Characterised by the method of coating and and (C23C16/44)

ethod for obtaining diamond film on hard-alloy items made of carbide tungsten // 2634098
FIELD: metallurgy.SUBSTANCE: surface preparation of said hard alloy and gas-phase chemical deposition of carbon are carried out. The preparation of the surface of said hard alloy is carried out by grinding with a diamond paste followed by washing in acetone using ultrasound and removing the cobalt binder in the surface layer of said hard alloy by sequential treatment in concentrated H2SO4, Mixtures of H2O2:H2SO4 in the ratio 1:3 and H2O2 for 10, 40, 20 minutes, respectively. Then, an ultrasonic treatment is carried out in a nanodiamond suspension consisting of a oxide ceramic nanopowder ZrO2-Y2O3-CeO2 and nanodiamond powder and isopropyl alcohol. Then, gas-phase chemical precipitation of carbon is carried out at a microwave power of 700 W, a pressure in the chamber of 25 Torr, a composition of a gas mixture of 99:1 (H2:CH4), gas consumption 150 cm3/Min and sample temperature 720°C to obtain a continuous diamond film on said carbide hard-alloy items. In particular embodiments of the invention, the ultrasonic treatment is carried out in a nanodiamond suspension containing a nanopowder of an oxide ceramic ZrO2-Y2O3-CeO2 with a particle size of 18-21 nm and a nanodiamond powder synthesized by the CVD method, with a size of 90-120 nm.EFFECT: increasing the nucleation of the diamond phase and obtaining a film on a solid alloy of tungsten carbide that does not contain additional impurities.2 cl, 4 dwg, 1 ex
ethod for titanium silicides production // 2629121
FIELD: chemistry.SUBSTANCE: method for titanium silicides production involves mixing of titanium and silicon gaseous halides, taken at a molar ratio of 5:3 to 1:2 at a temperature of 450 to 1100°C in an inert gas atmosphere at normal pressure, titanium silicides synthesis by reduction of the titanium and silicon halides mixture in an inert gas atmosphere at normal pressure with molten zinc at a temperature of 450 to 900°C or zinc vapor at a temperature of 900 to 1100°C, titanium silicides purification by zinc halides and zinc metal distilling in an inert gas atmosphere at a temperature of 900 to 1100°C under normal pressure or in a vacuum at a temperature of 700 to 900°C.EFFECT: provision of a simple, economical and safe method for titanium silicides production while expanding the range of feedstock by using chlorides, bromides and iodides of titanium and silicon.3 ex
ethod of amorphous silicon coating producing on metal substrate internal surface // 2606690
FIELD: technological processes.SUBSTANCE: present invention relates to amorphous silicon coating on metal substrate internal surface producing method and can be used in gas-bearing systems natural gas samples taking and keeping for preparation of substrate, for example, gas storage vessel or supply pipeline, in oil and gas industry products quality control systems, in commercial metering units, in quantity and quality parameters measurement systems of gas and liquefied petroleum gases in gas main lines. Performing substrate inner surface cleaning with organic solvent and its activation with mineral acid or alkali solution, silicon precursor feeding into substrate in form of silicon hydride in amount from 5 vol% to 30% vol. with mixing with inert gas in form of argon, helium, mixtures thereof or nitrogen and silicon hydride decomposition at temperature from 600 °C to 1,000 °C during from 3 to 240 minutes. In particular cases of invention implementation, supply of silicon precursor into substrate is repeated until achievement of required coating thickness with intermediate substrate blowing with inert gas. Mixture of gases produced after decomposition reaction, is repeatedly used as carrier gas.EFFECT: providing higher quality of metal substrate internal surface coating with reduction of costs.3 cl, 1 ex

ethod of applying gas-tight coating of silicon carbide // 2601049
FIELD: chemistry.SUBSTANCE: invention relates to heat-protective and anti-oxidation coatings, and can be used to increase chemical resistance and operating temperature of materials, used in aerospace industry, fuel and energy sector, etc. Method of applying a gas-tight coating of silicon carbide on high-temperature material involves placing said part in a furnace heat zone and supplying to surface of said part gaseous silicon-containing and carbon-containing components. Gaseous silicon-containing component is obtained using silicon vapour source, in form of a silicon melt, which is placed in crucible in heat zone of furnace. Carbon-containing component used is gaseous hydrocarbons.EFFECT: reduced cost and faster process of producing coatings of gas-tight silicon carbide, higher thermal oxidative stability of protected materials, increased adhesion of silicon carbide, higher thermal oxidative strength of coated parts from various high-temperature materials.1 cl, 1 tbl, 8 dwg

ethod of regulating flow of coolant inside actively cooled structural elements and structural element // 2593798
FIELD: machine building. SUBSTANCE: invention relates to a method of aluminising inner surface of channel (10) of hollow structural element (1, 120, 130) of hydraulic machine and to hollow structural element (1, 120, 130) of hydraulic machine. Diffusion coating is applied by aluminising at least on internal surface of one channel (10) of structural element (1, 120, 130), wherein channel (10) comprises regions (4, 7) with different cross sections. Method comprises first application of diffusion coating by aluminising in area (7) with smaller cross section, providing a larger thickness of channel wall, and second application of diffusion coating by aluminising in area (4) with a large cross section, providing smaller bulge of channel wall as compared to said first application of coating. Source of aluminium used at said first aluminisation is Ni2Al3 (16), at second - NiAl (13). EFFECT: coolant flow rate adjustment is provided inside actively cooled structural elements. 9 cl, 6 dwg

High-strength material coated article made from metal, solid alloy, cermet or ceramic and method of making said articles // 2588933
FIELD: technological processes.SUBSTANCE: invention relates to high-strength coating applied on article made from metal, solid alloy, cermet or ceramics by thermal chemical vapour deposition without additional plasma excitation and a method of applying said coating. Said high-strength coating contains at least one nanocomposite layer TiSiCN, containing nano-crystalline phase of TiCxN1-x with size of crystallites from 5 to 150 nm, where 0.1≤x≤0.99, and second phase of amorphous SiCxNy. Method of applying said high-strength coating is characterised by that at least one composite layer from TiSiCN is deposited on an article from a gas mixture containing at least one titanium halide, at least one silicon-containing precursor, hydrogen and reaction compounds containing carbon and nitrogen atoms, and/or nitrogen compounds, and/or hydrocarbons and/or inert gases by thermal chemical vapour deposition at a temperature of 700-1,100°C and pressure from 10 Pa to 101.3 kPa without additional plasma excitation. Molar ratio between halides of titanium and silicon-containing precursors is selected to ensure in a gaseous mixture ratio between silicon and titanium atoms content greater than 1.EFFECT: providing coating with high hardness, resistance to oxidation and temperature resistance, as well as high adhesion strength, and can be used for protection of various tools from hard alloys and ceramics.13 cl, 2 dwg, 3 ex

Substrate for chemical vapour deposition (cvd) of diamond and method for obtaining thereof // 2577638
FIELD: chemistry.SUBSTANCE: invention relates to substrate for diamond coating, applied by chemical vapour deposition (CVD) method, method for its formation and electrode rod for formation of substrate by said method. Substrate contains base of carbide solid alloy or steel and layer, which contains diamond particles as seed crystal in matrix, which are deposited connected with matrix material on the surface of said base, in which said seed diamond particles have average particle size 1 mcm or smaller. Said matrix contains first element, selected from first group, consisting of Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W, and/or first compound of said first element and non-metal substance, selected from boron, carbon and nitrogen, and is made with possibility of holding diamond particles, distributed in it. Connective zone is formed as a result of diffusion of atoms of said first element and said carbide solid alloy or steel and distribution through material of said matrix and said base. Electrode rod is made by pressing mixed powder, obtained by mixing powder of at least one first element, selected from first group, consisting of Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W, and/or powder of inter-metal compound of said first element and second element, selected from the group, consisting of Al, Si and Ni, and powder of first compound of said first element and non-metal substance, selected from boron, carbon and nitrogen.EFFECT: provided is technology for obtaining substrate for deposition of diamond layer on instrument materials, for instance, from tungsten-carbide alloy, and constructive materials, containing metals of iron group, without deterioration of base material properties.13 cl, 1 dwg, 11 ex
ethod for wear-resistant coating deposition on piston seal surface // 2574563
FIELD: chemistry.SUBSTANCE: method for wear-resistant coating deposition on the surface of a cast iron or steel piston seal, at least partially, at least on its internal surface, where an intermediate layer a-C:H:X, where X is silicon, germanium, fluorine, boron, oxygen and/or nitrogen, is deposited, and there are also provided a layer (PVD-layer) containing chromium, aluminium and/or tungsten nitrides and/or carbides, applied by vapour deposition, and/or DLC-layer consisting of one or all the following layers: an adhesive layer 1.0 mcm thick or less of chromium and/or titanium, at least one metal intermediate layer a-C:H:Me, where Me is tungsten, titanium and/or chromium, or a-C:H:X, where X is silicone, germanium, fluorine, boron, oxygen and/or nitrogen, having a thickness of 0.1 mcm to 5 mcm, and a metal-free upper layer a-C:H 0.1 mcm to 5 mcm thick.EFFECT: improving frictional properties and/or wear behaviours of at least one component of two-part oil piston seal.4 cl

Coated bodies made of metal, solid alloy, cermet or ceramic and method of coating said bodies // 2563080
FIELD: chemistry.SUBSTANCE: invention relates to a wear resistant single- or multilayer coating applied by low-pressure chemical vapour deposition (LPCVD) without exciting plasma on a body made of metal, solid, alloy, cermet or ceramic, and to a method of applying said coating. Said coating contains at least one composite layer of solid material, wherein the main phases are cubic TiAlCN or hexagonal A1N. The cubic TiAlCN is microcrystalline face-centred cubic fcc-Ti1-xAlxCyNz, where x>0.75, y=0-0.25 and z=0.75-1 with crystallite size ≥0.1 mcm, wherein said composite layer further contains in grain boundary regions amorphous carbon with weight ratio of 0.01-20%. Said composite layer is deposited on said body via said method using a gas mixture containing Ti, Al, C and N precursors at temperature of 700-900°C and pressure of 102-105 Pa.EFFECT: providing a coating with a fine-grained composite structure with a smooth homogeneous surface, high oxidation resistance and high hardness.12 cl, 3 dwg, 2 ex

Helical compression steel spring for piston ring // 2558705
FIELD: machine building.SUBSTANCE: invention relates to helical compression steel spring for piston ring made with wear-resistant coating, that can be used as component of oil wiper ring in the piston of the internal-combustion engine. The wear-resistant coating contains layers of CrN and metal-containing DLC-layers out of a-C:H:Me, where Me is tungsten, chrome, titanium, germanium or silicon, at that number of layers is from 10 to 200, and layers out of CrN and a-C:H:Me have thickness from 30 to 100 nm.EFFECT: helical compression spring with improved friction properties, wear-resistance and running-in ability of at least one component of oil wiper piston ring out of two parts is ensured.7 cl, 1 dwg

Sliding element, in particular piston ring, and method of sliding element coating // 2558024
FIELD: machine building.SUBSTANCE: invention relates to a sliding element, in particular to piston ring, with coating, and also to method of coating application to the sliding element. Piston ring of internal-combustion engine is made out of cast iron or steel, and has wear-resistant coating. Specified coating has thickness from 2 to 40 mcm, and contains adhesive layer out of chrome (12), several alternating layers out of CrN (14) and metal-containing DLC-layers out of -C:H:Me (16), where Me is tungsten, chrome, titanium, germanium or silicon. The adhesive layer out of chrome (12) is applied by evaporation spattering, the alternating layers out of CrN (14) are applied by ion-plasma spattering, and a specified metal-containing DLC-layers are applied by plasma activated chemical vapour deposition (PA-CVD).EFFECT: sliding element is provided that together with adjoined element complies with the requirements for service life, and power consumption for friction overcoming.12 cl, 2 dwg, 1 tbl

ethod of cleaning for coating application plants // 2554838
FIELD: technological processes.SUBSTANCE: invention relates to the method of cleaning of auxiliary surfaces of coating application plants, which comprises a chamber for coating application. Prior to application of the coating, an anti-adhesive layer is applied onto auxiliary surfaces of the coating application chamber. After application of the coating they treat auxiliary surfaces with the help of jet treatment with dry ice and/or snow CO2.EFFECT: simplified cleaning of part surface with eliminated wear.4 cl, 4 dwg

Composite material c/al2o3 and method of its obtaining // 2552634
FIELD: chemistry.SUBSTANCE: uniform, continuous and dense layer of pyrolytic carbon has width of carbon coating, close to monolayer coating, equal 0.4-0.5 nm, density of precipitated carbon coating, equal ρC = 2.0-2.1 g/cm3, specific surface SBET = 90-200 m2/g, cumulative volume of pores ΣVpore≤0.4 cm3/g, average size of pores DBET≤10 nm, most probable size of pores DBJH = 5-7 nm with absence of micro pores. Invention also relates to method of production of such mesoporous composite material.EFFECT: claimed mesoporous composite material has high-quality thin carbon coating, which totally and uniformly covers external surface and walls of pores of said material.4 cl, 3 dwg, 3 tbl, 10 ex

Semiconductor growing method and semiconductor device // 2520283
FIELD: electricity.SUBSTANCE: group of inventions is related to semiconductor materials. A method (version 1) includes provision of a reaction chamber, a semiconductor substrate, a precursor gas or precursor gases, epitaxial CVD growing of a doped semiconductor material at the substrate in the reaction chamber in order to form the first layer, blowing of the reaction chamber with a gas mixture including hydrogen and halogen-containing gas with reduction of dopant memory effect without removal of the respective precipitated layer from the reaction zone and epitaxial CVD growing of the doped semiconductor material at the above substrate in the reaction chamber in order to form the second layer. The semiconductor device contains the semiconductor material received by the above method. The method (version 2) includes introduction of a new semiconductor substrate in the above reaction chamber after the above blowing process and epitaxial CVD growing of the doped semiconductor material at the above new semiconductor substrate.EFFECT: reproducibility of electrical properties during growing of semiconductor materials.13 cl, 3 dwg, 1 tbl, 1 ex

Chromium-based wearproof metal coating and method of its application // 2513496
FIELD: chemistry.SUBSTANCE: invention relates to obtaining coatings by method of chemical sedimentation from gas phase, namely to obtaining protective coatings from chromium and its alloys. Method of application of chromium-based wearproof metal coating includes supply of steam-gas mixture, which contains bis-arene compound of chromium and volatile compound of tin to the surface of heated product in vacuum, as volatile compound of tin applied is 0.1-1.0% tin tetrachloride, and process is carried out at temperature of heated product from 350 to 400 °C. Wearproof chromium-based metal coating contains modifying tin additive, has multi-layer structure from sequentially placed layers based on chromium with modifying tin additive, enriched and depleted of carbon. In depleted of carbon layers content of carbon is 0.5-5.0%, and in enriched with carbon layers - 6.0-12.0%.EFFECT: increased wear stability of coatings is ensured, which makes it possible to improve tribological characteristics of engine details.3 cl, 3 dwg, 2 tbl, 2 ex

ethod of cleaning for coating applicators // 2510664
FIELD: process engineering.SUBSTANCE: invention relates to pre-treatment of auxiliary surfaces of coating applicators. Auxiliary surfaces of coating applicators are subjected to pre-treatment by application thereon of release ply composed by suspension of graphite powder in volatile solvent. At further coating application coating material adhesion on auxiliary surfaces decreases notably as compared with adhesion without pre-treatment.EFFECT: simplified procedure.4 cl, 4 dwg

Systems and methods to distribute gas in reactor for chemical deposition from steam phase // 2499081
FIELD: machine building.SUBSTANCE: reactor for chemical deposition of polycrystalline silicon includes a reaction chamber, comprising a support board fixed in the reaction chamber, and a jacket connected to the support board for formation of the deposition chamber, a filament element attached to the support board, a source of electric current for supply of current to the filament element, a source of silicon-containing gas connected with the reaction chamber to create the flow of silicon-containing gas via the reaction chamber and the vertical pipe, connected to the source of silicon-containing gas, for introduction of the flow of silicon-containing gas into the reaction chamber. The vertical pipe is made as capable of receiving deposits of polycrystalline silicon in the reaction chamber.EFFECT: improved flow of gas in all volume of a reaction chamber, which makes it possible to increase yield of polycrystalline silicon, improved quality of polycrystalline silicon and reduced energy consumption.22 cl, 4 dwg

Production plant for material deposition and electrode for use in it // 2494579
FIELD: electricity.SUBSTANCE: bearing substrate has the first end and the second end located at the distance from each other. A contact seat is arranged on each end of the bearing substrate. The production plant comprises a body, which forms a chamber. At least one electrode is arranged as stretching through the body, besides, this electrode is at least partially arranged inside the chamber for connection with the contact seat. The electrode has outer surface that has an area of contact, which is adapted for contact with the contact seat. An outer coating is arranged on the outer surface of the electrode, outside the contact area. The outer coating has electric conductivity, at least, 9×106 Siemens/metre and corrosion resistance higher than of silver in the row of electrode potentials, which is based on using marine water of room temperature as electrolyte.EFFECT: slower clogging of an electrode and its increased service life.28 cl, 5 dwg

Production plant for material deposition and electrode for use // 2494578
FIELD: electricity.SUBSTANCE: bearing substrate has the first end and the second end located at the distance from each other. A contact seat is arranged on each end of the bearing substrate. The production plant comprises a body, which forms a chamber. At least one electrode is arranged as stretching through the body, besides, the electrode is at least partially arranged inside the chamber for connection with the contact seat. The electrode has outer surface that has an area of contact, which is adapted for contact with the contact seat. The contact area coating is arranged on the contact area of the outer surface of the electrode. The coating of the contact area has electric conductivity, at least, 9×106 Siemens/metre and corrosion resistance higher than of silver in the row of electrode potentials, which is based on using marine water of room temperature as electrolyte.EFFECT: invention makes it possible to reduce problem of electrode clogging and to increase efficiency and service life of an electrode.29 cl, 7 dwg

Composite nanopowder and method for production thereof // 2493938
FIELD: chemistry.SUBSTANCE: invention relates to chemical industry and can be used in producing nanopowder by a plasma-chemical method. The composite nanopowder contains particles consisting of a core, which consists of layers of titanium carbonitride and titanium nitrate, and a cladding which consists of a layer of nickel, with the following ratio of layers of the core and cladding, wt %: TiCxNy, where 0.28≤x≤0.70; 0.27≤y≤0.63; - 24-66; TiN0.6 - 30-67; Ni - 4-9. The method involves feeding a precursor containing titanium nickelide and titanium carbide into a reactor-evaporator, treating in a current of nitrogen plasma at plasma flow rate of 60-100 m/s and at precursor feeding rate of 100-140 g/h, subsequent cooling in a current of nitrogen and trapping the evaporation product on a filter surface. The precursor contains said components in the following ratio TiNi:TiC=25-50:50-75.EFFECT: obtaining nanocomposite powder which enables to obtain harder alloys.2 cl, 3 dwg, 2 ex

ethod for obtaining coatings from platinum metals // 2489516
FIELD: metallurgy.SUBSTANCE: coatings are obtained from iridium or rhodium; thermal decomposition process is performed at the temperature of 250-450°C and pressure of 0.01-0.05 mm Hg, and as a precursor there used is hydride of iridium tetra-trifluorophosphine of formula HIr(PF3)4 or hydride of rhodium tetra-trifluorophosphine of formula HRh(PF3)4 respectively.EFFECT: obtaining pore-free microcrystalline coatings with high adhesion to substrate material.4 tbl, 1 ex

Apparatus for catalytic chemical vapour deposition // 2486283
FIELD: chemistry.SUBSTANCE: apparatus has a reaction chamber, a support means mounted in the reaction chamber for supporting the substrate to be processed, a gas source for feeding into the reaction chamber starting gas containing the element to be deposited, a catalyst wire lying opposite said substrate and made from tantalum wire with a tantalum boride layer which is formed on the surface of the tantalum wire before feeding the starting gas. Said apparatus also has a heat source for heating the catalyst wire in order to deposit onto the substrate decomposition products of the starting gas formed by catalysis or via a thermal decomposition reaction. Said apparatus further includes a control means for activating heating of the catalyst wire with the heat source through continuous supply of energy.EFFECT: prolonging service life of the catalyst wire by reducing thermal expansion of the catalyst wire and increasing its mechanical strength.2 cl, 4 dwg, 1 ex

Vacuum chamber on frame base for coating application plants // 2486278
FIELD: metallurgy.SUBSTANCE: chamber includes a chamber frame. Insert panels are inserted into the frame mechanically detachably and tightly, besides, some of the insert panels carry functional elements. The chamber frame includes at least one main surface with cantilevers cut from a moulded solid metal panel. Cantilevers are bent in the field of attachment to the main surface so that they form chamber frame links. The side surface of the frame is formed from a solid metal part, in which a material with large surface is cut.EFFECT: holes are produced for insert panels, where insert panels are installed, no welded joints are required.11 cl, 10 dwg

Reactor for epitaxial growth of hydrides in vapor phase // 2484177
FIELD: machine building.SUBSTANCE: reactor comprises reaction chamber with inlet for feeding process gases therein and outlet for discharge of residual gases, and pump to force residual gases from reaction chamber via said outlet. Said pump produces and maintains pressure in reaction chamber equal to or lower than approx. 10 kPa (100 mbar). Besides, reactor comprises appliances to feed liquid diluents into pump to dilute harmful substances precipitated from residual gases on pump inner surfaces. Said appliances are composed of container for diluents communicated with pump delivery and discharge openings to make closed circuit for diluent circulation.EFFECT: continuous operation.2 cl, 1 dwg

Porous article sealing system // 2445405
FIELD: machine building.SUBSTANCE: at least, first set of porous substrates is arranged in first reaction chamber. Note here that packs of porous substrates arranged along periphery of reaction chamber represent uncompacted porous substrates, partially compacted porous substrates of combination of both aforesaid substrates. One or several packs of partially compacted substrates are located at central part. at least, first set of porous substrate pack set is compacted by chemical infiltration of gas phase. Arrangement and alternation of uncompacted porous substrates and partially compacted substrates allow using thermal characteristics of partially compacted porous substrates for better distribution of heat flow in CVI-furnace chamber.EFFECT: better quality of compaction, higher efficiency of process.10 cl, 29 dwg, 4 tbl, 4 ex

Increase of polysilicon deposition efficiency in the deposition reactor from steam phase // 2442844
FIELD: chemistry.SUBSTANCE: the invention relates to production of polysilicon, in particular, to the reactor for chemical deposition of polysilicon from steam phase. = The reactor includes a support system fitted with supports for heating elements and the hull attached to the said support system, forming the deposition chamber. The device comprises at least one silicone heating element positioned in the chamber on the supports, and a power source connectable with both ends of the heating element through lead-ins in the support system, used to heat the heating element. The support system has a gas inlet connected with the silicon-containing gas source and a gas outlet. Furthermore, the heating element is U-shaped and has at least one tubular section with the outer diameter of at least 20 mm and the ratio of wall width to the outer diameter less than 1/4. EFFECT: increased polysilicon production yield.7 cl, 6 dwg

Heat source // 2439196
FIELD: power engineering.SUBSTANCE: heat source (1) comprises a container (2) for an initial substance and a cavity (4). The container (2) for the initial substance is made as detachable with the possibility of attachment to the cover (6), having the first heating device (8) to heat the cover (6) so that heat due to heat conductivity is sent to the container (2) and further to the initial substance in the cavity (4). The cover (6) additionally comprises a heated supply channel (14), being in a liquid connection with the cavity (4), to supply the initial substance from the cavity (4) into the reactor so that between the container (2) for the initial substance and the reactor an increasing temperature gradient is achieved.EFFECT: heat source provides for production of a temperature gradient that increases in direction to the reactor, which prevents condensation of the initial substance.19 cl, 2 dwg

Coated articles // 2413746
FIELD: chemistry.SUBSTANCE: invention relates to a method of coating articles made from valve metals which are used as component parts of turbomolecular pumps. An article made from a valve metal selected from aluminium, magnesium, titanium, niobium and/or zirconium and alloys thereof, is coated with an oxide ceramic layer formed from metal using a plasma-chemical method. The ceramic layer has a barrier inter-phase layer adjoining the metal, whose surface is coated with a polymer formed from monomers in form of dimers or halogenated dimers of general formula I where R1 denotes one or more hydrogens or halogens; each R2 denotes hydrogen or halogen; and each R3 denotes a xylylene residue with formation of a dimeric structure. Said monomers are incorporated into a capillary system and then polymerised on the surface of the oxide ceramic layer in a vacuum.EFFECT: invention enables to obtain coatings with uniform surface porosity and high resistance to aggressive and corrosive media.10 cl, 1 ex

ethod for obtaining oriented fluoride coatings from gas phase // 2405857
FIELD: metallurgy.SUBSTANCE: method for obtaining oriented fluoride coatings by method of chemical deposition from vapour phase involves arrangement of bottom layer in deposition zone of chemical deposition reactor at temperature of 250-400°C, deposition of fluoride coating on the bottom layer by mixing the flow of metal-organic compounds which are evaporated within temperature range of 150-300°C and pressure of 1-20 mbar, and fluoride-forming flow. As metal-organic compounds there used are volatile metal-organic compounds not containing fluor. Fluoride-forming flow is generated from solid precursor as a result of its evaporation directly in chemical deposition reactor at temperature of 50-120°C from solid precursor, and acid nonorganic bifluoride is used as precursor. Flow of metal-organic compounds and fluoride-forming flow is supplied to deposition zone either with counter-flow, or by coaxial introduction of flows in the inert gas flow.EFFECT: range of used bottom layers and metal-organic reagents is enlarged, corrosion of equipment is eliminated at performing this method, protection of the obtained coatings is provided against oxidation, temperature of the process performed decreases and cost of the obtained coatings is reduced.6 cl, 2 dwg, 4 ex

ethod of gas-jet application of nano-dimensioned metal polymeric coatings // 2403317
FIELD: metallurgy.SUBSTANCE: in vacuum chamber of reactor for evaporation and pyrolysis containing one or more polymers there arranged is reactor for controlled evaporation of metal, which contains one or more metals, and substrate. There performed is simultaneous heating of reactor for evaporation and pyrolysis for decomposition of polymer to precursor gas and reactor for controlled metal evaporation. Supersonic or subsonic jet is formed when precursor gas passes through reactor nozzle for evaporation and pyrolysis. Then leaking of formed jet is performed to heated wire net installed on reactor nozzle for evaporation and pyrolysis, and formed jet is supplied to substrate. Polymerisation is performed on substrate so that polymer material is formed. Carrying gas is simultaneously supplied to heated reactor for controlled evaporation of metal. Then carrying gas jet together with vapours of one or more metals and/or their oxides is supplied to substrate and vapours of one or more metals and/or their oxides are mixed so that polymer is formed on rotating substrate and metal polymeric material is formed. Process is performed at vacuum chamber pressure of 10-2 -10-1 torr.EFFECT: metal polymeric materials are obtained with new unique properties; at that, the design is simplified and cost of plant for obtaining metal polymeric coatings is decreased.5 dwg, 1 ex

Source for vapour-phase deposition, mount for this source and method of mounting and dismantling said source // 2398048
FIELD: process engineering.SUBSTANCE: invention relates to liquid or solid material source for vapour-phase deposition, and mount for this source to be arranged in reactor. Proposed source can be placed in at least partially, in fitting communicated with vapour-phase deposition reactor reaction chamber. Source consists of rod 5 with first and second ends 11 and 9, respectively, chamber 1 for solid or liquid material arranged on second end 9 or nearby it and having at least one partially open wall and isolating appliances representing casing to be fitted on the wall of chamber 1 to separate it from ambient atmosphere. Aforesaid casing and chamber can slide relative to each other to open and/or close chamber 1 after mounting proposed source in reactor fitting.EFFECT: ease of use and servicing.30 cl, 1 dwg

ethod of obtaining two-sided superconductor of second generation // 2386732
FIELD: metallurgy.SUBSTANCE: invention refers to chemical engineering and is used for obtaining the so called superconductors of the second generation. Method of obtaining two-sided superconductor of the second generation by means of chemical deposition method organometallic compounds from vapour phase in tubular chemical deposition reactor consists in the fact that first, in tubular reactor there deposited simultaneously on both sides of moving long base is buffer layer from vapours of organometallic compounds at 350-850°C, and then in the above reactor there deposited simultaneously on both sides of moving long base is superconducting layer on the applied buffer layer from vapours of organometallic compounds at 650-850°C; at that, heating of tubular reactor is performed by means of heating elements located along external surface of tubular reactor; tubular reactor pressure is kept equal to 0.1-100 Mbar, organometallic compounds are pre-evaporated in evaporator at 150-300°C and supplied with carrier gas to tubular reactor deposition zone; base movement is carried out with speed of 1-10 m/hour, and tubular reactor is blown down on two opposite sides with gaseous flow.EFFECT: invention allows applying buffer layer and superconducting layer simultaneously on both sides of moving long carrier tape, thus doubling critical current value of isolated conductor, enlarging the choice of types of used bases, decreasing deposition temperature at increase of qualitative characteristics of deposited buffer and superconducting layers, and increasing the pressure for carrying out the process.13 cl, 6 ex, 1 tbl, 10 dwg

Bubbler for constant delivery of vapour of solid chemical // 2384652
FIELD: chemistry.SUBSTANCE: invention relates to a bubbler for providing an evaporated compound during chemical vapour phase deposition and can be used in the production of semiconductors. The composite construction of the bubbler chamber has one or more chambers joined into rows. All the chambers are essentially vertical or are at an angle of 45° to the horizontal. Inside the chamber(s) there is a solid or liquid source of compound. The ratio of the length of the chamber or the combined length of the chamber joined into a row relative the direction of the stream of the carrier gas though the chamber(s) to the average diametre, equivalent to the cross section of the chamber(s) relative the direction of the carrier gas through the chamber(s) is not less than approximately 6:1.EFFECT: stable and constant rate of delivering an evaporated compound during vapour deposition.19 cl, 11 dwg, 3 ex

Instrument with covering // 2384650
FIELD: metallurgy.SUBSTANCE: invention relates to instrument or item which allows coating. Cutting tool with coating which contains main part from in essence not containing carbon, heat-treatable alloy on the basis of iron of system iron-cobalt-molybdenum/ tungsten-nitrogen and coating, applied by method PVD or CVD and allowing one-phase crystalline structure with cubical face-centered lattice.EFFECT: obtaining tool with cutting part keeping equal cutting properties during cutting and allowing high thermal conduction that provides increasing of tool durability.12 cl, 5 dwg

Device for plasmochemical sedimentation from vapor phase of winding type // 2371515
FIELD: metallurgy.SUBSTANCE: invention relates to device for plasmochemical sedimentation from vapor phase of winding type for formation of coating layer on film. Film (22) is kept between couple of mobile drums, located at side of outlet and side of inlet of sedimentation section (25) relative to direction of movement of film (22). Then film (22) is forced to move linear into place of sedimentation. Distance between lattice for dispersion (37) and film (22) is kept constant, and quality of layer is homogeneous. Film is heated by means of metallic strip (40), simultaneously moving at reverse side of film. Movable drums are lifted from the position of sedimentation into position of self-cleaning, and film (22) can be separated from lattice for dispersion (37). Self-cleaning can be implemented on the way of sedimentation on film, closing slot of mask (51) by shutter (65) and, thereby, preventing dispersion of cleaning gas.EFFECT: invention provides receiving of layer's high quality ensured by feeding of reactionary gas evenly to sedimentation area of film, and it is possible to implemented self-cleaning process of sedimentation area on the way of sedimentation on film.19 cl, 7 dwg

Simple system of chemical deposition from vapours and plating methods of many-metallic aluminide coatings // 2352685
FIELD: metallurgy.SUBSTANCE: invention relates to system an method of chemical deposition of vapours (CDV) for plating on jet detail aluminide coating and can be used while manufacturing and repair of jets. It is implemented plating, consisting two or more number of impurity metallic components. Aluminide coating is able to form protective complex oxide at following heating in oxidising medium. At least one of impurity metal in aluminide coating is delivered in the form of separated vapor-phase reagent from container, connected by closed passage with reaction chamber of CDV system and free from gas-carrier. Aluminide coating is formed by means of chemical unification of vapor-phase reagent with other vapor-phase reagent, formed either on place in reaction chamber, or fed by gas-carrier to reaction cham from the source of parent substance.EFFECT: it is received a qualitative coating.37 cl, 3 dwg

ethod of depositing thin stoichiometric films of binary compounds // 2342469
FIELD: nanotechnology.SUBSTANCE: present invention pertains to semiconductor nanotechnology, in particular, to thin-film material science, and can be used in modern technology, especially the fast growing technology of integral circuits. To deposit thin stoichiometric films of binary CdTe compound, the following technological operations are carried out. Successive processing of the substrate surface is carried out at 210-390°C using vapours of cation- and anion containing reagents-precursors of dimethylcadmium and methallyl telluride mixed with a gas carrier. Intermediate removal of tellurium from the surface of the substrate is carried out, which is in excess after formation of the stoichiometric CdTe compound. Removal is done by treatment with a reagent-precursor, which forms a volatile compound with the tellurium.EFFECT: obtaining high quality thin stoichiometric films of binary CdTe compound are obtained without geometrical and chemical defects.4 cl, 9 dwg

etallisation of base (bases) by method of depositing from steam-and-liquid phase // 2330122
FIELD: technological processes.SUBSTANCE: invention is related to metal coatings that are applied by means of chemical-thermal deposition from steam phase, and also to products and methods. Metal-containing precursor is transported in transport medium via chamber to base at temperature in transport volume that is less than temperature of metal-containing precursor decomposition. Deposition of metal layer onto base is carried out by means of decomposition of metal-containing precursor on base. Temperature at base is higher than decomposition temperature of metal-containing precursor. Temperature of base and temperature of metal-containing precursor in transport volume are measured directly. Rate of deposition and quality of mentioned metal layer on specified base is controlled by means of regulation of specified base temperature and temperature of metal-containing precursor in transport volume with application of transport mediums that are saturated with precursor. Temperature is regulated between transport mediums and base and during maintenance of conditions for transport mediums that are at least close to saturation.EFFECT: improves quality of thin film from deposited material and significantly reduces formation of metal dust.44 cl, 10 dwg, 2 tbl, 12 ex

ethod and plant for evaporation of reagents used for application of coats by chemical deposition from vapor phase // 2303078
FIELD: evaporation of liquid reagents used as precursors at application of coats by chemical deposition from vapor phase.SUBSTANCE: liquid precursors of coat are continuously injected into evaporation chamber for forming the vapor. Evaporation chamber is provided with unit for distribution of liquid precursors of coat and is set in rotation by drive magnetic clutch not provided with seals. According to one version, gas forming the barrier before evaporation chamber is injected into zone located near evaporation chamber; velocity of this gas exceeds velocity of coat precursor vapor escaping from evaporation chamber, thus excluding penetration of vapor into drive magnetic clutch. According to another version, first member of drive magnetic clutch is connected with liquid precursor distributing unit located in evaporation chamber. Second member of drive magnetic clutch located near first member outside the evaporation chamber is set in rotation by first member of clutch which is connected with it by magnetic field.EFFECT: possibility of obtaining pure flow of vapor used for chemical deposition of coats.56 cl, 5 dwg

Process monitoring method with use of gaseous reagent containing one or more gaseous hydrocarbons // 2291914
FIELD: processes of chemical infiltration or chemical deposition from vapor phase, case hardening in furnace.SUBSTANCE: method is used for monitoring process realized in furnace with use of gas reagent containing at least one gaseous hydrocarbon. Method comprises steps of adjusting working parameters of furnace; adding into furnace gas-reagent containing at least one gaseous hydrocarbon; discharging from furnace exhaust gases that contain by-products of gas-reagent reaction; washing out exhaust gases by means of oil that absorbs resins present in exhaust gases; receiving information related to process according to measured quantity of resins absorbed by oil. It is possible to change working parameters of furnace such as temperature, pressure in furnace, gas-reagent consumption and composition.EFFECT: possibility for monitoring process in furnace without special apparatus of infiltration furnace.14 cl, 1 dwg, 1 ex

ethod of forming of polycrystalline silicon layers // 2261937
FIELD: microelectronics; methods of manufacture of microcircuit chips.SUBSTANCE: the offered invention is pertaining to the field of microelectronics, in particular, to the methods of manufacture of microcircuit chips. The offered method includes a loading of semiconductor slices in a reactor having hot walls perpendicularly to a gas stream, pumping-out of the reactor air up to the ultimate vacuum, introduction of monosilane for deposition of layers of polycrystalline silicon, silane supply cutoff, pumping-out of the reactor air up to the ultimate vacuum, delivery of a noble gas into the reactor up to atmospheric air pressure, unloading of the semiconductor slices from the reactor. After introduction of the noble gas into the reactor conduct an additional thermal annealing of layers of polycrystalline silicon at the temperature of no less than 1323K, then keep the slices at this temperature during 40-60 minutes in a stream of noble gas and reduce the temperature down to the temperature of the polycrystalline silicon layers growth. The technical result of the invention is a decrease of heterogeneity of resistance of the polycrystalline silicon layers.EFFECT: the invention ensures a decrease of heterogeneity of resistance of the polycrystalline silicon layers.1 dwg, 2 tbl, 1 ex

ethod of preparing moisture-resistant particles of electroluminescent phosphor // 2247761
FIELD: luminescent materials.SUBSTANCE: nitride coating precursor, in particular aluminum-, gallium-, or tin-containing metalloorganic nitride, is charged into reaction vessel 10a filled with electroluminescent phosphor, e.g. ZuS-Cu, and surrounded by heating means 30a using nitrogen as inert gas carrier. Precursor is passed through pipeline 32 open all over its length. Co-reagent, e.g. anhydrous ammonia is fed into lower part of vessel 12a through porous glass disk 12a. When vessel 10a is heated to 150-225°C, nitride coating precipitates on phosphor particles being in fluidized state. Phosphor bearing nonoxide coating is characterized by high brightness after 100 h use at high humidity.EFFECT: enabled large-scale manufacture of phosphors.3 cl, 2 dwg
ethod for manufacturing printed circuit boards // 2246558
FIELD: radio and electric engineering.SUBSTANCE: method includes applying oxide dielectric film on heat-resistant board and making electric-conductive circuit imprint by photo-lithography method, after applying film, metallic film is applied with specific resistance ρ≤1 Ohm•sm with thickness 15-25 mcm, then protective, well-soldering, metal-resistant nickel or cobalt cover is applied with thickness 4-5 mcm, as dielectric oxide film chromium-oxide film of black color is used with thickness not less than 8 mcm with specific resistance ρ≥1x109 Ohm•sm. In certain cases of method realization, applying said dielectric oxide and then metallic with specific resistance ρ≤1 Ohm•sm and protective metal-resistant well-soldering films is performed on both sides of heat-resilient board and onto inner surface of technological apertures; as heat-resilient board titan or copper, or aluminum plates are used, as metallic cover with specific resistance ρ≤1 Ohm•sm copper or aluminum, or molybdenum are precipitated.EFFECT: higher efficiency.4 cl, 4 ex

ethod of production of composite materials // 2241516
The invention relates to desublimation technique and can be used in the chemical and pharmaceutical industries for the production of composite materials, including fine and ultrafine

The method and apparatus of the infiltration of gas phase chemical substances and chemical vapor deposition (options), the product obtained in this way, the feeder of the first of a reagent gas into the furnace for infiltration and deposition from the gas phase and the friction disk // 2173354
The invention relates to high-temperature composite materials obtained by the infiltration of gas phase chemical substances and deposition of matrix binder material in the porous structure of the

The method of chemical infiltration in the vapor phase to seal porous substrates located koltseobrazno piles // 2167217
The invention relates to the manufacture of composite materials

The body of cemented carbide coating and method of its manufacture // 2131328
The invention relates to the creation of a tool of cemented carbide with a wear resistant coating obtained by deposition from the gas phase, which is used in the metal with the formation of chips

Cutting tool and method of coating // 2130823
The invention relates to cutting tools with alumoxane coating for machining metals with removing

The method of surface treatment and device for its implementation // 2099440
The invention relates to metallurgy and can be used for cleaning metal and other conductive surfaces from contamination and damage to their various kinds and functional coatings
 
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