
13. A method according to claim 1, characterized in that
- on the first substrate with a microstructure or a second substrate with a microstructure on a surface, the preferred image on the surface of which is provided a microstructure on at least one partial area is applied with a positively working photoresist, resulting in the microstructure and the coating of positively working photoresist, when viewed at right angles to the substrate surface with a microstructure at least partially overlap each other,
- coating of positively working photoresist with the use of the microstructure as a mask for exposure is irradiated by light rays of a suitable wavelength, with the result that the coating not covered by the microstructure of the parts are changed,
- photochemically altered areas of the coating are removed, resulting in a substrate with the microstructure and the microstructure of the same size of positively working photoresist, and that
- optional, remove the microstructure, while the microstructure remains of positively working photoresist of the same size
and positively working photoresist may be colorless or colored, or may be used photoresists of different colors.
14. A method according to claim 1, characterized in that after the operation (G) microstr�Churu first substrate with a microstructure or microstructure of the second poloski with microstructure over the entire surface or a part of it cause at least one printing ink and/or at least one reflective material covering, and a reflective coating material, preferred, chosen from metals, systems with overflow of colors, materials with high refraction, metallic pigments or pigments to create other effects.
15. A method according to claim 14, characterized in that the first applied to one or more printing inks, if necessary, overlay, and then applied the reflective material coating, and printing (s) dye (s) and the reflective material coating close the same and/or different parts of the microstructure.
16. A method according to claim 1, characterized in that
- during the operation (A1) on the first partial area of the donor film is formed of the first embossed structure and the second partial area of the donor film is formed or a second embossed structure, the second embossed structure, the preferred way is a sawtooth structure,
- during the operation (A2) coating is applied to at least one partial section of the first embossed structure, and, if necessary, also applied to the second embossed structure,
- during the operation, (B) the donor film so cacheroot with acceptor film that only at least one partial area covered by the first embossed structure comes in contact with the adhesive layer of the acceptor foil, so
- during the operation (G) in�arose substrate with the microstructure on the first partial area, which forms the first part of the motif, and with a microstructure on the second partial area, which constitutes the second section of the motive, and the first part of the motif and the second phase of the motive, the preferred way, complementary to the combined motive.
17. A method according to claim 1, characterized in that
- during the operation (B) use the second foil material, which has one main surface with a first partial area without an embossed structure and a second partial section with an embossed structure, the preferred way of the sawtooth structure,
- during the operation (A1) formed of the donor film with raised surfaces on the first partial area and, optionally, with an elevated surface in the second partial area and the second partial area or, if necessary, raised surface in the second partial area sized and shaped to fit the surface of the embossed patterns of the second partial area of the second film material,
- during the operation (In) of the donor film and the second film material so cacheroot with each other that the embossed structure of the second partial area of the second film material comes in contact with the second partial area of the donor film, and a first partial area of the second film material comes in contact with the p�first partial area of the donor film, so
- during the operation (G) there is a substrate with a microstructure in the first partial section, which forms the first part of the motif, and with a microstructure on the second partial area, which constitutes the second section of the motive, and the first part of the motif and the second phase of the motive, the preferred way, complementary to the combined motive.
18. A method according to claim 16 or 17, characterized in that the substrate with the microstructure combined with micro-optics device processing, which has microfocusing elements, and microfocusing elements are only on the first section of the motive with which they form a first micro-optics display structure, while the second micro-optics structure forms a second display of ultra thin display structure.
19. A method according to claim 1, characterized in that before or after the operation (A1) and preferred manner to the operation (A2), on one main surface of the first film material opposite to the main surface of the first film material, or in a suitable embossing layer on one main surface of the first film material opposite to the main surface, microfocusing elements vytisknout so that microfocusing elements form a micro-optics device�istwo review for arise during the surgery (G) of the substrate with the microstructure, moreover, micro-optics device consideration and the substrate to form a microstructure of ultra thin display structure.
20. A method according to claim 1, characterized in that during the operation (B) use the second film material, which on one main surface of the second film material opposite to the main surface or on a suitable for embossing layer on one main surface of the second film material opposite to the main surface, embossed microfocusing elements so that microfocusing elements form a micro-optics device review to occur during the operation (G) of the first substrate with the microstructure, and micro-optics device consideration and the substrate to form a microstructure of ultra thin display structure.
21. The protective element, characterized in that it has a substrate with a microstructure obtainable by the method according to one of claims.1-17, or microoptical display structure obtained by the method according to one of claims.18-20.
22. The protective element according to claim 21, characterized in that it has a micro-optics structure displaying at least one micromotives and one device consider micromotives, and micromodel is formed by a microstructure obtainable by the method according to one of claims.1-17 substrate � microstructure, and/or device review of mikromotivov is formed by a microstructure obtainable by the method according to one of claims.1-17 of the substrate with the microstructure.
23. The protective element according to claim 21, characterized in that the micro-optics structure display has at least one micromatic one or microoptical device of the consideration on both sides of micromotives.
24. The protective element according to claim 21, characterized in that
microoptical device consideration is moire magnifying structure, magnifying moire structure type or magnifying module structure.
25. The product of any kind, especially a branded product or a valuable item, such as a banknote, characterized in that it is provided with a protective element according to one of claims.21-24.
SUBSTANCE: printing protective element is created, comprising at least a first and a second overprints. The first of them is a raster formed by the pixel grid having the form of signs bearing information, and the second is a raster which coincides in position with the first overprint. At that the combination of the first and second overprints is of the form of continuous-tone image, and the information contained in the said signs is at least partially hidden by the second overprint.
EFFECT: method of manufacturing the said protective element is created.
22 cl, 12 dwg
SUBSTANCE: method includes forming an image within a sheet material comprising a monolayer of transparent microspheres, partially immersed in a reflecting layer deposited on a plastic substrate and containing a solid solution of fluorescent or luminiferous coloured particles. A plastic layer and a metal foil layer are successively deposited on a monolayer of microlenses. Pulsed laser radiation forms holes in the foil layer at given points and the plastic layer under the foil, the material of the reflecting layer and the plastic substrate are melted within the laser spot. Microlenses are melted with a compact laser beam within a reduced laser spot and fused with each other. A through-hole is formed in the plastic substrate. Clusters of microlenses with crystals formed thereon with nodules of the coloured particles of the reflecting layer and fused microlenses form points of the colour security image visible in transmitted light and reflected on surfaces of the sheet material by the set of coaxial holes.
EFFECT: easy recognition of a security feature, which provides reliable counterfeit protection of articles.
6 cl, 9 dwg
FIELD: process engineering.
SUBSTANCE: proposed process comprises preparation of substrate and its pre-structuring to make bulges on its face and recesses on its rear that comply with said bulges. Said substrate pre-structuring is performed by embossing via intaglio to apply translucent polymer in the area of bulges or recesses to make micro lenses on at least one side of said substrate. Production of substrate provided with micro lenses involves rigid connection of micro lenses with said substrate which features mirror symmetry relative to mirror plane aligned with mid plane of biconvex micro lenses and parallel with said substrate.
EFFECT: simplified process.
29 cl, 14 dwg
FIELD: physics, optics.
SUBSTANCE: mix comprises first set of pigment scales oriented by magnetic field. Said scales can vary their colour from first to second colour at first change of the angle of vision. Second set of pigment scales not oriented by magnetic field that can vary their colour from said first to third colour at second change of the angle of vision other than the first one. Note here that said first, second and third colours are different colours. Scales of said first and second sets are applied on substrate in binder that makes the mix of scales. Note also that said scales have said first colour if seen on substrate at direct angle. Note also that scales oriented by magnetic field are oriented, in fact, in similar way differing from orientation of scales not oriented by magnetic field so that substrate inclination relative to first axis causes the change in seen colour from said first to said second colour. Substrate inclination relative to second axis perpendicular to first axis causes the change of colour from first colour to said third colour.
EFFECT: coat colouration changing.
8 cl, 10 dwg
SUBSTANCE: marking element is made in form of woven tape, formed by interlacing of main threads from thin poorly melting wire and weft threads of two types: glass threads of white colour and carbon threads of black colour, forming straps with specified combination, read by scanner. Application of fire-resistant threads in woven tape gives advantage of reliability of information storage under conditions of fire impact.
EFFECT: increase of protection of marking element against counterfeiting.
FIELD: physics, optics.
SUBSTANCE: invention relates to a multilayer body having a transparent first layer. In the transparent first layer, a plurality of microlenses, arranged according to a microlens grid, are imprinted in a first region. The multilayer body also has a second layer under the first layer and in a fixed position relative to the first layer and has a plurality of microimages arranged according to a microimage grid and in each case at least with local overlapping with one of the microlenses from the microlens grid in order to generate a first optically variable information element. The grid spacing in the microimage grid and in the microlens grid in each case in at least one spatial direction is less than 300 mcm. The second layer has in a first region at least one first area having microimages, and has at least one second area having optically active surface structures for forming a third optically variable information element, different from the first optically variable information element.
EFFECT: improved security.
32 cl, 14 dwg
SUBSTANCE: security document comprises a substrate coated with a film element. The film element comprises a security feature such as a diffraction structure, such as a hologram. For quick identification of the remote film element using the conventional detecting devices the marking intersecting film element is printed between the lower surface and the substrate, at that the marking is at least partially overlapped with the film element. At that at least a part of the marking is printed on the substrate and for the said part of the marking printed on the substrate, adhesion of the marking to the substrate is weaker than the adhesion of the marking with the film element.
EFFECT: improvement of the document security.
15 cl, 2 dwg
SUBSTANCE: security element is proposed, which has at least a first luminophor and a second luminophor which are characterised by the presence of substantially equal common band of emission. Each of the two luminophors is characterised by the presence of at least one excitation band that leads to emission of radiation in the common band of emission, i.e. both luminophors are selected so that they are at different excitation capable to emit radiation on at least one common wavelength, and for each of both luminophors there is at least one wavelength on which the excitation is possible, accordingly, of only one luminophor, and excitation of the other is impossible.
EFFECT: proposed protective element increases the degree of protection against counterfeiting of valuable documents.
18 cl, 24 dwg, 2 tbl, 4 ex
FIELD: physics, signalling.
SUBSTANCE: disclosed is a method of making a security element having a base with at least one hole which is closed at one side by at least a partially translucent or transparent film. A coating is deposited on one side of the base, and a through-hole is made in the base and the coating and the back side of the base is coated with at least a partially translucent or transparent film, as a result of which the hole is closed at one side by at least partially translucent or transparent film, and the coating on the base is primarily located in an area of the surface occupied by said film.
EFFECT: method improves counterfeit protection of the security element.
19 cl, 7 dwg
FIELD: physics, optics.
SUBSTANCE: described is a security element for a counterfeit protected article, having an upper side and a lower side, as well as one or more imaging optical systems, each forming an enlarged image of the associated object only in the space before the upper side of the security element. One optical system or at least one of the optical systems has multiple reflective imaging microelements arranged in two-dimensional space in the form of a first drawing, said microelements being in the form of concave micromirrors. The object associated with the optical system is in the form of a microrelief object formed by multiple microrelief structures which are arranged in the form of a microrelief drawing, matched with the first drawing such that the reflective imaging microelements form an enlarged image of the microrelief object in the space before the upper side of the security element, which has at its upper side and its lower side an adhesive layer which enables to embed the security element into the counterfeit protected article with adhesion thereof to the upper side and the lower side of the security element.
EFFECT: improved security.
13 cl, 6 dwg
FIELD: processes of making protecting members such as filaments for protection against counterfeit of valuable papers, possibly determination of authenticity of bank notes and other bank-papers and credit documents.
SUBSTANCE: protecting magnetic filament includes polymeric film base onto which laminate structure of protecting means is formed. Such structure includes first masking layer of metallic material applied on base and successively arranged layer of magnetic material to be detected, additional masking layer of metallic material and outer covering film layer of polymeric material. First masking layer is arranged between surface of polymeric film base and layer of detected magnetic material whose characteristic magnetic parameters are limited by respective values: 0.1 Oe < Hc < 1 Oe; Hc/Hs ˜= 0.95 -0.98 where Hc - coercive force of magnetic material; Hs - saturation field of magnetic material.
EFFECT: enhanced degree of protecting valuable papers.
3 cl, 4 dwg
SUBSTANCE: invention can be used in exhibition systems for advertisement producers, and can be used to make personal information cards, badges, shields etc. The personal identification apparatus includes an identification element and means of attracting the attention of observers. The identification element contains personal information and is illuminated by a multi-layer light pane. The light panel consists of a layer of a polymer substrate, a layer of current-conducting optically transparent material which is a first electrode, an emitting layer which converts electrical energy to light, a protective layer, a current-conducting layer made from opaque material which is a second electrode, a sealing layer, as well as electric power sources and means of communicating with said sources.
EFFECT: invention increases efficiency of the process of personal identification and activation of specific perception of an object.
3 cl, 5 dwg, 2 ex
SUBSTANCE: invention relates to special types of printing enabling to create in the body of the sheet material the original image protecting it against forgery. The method of creation on the sheet material of the iridescent image consists in the impact on the image applied on the sheet material with the light flux reflected from the diffraction grating at different angles of its rotation. In the body of the sheet material the image of isolated points in the form of volumetric extended metal-dielectric nanostructures with quantum size effects is created and placed it between the metal layer and the reflective diffraction grating. At that over each point of the image in the metal layer an opening is made through which the light flux is directed to the diffraction grating.
EFFECT: proposed invention provides a bright image providing protection of the sheet material against forgery.
9 cl, 5 dwg
SUBSTANCE: data medium has a base in which a see-through portion is formed by line grid consisting of a plurality of parallel cutting lines. Inside the see-through portion, there is a motif region which is in form of a pattern, characters or code which looks different when viewed in reflected and/or incident light.
EFFECT: solution improves protection of a document from forgery.
31 cl, 15 dwg
FIELD: textile, paper.
SUBSTANCE: polymer sandwich element for paper, which has optically variable effect, is made in the form of a sandwich polymer structure containing at least one layer with microraster relief structure. It has an additional layer with printed or embossed raster of microimages, which is spatially combined with microraster relief structure. Microraster structure is made in the form of raster of spherical transparent polymer lenses or prisms or raster of Fresnel diffraction polymer structures. Printed microimages located in nodes of the printed raster consist of elements of different colours with diametre of 20-100 mcm, which are located at the distance of 40-400 mcm from each other. Mutual location of colourful elements in nodes of the printed raster is discernible in different places of a representational printed field. Inside the defined areas the mutual location of colourful elements differs from mutual location of elements outside the defined areas.
EFFECT: invention allows increasing protection degree of products with protective elements without any increase in prime cost of their production process.
3 cl, 4 dwg, 1 ex
SUBSTANCE: invention relates to the field of manufacturing security documents. The protected structure (1) comprises: a fibrous layer (2a, 2b); substrate (3) with a translucent area; a watermark or its imitation (8a, 8b) applied on the fibrous layer (2a, 2b) and overlapped in the plan at least partially with the translucent area of the substrate, so that in this area the watermark or its imitation (8a, 8b) is visible against the light through the protected structure (1) only from the side of the fibrous layer; and the microelectronic device (4, 10) providing a contact or remote communication.
EFFECT: protection against counterfeiting and erasures.
44 cl, 22 dwg
FIELD: physics, optics.
SUBSTANCE: diffraction structure comprises a plurality of channels assembled to generate a first diffraction optical effect. Each channel is formed from a plurality of scattering and/or diffraction channel elements, each aligned to provide a second scattering and/or diffraction optical effect to form a micro- or macro-distinguishable graphic feature. The method of creating a diffraction surface relief structure involves forming a plurality of scattering and/or diffraction channel elements with alignment, which serves to form a plurality of channels that are assembled to generate a first diffraction optical effect. Each of the plurality of channel elements is assembled to provide a second scattering and/or diffraction optical effect to form a micro- or macro-distinguishable graphic feature.
EFFECT: creating a unique, highly secure feature which is difficult to imitate and can be combined with any optically variable features.
50 cl, 18 dwg
FIELD: textiles, paper.
SUBSTANCE: laminated article on paper or polymer substrate with optically variable structure comprises a coating in the form of printing raster and a three-dimensional raster. The coating is formed on one side of the substrate, and the three-dimensional raster is applied to the other side of the substrate. The field of printing or the three-dimensional raster is divided into two or more sectors which are displaced relative to each other. Each sector has a different colour so that when changing the view angle the colour of the sectors on the image changes. The three-dimensional raster is made in the form of elements with a symmetrical and/or asymmetrical profile to form a relief on both sides of the substrate and is positioned relative to the printing raster so that the three-dimensional raster is at least partially located above the printing raster. The width of the printing raster lines is from 50 to 200 microns, the width of the three-dimensional raster lines is 100 to 600 microns, the angle between the elements of the printing and the three-dimensional rasters is from 0° to 10°, at that they form a moire image, which when observing the data medium under the right angle is concealed, and when observing the data medium at an acute angle becomes visible.
EFFECT: improving security of articles, increased manufacturability and reducing the cost of the security element due to reduction of runs in the printing machine.
15 cl, 18 dwg, 4 ex
FIELD: physics, optics.
SUBSTANCE: invention relates to a film (1), designed to protect and decorate articles. The film includes at least one transparent replicating layer (2), having a diffracting relief structure (3) and a reflecting layer. The reflecting layer is formed from at least one layer (4) of pigmented lacquer, which is placed in the immediate vicinity of the diffracting relief structure (3). Refraction indices n1 of at least one lacquer layer (4) and n2 of the replicating layer (2) assume values whose difference is in the range from 0.05 to 0.7. Luminosity L* of at least one lacquer layer (4) is in the range from 0 to 90. Disclosed also is a method of producing said film and use thereof to coat car number plates and other articles to protect from forgery, coupled with an optically variable decorative effect.
EFFECT: improved properties of the film.
21 cl, 6 dwg
FIELD: process engineering.
SUBSTANCE: set of inventions relates to production of protection element and to retransfer film. Said retransfer film gas base layer with the first bearing film and one-layer or sandwich layer. First adhesive layer is applied on the first bearing film surface opposite the surface facing the decorative layer while second bearing film is applied so that first adhesive layer is located between first and second bearing films. First adhesive layer in activated in the first area that covers, at least partially, one first section of base film while first adhesive layer is not activated, nor created, created only partially or deactivated in second area adjacent to said area. Then, first bearing film is cut, at least partially, along boundary line defining at least first area and separating at least one first section from second area of base film. Second part of base film including second section is removed from second bearing film. Note here that base film is adhered, at least one in one first section to second bearing film by activated first adhesive layer. Note that said first part comprises at least one first section and stays at second bearing film.
EFFECT: better protection against counterfeit.
52 cl, 10 dwg