Light-sensitive polymer composition, methods of structure obtaining and head for liquid supply

FIELD: chemistry.

SUBSTANCE: invention relates to a light-sensitive polymer composition, suitable for obtaining various microdevices for microelectromechanical systems and other systems, as well as to a method of the structure obtaining and to a head for a liquid supply. The polymer composition contains the following components: (a) epoxy resin, which can be polymerised in the presence of an acid; (b) photoacid-generating agent, which contains an onium salt, containing a structure of a cationic part, represented by formula , and a structure of an anionic part, represented by formula , and (d) one of diphenyl, naphthalene and anthracene compounds, containing one of the following compounds: The component (b) absorbs, at least, 50% of quantity of light with the wavelength of 365 nm, absorbed by the light-sensitive polymer composition. The method of the structure obtaining consists in the following: a substrate, containing a layer of the said light-sensitive polymer composition is taken and irradiated by light. After that, an irradiated part is hardened and a non-solidified part is removed. After that, a solidified part is heated at a temperature, of at least, 140 degrees Celsius to obtain the structure. The head for the liquid supply contains an element of a hole for supply, containing the hole for supply, constructed for the liquid supply. The element of the hole for supply is obtained from the product of hardening of the said light-sensitive polymer composition.

EFFECT: invention makes it possible to obtain the structure with high sensitivity and high shape correctness.

9 cl, 9 dwg, 4 tbl, 9 ex

 

The technical field to which the present invention

The present invention relates to a photosensitive resin composition, method for producing patterns and head for the fluid.

The prior art of the present invention

One of the well-known microfabrication method includes photolithography, including the effects on the negative photosensitive resin light and manifestation to obtain patterns with imprint. This method is widely used for various purposes, such as the use of semiconductor integrated circuits, the use of semiconductor photomasks and application for various microelectromechanical systems (MEMS). In the example of application to obtain the MEMS method is used to obtain a nozzle head for supplying the liquid. Installation for lithography with serial stepper exposure with a light source of i-line is widely used as imaging devices. In the field of this technology currently requires a more complex and have more complicated structures and, therefore, requires a negative photosensitive resin, which has high sensitivity to light from a light source and a high accuracy of form.

Published patent application Japan is the 2008-256980 describes the photosensitive polymer composition, which contains a polyfunctional epoxy resin and initiator of cationic polymerization as an example of this negative photosensitive resin.

U.S. patent 6155673 describes an example of the structure of the device for the fluid containing the nozzle, in which bubbles are generated by heating the heat-resistant element, interact with the outside air so as to supply droplets of paint.

However, the above composition does not have satisfactory properties in some cases, for the reasons mentioned below. For example, when there is a complicated structure, such as a conical hole for the feed device to feed the liquid by applying this negative photosensitive polymer composition and the light source of i-line, can produce undesirable form, such as a partially rounded edge.

The essence of the present invention

The present invention relates to a photosensitive resin composition with which it is possible to obtain a structure with high sensitivity and high accuracy of form, using the photolithography light source of i-line.

According to one aspect of the present invention provide a photosensitive polymer composition comprising (a) compound, which can be polimerizuet in prisutstvie the acid; and (b) the agent generating motocicleta, including oneway salt containing the structure of the cation part represented by the formula (b1) below, and the structure of the anion portion represented by the formula (b2) below, in which component (b) absorbs 50% or more the amount of light with a wavelength of 365 nm, which is absorbed by a photosensitive resin composition.

Scheme 1

Here each R1-R3independently represents an organic group of 1-30 carbon atoms; R1-R3represents a structure containing at least two oxygen atom and comprising at least one organic group selected from thioxanthones patterns, 9,10-dialkoxybenzene patterns or antrahinonovye structure; X is selected from carbon atom, nitrogen atom, phosphorus atom, boron atom and an atom of antimony, at least one Y is selected from-S(=O)2-, -CF2-O-, -CF2-C(=O)-, -CF2-C(=O)-O -, and-CF2-O-C(=O)-, or X and R4directly connected to each other; R4represents a hydrocarbon group of 1-30 carbon atoms, provided that when Y is-S(=O)2or a simple bond, a hydrocarbon group represented by R4contains at least one fluorine atom, and when X represents a carbon atom, m and n represent integers which satisfy your high is accelerate m+n=3 and n=0-2, when X represents a nitrogen atom, m and n are integers that satisfy m+n=2 and n=0-1, when X represents an atom of phosphorus or antimony, m and n are integers that satisfy m+n=6 and n=0-6, or when X represents a boron atom, m and n represent integers that satisfy m+n=4 and n=0-3.

According to an exemplary variant of implementation of the present invention provide a photosensitive polymer composition, which can be used to obtain the structure with high sensitivity and high accuracy of form, using the photolithography light source of i-line.

Additional features and aspects of the present invention will become clear from the following detailed description of exemplary embodiments with reference to the accompanying drawings.

Brief description of drawings

The accompanying drawings, which are entered and are part of the description, illustrate exemplary embodiments of the characteristics and aspects of the present invention and, together with the description, serve to explain the principles of the present invention.

Figure 1 is a diagram illustrating a photomask for use in obtaining the model sample in an exemplary embodiment of the present invention.

Figure 2 is a diagram illustrating an example structure of the tours inkjet recording head according to an exemplary variant of implementation of the present invention.

Figure 3 represents a diagram illustrating the structure having many elements that generate energy located at a predetermined distance from each other on the substrate, shown in figure 2.

Figa is a cross section showing a method of obtaining a head for feeding fluid according to an exemplary variant of implementation of the present invention.

FIGU is a cross section showing a method of obtaining a head for feeding fluid according to an exemplary variant of implementation of the present invention.

Figs is a cross section showing a method of obtaining a head for feeding fluid according to an exemplary variant of implementation of the present invention.

Fig.4D is a cross section showing a method of obtaining a head for feeding fluid according to an exemplary variant of implementation of the present invention.

File is a cross section showing a method of obtaining a head for feeding fluid according to an exemplary variant of implementation of the present invention.

Fig.4F is a cross section showing a method of obtaining a head for feeding fluid according to an exemplary variant of implementation of the present invention.

Description variant is implementation

Various exemplary embodiments of the characteristics and aspects of the present invention will be described in detail below with reference to the drawings.

The photosensitive polymer composition

The photosensitive polymer composition according to an exemplary variant of implementation of the present invention describe in detail below.

(a) a Compound that can cure in the presence of acids

The photosensitive polymer composition according to an exemplary variant of implementation of the present invention contains a compound (component (a)), which may polymerization in the presence of acid. The connection, which may polymerization in the presence of acid may be any compound that can cure cation, such as an epoxy compound, oxetane connection or vinyl compound, which can cure cation. To obtain a thick film using the photosensitive polymer composition, epoxysilane is preferred, and a polyfunctional epoxysilane containing two or more apachegroup, is preferred. The number of functional groups in the polyfunctional epoxysilane preferably is five or more.

Examples of polyfunctional epoxysilane include p is bifunktionalno alicyclic epoxy resin, polyfunctional phenomenology epoxy resin, polyfunctionalo-krizanovicka epoxy resin, multifunctional Novolac epoxy resin triphenylene type and polyfunctional bisphenol-A Novolac epoxy resin. In particular, polyfunctional bisphenol-A Novolac epoxy resin or alicyclic polyfunctional epoxy resin is preferred. Examples of commercially available polyfunctional epoxy compounds include Epicoat 157S70 (trade name)produced Japan Epoxy Resins Co., Ltd., EPICLON N-865 (trade name), obtained by DIC Corporation, and EHPE 3150 (trade name)produced DAICEL CHEMICAL INDUSTRIES, LTD.

Component (a) preferably is a solid at room temperature (24 degrees Celsius). The softening temperature of component (a) is preferably, but not limited to, 50-180 degrees Celsius, more preferably 60-160 degrees Celsius.

One component (a) or two or more of components (a) can be applied separately or in combination. The content of the component (a) in the photosensitive resin composition is preferably from 60 to 99.9 wt. -%, more preferably from 80 to 99.9 wt. -%, even more preferably from 85 to 99,2% of the mass, relative to the total mass of solids photosensitive polymer composition of the Photosensitive polymer composition, contains the quantity of the component (a) in the above range, can form a protective layer with high sensitivity and a suitable hardness of the coating on the material to stiffen.

(b) the Agent generating motociclete

The photosensitive polymer composition according to an exemplary variant of implementation of the present invention contains the agent generating motocicleta (component (b)). The agent generating motocicleta (component (b)), contains Onyewu salt, having the ability to generate acid when exposed to light of i-line, especially light at a wavelength of 365 nm, and containing the structure of the cation part represented by the formula (b1) below, and the structure of the anion portion represented by the formula (b2) below.

Scheme 2

An example of the component (b)containing Onyewu salt containing the structure of the cation part represented by the formula (b1), and the structure of the anion portion represented by the formula (b2)shown below.

Scheme 3

In the formula (b1) for every R1-R3independently represents an organic group of 1-30 carbon atoms, and R1-R3represent structures containing two or more oxygen atoms and containing at least one organic group selected from thioxanthone structure is s, 9,10-dialkoxybenzene patterns or antrahinonovye patterns. Because the agent generating motocicleta contains the structure of the cation part represented by the formula (b1), the absorption wavelength is shifted to longer wavelengths, and the resulting photosensitive polymer composition may have photosensitivity to light of i-line.

Examples of the organic group represented by each of R1-R3include alkyl group of 1-30 carbon atoms, alkenylphenol group of 2-30 carbon atoms, alkylamino group of 2-30 carbon atoms, aryl group of 6-30 carbon atoms, heterocyclic group of 4-30 carbon atoms, the above groups in which at least one hydrogen atom is substituted with hydroxyl group, amino group, cyano, a nitro-group or halogen atom and the above group, in which the ester linkage, thioester linkage, a carbonyl group, oxycarbonyl group, thiocarbonyl group, sulfonylurea group or sulfonylurea group is placed between the carbon atoms to such an extent that the number of carbon atoms is not more than 30. R1-R3may be the same or different. Two or more R1-R3can be linked, forming a ring structure.

In the formula (b2) X is selected from carbon atom, nitrogen atom, and the Ohm phosphorus, the boron atom and an atom of antimony. Y is selected from-S(=O)2-, -CF2-O-, -CF2-C(=O)-, -CF2-C(=O)-O -, and-CF2-O-C(=O)-, or X and R4directly related to each other. R4represents a hydrocarbon group of 1-30 carbon atoms, optionally substituted by a fluorine atom, and when Y is-S(=O)2or a simple bond, a hydrocarbon group represented by R4contains at least one fluorine atom, in particular, is a group of CF3or C2F5. When X represents a carbon atom, m and n are integers that satisfy m+n=3 and n=0-2. When X represents a nitrogen atom, m and n are integers that satisfy m+n=2 and n=0-1. When X represents an atom of phosphorus or antimony, m and n are integers that satisfy m+n=6 and n=0-6. When X represents a boron atom, m and n are integers that satisfy m+n=4 and n=0-3.

Because the agent generating motocicleta contains the structure of the anion portion represented by the formula (b2), component (b) may decompose upon irradiation with light of i-line, so that the acid can be obtained from the structure represented by formula (b2). The resulting acid may act by initiating and facilitating the reaction of the cationic polymerization of the component (a). Acid obtained by the decomposition of the component is (b), has a degree of acidity that the component (a) can sufficiently be cured. As used in the present invention, the expression "this degree of acidity that the component (a) can sufficiently be cured" means that the acid is a strong Lewis acid, which is as strong or stronger than geksaftorpropena acid, especially a strong Lewis acid whose acidity function of Gamete-HO is 18 or more, or that the acid is a strong acid Bronsted, which is as strong or stronger than nonattributable, especially a strong acid Bronsted having a PKa -3,57 or more.

Preferred examples of the structure of the cation part represented by the formula (b1)include (b1-1)to(b1-26), shown below, and preferred examples of the anionic structure part represented by the formula (b2)include (b2-1)to(b2-23)shown below.

Scheme 4

Scheme 5

Scheme 6

Scheme 7

One component (b) or two or more of components (b) can be applied separately or in combination. The content of component (b) in the photosensitive resin composition is preferably from 0.01 to 20 parts by weight, more preferably from 0 to 10 parts by weight, relative to the total weight of solids photosensitive resin composition.

In the photosensitive resin composition according to an exemplary variant of implementation of the present invention, the amount of light with a wavelength of 365 nm, absorbed component (b), approaching 50% or more of the amount of light with a wavelength of 365 nm, which is absorbed by a photosensitive resin composition. This allows to obtain a high photosensitivity and to carry out image formation with high sensitivity effects. To further increase the sensitivity of the amount of light with a wavelength of 365 nm, the absorbed component (b), preferably 80% or more of the amount of light with a wavelength of 365 nm, which is absorbed by a photosensitive resin composition.

(c) a Compound capable of deactivating the acid derived from the component (b), after exposure to light

The photosensitive polymer composition according to an exemplary variant of implementation of the present invention may further contain a compound (component (c)), is able to deactivate the acid derived from the component (b). The compound capable of deactivating the acid is usually a basic compound containing a nitrogen atom, while it is not specifically limited regarding chemical is eskay patterns. The basic compound containing a nitrogen atom, refers to the basic compound containing a nitrogen atom and possesses the basic properties resulting from the lone-pair electrons of the nitrogen atom. For example, component (c) can function, capturing the acid obtained from the agent, generating motocicleta, and by disabling the acidity. This increases the resolution of image formation by controlling the diffusion length of the acid at the stage of diffusion of the acid by heating or deactivates a very small amount of acid generated from the agent generating motocicleta, or a similar reaction in the dark during storage of the solution of photosensitive resin composition, which gives the advantage that the change of sensitivity is suppressed during storage.

The basic compound containing a nitrogen atom, as component (c) is preferably, but not limited to, a basic compound containing two or more nitrogen atoms in different chemical environments. In particular, the basic compound containing a nitrogen atom preferably is a compound containing at least one substituted or an unsubstituted amino group and at least one ring structure containing a nitrogen atom, and this compound is more preferably soda is separated by at least one alkylamino as substituted amino groups. The basic compound containing a nitrogen atom may form an ionic compound, such as tetraalkylammonium salt, or pinnae connection.

Examples of the basic compound containing a nitrogen atom include guanidine, pyridine, pyrrolidine, indazole, imidazole, pyrazole, pyrazin, pyrimidine, purine, imidazole, pyrazoline, piperazine, piperidine and morpholine. These compounds may contain a substituent. Examples of the substituent include an amino group, aminoalkyl group, alkylamino, aminoaryl group, killingray, alkyl group, alkoxygroup, acyl group, alliancegroup, aryl group, alloctype, the nitro-group, a hydroxy-group and cyano.

Preferred examples of the basic compound containing a nitrogen atom include guanidine, 1,1-dimethylguanidine, 1,1,3,3-tetramethylguanidine, 2-aminopyridine, 3-aminopyridine, 4-aminopyridine, 2-dimethylaminopyridine, 4-dimethylaminopyridine, 2-diethylaminopropyl, 2-(aminomethyl)pyridine, 2-amino-3-methylpyridine, 2-amino-4-methylpyridine, 2-amino-5-methylpyridine, 2-amino-6-methylpyridine, 3-aminomethylpyridine, 4-aminomethylpyridine, 2-aminopyrrolidine, 3-aminopyrrolidine, 1-(2-amino-ethyl)pyrrolidine, piperazine,N-(2-amino-ethyl)piperazine,N-(2-amino-ethyl)piperidine, 4-amino-2,2,6,6-tetramethylpiperidine, 4-piperidinophenyl, 2-aminopiperidin, pyrazole, 3-amino-5-methyl shall irsol, 5-amino-3-methyl-1-p-tollerson, pyrazin, 2-(aminomethyl)-5-methylpyrazine, pyrimidine, 2,4-diaminopirimidina, 4,6-dihydroxypyrimidine, 2-pyrazoline, 3-pyrazoline,N-aminomorpholine andN-(2-amino-ethyl)morpholine.

One component (c) or two or more components (c) can be applied separately or in combination. The content of component (c) in the photosensitive resin composition is preferably from 0.001 to 10 parts by weight, more preferably from 0.01 to 5 parts by weight, relative to the total mass of solids photosensitive resin composition.

(d) low Molecular compound containing two or more benzene rings or condensed ring in the molecule

The photosensitive polymer composition according to an exemplary variant of implementation of the present invention may further comprise a low-molecular compound (component (d))containing two or more benzene rings or condensed ring in the molecule. Component (d) is a low molecular weight compound containing two or more benzene rings or condensed ring in the molecule, which preferably has such a molecular weight that it is less volatile and remains in sufficient quantities in the formed film, while it is not specifically limited regarding Henichesk the second structure, provided that it does not correspond to any component (b)or component (c). The molecular weight of the component (d) preferably is in the range 100-1100, more preferably in the range of 200-900.

Component (d) may have the ability to control the characteristics of the formed film. For example, it can function, reducing the internal stress generated in the curing process, controlling the hydrophilicity or water resistance of the formed film or improving the characteristics of the surface layer.

Preferred examples of the component (d) includes (d-1) (d-7)shown below.

Scheme 8

One component (d) or two or more components (d) can be applied separately or in combination. The content of component (d) in the photosensitive resin composition is preferably from 0.1 to 30 parts by weight, more preferably from 1 to 25 parts by weight, relative to the total mass of solids photosensitive resin composition.

The photosensitive polymer composition according to an exemplary variant of implementation of the present invention can be applied in various fields, examples of which include, but are not limited to, the production of semiconductor integrated circuits, obtaining provodnikov masks and receiving MEMS. In particular, since the photosensitive polymer composition according to an exemplary variant of implementation of the present invention has high sensitivity and correctness of form, it can form feed holes of the complex form when applying to get heads for the fluid in the area of MEMS.

Head for the fluid according to an exemplary variant of implementation of the present invention includes a feed slot formed through the layer of photosensitive polymer composition. Example head for the fluid may represent, but is not limited to, ink-jet recording head having the structure shown in figure 2.

Ink-jet recording head shown in figure 2, includes a substrate 1 having a large number of items 2, generating energy, and layer 4, forming a path for the current ink, which provide on the substrate 1, and forms a path 3c for the current ink for holding ink and holes 5 for supplying ink, which communicates with the through 3c for the current ink. The substrate 1 also contains the opening 6 to the ink supply ports through which ink fed into the passage for supplying ink 3c. Head for the fluid according to an exemplary variant of implementation of the present invention and the method of its obtaining describe below with reference to figure 2 and figa-4F, p. the practice showing the A-B cross-section figure 3. As shown in figure 3 and 4A, a large number of items 2, generating energy, is placed at a predetermined distance from each other on the substrate 1, and each of the elements 2, generating energy, is connected to the input electrode control signal (not shown) to activate the element.

The substrate 1 preferably is a silicon substrate. In particular, the substrate 1 preferably is a single crystal silicon substrate. When through holes are formed in the substrate 1 by anisotropic etching, the substrate 1 preferably is a single crystal silicon substrate with a crystal orientation [100]. When through holes are formed in the substrate 1 by dry etching, sand blasting or laser treatment, the substrate 1 may be a monocrystalline silicon substrate with a crystal orientation [110].

Items 2, generating energy, can belong to any type capable of applying energy to the ink so that ink droplets can stand out from the hole to supply ink. For example, when the heating resistor elements are used as elements 2, generating energy, the heating resistor elements heat the ink near you, changing the state of the ink, so that generiques the energy for separation of ink.

Soluble polymer composition applied to the substrate 1 in order to obtain a structured layer for the current ink 3a (pigv). A method of obtaining a structured layer for the current ink 3a may include dissolution of the positive photosensitive resin in a suitable solvent, applying the solution on the substrate 1 by a coating method, centrifugation or any other method, and then heating the coating to obtain a structured layer for the current ink 3a. The thickness of the structured layer for current 3a ink may be such that can form a passage for a current of ink to the desired height, which is preferably, but not limited to, 2-50 micrometers.

Then the structured layer for the current ink 3 is subjected to irradiation and are so formed imprint for the current ink 3b (figs).

Then a layer 4, forming a path for the current ink, the print for the current ink 3b and the substrate 1 by applying the photosensitive polymer composition according to an exemplary variant of implementation of the present invention. The thickness of the layer 4, forming a path for the current ink, the print for the current ink 3b is preferably 2 micrometers or more. The upper limit of the thickness of the layer 4, forming a path for the current ink, the print for the current ink 3b preferably the composition is yet 100 micrometers or less, while he did not specifically limited, provided that it is within the range which does not exhibiting reduced the ability of holes for ink supply.

Then layer 4, forming a path for the current ink are irradiated and then treated with isobutyl ketone (MIBK) or the like, and optionally subjected to washing IPA or similar, so that formed an outlet for ink 5 (fig.4D). Then get a passage 6 for supplying ink suitable means, such as etching (fige).

Then the thumbprint for the passage of the current ink 3b is dissolved and removed using a suitable solvent (fig.4F). The solvent to be used may be an aqueous alkali solution or an organic solvent.

Then, the substrate 1 is cut and divided into pieces, using the installation for cutting or any other device and provide electrical connection to each piece, so that the elements 2, generating energy, could function. To them additionally attach the tank to the ink so that the ink jet recording head was prepared.

It should be clear that the above method is suitable not only for the method of producing an inkjet recording head, but also as a way of receiving concave prints.

Examples of the present invention which is, assumed not to limit the scope of the present invention, are described below.

Examples 1-9 and comparative examples 1-4

Each photosensitive polymer composition containing a polyfunctional epoxy resin (component (a)), the agent generating motocicleta (component (b)), the solvent and optional component (c), component (d) and/or sensitizer, receive according to the formulations (in units of parts by weight)shown in table 1. With regard to component (b), table 1 shows the chemical formulas of the anionic and cationic parts in the column components. The used solvent was a mixed solvent acetate nanometrology ether of propylene glycol and propylene carbonate (25:1 in mass ratio) and 80 parts by weight of solvent were added to 100 parts by weight of component (a).

Each of these photosensitive polymer compositions was applied on the carrier material of a silicon wafer using a spin-cooter, and then dried by heat treatment at 90 degrees Celsius for 5 minutes so as to obtain a layer of photosensitive resin composition with a thickness of 20 micrometers. After heat treatment, the layer of polymer composition was subjected to exposure for obtaining a fingerprint using a photomask having the desired imprint, applying FPA-3000i5+ (trade name setup for l is adopted with serial stepper exposure to i-line, received Cannon Inc.), and then subjected to heat treatment after exposure at 90 degrees Celsius for 4 minutes using a hotplate. Then he made the manifestation of using CDS-630+ (trade name, obtained by Cannon Inc.). After developing the resin with the mark on the substrate was subjected to posterboard at 140 degrees Celsius for 1 hour, using the oven, so to get cured resin print in photoresist on the raw material.

Comparative examples 1-3 were carried out using the agent generating motocicleta containing sulfonate salt (b1-27) (alternatively, component (b)), which does not contain organic group selected from thioxanthones patterns, 9,10-dialkoxybenzene patterns or antrahinonovye structure and in which all its constituent atoms for R1-R3contain only one atom of oxygen. Comparative example 4 was carried out using the agent generating motocicleta containing sulfonate salt (b1-28) (alternatively, component (b)), which did not contain the organic group selected from thioxanthones patterns, 9,10-dialkoxybenzene patterns or antrahinonovye structure and in which all its constituent atoms for R1-R3not contain an oxygen atom.

The definition of the values

Sensitivity

Note the inner photomask, shown in figure 1, the negative imprint in the photoresist was obtained by transfer of a model imprint containing the thumbprint for the elliptical holes of the nozzle with a design size of 20 μm (major axis) * 16 micrometers (lower axis) and the imprint of the bridge line (represented in figure 1) with a width of 3 microns across the ellipse along the minor axis. When I received this imprint, irradiation with light of i-line was carried out with the amount of exposure light, gradually changing in the range of 500-20000 j/m2and determined the amount of exposure light required to obtain a thumbprint from the designed size.

The correct form

Watched the part in which the imprint of the bridge line intersects the ellipse, using a scanning electron microscope (SEM), when determining permissions. The virtual straight line is drawn from the end (represented by a in figure 1) sickle shape, which will be formed when the imprint in the photoresist receive according to the project footprint photomask, along the side of the imprint bridge line. The correct form (in units of micrometers) is defined as the length (represented by b in figure 1) virtual straight line drawn to the point where it intersects with the real manifested imprint. If the real manifested imprint reaches end is (a in figure 1) Crescent shape, the correct form would be 0 micrometers, which means that the fingerprint matches the designed size. However, as the fall of the correct form curable material remains at the end (a in figure 1) Crescent shape. Thus, the value in the correct format is determined depending on how many of the cured material is distributed.

The absorption rate

To assess the absorption initially received two compositions, as described below.

Composition 1

The photosensitive polymer composition was obtained as described above.

Composition 2

The photosensitive polymer composition was obtained in the same manner as described above except that it did not add the component (b).

Then each of the compositions 1 and 2 was applied on the carrier material made of quartz glass, applying a spin-cooter, and then dried by termoobrabotki at 90 degrees Celsius for 5 minutes so as to obtain a layer of polymer compositions 1 and 2 with a thickness of approximately 20 micrometers each. Absorption (Abs units) of each layer of polymer compositions 1 and 2 was measured at a wavelength of 365 nm, using a spectrophotometer Model U-3300 (trade name received by Hitachi Ltd.). Also measured the thickness of each layer of polymer compositions 1 and 2 (in units of micrometers). The ratio of the amount of light with DL is Noah wave 365 nm, the absorbed component (b), the amount of light with a wavelength of 365 nm, the absorbed photosensitive polymer composition was calculated from the measurements according to the formula below. The calculated quantities are called the absorption coefficient (in units of %).

Calculation formula

Absorption rate = {[(absorption layer polymeric composition 1/the thickness of the layer of resin composition 1) - (absorption layer polymeric composition 2/the thickness of the layer of polymeric composition 2)]/(absorption layer polymeric composition 1/the thickness of the layer of resin composition 1)} · 100

The results are presented in table 1.

(a-1): EPICLON N-865 (trade name, obtained by DIC Corporation) amoxicillinum 210 and a softening temperature of 68 degrees Celsius

(a-2): JER157S70 (trade name, received Japan Epoxy Resins Co., Ltd.) with amoxicillinum 210 and a softening temperature of 70 degrees Celsius

(a-3): EHPE 3150 (trade name, obtained by DAICEL CHEMICAL INDUSTRIES, LTD.) with amoxicillinum 180 and a softening temperature of 85 degrees Celsius

(b1-27):

Scheme 9

(b1-28): triphenylsulfonium

(c-1): 4-aminomethylpyridine

(d-1): 1-naphthol

In examples 1-9 model imprint to drip from the Erste for submission was successfully received with a small amount of lighting 4000 j/m 2or less. At this stage, the correct form is so low as 2.0 micrometer or less.

In contrast, when the structure of the cation part represented by the formula (b1)contain only one atom of oxygen or did not contain oxygen atom, as in comparative examples 1-4, high sensitivity, in particular, a small amount of light and high accuracy of form was not satisfied. When the absorption coefficient of the incident light component (b) was low, as in comparative examples 3 and 4, in particular, when the absorption coefficient was less than 50%, there was a decrease in the correct format.

As described above, the formation of the imprint with high sensitivity and high accuracy of shape can be realized by applying the photosensitive polymer composition according to an exemplary variant of implementation of the present invention. Therefore, the photosensitive polymer composition according to an exemplary variant of implementation of the present invention is suitable for various microstruct for MEMS and other systems.

While the present invention is described with reference to exemplary embodiments of the implementation, it should be clear that the present invention is not limited to the described exemplary embodiments of the implementation. The volume of the following formula from the Britania corresponds to the most broad interpretation, to include all modifications, equivalent structures and functions.

This application claims the priority of patent application of Japan No. 2010-024681 entered in the register on 5 February 2010, which is included in the present invention fully by reference.

1. The photosensitive polymer composition containing
(a) epoxy resin, which may polymerization in the presence of an acid;
(b) the agent generating motocicleta containing Onyewu salt containing the structure of the cation part represented by the formula (b1), and the structure of the anion portion represented by the formula (b2),

where R1-R3represents a structure containing at least one organic group selected from thioxanthones patterns or antrahinonovye patterns,
X represents a carbon atom, while Y is selected from-S(=O)2-, -CF2-O-, -CF2-C(=O)-, -CF2-C(=O)-O -, and-CF2-O-C(=O)-, R4represents a hydrocarbon group of 1-30 carbon atoms; Y represents-S(=O)2-, the hydrocarbon group represented by R4contains at least one fluorine atom;
X represents a phosphorus atom or a boron atom, R4represents a hydrocarbon group of 1-30 carbon atoms, containing at least one fluorine atom, with the and R 4directly connected to each other, and Y represents a simple bond;
when X represents a carbon atom, m and n are integers that satisfy m+n=3 and n=0-2,
when X represents a phosphorus atom, m and n are integers that satisfy m+n=6 and n=0-6,
when X represents a boron atom, m and n represent integers that satisfy m+n=4 and n=0-3;
where component (b) absorbs at least 50% of the amount of light with a wavelength of 365 nm, which is absorbed by a photosensitive polymer composition, and
(d) one of diphenylene, naftalinovogo and anthracene compounds containing one of the following substituents:

2. The photosensitive polymer composition according to claim 1, characterized in that X in the component (b) is a phosphorus atom.

3. The photosensitive polymer composition according to claim 2, characterized in that the structure of the component (b)represented by R1-R3contain at least two thioxanthone patterns, Y represents a simple bond, R4is a CF3or C2F5and m is at least 3.

4. The photosensitive polymer composition according to claim 1, characterized in that it further comprises (C) a compound capable of deactivating the acid derived from the component (b) after exposure to light.

5. The photosensitive polymer composition according to claim 1, characterized in that the component (d) includes one of the following structures (d-1) (d-7):



6. A method of obtaining a structure, and the method includes, in this order:
providing a substrate containing a layer of photosensitive resin composition for obtaining the structure, and the photosensitive polymer composition contains
(a) epoxy resin, which may polymerization in the presence of acid; and
(b) the agent generating motocicleta containing Onyewu salt containing the structure of the cation part represented by the formula (b1) below, and the structure of the anion portion represented by the formula (b2) below,

where R1-R3represents a structure containing at least one organic group selected from thioxanthones patterns or antrahinonovye structure;
X represents a carbon atom, while Y is selected from-S(=O)2-, -CF2-O-, -CF2-C(=O)-, -CF2-C(=O)-O -, and-CF2-O-C(=O)-, R4represents a hydrocarbon group of 1-30 carbon atoms; Y represents-S(=O)2-, the hydrocarbon group represented by R4contains at IU is greater least one fluorine atom;
X represents a phosphorus atom or a boron atom, R4represents a hydrocarbon group of 1-30 carbon atoms, containing at least one fluorine atom, with X and R4directly connected to each other, and Y represents a simple bond;
when X represents a carbon atom, m and n are integers that satisfy m+n=3 and n=0-2,
when X represents a phosphorus atom, m and n are integers that satisfy m+n=6 and n=0-6,
when X represents a boron atom, m and n represent integers that satisfy m+n=4 and n=0-3,
where component (b) absorbs at least 50% of the amount of light with a wavelength of 365 nm, which is absorbed by a photosensitive polymer composition,
(d) one of diphenylene, naftalinovogo and anthracene compounds containing one of the following substituents:

irradiation of the layer with light, and then curing the irradiated part, and removing the uncured portion; and
heating utverzhdenii part at a temperature of at least 140 degrees Celsius to obtain the structure.

7. The method according to claim 6, in which component (d) includes one of the following structures (d-1) (d-7):



8. Head to feed the liquid, contains
the element holes for the feed containing the feed slot, designed to supply liquid
which element of the feed holes is obtained from the product of curing a photosensitive resin composition containing
(a) epoxy resin, which may polymerization in the presence of acid; and
(b) the agent generating motocicleta containing Onyewu salt containing the structure of the cation part represented by the formula (b1) below, and the structure of the anion portion represented by the formula (b2) below,

where R1-R3represents a structure containing at least one organic group selected from thioxanthones patterns or antrahinonovye structure;
X represents a carbon atom, while Y is selected from-S(=O)2-, -CF2-O-, -CF2-C(=O)-, -CF2-C(=O)-O -, and-CF2-O-C(=O)-, R4represents a hydrocarbon group of 1-30 carbon atoms; Y represents-S(=O)2-, the hydrocarbon group represented by R4contains at least one fluorine atom;
X represents a phosphorus atom or a boron atom, R4represents a hydrocarbon group of 1-30 carbon atoms, containing at least one fluorine atom, with X and R4directly connected to each other, and represents a simple bond;
when X represents a carbon atom, m and n are integers that satisfy m+n=3 and n=0-2,
when X represents a phosphorus atom, m and n are integers that satisfy m+n=6 and n=0-6,
when X represents a boron atom, m and n represent integers that satisfy m+n=4 and n=0-3,
where component (b) absorbs at least 50% of the amount of light with a wavelength of 365 nm, which is absorbed by a photosensitive polymer composition,
(d) one of diphenylene, naftalinovogo and anthracene compounds containing one of the following substituents:

9. Head of claim 8, wherein component (d) includes one of the following structures (d-1) (d-7):





 

Same patents:

FIELD: chemistry.

SUBSTANCE: invention relates to demulsifier compositions (versions) containing: (a) an anionic surfactant selected from a group consisting of alkylsulphosuccinates, alkyl phosphate esters, alkylphosphonic acids, salts thereof, and combinations thereof; and/or (b) a nonionic surfactant selected from a group consisting of ethylene oxide and propylene oxide copolymers, ethoxylated fatty acid esters and polyethylene glycol, terpene alkoxylates, alcohol ethoxylates, modified alkanolamides, and combinations thereof; and (c) a solvent base composition containing a mixture of dibasic esters. The present invention also relates to methods of breaking oil and water emulsions (versions).

EFFECT: obtaining solvent bases for use in demulsifier compositions, which have less toxicity and are environmentally safer.

40 cl, 6 tbl, 2 dwg

FIELD: medicine, pharmaceutics.

SUBSTANCE: invention relates to application of ester compounds of benzoic acid, taken from group, which includes 1-phenylvinyl 4-methoxybenzoate; 1-(4-methoxyphenyl)-vinyl 4-tert-butyl benzoate, 1-(4-tert-butylphenyl)-vinyl 4-methoxybenzoate, 1-phenylvinyl 4-tert-butyl benzoate, 4-benzoyloxy-2-methoxybenzolsulphonic acid, 3-diethylaminophenyl benzoate and 3-(1-pyrrolidinyl) phenyl benzoate and 3-methoxy salicylate, as component for preparing composition for protection of human organism or animal or material from ultraviolet radiation, containing effective quantity at least one of claimed compounds, as component for preparing composition, which is characterised by progressive protection from UV radiation, depending on duration of sun influence and level of sun radiation, as component for preparing composition for individual hygiene, which is characterised by progressive protection from UV radiation, depending on duration of sun influence and level of sun radiation, as component for preparing industrial composition, which is characterised by progressive protection from UV radiation, depending on duration of sun influence and level of sun radiation, and as component for preparing composition, which at photo-regrouping shows quantity of obtained UV-B radiation.

EFFECT: invention also relates to composition for protecting human or animal organism or protection of material from ultraviolet radiation, contains effective quantity of at least one above mentioned ester compound of benzoic acid.

40 cl, 6 dwg, 33 ex

FIELD: oil and gas industry.

SUBSTANCE: inhibitor consists of mixture of solvent from alcohol and hydrocarbon compounds and additive in the form of quaternary ammonium salt of vegetable oil alkilimidasoline and benzyl chloride of the following general formula: where R - acid radical of vegetable oil of selected group: caprylic, capric, lauric, myristic, palmitic, palmitoleic, stearic, oleic, linoleic, arachidic, linolenic, gondoinic, behenic, erucic. Component ratio in the mixture, wt %: additive - 1.0-30.0; solvent - 70-99.

EFFECT: invention allows preventing formation of high-molecular deposits on the surface of equipment and corrosion of metal.

2 tbl, 14 ex

FIELD: process engineering.

SUBSTANCE: invention relates to abrasive grain mix bonded by inorganic binder. Mix structure is formed by multiple abrasive grains. Note here that abrasive grain is selected from the group consisting of corundum, fused corundum, sintered corundum, zirconium corundum, silicon carbide, boron carbide, cubic boron nitride, diamond and/or mixed thereof, and bonded by inorganic binder. Said binder is based on aluminium silicate, liquid glass and water. Note here that molar ratio of Al2O3 components to those of SiO2 in binder varies from 1:2 to 1:20. Proposed method comprises mixing abrasive grains with binder, drying produced mix at 100°C - 150°C and curing the mix at 200°C to approx. 450°C.

EFFECT: highest possible hardness.

18 cl, 3 dwg, 2 tbl, 3 ex

FIELD: organic chemistry.
SUBSTANCE: invention refers to using a flocculating and sequestering agent with the organic solution as an agent to facilitate such purification. A method of purifying an organic solution, comprising contacting a flocculating and sequestering agent with the organic solution, which organic solution comprises fatty acid alkyl esters, wherein the water content of the organic solution is equal or less than 5% by weight, when the pH in the organic solution is 9 to 12, wherein the flocculating and sequestering agent is chosen from polyaluminium coagulants. There is provided a process for purification of an organic solution of fatty acid alkyl esters suitable for use as biodiesel, comprising: adding a flocculating and sequestering agent chosen from polyaluminium coagulants to the organic solution so as to facilitate the purification when the pH in the organic solution is 9 to 12 and removing a portion from the organic solution, which portion comprises the flocculating and sequestering agent, and impurities, wherein the water content of the organic solution is equal or less than 5% by weight.

EFFECT: process will enable less energy input and becomes less time-consuming and less costly, as compared to the known processes using water to purify the organic solution.

10 cl, 3 tbl, 12 ex

FIELD: chemistry.

SUBSTANCE: method involves preparation of a solution of initial components and addition of extra components to the said solution while stirring. The initial components used are glycerin, polyethylene glycol and distilled water and are stirred for 1 hour at 55°C. During addition of extra components, the following are successively added to the solution of initial components: acetates of aliphatic amines while stirring for 12 hours, benzotriazole while stirring for 12 hours, sodium benzoate while stirring for 5 hours, triethanolamine while stirring for 2 hours and proxanol while stirring for 3 hours. The extra components are added while stirring at 55°C and the following nominal ratio of components is maintained (wt %): glycerin 37.20, distilled water 32.64, polyethylene glycol 23.10, triethanolamine 4.00, sodium benzoate 1.50, benzotriazole 1.30, acetates of aliphatic amines 0.25, proxanol 0.01.

EFFECT: wider field of use, obtaining hydraulic fluid for use as actuating medium in hydraulic systems.

1 cl

FIELD: oil and gas industry.

SUBSTANCE: composition contains di-sodium salt of ethylene-diamin-tetra-acetic acid, sodium hydroxide, ethylene glycol and water at following ratio of components, wt %: di-sodium salt of ethylen-diamin-tetra-acetic acid 9-15, sodium hydroxide 2-6, ethylene glycol 20-40 and water the rest.

EFFECT: composition possesses upgraded dissolving capacity relative to non-organic sediments of complex composition with inclusions of sulphide and iron oxide in them in wide range; also there is facilitated increased capacity of dissolving, high lubricant ability and added capacity to retain ions of iron in dissolved condition.

3 tbl, 1 ex

FIELD: chemistry.

SUBSTANCE: bottles are crushed to particle size ranging from 0.001 to 5 mm, mixed with calcium chloride in mass ratio bottle : CaCl2 equal to 20:1.

EFFECT: obtaining new material.

1 cl, 2 tbl

FIELD: oil-and-gas production.

SUBSTANCE: group of inventions related to material and method for collection of oil, lube, masut, fuel and hydrocarbons form water, soil, and other surfaces, also for cleaning of contaminated with oil and oil-products waters The material consists of swelling in oil and/or oil-products rubber and dispersing mineral filler with opened internal hydrophobic porosity.

EFFECT: efficiency increase and economically more profitable in terms of material consumption and method itself due to oil bonding speed increase and decrease of resin volume in the material.

3 cl, 2 ex, 4 tbl

FIELD: medicine.

SUBSTANCE: invention relates to the new hem-difluoridated compound of the formula: where R1 represents a group, containing alkyl chain or amino group; R2 represents hydrogen atom, either free or protected functional group of alcohol; R3 represents a group CH2OH, CH2-OGP, where GP respresents protecting group such as alkyl, benzyl (Vp), trimethylsilyl (TMS), tert-butyldimethylsilyl (TBDMS), tert-butyldiphenylsilyl (TBDPS), acetate (Ac); Y, Y', Y" represent independent groups OR, where R represents H, benzyl, Ac, TMS, TBDMS, TBDPS that are used for producing antitumor, antiviral, hypoglycemic and anti-flammatory medicine and compounds for immunology and cosmetology, or glyco peptide analogs of antifreeze molecules. The invention refers particularly also to the new hem-difluoridated compound of the general formula: and to the method of producing new hem-difluoridated compound of the formula: .

EFFECT: compounds possess increased effectiveness.

7 cl, 8 ex, 24 dwg

FIELD: process engineering.

SUBSTANCE: invention relates to fluid release head backup including multiple ink feed ports and lines on backup between adjacent power generating elements. Backup of substrate of fluid release head comprises array of elements generating power for fluid release, first common line, second common line, first separate lines configured to communicate elements and first common line and second separate lines to communicate elements and second common line. Array of elements is arranged between first common line and second common line. First separate lines are arranged between array of elements and first common line. Second separate lines are arranged between array of elements and second common line. Array of elements on the surface is arranged between first common line and second common line. Multiple first separate lines are arranged between array of elements and first common line. Multiple second separate lines are arranged between array of elements and second common line. Multiple fluid feed ports are arranged at least in one of multiple zones between adjacent elements, multiple zones between adjacent first separate lines and multiple zones between adjacent second separate lines.

EFFECT: higher density of power generation elements.

10 cl, 19 dwg

FIELD: chemistry.

SUBSTANCE: photosensitive composition contains a cation-polymerisable compound, an acid photogenerator having an anionic part and a cationic part, as well as a salt having a cationic part having anyone of a quaternary ammonium structure or a quaternary phosphonium structure, and an anionic part. The anionic part of the salt is substituted with the anionic part of the first acid obtained from the anionic part of the acid photogenerator, to form a second acid having acid strength lower than that of the first acid. The cation-polymerisable compound is an epoxy resin. The acid photogenerator is at least a compound selected from a group comprising a sulphonic acid compound and other sulphonic acid derivatives, a diazomethane compound, a sulphonium salt, an iodonium salt, a sulphonimide compound, a disulphonic compound, a nitrobenzene compound, a benzoin tosylate compound, an iron arene complex, a halogen-containing triadine compound, an acetophene derivative, and a cyano group-containing sulfatoxim. The method of forming a pattern involves preparing a substrate on which the photosensitive composition is provided. A portion of the composition is then exposed to light to cure the exposed portion. The cured portion is then heated. The liquid ejection head has a part with an outlet channel for ejecting liquid. The part with the outlet channel is formed from cured material made from said composition.

EFFECT: invention increases heat resistance of the photosensitive composition and increases accuracy of forming a pattern.

13 cl, 4 dwg, 5 tbl, 9 ex

FIELD: printing.

SUBSTANCE: invention relates to a semiconductor device that can be used in a head for fluid discharge, a cartridge for fluid discharge and a device for fluid discharge. The semiconductor device comprises segments, platform for power supply site power and electrically conductive structures. Each segment contains activating units for fluid discharge. Each activating unit has an activating circuit and an element driven by the activating circuit to apply the energy for discharge to the fluid. The electrically conductive structure comprises a first electrically conductive section connected to the platform for power supply, the second rectangular electrically conductive section, the third electrically conductive section connected to the activating units, and a section of connection that connects the second and third electrically conductive sections. These electrically conductive sections pass in the first direction. In the second direction the length of the second electrically conductive section is greater than the length of the first electrically conductive section. The second electrically conductive section is connected to the first electrically conductive section in the first corner and the connecting area in the second corner diagonally to the first corner.

EFFECT: exception of increase of the size of the printing head in the plan due to reducing the area of routing and eliminating the change of resistance of tracks to the respective segments.

9 cl, 15 dwg

FIELD: process engineering.

SUBSTANCE: fluid ejecting head comprises ejecting element silicon substrate with one surface provided with generator of power for fluid ejection and substrate support. Proposed method consists in that pitch composition to be cured on heating is placed between said substrate and support element so that portion of rear surface of substrate one surface comes in contact with both sides of support element. Then, light comprising at least ultraviolet rays and infrared rays is emitted onto said pitch composition from the side of ejecting element substrate through silicon plate to cure said composition.

EFFECT: higher printing quality of said head.

8 cl, 5 dwg

FIELD: measurement equipment.

SUBSTANCE: invention refers to element base of head with electrothermal converter, recording head and recording device. Element base of head, which includes many recording elements, contains the receiving device of the data in which data bits of pulse width of drive are inserted between recording data bits, device of extracting the recording data from the data received with the receiving device, and device of signal generation of pulse width of the drive determining the period of switching on the power of many recording elements by extracting the data of pulse width of the drive from the data received with the receiving device; at that, many recording elements are brought into action on the basis of the recording data extracted with the extraction device, and the drive pulse width signal. Recording device for performing the recording by means of recording head includes generation device of recording data and drive pulse width data, multiplexing device for generation of data bits of drive pulse width, in which there digitised is drive pulse width signal, and recording data bits, and device for transmitting the data generated with the multiplexing device to the recording head.

EFFECT: invention allows reducing the data receiving period and can multiplex the recording data and drive pulse width signal.

13 cl, 23 dwg

FIELD: polygraphy.

SUBSTANCE: ink cartridge comprises printing head for thermal jet printing. The said printing head incorporates element to generate heat for ejecting ink out through appropriate orifice. Aforesaid element in contact with ink features a protective layer comprising at least one component selected from the group consisting of silicon nitride and silicon carbide. Proposed inks comprise at least one component selected from polyvalent carboxylic acid and its salts. Note that aggregate level of content of aforesaid chemicals varies from at least 0.001 mmol/l to not less than 0.5 mmol/l.

EFFECT: expanded performances.

7 cl, 8 dwg, 8 tbl

FIELD: printing industry.

SUBSTANCE: invention concerns fluid recording head. Fluid recording head for recording by drop ejection from multiple ejection orifices in the substrate includes multiple first ejection orifices, each for ejection of rather large volume drops; multiple second ejection orifices, each for ejection of rather small volume drops; power generation elements for drop ejection from multiple first and second ejection orifices; storage tank for fluid ejected from multiple first and second ejection orifices; at least two first fluid passages for fluid flow between fluid tank and each of the first ejection orifices; and second fluid passage for fluid flow between fluid tank and each of the second ejection orifices.

EFFECT: concordance of small and large drop ejection rates, maintenance of normal ejection mode.

13 cl, 13 dwg

FIELD: mechanics.

SUBSTANCE: proposed fluid ejection device incorporates heating cells comprising the first stock of heating cells and second stock of heating cells, the first address generator designed to generate signal in response to the control signal for selective sequence of the first address signals used to activate the first stock of heating cells and to generate the second address signals to activate the second stock of heating cells. Note here that the second sequence of signals is sent irrespective of the first one. The control signals are received and in response to the control signals the first sequence of the first address signals is selectively sent out to activate the first stock of heating cells and then the second sequence is sent to activate the second stock of heating cells. Note here that for selective transmission control pulses in one of the control signals are received, along with the sequence of the sync pulses in the control signals. Note here that to initiate the first and second sequences, the control signals are duly processed.

EFFECT: higher speed and quality of printing.

20 cl, 20 dwg

FIELD: technological processes; printing industry.

SUBSTANCE: device for ejection of fluid medium contains multiple activating cells, activation bus bar arranged with the possibility of energy signal reception and generator of address intended for formation of address signals sequence. Address generator contains shift register, which has double-stage cells designed for reception of input signal and storage of input signal, and logical elements that are intended for reception of input signals during every address time slot and formation of address signals sequence. Energy signal represents pulse of energy during every address time slot in sequence of address time slots for excitation of selected permitted activating cells. Unit of printing head is suggested that contains controller for generation of set of signals, in preset configuration, the first bus bar for passage of the first pulses, the second bus bar for passage of the second pulses, the first group of resistors and the second group of resistors, which are connected with the possibility to conduct on the basis of mentioned set of signals and pu;se signals.

EFFECT: device provides specific height of printing strip and makes it possible to retain costs.

22 cl, 27 dwg

FIELD: printing.

SUBSTANCE: invention relates to a substrate for jet printing head, printing head and jet printing device. The said substrate with electrical heat converters intended for generation of heat required for releasing the ink incorporates a logic circuit to generate a unit selection signal to select the said converters in separate units proceeding from the voltage amplitude first level input signal and the element excitation signal for excitation of every electrical heat converter in the selected unit at the second voltage amplitude level exceeding the first one, and the excitation circuit intended for every electrical heat converter to excite the said converters in separate units proceeding from the unit selection and element selection signals of the second level of voltage amplitude, the said signals coming from the logic circuit. The method of controlling the excitation of electrical heat converters incorporates feeding the voltage amplitude first level input signal allowing for the input signal, the unit selection signal to select the unit of electrical heat converters in separate units and the element excitation signal to excite every electrical heat converter in the selected unit at the second level of the voltage amplitude exceeding that of the first one, and exciting the electrical heat converters in separate units allowing for the unit selection and element selection signals of the second voltage amplitude level coming from the logic circuit, the above functions are realised by exciting the excitation circuit designed for every electrical heat converter. The jet printing head contains outlets for ink and the substrate supporting the electrical heat converters arranged in compliance with outlets. The jet printing head cartridge carries a jet printing head and a cup filled with ink to be fed into the printing head. The jet printing device has outlets to let out the ink and a substrate whereon installed are electrical heat converters arranged in compliance with outlets. The circuit design is developed wherein the logic excitation voltage is converted into the voltage of elements excitation without increase in the length of segments in direction perpendicular to the direction of the matrix of segments. Annual output of finished products is increased and circuitry is simplified by reducing the circuit of pulse-amplitude modulation and the number of elements on the substrate.

EFFECT: increased annual output and simplified circuitry.

12 cl, 12 dwg

FIELD: transport, distribution.

SUBSTANCE: method for fixed liquid amount outlet uses device provided with: decompression valve to lower pressure of compressed gas fed by compressed gas source; outlet valve to control speed of gas flow decompressed in decompression valve; liquid storing reservoir to outlet liquid from nozzle under pressure of gas supplied through outlet valve; and buffer vessel located between decompression and outlet valve which vessel has capacity that exceeds capacity of liquid storing reservoir. Method and device for fixed liquid amount outlet features suppression of pressure lowering which occurs in gas flow path to feed compressed gas into the said liquid storing reservoir during operation of the said decompression valve due to flow resistance increase in flow path which connects the said buffer vessel with the said storage reservoir so that to exceed flow resistance in flow path which connects the said pressure chamber with the said decompression valve.

EFFECT: method and device for fixed liquid amount outlet so that it could be possible to divide and give liquid material with higher accuracy than it is possible using conventional devices.

13 cl, 4 dwg

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