Target for applying film coatings of complex composition and its manufacturing process

FIELD: thin-film technology; electronic, atomic, and other fields of science and technology.

SUBSTANCE: proposed mosaic target designed for applying multicomponent film coatings has matrix and fusible components disposed in its depressions. Fusible components are placed in matrix in the form of powders having different density and surface area, dependencies between them being governed by properties of elements and stoichiometric coefficients or percentage of film material components. Method for manufacturing claimed target is also proposed.

EFFECT: enhanced quality of composite coatings.

2 cl, 2 dwg, 2 tbl

 

The invention relates to the technology of thin films and can be used in the manufacture of multicomponent films for electronic, nuclear and other fields of science and technology.

Known targets for ion-plasma deposition of thin film coatings of complex structure, consisting of compacted and then sintered powder of the desired composition having the form of plates [1].

The disadvantage in such cases is the need for a preliminary synthesis of compounds, often quite complex.

The closest technical solution is a mosaic target, consisting of a flat matrix and placed on the matrix inserts sprayed from dissimilar materials located in the zone of erosion evenly along the projections of magnetic field lines, recessed and/or protruding relative to the surface of other elements of the target. The total surface of the inserts of each material is proportional to the concentration of the element in the film [2].

A disadvantage of the known device is that it contains inserts of the sprayed materials, which require preliminary shaping by mechanical or thermal treatment, which is not always possible. In addition, the element concentration in the film depends not only on the surface area of the sprayed material, but also on when Oreste spray. Spraying speed, in turn, depends on the density of the target material, its atomic mass and energy of sublimation. Therefore, if the insertion of the target prototype will not have the same density and atomic mass, then the target will not provide a given stoichiometric composition of the film.

A known method of manufacturing the target, when the powder is pressed with subsequent annealing [1].

The drawback of this method is that the target is uniform in density, and the rate of sputtering from the entire surface is constant.

The technical result of the invention is to improve the quality of coatings, their stoichiometry by giving items target various densities and surface areas depending on the material properties and stoichiometric coefficients of a chemical formula or percentage of components of the material film, if a chemical reaction is absent.

This technical result is achieved by the fact that in the known target elements of different materials are powder, compacted to different densities or not pressed. It is known that the rate of sputtering V is described by the expression:

where jandthe ion current density;

Spthe sputtering rate of the material;

Na- the number of Avogadro is;

Maatomic mass of the target material;

e - electron charge;

ρ - the density of the sputtered target material.

The sputtering rate Spcan be determined from the expression:

where Mandatomic mass of the ions of gas;

Eandthe energy of the incident ions;

Ewith- energy sublimation of the target atoms;

α - dimensionless parameter that depends on Mand/Mand.

If the various chemical elements included in the formula of the film material with different stoichiometric coefficients, they must have different evaporation rate Vithat is to be close to the substrate with different concentrations so that

where V0some minimum rate of evaporation;

Sithe surface area of the i-th element;

aiis the stoichiometric coefficient of the i-th member of the chemical formula (Aa1Ba2...Dai,

then the ratio of velocity can be written:

taking into account (1) and (2) the relation (4) can be represented as follows:

From the expression (5) we can obtain the ratio of the densities of the elements of the target and their surface area using the parameters and stoichiometric coefficients of the material of the film:

where Sithe surface area of the i-th element;

ρithe density of the i-th element;

aiis the stoichiometric coefficient of the i-th element in the chemical formula or the percentage of the i-th element in the film;

Maiatomic mass of the i-th element;

Mandatomic mass of the ions of gas;

Eci- energy sublimation of the i-th element;

αi- the dimensionless parameter of the i-th element-dependent Ma/Mandwhere i varies from 2 to n (n is the total number of placed in the matrix elements);

S1the surface area of the matrix;

ρ1the density matrix element;

a1is the stoichiometric coefficient of the matrix element in the chemical formula or the percentage of the matrix element in the film;

MA1atomic mass of element matrices;

EC1- energy sublimation of atoms of element matrices;

α1- the dimensionless parameter of the matrix element that depends on Ma/Mand.

Expression (6) shows in what ratio must be the densities of the target and square surfaces, so they gave contribution to the film, respectively, the stoichiometric coefficients in the chemical formula or percentage of components in case of mechanical mixture.

Thus, the target for ion-plasma deposition of thin the film coating compound composition is a matrix, in the recesses which are powder elements, density and surface area of which depends on the properties of elements, chemical composition of the film in accordance with the formula (6).

This technical result is also achieved by the fact that in the known method of manufacturing the target items target perform a bulk powder of one component into the cavities of the matrix, then give him the required density in accordance with (6) by pressing under a certain pressure with regard to the expression [4]:

where ρCR- the density of the extruded material;

ρus- the density of the filled powder;

P - pressure;

b is a constant dependent on the properties of the powder.

Value ρusdepends on the particle shape and particle size distribution of powder and can be reduced by grinding. Thus, it is possible to vary the density of the matrix element from ρusto ρmaxus+b×lgPmaxwhere Rmax- maximum pressure. After the first element of the target in the same way form later.

This method can give the elements of the specified target density, so to satisfy the condition (6). This allows us to conclude that the claimed technical solution related IU the control of a single inventive concept.

Comparative analysis of the features set forth in the proposed technical solution, with signs prototype shows that the claimed target differs from the prototype elements having different density and surface area depending on their properties and composition of the film according to (6), and a method of manufacturing the target differs in that the elements are pressurized to different pressures to provide the required density in accordance with (6). All this proves the compliance of the technical solutions of the criterion of "novelty".

A comparison of the claimed technical solutions with other technical solutions in this field of technology showed that the target elements, the density and the area of which is determined by the properties of the element and the chemical formula or composition film according to (6), produced using sequential pressing, is unknown. In addition, the set of essential features, together with the bounding allows you to find inventive solutions other, in contrast to known properties, which include the following:

- ensuring stoichiometric or percentage composition of the films by the correct speed setting spray items target;

- providing a range of speeds spray elements by varying their densities;

- the lack of a stage fur is technical or heat producing elements of the target;

- the use of materials that cannot be subjected to mechanical or thermal treatment in air;

- the best selection of surface areas of the elements of the target by varying their density.

Thus, the other, in contrast to the known, the properties inherent in the proposed technical solutions, demonstrated the presence of significant differences, aimed at the achievement of a technical result.

Figure 1 shows the top view of the target, figure 2 - it cut.

The target for the deposition of copper coatings Bi2Sr2CaCu2O8(high temperature superconductor) is composed of a matrix of copper 1. The area of erosion of the target is a ring 2. In the zone of erosion are annular grooves for elements of the target Bi, Sr, Ca (figure 2). Because the matrix is made of copper, the size of this item is the sum of the squares of the rings between the grooves, and the density has already been set. To calculate the parameters of the target were carried out calculations relevant notions ρ/S (6). The required information is shown in table 1.

Table 1.
No.andMand, (g/mol)Ewith, (eV)ρ0, (g/cm3) Mand, (g/mol)α
1Cu263,53,58,960,4
2Sr287,62,72,6339,95 (Ar)0,45
3CA140,13,01,540,3
4Bi22093,79,80,8

ρ0the density of the compact material.

Substituting the data from table 1 in (6), obtained ratios for

Values of k are presented in table 2. For convenience of calculations, the selected density of elements equal to 0.6ρ0and calculated their area surfaces. The results are presented in table 2.

Table 2.
No.kSρ, (g/cm3)
1Cu15,08,96
2Sr0,920,921,56
3 Ca0,590,870,92
4Bi17,716,65,88

The base area was selected area of the element copper, which were selected with consideration to the size of the zone of erosion. In the calculation it is necessary to consider that the total area of the elements corresponds to the area of erosion. Given the density of elements was provided by introducing into the groove of a certain quantity of powder based

where d is the depth of the notch.

After calculation were formed elements of the target in the grooves of the matrix (3, 4, 5 2) by one-sided pressing with a hydraulic press. The pressure was 20...40 MPa. After fabrication of the target used for the reactive ion-plasma coatings of Bi2Sr2CaCu2O8. Measurements showed satisfactory fit of the material composition of the coating chemical formula.

The use of the proposed targets for ion-plasma obtain a film coating of complex composition and method of its manufacture help to improve the quality coverage to their stoichiometry.

Sources of information

1. Danilin BS Methods of deposition of films of high temperature superconductors // Results of science and technology. Ser. Electronics is. - M.: VINITI, 1990, C. - S-170.

2. Pat. Of the Russian Federation No. 2210620 (20.08.2003).

3. Nikonenko V.A. Mathematical modeling of technological processes. Workshop / edited Groznica. - M.: Misa, 2001. - 48 S.

4. Okazaki K. the Technology of ceramic dielectrics. TRANS. with the Japanese. M: Energy, 1976. - P.58-64.

1. The target for ion-plasma deposition of thin film coatings of complex structure, consisting of a matrix and placed in the cavities of the matrix a spray of elements, characterized in that the spraying devices are disposed in a matrix in the form of powders having different density, and the dependence of the surface area of each element and its density determined by the ratio

where Sithe surface area of the i-th element;

ρithe density of the i-th element;

andiis the stoichiometric coefficient of the i-th element in the chemical formula or the percentage of the i-th element in the film;

Maiatomic mass of the i-th element;

Mandatomic mass of the ions of gas;

Eci- energy sublimation of the i-th element;

αi- the dimensionless parameter of the i-th element, dependentwhere i varies from 2 to n (n is the total number of placed in the matrix elements);

S1the surface area of the matrix;/p>

ρ1the density matrix element;

and1is the stoichiometric coefficient of the matrix element in the chemical formula or the percentage of the matrix element in the film;

Ma1atomic mass of element matrices;

Ec1- energy sublimation of atoms of element matrices;

α1- the dimensionless parameter of the matrix element that depends on.

2. A method of manufacturing a target for ion-plasma deposition of thin film coatings of complex composition, comprising placing a spray of elements in the recesses of the matrix, characterized in that the spray elements placed in a matrix in the form of powders, and the powders are pressed alternately with different pressure and provide different density of sprayed elements of the target in accordance with a ratio according to claim 1.



 

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